JP6122253B2 - Capacitive touch panel substrate, manufacturing method and manufacturing apparatus thereof - Google Patents

Description

  The present invention relates to a capacitive touch panel substrate, a manufacturing method thereof, and a manufacturing apparatus, and more particularly to an on-cell capacitive touch panel substrate, a manufacturing method thereof, and a manufacturing apparatus.

Touch panels are used in a wide range of applications, from industrial fields such as ticket machines at stations and restaurants, cash registers at retail stores, and automated teller machines at banks, to consumer areas such as mobile phones, tablet terminals, and controllers for home appliances. ing.
A touch panel is roughly classified into an external type that is attached to an external surface of a display device and a built-in type that is built in the display device with respect to a display device such as a liquid crystal display device.

  The external type is a method that is widely used at present, for example, various methods such as a resistance film method, a capacitance method, an optical method, an acoustic method, and an electromagnetic method are known. The surface type capacitance type and the projection type capacitance method have been developed.

Since the above external mold has a configuration in which a touch panel is attached to the external surface of the display device, there is a disadvantage that the entire device is thick and tends to be heavy.
On the other hand, the built-in type has a configuration in which the touch panel is built in the display device, and can be thinner and lighter than the external type.

The built-in touch panel is roughly classified into an in-cell type and an on-cell type from the position where the touch panel for a display cell such as a liquid crystal cell is disposed.
As an in-cell type touch panel, for example, a contact method, a capacitance method, an optical method, and the like have been developed. On the other hand, as an on-cell type touch panel, for example, a resistive film type and a capacitive type such as a surface type capacitive type and a projected type capacitive type have been developed.
An on-cell capacitive touch panel has, for example, a configuration in which a transparent conductive film made of ITO (indium tin oxide) for detecting a touch position is formed in a pattern on a substrate constituting a display device.
A substrate constituting a display device, on which a transparent conductive film is patterned, is referred to as a touch panel substrate.

  Patent Documents 1 to 3 have a description related to the on-cell type touch panel.

JP 2011-165184 A JP 2011-2222013 A JP 2012-43394 A

  The problem to be solved is that in an on-cell capacitive touch panel, the transparent conductive film pattern formed on the substrate constituting the display device is visible on the display screen, which impairs the aesthetics of the display screen. Is that there is.

  The capacitive touch panel substrate of the present invention includes a first substrate made of optical glass, a first refractive index adjustment film made of a material having a lower refractive index than the first substrate formed on the first substrate, 1 having a transparent conductive film formed on the refractive index adjusting film.

  In the capacitive touch panel substrate of the present invention, the first refractive index adjusting film made of a material having a lower refractive index than the first substrate is formed on the first substrate made of optical glass, and the first refractive index adjusting film is formed. A transparent conductive film is formed thereon.

  In the capacitive touch panel substrate of the present invention, preferably, the transparent conductive film has a thickness of 50 nm or less.

  In the capacitive touch panel substrate of the present invention, preferably, the first refractive index adjustment film is a film formed by reactive plasma deposition.

  In the capacitive touch panel substrate of the present invention, preferably, the first refractive index adjusting film is made of silicon oxide or magnesium fluoride.

  The capacitance-type touch panel substrate of the present invention preferably further includes a second refractive index adjusting film formed between the first substrate and the first refractive index adjusting film.

  In the capacitive touch panel substrate of the present invention, preferably, the second refractive index adjusting film has a higher refractive index than the first substrate.

  In the capacitive touch panel substrate of the present invention, preferably, the first refractive index adjustment film is made of silicon oxide or magnesium fluoride, and the second refractive index adjustment film is niobium oxide, tantalum oxide, It consists of titanium oxide or indium tin oxide.

  The capacitive touch panel substrate of the present invention includes a first substrate made of optical glass and a transparent conductive film having a thickness of 50 nm or less formed on the first substrate.

  In the capacitive touch panel substrate of the present invention, a transparent conductive film having a thickness of 50 nm or less is formed on a first substrate made of optical glass.

  In the capacitive touch panel substrate of the present invention, the transparent conductive film is preferably patterned.

  In the capacitive touch panel substrate of the present invention, another substrate made of optical glass is preferably bonded to the patterned transparent conductive film via a transparent adhesive.

  The above-mentioned capacitive touch panel substrate of the present invention is preferably formed by laminating a plurality of transparent conductive films as the transparent conductive film via a transparent adhesive.

  The method of manufacturing a capacitive touch panel substrate according to the present invention includes a step of forming a first refractive index adjustment film made of a material having a refractive index lower than that of the first substrate on a first substrate made of optical glass, And 1 forming a transparent conductive film on the refractive index adjusting film.

  In the manufacturing method of the capacitive touch panel substrate of the present invention, the first refractive index adjustment film is formed on the first substrate made of optical glass, and the first refractive index adjustment film made of a material having a lower refractive index than the first substrate is formed. A transparent conductive film is formed on the film.

  In the method of manufacturing the capacitive touch panel substrate of the present invention, preferably, in the step of forming the first refractive index adjustment film, the transparent conductive film is formed with a thickness of 50 nm or less.

  The method for manufacturing a capacitive touch panel substrate of the present invention is preferably formed by reactive plasma deposition in the step of forming the first refractive index adjustment film.

  The above-described method for manufacturing a capacitive touch panel substrate of the present invention is preferably formed from silicon oxide or magnesium fluoride in the step of forming the first refractive index adjustment film.

  Preferably, in the method for manufacturing a capacitive touch panel substrate according to the present invention, the second refractive index adjustment is performed on the first substrate before the step of forming the first refractive index adjustment film on the first substrate. In the step of forming the first refractive index adjustment film, the first refractive index adjustment film is formed on the second refractive index adjustment film.

  In the method of manufacturing a capacitive touch panel substrate according to the present invention, preferably, in the step of forming the second refractive index adjustment film, the second refractive index adjustment made of a material having a higher refractive index than the first substrate. A film is formed.

  In the method of manufacturing the capacitive touch panel substrate of the present invention, preferably, in the step of forming the first refractive index adjusting film, the second refractive index adjusting film is formed of silicon oxide or magnesium fluoride. Is formed from niobium oxide, tantalum oxide, titanium oxide, or indium tin oxide.

  Moreover, the manufacturing method of the capacitive touch panel substrate of this invention has the process of forming a transparent conductive film with a film thickness of 50 nm or less on the 1st board | substrate which consists of optical glass.

