JP6253269B2 - リソグラフィ装置、リソグラフィ方法、それを用いた物品の製造方法 - Google Patents

リソグラフィ装置、リソグラフィ方法、それを用いた物品の製造方法 Download PDF

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JP6253269B2
JP6253269B2 JP2013125997A JP2013125997A JP6253269B2 JP 6253269 B2 JP6253269 B2 JP 6253269B2 JP 2013125997 A JP2013125997 A JP 2013125997A JP 2013125997 A JP2013125997 A JP 2013125997A JP 6253269 B2 JP6253269 B2 JP 6253269B2
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JP2015002260A5 (enrdf_load_stackoverflow
JP2015002260A (ja
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順一 本島
順一 本島
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Canon Inc
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JP2013125997A 2013-06-14 2013-06-14 リソグラフィ装置、リソグラフィ方法、それを用いた物品の製造方法 Expired - Fee Related JP6253269B2 (ja)

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JP2015002260A JP2015002260A (ja) 2015-01-05
JP2015002260A5 JP2015002260A5 (enrdf_load_stackoverflow) 2016-07-28
JP6253269B2 true JP6253269B2 (ja) 2017-12-27

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KR102387289B1 (ko) 2015-07-20 2022-04-14 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 제어하는 방법, 리소그래피 장치 및 디바이스 제조 방법
JP7336343B2 (ja) * 2019-09-30 2023-08-31 キヤノン株式会社 露光装置、露光方法、および物品の製造方法
JP2021196540A (ja) * 2020-06-16 2021-12-27 キヤノン株式会社 決定方法、パターン形成方法、物品の製造方法、プログラム、およびリソグラフィ装置
CN115704997A (zh) * 2021-08-09 2023-02-17 长鑫存储技术有限公司 一种半导体器件制作方法、设备、半导体曝光方法及系统

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3428973B2 (ja) * 1992-08-19 2003-07-22 キヤノン株式会社 面位置検出方法及びそれを用いた投影露光装置
JP3572430B2 (ja) * 1994-11-29 2004-10-06 株式会社ニコン 露光方法及びその装置
JP3696702B2 (ja) * 1996-10-16 2005-09-21 沖電気工業株式会社 露光装置のためのアライメント方法及び装置
JP3454497B2 (ja) * 1997-07-15 2003-10-06 キヤノン株式会社 投影露光方法および装置
SG125108A1 (en) * 2003-03-11 2006-09-29 Asml Netherlands Bv Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus
JP2005129674A (ja) * 2003-10-23 2005-05-19 Canon Inc 走査露光装置およびデバイス製造方法

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