JP6255268B2 - 大開口数で撮像するための多重反射素子を有する反射屈折光学系 - Google Patents

大開口数で撮像するための多重反射素子を有する反射屈折光学系 Download PDF

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JP6255268B2
JP6255268B2 JP2014023770A JP2014023770A JP6255268B2 JP 6255268 B2 JP6255268 B2 JP 6255268B2 JP 2014023770 A JP2014023770 A JP 2014023770A JP 2014023770 A JP2014023770 A JP 2014023770A JP 6255268 B2 JP6255268 B2 JP 6255268B2
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image
catadioptric
reflection
group
optical system
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JP2014153719A (ja
JP2014153719A5 (enExample
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中野 正嗣
正嗣 中野
マニュエル サシアン アルバラード ジョセ
マニュエル サシアン アルバラード ジョセ
ティー・エラザリー テイマー
ティー・エラザリー テイマー
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University of Arizona
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University of Arizona
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0836Catadioptric systems using more than three curved mirrors
    • G02B17/084Catadioptric systems using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0856Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/02Objectives
    • G02B21/04Objectives involving mirrors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014023770A 2013-02-13 2014-02-10 大開口数で撮像するための多重反射素子を有する反射屈折光学系 Active JP6255268B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/766,442 US9329373B2 (en) 2013-02-13 2013-02-13 Catadioptric optical system with multi-reflection element for high numerical aperture imaging
US13/766442 2013-02-13

Publications (3)

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JP2014153719A JP2014153719A (ja) 2014-08-25
JP2014153719A5 JP2014153719A5 (enExample) 2017-03-09
JP6255268B2 true JP6255268B2 (ja) 2017-12-27

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JP2014023770A Active JP6255268B2 (ja) 2013-02-13 2014-02-10 大開口数で撮像するための多重反射素子を有する反射屈折光学系

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US (1) US9329373B2 (enExample)
JP (1) JP6255268B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9341831B2 (en) * 2011-06-10 2016-05-17 Canon Kabushiki Kaisha Optical system with catadioptric optical subsystem
KR20150141820A (ko) * 2014-06-10 2015-12-21 삼성전자주식회사 카타디옵트릭 그룹을 포함하는 대물 렌즈 조립체
US11038600B2 (en) * 2016-12-30 2021-06-15 Finnovate Group LLC Wireless audio streaming system for swimmers and under water applications
CN108873289B (zh) * 2018-09-04 2024-02-09 中国科学院长春光学精密机械与物理研究所 显微物镜光学系统及光学设备
CN110045492B (zh) * 2019-04-26 2024-03-15 中国科学院长春光学精密机械与物理研究所 宽谱段大数值孔径超高通量的显微物镜光学系统
TWI736246B (zh) * 2020-05-04 2021-08-11 大立光電股份有限公司 成像用光學鏡頭組、取像裝置及電子裝置
CN113050244B (zh) * 2021-03-22 2023-03-17 业成科技(成都)有限公司 镜片组件及显示装置
NL2027950B1 (en) * 2021-04-12 2022-10-21 Nearfield Instr B V Compact optical microscope, metrology device comprising the optical microscope and a wafer positioning metrology apparatus comprising the metrology device
US12455453B2 (en) 2023-04-25 2025-10-28 Apple Inc. Lens assembly with a supplemental mirror
CN117352527B (zh) * 2023-10-08 2024-04-26 同济大学 一种六通道阵列式Schwarzschild极紫外成像系统
CN117270185B (zh) * 2023-11-17 2024-02-20 长春长光智欧科技有限公司 一种大数值孔径宽光谱的显微光学系统

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US4863253A (en) 1987-09-25 1989-09-05 Spectra-Tech, Inc. High magnification reflecting microscope objective having a dual magnification mode and zoom magnification capability
CA2177424C (en) 1995-06-06 2001-02-13 Bruce A. Cameron Solid catadioptric lens
US5650877A (en) 1995-08-14 1997-07-22 Tropel Corporation Imaging system for deep ultraviolet lithography
US6064517A (en) * 1996-07-22 2000-05-16 Kla-Tencor Corporation High NA system for multiple mode imaging
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
KR100350990B1 (ko) 2000-12-14 2002-08-29 삼성전자 주식회사 고체함침미러형 대물렌즈 및 이를 채용한 광픽업장치
US7646533B2 (en) * 2003-02-21 2010-01-12 Kla-Tencor Technologies Corporation Small ultra-high NA catadioptric objective
US8675276B2 (en) * 2003-02-21 2014-03-18 Kla-Tencor Corporation Catadioptric imaging system for broad band microscopy
US7884998B2 (en) * 2003-02-21 2011-02-08 Kla - Tencor Corporation Catadioptric microscope objective employing immersion liquid for use in broad band microscopy
US7712905B2 (en) * 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
WO2007055742A2 (en) 2005-06-03 2007-05-18 The Regents Of The University Of California Multiple reflective lenses and lens systems
WO2008101676A2 (en) 2007-02-23 2008-08-28 Carl Zeiss Smt Ag Catadioptric projection objective
EP2203777B1 (en) 2007-10-02 2018-12-05 KLA-Tencor Corporation Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths
DE102008049589A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Optische Abbildungseinrichtung und Abbildungsverfahren für die Mikroskopie
US8238042B2 (en) * 2009-06-05 2012-08-07 CVI Melles Griot, Inc. Reflective axicon systems and methods
US8223443B2 (en) * 2010-09-01 2012-07-17 Kla-Tencor Corporation Collection optics

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JP2014153719A (ja) 2014-08-25
US9329373B2 (en) 2016-05-03
US20140226203A1 (en) 2014-08-14

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