JP6233639B2 - ガス濃度推定装置 - Google Patents
ガス濃度推定装置 Download PDFInfo
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- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 106
- 238000004458 analytical method Methods 0.000 claims description 86
- 239000001569 carbon dioxide Substances 0.000 claims description 53
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 53
- 229930195733 hydrocarbon Natural products 0.000 claims description 19
- 150000002430 hydrocarbons Chemical class 0.000 claims description 19
- 238000011088 calibration curve Methods 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
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- 238000002485 combustion reaction Methods 0.000 claims description 4
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- 239000004215 Carbon black (E152) Substances 0.000 description 11
- 239000013307 optical fiber Substances 0.000 description 9
- 230000004048 modification Effects 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000284 extract Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000001499 laser induced fluorescence spectroscopy Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
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- 238000000691 measurement method Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/68—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/67—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using electric arcs or discharges
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0062—General constructional details of gas analysers, e.g. portable test equipment concerning the measuring method or the display, e.g. intermittent measurement or digital display
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/02—Devices for withdrawing samples
- G01N1/22—Devices for withdrawing samples in the gaseous state
- G01N1/2247—Sampling from a flowing stream of gas
- G01N1/2252—Sampling from a flowing stream of gas in a vehicle exhaust
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
- G01N2021/8578—Gaseous flow
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/067—Electro-optic, magneto-optic, acousto-optic elements
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
- G01N33/004—CO or CO2
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
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- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Description
−プラズマ生成装置−
−分析装置−
−ガス濃度推定装置の動作−
−実施形態の効果−
−実施形態の変形例1−
−実施形態の変形例2−
−実施形態の変形例3−
−実施形態の変形例4−
《その他の実施形態》
11 エンジン
12 排気管
15 プラズマ生成装置(プラズマ生成手段)
16 分析装置(分析手段)
23 混合器
24 放電器
32 光ファイバー
Claims (10)
- 分析ガスをプラズマ状態にするプラズマ生成手段と、
前記プラズマ生成手段により生成されたプラズマから発せられるプラズマ光を分析して、前記分析ガス中の対象成分の濃度を推定する分析手段とを備えたガス濃度推定装置であって、
前記分析ガスは、燃焼後に排出される排気ガスとし、
前記プラズマ生成手段は、マイクロ波駆動信号の立ち上がりから立ち下がりまでの期間に亘り、所定のデューティ比でマイクロ波パルスを繰り返し出力し、マイクロ波パルス出力期間とマイクロ波パルス休止期間とを繰り返すことにより、生成プラズマにマイクロ波を吸収させたマイクロ波プラズマを非平衡プラズマとして維持するよう構成され、該マイクロ波パルスを生成する半導体発振器を有するマイクロ波発生器を備え、
前記分析手段は、前記プラズマ光のうち、前記対象成分とは異なる原子構成で、該対象成分から分離した原子又は分子を含む所定のラジカルの発光に対応する波長成分の発光強度に基づいて、前記対象成分の濃度を推定し、短い周期で繰り返されるプラズマ生成動作に同期して、分析動作を行うことを特徴とするガス濃度推定装置。 - 請求項1に記載したガス濃度推定装置において、
