JP6181956B2 - ステージ装置、リソグラフィ装置及びデバイス製造方法 - Google Patents

ステージ装置、リソグラフィ装置及びデバイス製造方法 Download PDF

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Publication number
JP6181956B2
JP6181956B2 JP2013064918A JP2013064918A JP6181956B2 JP 6181956 B2 JP6181956 B2 JP 6181956B2 JP 2013064918 A JP2013064918 A JP 2013064918A JP 2013064918 A JP2013064918 A JP 2013064918A JP 6181956 B2 JP6181956 B2 JP 6181956B2
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Japan
Prior art keywords
movement stage
stage
fine movement
core
area
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JP2013064918A
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English (en)
Japanese (ja)
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JP2014192254A5 (OSRAM
JP2014192254A (ja
Inventor
雅教 山田
雅教 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2013064918A priority Critical patent/JP6181956B2/ja
Priority to US14/224,316 priority patent/US10036965B2/en
Publication of JP2014192254A publication Critical patent/JP2014192254A/ja
Publication of JP2014192254A5 publication Critical patent/JP2014192254A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/49—Nc machine tool, till multiple
    • G05B2219/49284—Two cascaded slides, large range sits on small range, piggyback

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Engineering & Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Manufacturing & Machinery (AREA)
  • Automation & Control Theory (AREA)
JP2013064918A 2013-03-26 2013-03-26 ステージ装置、リソグラフィ装置及びデバイス製造方法 Active JP6181956B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013064918A JP6181956B2 (ja) 2013-03-26 2013-03-26 ステージ装置、リソグラフィ装置及びデバイス製造方法
US14/224,316 US10036965B2 (en) 2013-03-26 2014-03-25 Stage apparatus, lithography apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013064918A JP6181956B2 (ja) 2013-03-26 2013-03-26 ステージ装置、リソグラフィ装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2014192254A JP2014192254A (ja) 2014-10-06
JP2014192254A5 JP2014192254A5 (OSRAM) 2016-04-21
JP6181956B2 true JP6181956B2 (ja) 2017-08-16

Family

ID=51621610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013064918A Active JP6181956B2 (ja) 2013-03-26 2013-03-26 ステージ装置、リソグラフィ装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US10036965B2 (OSRAM)
JP (1) JP6181956B2 (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI797114B (zh) * 2017-03-31 2023-04-01 日商尼康股份有限公司 移動體裝置、曝光裝置、平板顯示器的製造方法、元件製造方法以及移動體的驅動方法
JP7389597B2 (ja) * 2019-09-20 2023-11-30 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品製造方法
JP7560988B2 (ja) * 2020-10-09 2024-10-03 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品の製造方法
WO2025051467A1 (en) * 2023-09-06 2025-03-13 Asml Netherlands B.V. Linear motor with cogging compensation

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6130517A (en) * 1998-02-12 2000-10-10 Nikon Corporation Magnetic actuator producing large acceleration on fine stage and low RMS power gain
JP2003168721A (ja) * 2001-11-30 2003-06-13 Canon Inc 位置決め移動体機構
JP2005051245A (ja) * 2003-07-30 2005-02-24 Asml Netherlands Bv リソグラフィ装置
JP2007027331A (ja) * 2005-07-14 2007-02-01 Canon Inc 駆動装置及びこれを用いた露光装置並びにデバイス製造方法
JP2007329435A (ja) * 2006-06-09 2007-12-20 Canon Inc ステージ装置、露光装置及びデバイス製造方法
JP2008004647A (ja) * 2006-06-20 2008-01-10 Canon Inc 位置決め装置、露光装置及びデバイスの製造方法
JP2012235026A (ja) * 2011-05-06 2012-11-29 Canon Inc 位置決め装置、露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
US20140297019A1 (en) 2014-10-02
US10036965B2 (en) 2018-07-31
JP2014192254A (ja) 2014-10-06

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