JP6175437B2 - 流路部材およびこれを用いた熱交換器ならびに半導体製造装置 - Google Patents
流路部材およびこれを用いた熱交換器ならびに半導体製造装置 Download PDFInfo
- Publication number
- JP6175437B2 JP6175437B2 JP2014527043A JP2014527043A JP6175437B2 JP 6175437 B2 JP6175437 B2 JP 6175437B2 JP 2014527043 A JP2014527043 A JP 2014527043A JP 2014527043 A JP2014527043 A JP 2014527043A JP 6175437 B2 JP6175437 B2 JP 6175437B2
- Authority
- JP
- Japan
- Prior art keywords
- flow path
- wall portion
- wall
- heat exchanger
- path member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F13/00—Arrangements for modifying heat-transfer, e.g. increasing, decreasing
- F28F13/06—Arrangements for modifying heat-transfer, e.g. increasing, decreasing by affecting the pattern of flow of the heat-exchange media
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0434—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W40/00—Arrangements for thermal protection or thermal control
- H10W40/40—Arrangements for thermal protection or thermal control involving heat exchange by flowing fluids
- H10W40/47—Arrangements for thermal protection or thermal control involving heat exchange by flowing fluids by flowing liquids, e.g. forced water cooling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/87153—Plural noncommunicating flow paths
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
離が中央に向かうにつれて変化していることを特徴とする。
1a:第1壁部の主面
2:第2壁部
2a:第2壁部の主面
3:第3壁部
4,4a,4b,4c,4d,4e:流路口
5,6:流路
10,20,30,40,50,60:流路部材
61:ウェハ
62:流入口
63:流出口
64:供給チューブ
65:排出チューブ
100:熱交換器
200:半導体製造装置
Claims (4)
- 第1壁部と、第2壁部と、前記第1壁部と前記第2壁部との間に設けられた第3壁部とを備え、
前記第1壁部と前記第2壁部と前記第3壁部とで構成された内部が、流体が流れる流路としてなり、前記第1壁部から前記第2壁部にわたって切断したときの切断面に、前記流路の流路口が一方方向に並んで複数設けられており、
前記切断面における複数の前記流路口の全てを見たときに、前記流路口は、両端より中央に向かうにつれて漸次前記第1壁部側または前記第2壁部側にずれて配置されており、それぞれの前記流路口における前記第1壁部の主面までの距離および前記第2壁部の主面までの距離が中央に向かうにつれて変化していることを特徴とする流路部材。 - 前記流路を構成する前記第1壁部および前記第2壁部のうち少なくとも一方の中央部が、流路側に向けて湾曲していることを特徴とする請求項1に記載の流路部材。
- 請求項1または請求項2に記載の流路部材の前記第1壁部および前記第2壁部のうち少なくとも一方の表面または内部に金属部材が設けられていることを特徴とする熱交換器。
- 請求項1または請求項2に記載の流路部材の前記第1壁部および前記第2壁部のうち少なくとも一方の内部に金属部材が設けられている熱交換器を備えるとともに、前記金属部材がウェハを吸着するための電極であることを特徴とする半導体製造装置。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012167200 | 2012-07-27 | ||
| JP2012167200 | 2012-07-27 | ||
| PCT/JP2013/070524 WO2014017661A1 (ja) | 2012-07-27 | 2013-07-29 | 流路部材およびこれを用いた熱交換器ならびに半導体製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2014017661A1 JPWO2014017661A1 (ja) | 2016-07-11 |
| JP6175437B2 true JP6175437B2 (ja) | 2017-08-02 |
Family
ID=49997463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014527043A Active JP6175437B2 (ja) | 2012-07-27 | 2013-07-29 | 流路部材およびこれを用いた熱交換器ならびに半導体製造装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20150153116A1 (ja) |
| EP (1) | EP2879162B1 (ja) |
| JP (1) | JP6175437B2 (ja) |
| WO (1) | WO2014017661A1 (ja) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2015584A (en) * | 2014-10-28 | 2016-08-31 | Asml Netherlands Bv | A component for a lithography tool, a lithography apparatus, an inspection tool and a method of manufacturing a device. |
| JP6401012B2 (ja) * | 2014-10-28 | 2018-10-03 | 京セラ株式会社 | セラミック基体 |
| JPWO2016143033A1 (ja) * | 2015-03-09 | 2018-02-01 | ギガフォトン株式会社 | 高電圧パルス発生装置 |
| JP2017212328A (ja) * | 2016-05-25 | 2017-11-30 | 京セラ株式会社 | セラミック流路部材 |
| US11848177B2 (en) | 2018-02-23 | 2023-12-19 | Lam Research Corporation | Multi-plate electrostatic chucks with ceramic baseplates |
| CN113439330A (zh) * | 2019-02-12 | 2021-09-24 | 朗姆研究公司 | 具有陶瓷单体的静电卡盘 |
| US20230163017A1 (en) * | 2020-03-31 | 2023-05-25 | Kyocera Corporation | Channel member and method for manufacturing channel member |
| EP4050295A1 (en) * | 2021-02-26 | 2022-08-31 | Ovh | Water block having hollow fins |
