JP6162830B2 - 薄膜蒸着装置(thinfilmdepositionapparatus) - Google Patents
薄膜蒸着装置(thinfilmdepositionapparatus) Download PDFInfo
- Publication number
- JP6162830B2 JP6162830B2 JP2016001261A JP2016001261A JP6162830B2 JP 6162830 B2 JP6162830 B2 JP 6162830B2 JP 2016001261 A JP2016001261 A JP 2016001261A JP 2016001261 A JP2016001261 A JP 2016001261A JP 6162830 B2 JP6162830 B2 JP 6162830B2
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- trap
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- 238000000427 thin-film deposition Methods 0.000 title claims description 21
- 238000000151 deposition Methods 0.000 claims description 38
- 230000008021 deposition Effects 0.000 claims description 38
- 230000000903 blocking effect Effects 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 20
- 239000010408 film Substances 0.000 claims description 14
- 238000007599 discharging Methods 0.000 claims description 3
- 230000004888 barrier function Effects 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 description 33
- 239000000463 material Substances 0.000 description 32
- 239000000178 monomer Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 9
- 239000010409 thin film Substances 0.000 description 9
- 239000011159 matrix material Substances 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229920001621 AMOLED Polymers 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B14/00—Arrangements for collecting, re-using or eliminating excess spraying material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
111:内部空間
112:遮断膜
113:開口部
120:ソース供給部
121:レール
130:ソース収集部
131:トラップ
131a:吸入口
132:駆動部
132a:駆動リンク
132b:駆動モーター
133:線状ガイド
134:排出部
134a:連結リンク
134b:排出通路
A1:蒸着区間
A2:遮断区間
Claims (3)
- 内部空間が形成され、上部面を形成する遮断膜の一領域に蒸着対象基板が配置される開口部が形成されたチャンバーと、
前記チャンバーの内部空間内で移動しながら、前記遮断膜に向かって蒸着ソースを提供するソース供給部および、
前記開口部の少なくとも一側で前記ソース供給部と前記遮断膜との間に配置されて、前記遮断膜に向かって噴射される蒸着ソースを収集するソース収集部を含み、
前記ソース収集部は、前記ソース供給部と向かい合う面に流入口が形成され、前記ソース供給部の上側に配置されるトラップと、前記トラップを前記ソース供給部と並んだ方向に往復移動させる駆動部と、一端部は前記トラップの流入口と連結され、他端部は前記チャンバーの外部に連結されて、前記トラップに収集される蒸着ソースを排出する排出部を含み、
前記駆動部は、一端部は前記チャンバーに回動可能に連結され、他端部は前記トラップに連結されて、前記トラップを前記ソース供給部と並んだ方向に往復移動させる駆動リンクと、前記駆動リンクに駆動力を提供する駆動モーターを含む薄膜蒸着装置。 - 前記トラップは、前記チャンバーの内壁面に前記ソース供給部の移動方向と並んだ方向に設置される線状ガイドによって往復移動が案内されることを特徴とする請求項1に記載の薄膜蒸着装置。
- 前記排出部は、一端部は前記チャンバーに回動可能に連結され、他端部は前記トラップに連結される連結リンクと、前記連結リンクの内部に長さ方向に形成されて、前記トラップと前記チャンバーの外部空間を連結する排出通路を含む請求項1に記載の薄膜蒸着装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150006865A KR101641453B1 (ko) | 2015-01-14 | 2015-01-14 | 박막 증착 장치 |
KR10-2015-0006865 | 2015-01-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016130366A JP2016130366A (ja) | 2016-07-21 |
JP6162830B2 true JP6162830B2 (ja) | 2017-07-12 |
Family
ID=56390180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016001261A Expired - Fee Related JP6162830B2 (ja) | 2015-01-14 | 2016-01-06 | 薄膜蒸着装置(thinfilmdepositionapparatus) |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6162830B2 (ja) |
KR (1) | KR101641453B1 (ja) |
CN (1) | CN105772305A (ja) |
TW (1) | TWI575089B (ja) |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11229123A (ja) * | 1998-02-12 | 1999-08-24 | Casio Comput Co Ltd | 蒸着装置 |
KR20040013244A (ko) * | 2002-08-05 | 2004-02-14 | 신민석 | 휴대단말기를 이용한 주차관리시스템 |
JP2005353466A (ja) * | 2004-06-11 | 2005-12-22 | Toshiba Matsushita Display Technology Co Ltd | 表示装置の製造装置 |
KR20060080103A (ko) * | 2005-01-04 | 2006-07-07 | 샬롬엔지니어링 주식회사 | 모바일을 이용한 노면 주차관리시스템 |
JP2006274398A (ja) * | 2005-03-30 | 2006-10-12 | Sanyo Electric Co Ltd | 有機膜形成装置 |
US7638168B2 (en) * | 2005-11-10 | 2009-12-29 | Eastman Kodak Company | Deposition system using sealed replenishment container |
US20070283884A1 (en) * | 2006-05-30 | 2007-12-13 | Applied Materials, Inc. | Ring assembly for substrate processing chamber |
JP2008223102A (ja) * | 2007-03-14 | 2008-09-25 | Seiko Epson Corp | 蒸着装置、および蒸着方法 |
US20090258143A1 (en) * | 2008-04-11 | 2009-10-15 | Peck John D | Reagent dispensing apparatus and delivery method |
JP2014055342A (ja) * | 2012-09-14 | 2014-03-27 | Hitachi High-Technologies Corp | 成膜装置 |
KR20140077625A (ko) * | 2012-12-14 | 2014-06-24 | 삼성디스플레이 주식회사 | 유기물 증착 장치 |
KR20140125191A (ko) * | 2013-04-18 | 2014-10-28 | 삼성디스플레이 주식회사 | 증착 장치 |
KR101400765B1 (ko) * | 2013-08-08 | 2014-05-29 | 에이제이파크 주식회사 | 음성인식 주차관리시스템 |
-
2015
- 2015-01-14 KR KR1020150006865A patent/KR101641453B1/ko active IP Right Grant
- 2015-12-16 CN CN201510944230.8A patent/CN105772305A/zh active Pending
- 2015-12-18 TW TW104142644A patent/TWI575089B/zh not_active IP Right Cessation
-
2016
- 2016-01-06 JP JP2016001261A patent/JP6162830B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2016130366A (ja) | 2016-07-21 |
KR101641453B1 (ko) | 2016-07-21 |
TWI575089B (zh) | 2017-03-21 |
TW201631186A (zh) | 2016-09-01 |
CN105772305A (zh) | 2016-07-20 |
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