  In the method for manufacturing a capacitive touch panel substrate of the present invention, a transparent conductive film is formed with a film thickness of 50 nm or less on a first substrate made of optical glass.

  The manufacturing method of the capacitive touch panel substrate of the present invention preferably further includes a step of patterning the transparent conductive film after the step of forming the transparent conductive film.

  In the method of manufacturing a capacitive touch panel substrate of the present invention, preferably, after the step of patterning the transparent conductive film, optical glass is formed on the patterned transparent conductive film via a transparent adhesive. The method further includes the step of bonding another substrate made of

  Preferably, in the method of manufacturing a capacitive touch panel substrate according to the present invention, in the step of forming the transparent conductive film, a plurality of transparent conductive films are laminated as a transparent conductive film via a transparent adhesive. Form.

  The capacitance touch panel substrate manufacturing apparatus of the present invention includes a film forming chamber, a holding unit for holding a first substrate made of optical glass provided in the film forming chamber, and a film forming chamber. A first refractive index adjusting film material supply unit that deposits a first refractive index adjusting film made of a material lower than the refractive index of the first substrate on the first substrate; and provided in the film forming chamber, A transparent conductive film material supply unit that deposits a transparent conductive film on the first substrate, holds the first substrate made of optical glass in the holding unit, and has a lower refractive index than the first substrate on the first substrate A first refractive index adjusting film made of a material is formed, and a transparent conductive film is formed on the first refractive index adjusting film.

  The capacitance touch panel substrate manufacturing apparatus according to the present invention includes a holding unit for holding a first substrate made of optical glass in a film forming chamber, and a material having a refractive index lower than that of the first substrate. A first refractive index adjusting film material supplying unit for depositing the first refractive index adjusting film and a transparent conductive film material supplying unit for depositing a transparent conductive film on the first substrate, and the holding unit is made of optical glass. A first refractive index adjusting film made of a material lower than the refractive index of the first substrate is formed on the first substrate, and a transparent conductive film is formed on the first refractive index adjusting film.

  In the manufacturing apparatus of the capacitive touch panel substrate of the present invention, preferably, the first refractive index adjustment film is formed on the first substrate by RF application sputtering in-line, and the first refractive index adjustment film is formed on the first refractive index adjustment film. A transparent conductive film is formed by reactive plasma deposition.

  According to the capacitive touch panel substrate of the present invention, even if the transparent conductive film is patterned, the pattern of the transparent conductive film becomes difficult to see on the display screen, and a decrease in the appearance of the display screen can be suppressed.

  According to the method for manufacturing a capacitive touch panel substrate of the present invention, even if the transparent conductive film is patterned, the pattern of the transparent conductive film becomes difficult to see on the display screen, and a decrease in the appearance of the display screen can be suppressed.

  According to the apparatus for manufacturing a capacitive touch panel substrate of the present invention, even if the transparent conductive film is patterned, the pattern of the transparent conductive film becomes difficult to see on the display screen, and a decrease in the aesthetic appearance of the display screen can be suppressed.

FIG. 1 is a schematic configuration diagram of a display device incorporating an on-cell capacitive touch panel substrate according to the first embodiment of the present invention. FIGS. 2A to 2D are schematic views showing the manufacturing process of the method for manufacturing the on-cell capacitive touch panel substrate according to the first embodiment of the present invention. FIG. 3 is a schematic configuration diagram of a display device incorporating an on-cell capacitive touch panel substrate according to the second embodiment of the present invention. FIGS. 4A to 4D are schematic views showing manufacturing steps of a method for manufacturing an on-cell capacitive touch panel substrate according to the second embodiment of the present invention. FIG. 5 is a schematic configuration diagram of a display device incorporating an on-cell capacitive touch panel substrate according to a third embodiment of the present invention. FIG. 6 is a schematic configuration diagram of a display device incorporating an on-cell capacitive touch panel substrate according to a fourth embodiment of the present invention. FIG. 7 is a schematic configuration diagram of a display device incorporating an on-cell capacitive touch panel substrate according to a fifth embodiment of the present invention. FIG. 8 is a schematic configuration diagram of a display device incorporating an on-cell capacitive touch panel substrate according to a sixth embodiment of the present invention. FIG. 9 is a graph showing the transmittance and the reflectance with respect to the film thickness of the transparent electrode film according to Example 1 of the present invention. 10A to 10C are graphs showing the wavelength dependence of the reflectance of the touch panel substrate according to Example 2 of the present invention. FIGS. 11A to 11C are graphs showing the wavelength dependence of the reflectance of the touch panel substrate according to Example 2 of the present invention. 12A to 12C are graphs showing the wavelength dependence of the reflectance of the touch panel substrate according to Example 3 of the present invention. 13A to 13C are graphs showing the wavelength dependence of the reflectance of the touch panel substrate according to Example 3 of the present invention. FIGS. 14A and 14B are graphs showing the energy distribution of ions contributing to film formation according to Example 4 of the present invention. FIGS. 15A and 15B are X-ray diffraction spectra of the transparent electrode film according to Example 5 of the present invention. FIGS. 16A and 16B are electron micrographs of the transparent electrode film according to Example 6 of the present invention. FIG. 17 is a graph showing the deposition temperature dependence of the resistivity of the transparent electrode film according to Example 7 of the present invention. FIG. 18 shows the wavelength dependence (light absorption spectrum) of the sum of the transmittance and reflectance of the transparent electrode film according to Example 8 of the present invention.

  Embodiments of a capacitive touch panel substrate, a manufacturing method thereof, and a manufacturing apparatus according to the present invention will be described below with reference to the drawings.

<First Embodiment>
[Configuration of display device incorporating capacitive touch panel]
FIG. 1 is a schematic configuration diagram of a display device incorporating an on-cell capacitive touch panel substrate according to the present embodiment.
The display device of this embodiment is, for example, a liquid crystal display device.
For example, the first substrate 10 and the second substrate 20 are bonded to each other with a predetermined gap through a spacer (not shown). The first substrate 10 and the second substrate 20 are, for example, optical glass substrates, respectively.
For example, a TFT (thin film transistor) (not shown) for driving a pixel and a pixel electrode (not shown) divided for each pixel are provided on the surface of the second substrate 20 on the first substrate 10 side. An alignment film (not shown) is provided by coating.
Further, for example, a counter electrode (not shown) is provided on the entire surface of the first substrate 10 on the second substrate 20 side, and an alignment film (not shown) is provided so as to cover the surface. Further, the surface of the first substrate opposite to the second substrate 20 side is a display screen.
Liquid crystal is sealed in a gap between the first substrate 10 and the second substrate 20 to provide a liquid crystal layer 30.