| US12111120B2 (en) * | 2021-03-17 | 2024-10-08 | Carrier Corporation | Microchannel heat exchanger |
| JP7522089B2 (ja) * | 2021-11-10 | 2024-07-24 | 日本碍子株式会社 | ウエハ載置台 |
| JP7714505B2 (ja) * | 2022-01-27 | 2025-07-29 | 日本碍子株式会社 | ウエハ載置台及びそれを用いた半導体製造装置用部材 |
| EP4156251B1 (en) * | 2022-08-30 | 2024-07-03 | Ovh | Cooling block for cooling a heat-generating electronic component and method for manufacturing thereof |
| WO2024241516A1 (ja) * | 2023-05-24 | 2024-11-28 | 日本碍子株式会社 | ウエハ載置台 |
| JP7809404B1 (ja) * | 2025-08-29 | 2026-02-02 | 株式会社 Synax | 蒸発器、温度制御装置およびハンドラ |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US1296916A (en) * | 1918-02-07 | 1919-03-11 | Charles F Burroughs | Heating or cooling plate for molding-presses. |
| US1413571A (en) * | 1920-01-16 | 1922-04-25 | Wilhelm B Bronander | Phonograph-record die holder |
| US3369782A (en) * | 1965-10-05 | 1968-02-20 | Navy Usa | Cooled leading edge |
| US4489570A (en) * | 1982-12-01 | 1984-12-25 | The Board Of Trustees Of The Leland Stanford Junior University | Fast cooldown miniature refrigerators |
| JPS62229947A (ja) * | 1986-03-31 | 1987-10-08 | Tokuda Seisakusho Ltd | ドライエツチング装置 |
| GB8627981D0 (en) * | 1986-11-22 | 1986-12-31 | Howard Ind Pipework Services L | Furnace panel |
| JPH0284251A (ja) * | 1988-06-10 | 1990-03-26 | Matsushita Seiko Co Ltd | 伝熱管とその製造方法 |
| US5111280A (en) * | 1988-11-10 | 1992-05-05 | Iversen Arthur H | Thermal management of power conditioning systems |
| US5003376A (en) * | 1989-03-28 | 1991-03-26 | Coriolis Corporation | Cooling of large high power semi-conductors |
| JPH11329926A (ja) * | 1998-05-11 | 1999-11-30 | Dainippon Screen Mfg Co Ltd | 基板冷却装置および基板冷却方法 |
| JP2000266484A (ja) * | 1999-03-17 | 2000-09-29 | Bosch Automotive Systems Corp | 熱交換器 |
| JP4209057B2 (ja) * | 1999-12-01 | 2009-01-14 | 東京エレクトロン株式会社 | セラミックスヒーターならびにそれを用いた基板処理装置および基板処理方法 |
| JP2001165532A (ja) * | 1999-12-09 | 2001-06-22 | Denso Corp | 冷媒凝縮器 |
| JP4312339B2 (ja) * | 2000-02-24 | 2009-08-12 | ナブテスコ株式会社 | 蛇行通路付熱伝達装置 |
| JP4697833B2 (ja) * | 2000-06-14 | 2011-06-08 | キヤノンアネルバ株式会社 | 静電吸着機構及び表面処理装置 |
| KR100382523B1 (ko) * | 2000-12-01 | 2003-05-09 | 엘지전자 주식회사 | 마이크로 멀티채널 열교환기의 튜브 구조 |
| JP3945208B2 (ja) * | 2001-10-09 | 2007-07-18 | 株式会社デンソー | 熱交換用チューブ及び熱交換器 |
| US20070130769A1 (en) * | 2002-09-03 | 2007-06-14 | Moon Seok H | Micro heat pipe with pligonal cross-section manufactured via extrusion or drawing |
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| JP4942364B2 (ja) * | 2005-02-24 | 2012-05-30 | 京セラ株式会社 | 静電チャックおよびウェハ保持部材並びにウェハ処理方法 |
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| JP4826426B2 (ja) | 2006-10-20 | 2011-11-30 | 株式会社デンソー | 半導体装置 |
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| JP2010143110A (ja) * | 2008-12-19 | 2010-07-01 | Sii Printek Inc | ヘッドチップ、液体噴射ヘッド、及び液体噴射装置 |
| US8608852B2 (en) * | 2010-06-11 | 2013-12-17 | Applied Materials, Inc. | Temperature controlled plasma processing chamber component with zone dependent thermal efficiencies |
| JP2013011362A (ja) * | 2011-06-28 | 2013-01-17 | Kyocera Corp | 流通孔部材および流通孔部材の製造方法 |
-
2013
- 2013-07-29 JP JP2014527043A patent/JP6175437B2/ja active Active
- 2013-07-29 WO PCT/JP2013/070524 patent/WO2014017661A1/ja not_active Ceased
- 2013-07-29 US US14/415,674 patent/US20150153116A1/en not_active Abandoned
- 2013-07-29 EP EP13822788.9A patent/EP2879162B1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2879162B1 (en) | 2020-07-29 |
| WO2014017661A1 (ja) | 2014-01-30 |
| JPWO2014017661A1 (ja) | 2016-07-11 |
| EP2879162A4 (en) | 2016-03-23 |
| US20150153116A1 (en) | 2015-06-04 |
| EP2879162A1 (en) | 2015-06-03 |
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