前記分析手段は、前記プラズマ光のうち、CNラジカルの発光に対応する波長成分の発光強度に基づいて、前記対象成分としての二酸化炭素の濃度を推定することを特徴とするガス濃度推定装置。 - 請求項2に記載したガス濃度推定装置において、
炭化水素の燃焼後に排出される排気ガスを前記分析ガスとして、該分析ガス中の二酸化炭素を前記対象成分とする一方、
前記分析手段は、前記排気ガス中の未燃の炭化水素の濃度を推定し、その推定結果を用いて、CNラジカルの発光に対応する波長成分の発光強度に基づき推定した二酸化炭素の濃度を補正することを特徴とするガス濃度推定装置。 - 請求項3に記載したガス濃度推定装置において、
前記分析手段は、前記プラズマの発光のうち、CHラジカルの発光に対応する波長成分の発光強度に基づいて、未燃の炭化水素の濃度を推定することを特徴とするガス濃度推定装置。 - 請求項2乃至4の何れか1つに記載したガス濃度推定装置において、
前記分析手段は、CNラジカルの発光に対応する波長成分の発光強度と二酸化炭素の濃度との関係を表す検量線を用いて、前記CNラジカルの発光に対応する波長成分の発光強度から二酸化炭素の濃度を推定することを特徴とするガス濃度推定装置。 - 請求項1に記載したガス濃度推定装置において、
前記分析手段は、前記プラズマの発光のうち、OHラジカルの発光に対応する波長成分の発光強度に基づいて、前記対象成分としての水蒸気の濃度を推定することを特徴とするガス濃度推定装置。 - 請求項1乃至6の何れか1つに記載したガス濃度推定装置において、
前記プラズマ生成手段によりプラズマが生成されるプラズマ領域に流入する分析ガスの流量を検出する流量検出手段を備え、
前記分析手段は、前記流量検出手段により検出された流量を用いて、前記所定のラジカルの発光に対応する波長成分の発光強度に基づき推定した前記対象成分の濃度を補正することを特徴とするガス濃度推定装置。 - 請求項1乃至7の何れか1つに記載したガス濃度推定装置において、
前記分析ガスの流通方向において、前記プラズマ生成手段によりプラズマが生成されるプラズマ領域の上流に設けられ、該プラズマ領域の一部を遮蔽する遮蔽部材を備えていることを特徴とするガス濃度推定装置。 - 請求項8に記載したガス濃度推定装置において、
前記分析手段は、前記プラズマ領域のうち、前記遮蔽部材により遮蔽されていない領域から抽出したプラズマ光を分析して、前記分析ガス中の対象成分の濃度を推定することを特徴とするガス濃度推定装置。 - 分析ガスをプラズマ状態にするプラズマ生成ステップと、
前記プラズマ生成ステップにおいて生成されたプラズマから発せられるプラズマ光を分析して、前記分析ガス中の対象成分の濃度を推定する分析ステップとを備えたガス濃度推定方法であって、
前記分析ガスは、燃焼後に排出される排気ガスとし、
前記プラズマ生成ステップでは、マイクロ波駆動信号の立ち上がりから立ち下がりまでの期間に亘り、所定のデューティ比で、半導体発振器により生成されるマイクロ波パルスを繰り返し出力し、マイクロ波パルス出力期間とマイクロ波パルス休止期間とを繰り返すことにより、生成プラズマにマイクロ波を吸収させたマイクロ波プラズマを非平衡プラズマとして維持し、
前記分析ステップでは、前記マイクロ波プラズマから発せられるプラズマ光のうち、前記対象成分とは異なる原子構成で、該対象成分から分離した原子又は分子を含む所定のラジカルの発光に対応する波長成分の発光強度に基づいて、前記対象成分の濃度が推定し、短い周期で繰り返されるプラズマ生成動作に同期して、分析動作を行う
ことを特徴とするガス濃度推定方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011289568 | 2011-12-28 | ||
JP2011289568 | 2011-12-28 | ||
PCT/JP2012/083607 WO2013099923A1 (ja) | 2011-12-28 | 2012-12-26 | ガス濃度推定装置 |
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JPWO2013099923A1 JPWO2013099923A1 (ja) | 2015-05-07 |
JP6233639B2 true JP6233639B2 (ja) | 2017-11-22 |
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JP2013551726A Expired - Fee Related JP6233639B2 (ja) | 2011-12-28 | 2012-12-26 | ガス濃度推定装置 |
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Country | Link |
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US (1) | US10078053B2 (ja) |
EP (1) | EP2799846A4 (ja) |
JP (1) | JP6233639B2 (ja) |
WO (1) | WO2013099923A1 (ja) |
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KR102279611B1 (ko) * | 2014-02-21 | 2021-07-19 | 아크레이 가부시키가이샤 | 플라즈마 분광 분석 방법 |
JP6498959B2 (ja) * | 2014-02-21 | 2019-04-10 | アークレイ株式会社 | プラズマ分光分析方法 |
JP6427829B2 (ja) * | 2016-03-31 | 2018-11-28 | 大陽日酸株式会社 | 冷鉄源の溶解・精錬炉、及び溶解・精錬炉の操業方法 |
GB2583897A (en) * | 2019-04-05 | 2020-11-18 | Servomex Group Ltd | Glow plasma stabilisation |
WO2024196944A1 (en) * | 2023-03-21 | 2024-09-26 | Mks Instruments, Inc. | Real time radical output monitoring using optical emission spectroscopy |
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US4066904A (en) * | 1975-05-14 | 1978-01-03 | Agence Nationale De Valorisation De La Recherche Anvar | Method of measurement of the concentration of a substance contained in a gas and devices for carrying out said method |