In the display device having the above-described configuration, the first substrate 10 is a substrate constituting the liquid crystal display device, while being an on-cell capacitive touch panel substrate.
A first refractive index adjusting film 11 having a refractive index lower than that of the first substrate 10 is formed on the surface of the first substrate 10 opposite to the second substrate 20. The first refractive index adjustment film 11 is made of, for example, silicon oxide or magnesium fluoride, and has a film thickness of, for example, 5 to 100 nm.

A transparent conductive film 12p made of, for example, ITO (indium tin oxide) or the like is formed on the first refractive index adjusting film 11 with a film thickness of, for example, 5 to 50 nm.
The transparent conductive film 12p made of the above ITO or the like is a film formed by, for example, reactive plasma deposition (PRD).

  For example, a configuration in which the first refractive index adjustment film 11 is formed of silicon oxide with a film thickness of 25 nm and the transparent conductive film 12p is formed of ITO with a film thickness of 10 nm can be preferably used.

For example, the transparent conductive film 12p is patterned into a predetermined pattern so as to constitute a capacitive touch panel.
Further, for example, a third substrate 14 which is a glass substrate is bonded to the patterned transparent conductive film 12p with a transparent adhesive 13 interposed therebetween.

In the touch panel substrate configured as described above, the first substrate 10 and the third substrate 14 are optical glass substrates, and the refractive index is, for example, about 1.52.
When the first refractive index adjusting film 11 is made of, for example, silicon oxide, the refractive index is about 1.45.
When the transparent conductive film 12p is made of, for example, ITO, the refractive index is about 1.95.
The transparent adhesive 13 is an optically transparent adhesive and has a refractive index of, for example, 1.48 to 1.56.

In the above configuration, the transparent conductive film 12p is formed to be thin, for example, to a thickness of about 5 to 50 nm, and further, a first layer made of silicon oxide or the like is formed between the first substrate 10 and the patterned transparent conductive film 12p. By forming the first refractive index adjusting film 11 having a refractive index lower than that of the one substrate 10, the pattern of the transparent conductive film 12p becomes difficult to see on the display screen, and a decrease in the appearance of the display screen can be suppressed.
For example, by being thinly formed to about 5 to 50 nm, the reflectance of the touch panel substrate is reduced, the transmittance is increased, and the characteristics as a display device incorporating the touch panel are enhanced.
When the film thickness of the transparent electrode film 12p is less than 5 nm, the sheet resistance becomes high and the function as an electrode is reduced, which is not preferable. On the other hand, if it exceeds 50 nm, the effect of reducing the reflectance is reduced, which is not preferable.

The display device of the present embodiment is a liquid crystal display device, and a polarizing film (not shown) is provided on one side of the liquid crystal layer 30. For example, the polarizing film is provided on the surface of the second substrate 20 opposite to the first substrate 10 and the surface of the third substrate 14 opposite to the first substrate 10.
When the display device of the present embodiment is a color display device, a color filter (not shown) is provided. The color filter is appropriately provided on the surface of the first substrate 10 on the second substrate 20 side, for example.
In the above structure, the orientation of the liquid crystal is controlled by the voltage applied between the pixel electrode and the counter electrode, and an image can be displayed on the display screen of the liquid crystal display device.

In the display device incorporating the touch panel of the present embodiment, the touch panel is an on-cell capacitive touch panel.
For example, it is a projection type capacitance type, and when the surface of the third substrate 14 is touched with a finger or the like, a change occurs in the capacitance between the patterned transparent conductive films 12p, which is touched by detecting this. It is possible to specify the position.
The touch panel can be used as an input interface of the display device by associating the touched position on the touch panel with the display content of the display screen.

  According to the touch panel substrate of the present embodiment and the liquid crystal display device using the touch panel substrate, a first refractive index adjustment film having a refractive index lower than that of the first substrate is formed on the first substrate, and the transparent conductive material is formed on the first refractive index adjustment film. Since the film is formed and the transparent conductive film is thinned to a thickness of 5 to 50 nm, for example, the pattern of the transparent conductive film can be seen on the display screen even if the transparent conductive film is patterned. It becomes difficult to suppress a decrease in the appearance of the display screen.

[Method for manufacturing touch panel substrate]
Next, a manufacturing method of the touch panel substrate according to the present embodiment will be described.
First, as shown in FIG. 2A, the surface of the first substrate 10 opposite to the second substrate 20 is refracted from the first substrate 10 such as silicon oxide or magnesium fluoride by RF applied sputtering, for example. The first refractive index adjustment film 11 made of a material having a low rate is formed with a film thickness of, for example, 5 to 100 nm.
Next, the transparent conductive film 12 made of ITO (indium tin oxide) or the like is formed with a film thickness of 5 to 50 nm on the first refractive index adjusting film 11 by, for example, RPD (reactive plasma deposition).

  In the above RPD, for example, a deposition target substrate, an ITO deposition target, and a plasma gun are arranged in a deposition chamber, and indium ions or tin ions obtained from the deposition target using plasma generated from the plasma gun are combined with oxygen. Deposited on the substrate to be deposited as an oxide.

The voltage applied to the plasma gun may be as low as about 60 to 70 V, and the energy of indium ions or tin ions obtained from the plasma can be suppressed to, for example, 30 eV or less, and damage to the substrate caused by the plasma can be reduced compared to sputtering. For this reason, since the ITO film formed by RPD has a larger crystal grain size than that formed by sputtering, a low sheet resistance is obtained, and it can be used as thin as 5 to 50 nm.
Also, by ionizing a transparent conductive film material such as ITO in a plasma with a high current and a high plasma density, a thin film thickness is sufficient even if the temperature of the substrate to be deposited is lowered to a low temperature of about 100 ° C. for example. Since a low resistivity can be obtained, it can be applied to a low-temperature process after plastic or resin tape is laminated.

  In addition, in RPD, it is possible to form a film at a high pressure of, for example, about 0.3 Pa, the coverage of the ITO film to be formed is increased, and there is no gap between the film formation target substrate having unevenness. A dense film can be obtained, a sheet resistance can be reduced, and a transparent conductive film such as an ITO film having good environmental resistance can be formed.

Next, as shown in FIG. 2B, for example, a resist film (not shown) is formed in a predetermined pattern on the transparent conductive film 12, and etching such as dry etching or wet etching is performed using the obtained resist film as a mask. A transparent conductive film 12p that has been processed and patterned is obtained.
Thereafter, the resist film is removed.

