JP6255186B2 - 光学部材の検査方法、光学製品の製造方法、及び、光学部材の検査装置 - Google Patents

光学部材の検査方法、光学製品の製造方法、及び、光学部材の検査装置 Download PDF

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JP6255186B2
JP6255186B2 JP2013164481A JP2013164481A JP6255186B2 JP 6255186 B2 JP6255186 B2 JP 6255186B2 JP 2013164481 A JP2013164481 A JP 2013164481A JP 2013164481 A JP2013164481 A JP 2013164481A JP 6255186 B2 JP6255186 B2 JP 6255186B2
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optical member
light source
imaging unit
source unit
optical
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JP2015034710A (ja
Inventor
田村　透
透 田村
修也 古澤
修也 古澤
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Nitto Denko Corp
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Nitto Denko Corp
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Priority to JP2013164481A priority Critical patent/JP6255186B2/ja
Priority to TW106143987A priority patent/TWI649555B/zh
Priority to TW103118410A priority patent/TWI630380B/zh
Priority to KR1020140090810A priority patent/KR102270956B1/ko
Priority to CN201410384065.0A priority patent/CN104345062B/zh
Publication of JP2015034710A publication Critical patent/JP2015034710A/ja
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Priority to KR1020200073511A priority patent/KR102373254B1/ko
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Mathematical Physics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2013164481A 2013-08-07 2013-08-07 光学部材の検査方法、光学製品の製造方法、及び、光学部材の検査装置 Active JP6255186B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2013164481A JP6255186B2 (ja) 2013-08-07 2013-08-07 光学部材の検査方法、光学製品の製造方法、及び、光学部材の検査装置
TW106143987A TWI649555B (zh) 2013-08-07 2014-05-27 光學構件的檢查方法、光學製品的製造方法、及光學構件的檢查裝置
TW103118410A TWI630380B (zh) 2013-08-07 2014-05-27 光學構件的檢查方法、光學製品的製造方法、及光學構件的檢查裝置
KR1020140090810A KR102270956B1 (ko) 2013-08-07 2014-07-18 광학 부재의 검사 방법, 광학 제품의 제조 방법 및 광학 부재의 검사 장치
CN201410384065.0A CN104345062B (zh) 2013-08-07 2014-08-06 光学构件的检查方法、光学产品的制造方法以及光学构件的检查装置
KR1020200073511A KR102373254B1 (ko) 2013-08-07 2020-06-17 광학 부재의 검사 방법, 광학 제품의 제조 방법 및 광학 부재의 검사 장치

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JP2013164481A JP6255186B2 (ja) 2013-08-07 2013-08-07 光学部材の検査方法、光学製品の製造方法、及び、光学部材の検査装置

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JP6255186B2 true JP6255186B2 (ja) 2017-12-27

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JP (1) JP6255186B2 (zh)
KR (2) KR102270956B1 (zh)
CN (1) CN104345062B (zh)
TW (2) TWI649555B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6255186B2 (ja) * 2013-08-07 2017-12-27 日東電工株式会社 光学部材の検査方法、光学製品の製造方法、及び、光学部材の検査装置
JP6807637B2 (ja) * 2015-09-30 2021-01-06 日東電工株式会社 偏光子の検査方法および偏光板の製造方法
JP6898492B2 (ja) * 2015-09-30 2021-07-07 日東電工株式会社 偏光子の検査方法および偏光板の製造方法
JP6986614B2 (ja) * 2015-10-05 2021-12-22 日東電工株式会社 偏光子の製造方法
JP6795883B2 (ja) * 2015-10-05 2020-12-02 日東電工株式会社 偏光子の製造方法
KR102286356B1 (ko) * 2016-10-26 2021-08-04 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 반사 및 투과형 나노포톤 디바이스를 위한 고 처리량, 고 해상도 광학 기법
CN113702382A (zh) * 2021-09-28 2021-11-26 浙江辛帝亚自动化科技有限公司 一种芯片检测机

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3677133B2 (ja) * 1996-12-18 2005-07-27 株式会社ヒューテック 透明体検査装置
JP4620228B2 (ja) * 2000-07-31 2011-01-26 大日本印刷株式会社 光散乱透過シートの欠点検査装置
JP2003344301A (ja) * 2002-05-31 2003-12-03 Sumitomo Chem Co Ltd 偏光フィルムの検査方法および検査装置
JP4839745B2 (ja) * 2004-09-17 2011-12-21 住友化学株式会社 光学積層体
JP4755888B2 (ja) * 2005-11-21 2011-08-24 住友化学株式会社 枚葉フィルム検査装置及び枚葉フィルム検査方法
JP5051874B2 (ja) 2006-01-11 2012-10-17 日東電工株式会社 積層フィルムの製造方法、積層フィルムの欠陥検出方法、積層フィルムの欠陥検出装置
JP2007298416A (ja) * 2006-04-28 2007-11-15 Kaneka Corp シート状透明体検査装置、シート状透明体の検査方法およびシート状透明体の製造方法
JP4960161B2 (ja) * 2006-10-11 2012-06-27 日東電工株式会社 検査データ処理装置及び検査データ処理方法
JP2008175609A (ja) * 2007-01-17 2008-07-31 Sekisui Chem Co Ltd 光学フィルムの検査方法及び光学フィルム
JP2009069142A (ja) * 2007-08-23 2009-04-02 Nitto Denko Corp 積層フィルムの欠陥検査方法およびその装置
JP2009205138A (ja) * 2008-01-28 2009-09-10 Nitto Denko Corp 光学表示ユニットの製造方法および製造システム
JP4785944B2 (ja) * 2008-04-16 2011-10-05 日東電工株式会社 光学表示装置の製造方法
JP4503691B1 (ja) * 2009-10-13 2010-07-14 日東電工株式会社 液層表示素子の連続製造方法及び装置
JP2011085520A (ja) * 2009-10-16 2011-04-28 Kaneka Corp 欠陥判別装置、欠陥判別方法及びシート状物
JP2011226957A (ja) * 2010-04-21 2011-11-10 Sanritz Corp 偏光板の欠陥検査方法及び欠陥検査装置
CN102906561B (zh) * 2010-05-25 2015-10-07 东丽株式会社 膜缺陷检查装置、缺陷检查方法和脱模膜
JP4921597B1 (ja) * 2011-03-18 2012-04-25 日東電工株式会社 液晶表示パネルの連続製造システムおよび液晶表示パネルの連続製造方法、並びに、検査装置および検査方法
JP6255186B2 (ja) * 2013-08-07 2017-12-27 日東電工株式会社 光学部材の検査方法、光学製品の製造方法、及び、光学部材の検査装置

Also Published As

Publication number Publication date
TW201809641A (zh) 2018-03-16
KR102270956B1 (ko) 2021-07-01
CN104345062B (zh) 2018-09-28
TWI630380B (zh) 2018-07-21
TW201506384A (zh) 2015-02-16
TWI649555B (zh) 2019-02-01
KR102373254B1 (ko) 2022-03-10
CN104345062A (zh) 2015-02-11
KR20200078438A (ko) 2020-07-01
JP2015034710A (ja) 2015-02-19
KR20150017663A (ko) 2015-02-17

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