JP2675561B2 (ja) * | 1987-12-18 | 1997-11-12 | 株式会社日立製作所 | プラズマ微量元素分折装置 |
US5184501A (en) * | 1991-05-03 | 1993-02-09 | Horiba Instruments Incorporated | Exhaust sampler and control means |
US5825485A (en) * | 1995-11-03 | 1998-10-20 | Cohn; Daniel R. | Compact trace element sensor which utilizes microwave generated plasma and which is portable by an individual |
JPH09304280A (ja) | 1996-05-14 | 1997-11-28 | Hideichiro Hirai | Co2の濃度測定方法 |
US5986757A (en) * | 1997-09-17 | 1999-11-16 | The United States Of America As Represented By The Secretary Of The Navy | Correction of spectral interferences arising from CN emission in continuous air monitoring using inductively coupled plasma atomic emission spectroscopy |
US6689322B2 (en) * | 1999-11-12 | 2004-02-10 | The Ohio State University | Free-standing fluid sensors, filters, and catalyst devices, and methods involving same |
US6774993B2 (en) * | 2001-04-03 | 2004-08-10 | Agilent Technologies, Inc. | Method and apparatus for atomic emission spectroscopy |
DE10124235B4 (de) * | 2001-05-18 | 2004-08-12 | Esytec Energie- Und Systemtechnik Gmbh | Verfahren und Vorrichtung zur umfassenden Charakterisierung und Kontrolle des Abgases und der Regelung von Motoren, speziell von Verbrennungsmotoren, und von Komponenten der Abgasnachbehandlung |
US7701578B1 (en) * | 2003-09-12 | 2010-04-20 | Herring Cyrus M | Planar micro-discharge gas detector |
US7453566B2 (en) * | 2006-08-31 | 2008-11-18 | Massachusetts Institute Of Technology | Hybrid plasma element monitor |
JP4252076B2 (ja) | 2006-09-01 | 2009-04-08 | 株式会社オートネットワーク技術研究所 | 絶縁電線およびワイヤーハーネス |
WO2008059598A1 (fr) * | 2006-11-17 | 2008-05-22 | Imagineering, Inc. | Dispositif d'analyse de réaction, support d'enregistrement et système de mesure |
EP2015352A3 (en) | 2007-07-05 | 2009-11-11 | Imec | Photon induced etching of copper |
US8367005B2 (en) * | 2007-07-12 | 2013-02-05 | Imagineering, Inc. | Gas processing apparatus, gas processing system, and gas processing method, and exhaust gas processing system and internal combustion engine using the same |
EP2034296B1 (en) * | 2007-09-07 | 2012-09-26 | Imec | Quantification of hydrophobic and hydrophilic properties of materials |
JP5150824B2 (ja) * | 2008-09-22 | 2013-02-27 | イマジニアリング株式会社 | 燃料濃度計測装置及び燃料濃度計測方法、並びに、そのための較正曲線の準備方法 |
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- 2012-12-26 US US14/369,020 patent/US10078053B2/en not_active Expired - Fee Related
- 2012-12-26 JP JP2013551726A patent/JP6233639B2/ja not_active Expired - Fee Related
- 2012-12-26 EP EP12863370.8A patent/EP2799846A4/en not_active Withdrawn
- 2012-12-26 WO PCT/JP2012/083607 patent/WO2013099923A1/ja active Application Filing
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Publication number | Publication date |
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EP2799846A4 (en) | 2015-09-02 |
JPWO2013099923A1 (ja) | 2015-05-07 |
EP2799846A1 (en) | 2014-11-05 |
US10078053B2 (en) | 2018-09-18 |
WO2013099923A1 (ja) | 2013-07-04 |
US20150015881A1 (en) | 2015-01-15 |
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