Next, as shown in FIG. 2C, the transparent adhesive 13 is coated on the entire surface by coating the patterned transparent conductive film 12p and the first refractive index adjusting film 11 by, for example, spin coating or the like. supplied, as shown in FIG. 2 (d), laminating the third substrate 14 is a glass substrate via a transparent adhesive 13.

As described above, the touch panel substrate according to the present embodiment can be manufactured.
When the liquid crystal display device according to FIG. 1 is manufactured, for example, a counter electrode is provided on the surface of the first substrate 10 constituting the touch panel substrate obtained as described above on the surface opposite to the surface on which the transparent conductive film 12p is formed. On the other hand, TFTs and pixel electrodes are formed on the second substrate 20, an alignment film is provided, and the first substrate 10 and the second substrate 20 are bonded to each other with a predetermined gap through a spacer (not shown). The liquid crystal layer 30 can be provided by enclosing the liquid crystal in the gap.

  According to the method for manufacturing a touch panel substrate of the present embodiment, a first refractive index adjustment film having a lower refractive index than the first substrate is formed on the first substrate, a transparent conductive film is formed on the first refractive index adjustment film, Further, by reducing the thickness of the transparent conductive film to a film thickness of, for example, 5 to 50 nm, even if the transparent conductive film is patterned, the pattern of the transparent conductive film becomes difficult to see on the display screen, and the appearance of the display screen is reduced. Can be suppressed.

[Touch panel substrate manufacturing equipment]
The touch panel substrate according to the present embodiment can be manufactured by the following manufacturing apparatus.
For example, a film forming chamber, a holding unit that holds a first substrate provided in the film forming chamber, and a material that is provided in the film forming chamber and has a lower refractive index than the first substrate, such as silicon oxide. A first refractive index adjusting film material supply unit for depositing the first refractive index adjusting film, and a transparent conductive film material supplying unit provided in the film forming chamber for depositing the transparent conductive film on the first substrate.

  A vacuum pump is connected to the film forming chamber via an exhaust pipe, and the inside can be reduced to a predetermined pressure. The back pressure in the film formation chamber during film formation by RPD is, for example, about 0.3 Pa.

The first substrate made of optical glass is held in the holding unit, the inside of the film forming chamber is reduced to a predetermined pressure as described above, and the first refractive index adjusting film material supply unit is supplied from the first refractive index adjusting film material supplying unit. Then, for example, the first refractive index adjusting film made of silicon oxide is formed on the first substrate by RF application sputtering.
Next, a transparent conductive film material is supplied from the transparent conductive film material supply unit, and a transparent conductive film made of ITO is formed on the first refractive index adjustment film by, for example, RPD.
The touch panel substrate can be manufactured, for example, in-line by the manufacturing apparatus having the above configuration.

  According to the touch panel substrate manufacturing apparatus of the present embodiment, a first refractive index adjustment film having a lower refractive index than the first substrate is formed on the first substrate, a transparent conductive film is formed on the first refractive index adjustment film, Further, by reducing the thickness of the transparent conductive film to a film thickness of, for example, 5 to 50 nm, even if the transparent conductive film is patterned, the pattern of the transparent conductive film becomes difficult to see on the display screen, and the appearance of the display screen is reduced. Can be suppressed.

Second Embodiment
[Configuration of display device incorporating capacitive touch panel]
FIG. 3 is a schematic configuration diagram of a display device incorporating the on-cell capacitive touch panel substrate according to the present embodiment.
The display device of this embodiment is, for example, a liquid crystal display device. As shown in FIG. 3, except that it further includes a second refractive index adjusting film 15 formed between the first substrate 10 made of optical glass and the first refractive index adjusting film 11 made of silicon oxide. In particular, the configuration is the same as that of the display device of the first embodiment.

In the display device having the above-described configuration, the first substrate 10 is a substrate constituting the liquid crystal display device, while being an on-cell capacitive touch panel substrate.
The first substrate 10 such as ITO, niobium oxide (Nb ₂ O ₅ ), tantalum oxide (Ta ₂ O ₅ ), or titanium oxide (TiO ₂ ) is formed on the surface of the first substrate 10 opposite to the second substrate 20. A second refractive index adjusting film 15 made of a material having a higher refractive index is formed with a thickness of 5 to 100 nm.
A first refractive index adjusting film 11 having a refractive index lower than that of the first substrate 10 is formed on the second refractive index adjusting film 15. The first refractive index adjustment film 11 is made of, for example, silicon oxide or magnesium fluoride, and has a film thickness of, for example, 5 to 100 nm.

A transparent conductive film 12p made of, for example, ITO or the like is formed on the first refractive index adjusting film 11 with a film thickness of, for example, 5 to 50 nm.
The transparent conductive film 12p made of ITO or the like is a film formed by RPD, for example.

  For example, the first refractive index adjustment film 11 is formed of ITO having a thickness of 10 nm, the first refractive index adjustment film 11 is formed of silicon oxide having a thickness of 50 nm, and the transparent conductive film 12p is formed of ITO having a thickness of 10 nm. The configuration described above can be preferably used.

For example, the transparent conductive film 12p is patterned into a predetermined pattern so as to constitute a capacitive touch panel.
Further, for example, a third substrate 14 which is a glass substrate is bonded to the patterned transparent conductive film 12p with a transparent adhesive 13 interposed therebetween.

In the touch panel substrate configured as described above, the first substrate 10 and the third substrate 14 are optical glass substrates, and the refractive index is, for example, about 1.52.
For example, when the second refractive index adjusting film 15 is made of ITO, the refractive index is about 1.95, and when made of niobium oxide, the refractive index is about 2.3.
When the first refractive index adjusting film 11 is made of, for example, silicon oxide, the refractive index is about 1.45.
When the transparent conductive film 12p is made of, for example, ITO, the refractive index is about 1.95.
The transparent adhesive 13 is an optically transparent adhesive and has a refractive index of, for example, 1.48 to 1.56.

In the above configuration, the second refractive index adjusting film 15 made of a material having a higher refractive index than that of the first substrate 10 made of ITO or the like is formed between the first substrate 10 and the patterned transparent conductive film 12p and silicon oxide. The first refractive index adjusting film 11 having a refractive index lower than that of the first substrate 10 is formed, and the transparent conductive film 12p is formed to be as thin as, for example, about 5 to 50 nm. The pattern of the film 12p becomes difficult to see on the display screen, and the aesthetic deterioration of the display screen can be suppressed.
Further, since the transparent conductive film 12p is thinly formed, for example, to a thickness of about 5 to 50 nm, the reflectance of the touch panel substrate is reduced, the transmittance is increased, and the characteristics as a display device incorporating the touch panel are enhanced.
When the film thickness of the transparent electrode film 12p is less than 5 nm, the sheet resistance becomes high and the function as an electrode is reduced, which is not preferable. On the other hand, if it exceeds 50 nm, the effect of reducing the reflectance is reduced, which is not preferable.

