JP6175721B2 - オゾン発生装置、及び、オゾン発生方法 - Google Patents

オゾン発生装置、及び、オゾン発生方法 Download PDF

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Publication number
JP6175721B2
JP6175721B2 JP2012247804A JP2012247804A JP6175721B2 JP 6175721 B2 JP6175721 B2 JP 6175721B2 JP 2012247804 A JP2012247804 A JP 2012247804A JP 2012247804 A JP2012247804 A JP 2012247804A JP 6175721 B2 JP6175721 B2 JP 6175721B2
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Japan
Prior art keywords
plasma
electrode
gas
flow path
ozone generator
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Expired - Fee Related
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JP2012247804A
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English (en)
Japanese (ja)
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JP2014094863A (ja
JP2014094863A5 (https=
Inventor
楠原　昌樹
昌樹 楠原
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Watanabe Shoko KK
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Watanabe Shoko KK
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Priority to JP2012247804A priority Critical patent/JP6175721B2/ja
Priority to PCT/JP2013/080469 priority patent/WO2014073686A1/ja
Priority to US14/442,011 priority patent/US20160023900A1/en
Publication of JP2014094863A publication Critical patent/JP2014094863A/ja
Publication of JP2014094863A5 publication Critical patent/JP2014094863A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C01B13/11—Preparation of ozone by electric discharge
    • C01B13/115—Preparation of ozone by electric discharge characterised by the electrical circuits producing the electrical discharge
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C01B13/11—Preparation of ozone by electric discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/13—Ozone
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/10—Dischargers used for production of ozone
    • C01B2201/12—Plate-type dischargers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/20—Electrodes used for obtaining electrical discharge
    • C01B2201/22—Constructional details of the electrodes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/20—Electrodes used for obtaining electrical discharge
    • C01B2201/24—Composition of the electrodes

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Electrochemistry (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
JP2012247804A 2012-11-09 2012-11-09 オゾン発生装置、及び、オゾン発生方法 Expired - Fee Related JP6175721B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012247804A JP6175721B2 (ja) 2012-11-09 2012-11-09 オゾン発生装置、及び、オゾン発生方法
PCT/JP2013/080469 WO2014073686A1 (ja) 2012-11-09 2013-11-11 オゾン発生装置、及び、オゾン発生方法
US14/442,011 US20160023900A1 (en) 2012-11-09 2013-11-11 Ozone generator and ozone generation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012247804A JP6175721B2 (ja) 2012-11-09 2012-11-09 オゾン発生装置、及び、オゾン発生方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017079313A Division JP2017141159A (ja) 2017-04-12 2017-04-12 オゾン発生装置、及び、オゾン発生方法

Publications (3)

Publication Number Publication Date
JP2014094863A JP2014094863A (ja) 2014-05-22
JP2014094863A5 JP2014094863A5 (https=) 2015-12-24
JP6175721B2 true JP6175721B2 (ja) 2017-08-09

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Country Status (3)

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US (1) US20160023900A1 (https=)
JP (1) JP6175721B2 (https=)
WO (1) WO2014073686A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160148721A (ko) * 2011-06-03 2016-12-26 가부시키가이샤 와콤 Ｃｖｄ 장치, 및 ｃｖｄ 막의 제조 방법
CN104192809B (zh) * 2014-08-26 2016-08-17 深圳市信诚高科科技开发有限公司 一种模块化板式臭氧发生器
CN108227413B (zh) * 2016-12-15 2023-12-08 中微半导体设备(上海)股份有限公司 一种光刻胶去除装置及其清洗方法
CN107484319B (zh) * 2017-08-17 2024-03-26 福州美美环保科技有限公司 一种可拓展的等离子发生装置
CN108977828B (zh) * 2018-10-19 2023-11-03 胡松 一种膜电极电解臭氧发生器及其制备工艺
WO2020095504A1 (ja) * 2018-11-08 2020-05-14 株式会社村田製作所 プラズマ処理装置
CN109336058A (zh) * 2018-11-30 2019-02-15 南昌大学 一种外场增强臭氧发生装置
CN110395695A (zh) * 2019-08-28 2019-11-01 烟台三禾畜牧养殖环境净化工程有限公司 移动式臭氧发生器
US20210185793A1 (en) * 2019-12-13 2021-06-17 Applied Materials, Inc. Adhesive material removal from photomask in ultraviolet lithography application
CN112749483B (zh) * 2020-12-28 2023-06-06 北方工业大学 建立放电室模型的方法、装置、电子设备及存储介质
US11803118B2 (en) * 2021-04-12 2023-10-31 Applied Materials, Inc. Methods and apparatus for photomask processing
EP4401514A4 (en) * 2022-09-14 2026-02-11 Toshiba Mitsubishi Electric Industrial Systems Corp ACTIVE GAS GENERATION DEVICE

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54171670U (https=) * 1978-05-25 1979-12-04
JPS5944782A (ja) * 1982-09-07 1984-03-13 増田　閃一 沿面コロナ放電素子およびその製造方法
JPS623002A (ja) * 1985-06-28 1987-01-09 Hidetoshi Ishida オゾン発生器の電極体
JPS62292605A (ja) * 1986-06-09 1987-12-19 Techno Japan Kk オゾン発生器
JPH0519299Y2 (https=) * 1988-05-30 1993-05-21
JP2589599B2 (ja) * 1989-11-30 1997-03-12 住友精密工業株式会社 吹出型表面処理装置
JP2537304B2 (ja) * 1989-12-07 1996-09-25 新技術事業団 大気圧プラズマ反応方法とその装置
JPH04108603A (ja) * 1990-08-27 1992-04-09 Kazuhiro Miyama オゾン発生装置
JP3015268B2 (ja) * 1994-12-27 2000-03-06 オーニット株式会社 低温プラズマ発生体
JP3038907U (ja) * 1996-12-20 1997-06-30 華鴻國際企業有限公司 オゾン発生装置
JP3959906B2 (ja) * 1998-10-26 2007-08-15 松下電工株式会社 プラズマ処理装置及びプラズマ処理方法
JP2001079446A (ja) * 1999-09-13 2001-03-27 Mitsubishi Electric Corp 放電ユニット
JP2002068713A (ja) * 2000-08-31 2002-03-08 West Electric Co Ltd オゾン発生装置
EP2436645A4 (en) * 2009-05-28 2013-05-22 Tada Electric Co Ltd OZONE GENERATOR

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WO2014073686A1 (ja) 2014-05-15
JP2014094863A (ja) 2014-05-22
US20160023900A1 (en) 2016-01-28

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