Except for the above, the first embodiment has the same configuration.
According to the touch panel substrate of this embodiment and the liquid crystal display device using the same, the second refractive index adjustment film having a higher refractive index than the first substrate is formed on the first substrate, and the first refractive index adjustment film is formed on the first refractive index adjustment film. A first refractive index adjusting film having a refractive index lower than that of the substrate is formed, and the transparent conductive film is thinned to a film thickness of, for example, 5 to 50 nm, so that the transparent conductive film can be formed even if the transparent conductive film is patterned. The film pattern becomes difficult to see on the display screen, and the aesthetic deterioration of the display screen can be suppressed.

[Method for manufacturing touch panel substrate]
Next, a manufacturing method of the touch panel substrate according to the present embodiment will be described.
First, as shown in FIG. 4A, a material having a higher refractive index than the first substrate 10 such as ITO or niobium oxide is formed on the surface of the first substrate 10 opposite to the second substrate 20 by RPD, for example. The second refractive index adjusting film 15 made of is formed with a film thickness of, for example, 5 to 100 nm.
Next, the first refractive index adjusting film 11 made of a material having a lower refractive index than the first substrate 10 such as silicon oxide or magnesium fluoride is formed on the second refractive index adjusting film 15 by, for example, RF application sputtering. For example, it is formed with a film thickness of 5 to 100 nm.
Next, the transparent conductive film 12 made of ITO or the like is formed with a film thickness of 5 to 50 nm on the first refractive index adjusting film 11 by, for example, RPD.

Since the ITO film formed by RPD has a larger crystal grain size than that formed by sputtering, a low sheet resistance is obtained, and it can be used as thin as 5 to 50 nm.
Since the ITO film formed by RPD has a larger crystal grain size than that formed by sputtering, a low sheet resistance can be obtained and it can be used as thin as 5 to 50 nm. Even when the temperature of the substrate is lowered to a low temperature of about 100 ° C., for example, a sufficiently low resistivity can be obtained with a thin film thickness. Therefore, it can also be applied to a low temperature process after laminating plastics or resin tapes.

Next, as shown in FIG. 4B, for example, a resist film (not shown) is formed in a predetermined pattern on the transparent conductive film 12, and etching such as dry etching or wet etching is performed using the obtained resist film as a mask. A transparent conductive film 12p that has been processed and patterned is obtained.
Thereafter, the resist film is removed.

Next, as shown in FIG. 4C, the transparent adhesive 13 is coated on the entire surface by coating the patterned transparent conductive film 12p and the first refractive index adjustment film 11 by, for example, spin coating or the like. supplied, as shown in FIG. 4 (d), laminating the third substrate 14 is a glass substrate via a transparent adhesive 13.

As described above, the touch panel substrate according to the present embodiment can be manufactured.
When the liquid crystal display device according to FIG. 3 is manufactured, for example, the counter electrode is provided on the surface of the first substrate 10 constituting the touch panel substrate obtained as described above on the surface opposite to the surface on which the transparent conductive film 12p is formed. On the other hand, a TFT and a pixel electrode are formed on the second substrate 20, an alignment film is provided, and the first substrate 10 and the second substrate 20 are bonded to each other with a predetermined gap through a spacer (not shown). The liquid crystal layer 30 can be provided by enclosing liquid crystal in the gap.

  According to the method for manufacturing a touch panel substrate of the present embodiment, the second refractive index adjustment film having a higher refractive index than the first substrate is formed on the first substrate, and the refractive index is higher than the first substrate on the second refractive index adjustment film. By forming a low first refractive index adjustment film and further thinning the transparent conductive film to a film thickness of, for example, 5 to 50 nm, the pattern of the transparent conductive film is displayed even if the transparent conductive film is patterned. It becomes difficult to see above, and the aesthetic deterioration of the display screen can be suppressed.

[Touch panel substrate manufacturing equipment]
The touch panel substrate according to the present embodiment can be manufactured by the following manufacturing apparatus.
For example, a film forming chamber, a holding unit for holding a first substrate provided in the film forming chamber, and a material provided in the film forming chamber and having a higher refractive index than the first substrate, such as ITO, are provided in the first substrate. A second refractive index adjusting film material supply unit for depositing the second refractive index adjusting film, and a first refractive index adjusting film made of a material having a lower refractive index than the first substrate such as silicon oxide on the first substrate. A refractive index adjusting film material supply unit; and a transparent conductive film material supply unit provided in the film forming chamber and depositing the transparent conductive film on the first substrate.

  A vacuum pump is connected to the film forming chamber via an exhaust pipe, and the inside can be reduced to a predetermined pressure. The back pressure in the film formation chamber during film formation by RPD is, for example, about 0.3 Pa.

The first substrate made of optical glass is held in the holding unit, the inside of the film forming chamber is reduced to a predetermined pressure as described above, and the second refractive index adjusting film material supply unit is supplied from the second refractive index adjusting film material supplying unit. Then, for example, the second refractive index adjusting film made of ITO is formed on the first substrate by RPD.
Next, the first refractive index adjusting film material is supplied from the first refractive index adjusting film material supply unit, and the first refractive index adjusting film made of silicon oxide is formed on the second refractive index adjusting film by RF application sputtering, for example. To do.
Next, a transparent conductive film material is supplied from the transparent conductive film material supply unit, and a transparent conductive film made of ITO is formed on the first refractive index adjustment film by, for example, RPD.
The touch panel substrate can be manufactured, for example, in-line by the manufacturing apparatus having the above configuration.

  According to the touch panel substrate manufacturing apparatus of the present embodiment, the second refractive index adjustment film having a higher refractive index than the first substrate is formed on the first substrate, and the refractive index is higher than that of the first substrate on the second refractive index adjustment film. By forming a low first refractive index adjustment film, forming a transparent conductive film on the first refractive index adjustment film, and further reducing the thickness of the transparent conductive film to a film thickness of, for example, 5 to 50 nm, the transparent conductive film Even if the pattern is formed, the pattern of the transparent conductive film becomes difficult to see on the display screen, and the appearance of the display screen can be prevented from deteriorating.

<Third Embodiment>
[Configuration of display device incorporating capacitive touch panel]
FIG. 5 is a schematic configuration diagram of a display device incorporating the on-cell capacitive touch panel substrate according to the present embodiment.
The display device of this embodiment is, for example, a liquid crystal display device.
In the display device having the above-described configuration, the first substrate 10 is a substrate constituting the liquid crystal display device, while being an on-cell capacitive touch panel substrate.
On the surface of the first substrate 10 opposite to the second substrate 20, a transparent conductive film 12p made of, for example, ITO or the like is formed with a film thickness of, for example, 5 to 50 nm.
The transparent conductive film 12p made of ITO or the like is a film formed by RPD, for example.

For example, the transparent conductive film 12p is patterned into a predetermined pattern so as to constitute a capacitive touch panel.
Further, for example, a third substrate 14 which is a glass substrate is bonded to the patterned transparent conductive film 12p with a transparent adhesive 13 interposed therebetween.

In the touch panel substrate configured as described above, the first substrate 10 and the third substrate 14 are optical glass substrates, and the refractive index is, for example, about 1.52.
When the transparent conductive film 12p is made of, for example, ITO, the refractive index is about 1.95.
The transparent adhesive 13 is an optically transparent adhesive and has a refractive index of, for example, 1.48 to 1.56.

In said structure, when the transparent conductive film 12p is thinly formed, for example to the extent of 5-50 nm, the pattern of the transparent conductive film 12p becomes difficult to see on a display screen, and the aesthetics fall of a display screen can be suppressed.
Further, since the transparent conductive film 12p is thinly formed, for example, to a thickness of about 5 to 50 nm, the reflectance of the touch panel substrate is reduced, the transmittance is increased, and the characteristics as a display device incorporating the touch panel are enhanced.
When the film thickness of the transparent electrode film 12p is less than 5 nm, the sheet resistance becomes high and the function as an electrode is reduced, which is not preferable. On the other hand, if it exceeds 50 nm, the effect of reducing the reflectance is reduced, which is not preferable.

Except for the above, the first embodiment has the same configuration.
According to the touch panel substrate of the present embodiment and the liquid crystal display device using the touch panel substrate, the transparent conductive film is thinned to a film thickness of, for example, 5 to 50 nm, so that the transparent conductive film is transparent even if the pattern is formed. The pattern of the conductive film becomes difficult to see on the display screen, and a decrease in the aesthetic appearance of the display screen can be suppressed.

[Method for manufacturing touch panel substrate]
Next, a manufacturing method of the touch panel substrate according to the present embodiment will be described.
First, the transparent conductive film 12 made of ITO or the like is formed on the first substrate 10 with a film thickness of 5 to 50 nm, for example, by RPD.

Since the ITO film formed by RPD has a larger crystal grain size than that formed by sputtering, a low sheet resistance is obtained, and it can be used as thin as 5 to 50 nm.
Also, compared to sputtering, plasma damage can be reduced, and a sufficiently low resistivity can be obtained with a thin film thickness even if the temperature of the film formation target substrate is lowered to about 100 ° C. Therefore, a plastic or resin tape Can be applied to a low-temperature process after laminating and the like, and the coverage is further increased, and a uniform and dense film can be obtained with respect to the film formation target substrate having unevenness, and the sheet resistance is reduced. A transparent conductive film such as an ITO film that is reduced and has high environmental resistance can be formed.

  The subsequent steps can be performed in the same manner as in the first embodiment.

  According to the manufacturing method of the touch panel substrate of the present embodiment, the transparent conductive film is thinned to a film thickness of, for example, 5 to 50 nm, so that the pattern of the transparent conductive film is displayed even if the transparent conductive film is patterned. It becomes difficult to see on the screen, and a decrease in the aesthetic appearance of the display screen can be suppressed.

<Fourth embodiment>
FIG. 6 is a schematic configuration diagram of a display device incorporating the on-cell capacitive touch panel substrate according to the present embodiment.
The display device of this embodiment is, for example, a liquid crystal display device. As shown in FIG. 6, the plurality of transparent conductive films (12a, 12b) are substantially the same as those of the first embodiment except that the transparent conductive films (12a, 12b) are laminated through transparent adhesives (13a, 13b). The configuration is the same as that of the display device.
The plurality of transparent conductive films (12a, 12b) of this embodiment are patterned so that, for example, the transparent conductive film 12a extends in the X-axis direction, and is patterned so that the transparent conductive film 12b extends in the Y-axis direction. ing.

In the display device incorporating the touch panel of the present embodiment, the touch panel is an on-cell capacitive touch panel.
For example, this is a projected capacitance method, and when the surface of the third substrate 14 is touched with a finger or the like, the capacitance between the patterned conductive films (12a, 12b) changes, and this is detected. Thus, the touched position can be specified as (X, Y) coordinates.
The touch panel can be used as an input interface of the display device by associating the touched position on the touch panel with the display content of the display screen.

  According to the touch panel substrate of the present embodiment and the liquid crystal display device using the touch panel substrate, a first refractive index adjustment film having a refractive index lower than that of the first substrate is formed on the first substrate, and the transparent conductive material is formed on the first refractive index adjustment film. Since the film is formed and the transparent conductive film is thinned to a thickness of 5 to 50 nm, for example, the pattern of the transparent conductive film can be seen on the display screen even if the transparent conductive film is patterned. It becomes difficult to suppress a decrease in the appearance of the display screen.

  In the process of forming the transparent conductive film, the touch panel substrate of the present embodiment is formed by patterning the transparent conductive film 12a so as to extend in the X-axis direction, and after flattening by providing the transparent adhesive 12a, the transparent conductive film 12b Can be manufactured in the same manner as the touch panel substrate manufacturing method of the first embodiment except that the pattern is formed so as to extend in the Y-axis direction.

<Fifth Embodiment>
FIG. 7 is a schematic configuration diagram of a display device incorporating an on-cell capacitive touch panel substrate according to the present embodiment.
The display device of this embodiment is, for example, a liquid crystal display device. As shown in FIG. 7, the second embodiment is substantially the same as that of the second embodiment except that a plurality of transparent conductive films (12a, 12b) are laminated through transparent adhesives (13a, 13b). The configuration is the same as that of the display device.
The plurality of transparent conductive films (12a, 12b) of this embodiment are patterned so that, for example, the transparent conductive film 12a extends in the X-axis direction, and is patterned so that the transparent conductive film 12b extends in the Y-axis direction. ing.

In the display device incorporating the touch panel of the present embodiment, the touch panel is an on-cell capacitive touch panel.
For example, this is a projected capacitance method, and when the surface of the third substrate 14 is touched with a finger or the like, the capacitance between the patterned conductive films (12a, 12b) changes, and this is detected. Thus, the touched position can be specified as (X, Y) coordinates.
The touch panel can be used as an input interface of the display device by associating the touched position on the touch panel with the display content of the display screen.

  According to the touch panel substrate of this embodiment and the liquid crystal display device using the same, the second refractive index adjustment film having a higher refractive index than the first substrate is formed on the first substrate, and the first refractive index adjustment film is formed on the first refractive index adjustment film. A first refractive index adjusting film having a refractive index lower than that of the substrate is formed, and the transparent conductive film is thinned to a film thickness of, for example, 5 to 50 nm, so that the transparent conductive film can be formed even if the transparent conductive film is patterned. The film pattern becomes difficult to see on the display screen, and the aesthetic deterioration of the display screen can be suppressed.

  In the process of forming the transparent conductive film, the touch panel substrate of the present embodiment is formed by patterning the transparent conductive film 12a so as to extend in the X-axis direction, and after flattening by providing the transparent adhesive 12a, the transparent conductive film 12b Can be manufactured in the same manner as the touch panel substrate manufacturing method of the second embodiment, except that the pattern is formed so as to extend in the Y-axis direction.

<Sixth Embodiment>
FIG. 8 is a schematic configuration diagram of a display device incorporating the on-cell capacitive touch panel substrate according to the present embodiment.
The display device of this embodiment is, for example, a liquid crystal display device. As shown in FIG. 8, the third embodiment is substantially the same as that of the third embodiment except that a plurality of transparent conductive films (12a, 12b) are laminated through transparent adhesives (13a, 13b). The configuration is the same as that of the display device.
The plurality of transparent conductive films (12a, 12b) of this embodiment are patterned so that, for example, the transparent conductive film 12a extends in the X-axis direction, and is patterned so that the transparent conductive film 12b extends in the Y-axis direction. ing.

In the display device incorporating the touch panel of the present embodiment, the touch panel is an on-cell capacitive touch panel.
For example, this is a projected capacitance method, and when the surface of the third substrate 14 is touched with a finger or the like, the capacitance between the patterned conductive films (12a, 12b) changes, and this is detected. Thus, the touched position can be specified as (X, Y) coordinates.
The touch panel can be used as an input interface of the display device by associating the touched position on the touch panel with the display content of the display screen.

  According to the touch panel substrate of the present embodiment and the liquid crystal display device using the touch panel substrate, the transparent conductive film is thinned to a film thickness of, for example, 5 to 50 nm, so that the transparent conductive film is transparent even if the pattern is formed. The pattern of the conductive film becomes difficult to see on the display screen, and a decrease in the aesthetic appearance of the display screen can be suppressed.

  In the process of forming the transparent conductive film, the touch panel substrate of the present embodiment is formed by patterning the transparent conductive film 12a so as to extend in the X-axis direction, and after flattening by providing the transparent adhesive 12a, the transparent conductive film 12b Can be manufactured in the same manner as the touch panel substrate manufacturing method of the third embodiment except that the pattern is formed so as to extend in the Y-axis direction.

<Example 1>
FIG. 9 is a graph showing the transmittance and the reflectance with respect to the film thickness of the transparent electrode film according to Example 1.
The dependency of the transmittance T (%) and the reflectance R (%) on the ITO film thickness d (nm) of the sample in which an ITO film was formed on the optical glass by RPD and the optical glass was laminated thereon was measured.

  The reflectivity R decreases as the ITO film thickness becomes thin with a peak at about 70 nm. In particular, when the thickness is 50 nm or less, the reflectance R is about 4% or less, and can be reduced to about 1% at 20 nm and about 0.2% at 10 nm.

  As described above, in the touch panel substrate and the liquid crystal display device using the same, the transparent conductive film is thinned to a film thickness of, for example, 5 to 50 nm, so that the transparent conductive film is formed even if the transparent conductive film is patterned. It was confirmed that the film pattern is difficult to see on the display screen, and the aesthetic deterioration of the display screen can be suppressed.

<Example 2>
10A to 10C are graphs showing the wavelength λ (nm) dependence (reflection spectrum) of the reflectance of the touch panel substrate according to Example 2. FIG.
FIGS. 11A to 11C are graphs showing the wavelength λ (nm) dependence of the reflectance of the touch panel substrate according to the second embodiment.

10A shows a sample in which an ITO film having a thickness of 10 nm is formed on an optical glass by RPD. FIG. 10B shows an optical glass on which 25 nm of silicon oxide is formed by RF application sputtering, and an upper layer is formed by RPD. A sample with an ITO film having a thickness of 10 nm, FIG. 10C shows an optical glass having an ITO film having a thickness of 10 nm formed by RPD, an upper layer of 25 nm of silicon oxide formed by RF applied sputtering, and an upper layer formed by RPD. It is each reflection spectrum of the sample which formed ITO film of 10 nm.
FIGS. 11A to 11C are reflection spectra of a sample in which optical glass is further bonded to the upper layer of the sample of FIGS. 10A to 10C.

  As shown in FIG. 11 (a), by setting the thickness of the ITO film to 10 nm, the reflectance is less than 0.8% in the entire visible light region, and further, as shown in FIG. By forming a 25 nm silicon oxide film between the ITO film and the ITO film, the reflectivity is less than 0.6% in the entire visible light region. Further, as shown in FIG. In the meantime, a 10 nm ITO film and a 25 nm silicon oxide film were formed, and the reflectance was below 0.05% in the entire visible light region.

  From this example, the transparent conductive film is thinned, and the first refractive index adjusting film having a lower refractive index than the first substrate is formed, or the first substrate has a higher refractive index than the first substrate. 2 The refractive index adjusting film is formed, and the first refractive index adjusting film having a lower refractive index than the first substrate is formed on the second refractive index adjusting film, so that the transparent conductive film is transparent even if the pattern is formed. It was confirmed that the pattern of the conductive film became difficult to see on the display screen, and the deterioration of the aesthetic appearance of the display screen could be suppressed.

<Example 3>
12A to 12C are graphs showing the wavelength dependence of the reflectance of the touch panel substrate according to Example 3. FIG.
FIGS. 13A to 13C are graphs showing the wavelength dependence of the reflectance of the touch panel substrate according to the third embodiment.
A 25 nm silicon oxide is formed on optical glass by RF applied sputtering, a 10 nm ITO film is formed on the upper layer by RPD, and an optical glass is laminated on the upper layer, and the reflectance R (%) is measured. did.

FIG. 12A shows the average reflectance (a1), minimum reflectance (a2), and maximum reflectance (a3) when the ITO film thickness is changed by 5%.
FIG. 12B shows average reflectance (b1), minimum reflectance (b2), and maximum reflectance (b3) when the silicon oxide film thickness is changed by 5%.
FIG. 12C shows the average reflectance (c1), minimum reflectance (c2), and maximum reflectance (c3) when the ITO film thickness and the silicon oxide film are varied by 5%.
As shown in FIG. 12B, even if the silicon oxide film fluctuates, the variation in the reflectance is small, and this is because the reflectance in FIG. 12A and FIG. confirmed. That is, it was confirmed that the reflectivity has high resistance to the film thickness variation of the first refractive index adjustment film.

FIG. 13A shows the average reflectance (a1), minimum reflectance (a2), and maximum reflectance (a3) when the ITO film thickness is changed by 10%.
FIG. 13B shows average reflectance (b1), minimum reflectance (b2), and maximum reflectance (b3) when the silicon oxide film thickness is changed by 10%.
FIG. 13C shows the average reflectance (c1), the minimum reflectance (c2), and the maximum reflectance (c3) when the ITO film thickness and the silicon oxide film are each changed by 10%.
Similarly to the above, as shown in FIG. 13B, even if the silicon oxide film fluctuates, the variation in the reflectance is small, which is substantially the same as that in FIGS. 13A and 13C. It was also confirmed from showing. That is, it was confirmed that the reflectivity has high resistance to the film thickness variation of the first refractive index adjustment film.

<Example 4>
14A and 14B are graphs showing the energy distribution of ions contributing to film formation according to Example 4. FIG.
FIG. 14A shows the intensity of indium ions (In ⁺ ) and the distribution of energy E (eV) in RPD.
In RPD, it was confirmed that there were no particles whose energy exceeded 100 eV, and most of the particles had substantially low energy of 30 eV or less .
Also, FIG. 14 (b) shows the intensity and its energy distribution E (eV) of the argon ions (Ar ⁺⁾ in the sputtering.
In sputtering, particles having large energy exceeding 100 eV existed.
In other words, it was confirmed that RPD can reduce damage to the substrate caused by plasma compared to sputtering.

<Example 5>
15A and 15B are X-ray diffraction spectra of the transparent electrode film according to Example 5. FIG.
A 300 nm ITO film was formed on the optical glass by RPD or sputtering to prepare a sample.
FIG. 15A is an X-ray diffraction spectrum of an ITO film formed by RPD.
In RPD, it was confirmed that the (222) plane peak was strong and an ITO film with high directivity could be formed.
FIG. 15B is an X-ray diffraction spectrum of the ITO film formed by sputtering.
In sputtering, peaks on various surfaces appeared, and it was confirmed that an ITO film having lower directivity than RPD was formed.

<Example 6>
16A and 16B are electron micrographs of the transparent electrode film according to Example 6. FIG.
A 300 nm ITO film was formed on the optical glass by RPD or sputtering to prepare a sample.
FIG. 16A is an electron micrograph of an ITO film formed by RPD.
In RPD, it was confirmed that a film having a large crystal grain size and a low surface roughness of 8 nm can be formed.
FIG. 16B is an electron micrograph of an ITO film formed by sputtering.
In sputtering, it was confirmed that a film having a small crystal grain size and a large surface roughness of 30 nm was formed.

<Example 7>
FIG. 17 is a graph showing the film formation temperature dependence of the resistivity of the transparent electrode film according to Example 7.
An ITO film was formed on the optical glass at various film forming temperatures T (° C.) by RPD (a) or sputtering (b), samples were prepared, and resistivity R (μΩ · m) was measured.
According to RPD, it was confirmed that an ITO film having a resistivity R lower than that of sputtering can be formed.
In particular, the ITO film thickness for obtaining a sheet resistance of 10Ω / □ was 200 nm in RPD at a temperature of 100 ° C., but 300 nm or more was required in sputtering.

<Example 8>
FIG. 18 shows the wavelength dependence (light absorption spectrum) of the sum of the transmittance and reflectance of the transparent electrode film according to Example 8.
ITO films having various thicknesses were formed on the optical glass by RPD, and the transmittance T (%) and the reflectance R (%) were measured.
In FIG. 18, the vertical axis represents the sum of the transmittance T and the reflectance R, and the amount reduced from 100 (%) indicates light absorption. An ITO film having a thickness of 25 nm (b), 50 nm (c), 100 nm (d), 150 nm (e), 200 nm (f), and 250 nm (g) was formed on optical glass only (a).
As the thickness of the ITO film formed by RPD increases, light absorption increases. For example, in a thin region having a thickness of 50 nm or less, it was confirmed that the light absorption spectrum is almost flat in the visible light region. That is, for example, an ITO film having a thickness of 50 nm or less is a film that is substantially transparent to visible light.

The present invention is not limited to the above description.
For example, in the embodiment, a mode in which the touch panel substrate is applied to a liquid crystal display device is shown, but not limited thereto, an LED (light emitting diode) display device, an organic EL (Electro Luminescence) display device, a VFD (fluorescence), and the like. Display tube) Applicable to display devices other than liquid crystal display devices such as display devices and PDPs (plasma display panels). By making the substrate constituting various display devices into a touch panel substrate of the present invention, a built-in on-cell type A display device with a touch panel can be realized.
In addition, various modifications can be made without departing from the scope of the present invention.

DESCRIPTION OF SYMBOLS 10 ... 1st board | substrate 11 ... 1st refractive index adjustment film | membrane 12, 12p, 12a, 12b ... Transparent conductive film 13, 13a, 13b ... Transparent adhesive 14 ... 3rd board | substrate 15 ... 2nd refractive index adjustment film | membrane 20 ... 2nd Substrate 30 ... Liquid crystal layer

Claims (17)

A first substrate made of optical glass;
A transparent conductive film formed by patterning on the first substrate;
Have
The transparent conductive film is
Is formed by reactive plasma deposition, the particle diameter of crystal grains constituting greater than film by sputtering, the surface roughness is rather small,
A capacitive touch panel substrate, wherein the transparent conductive film has a thickness of 10 nm . A first substrate made of optical glass;
A transparent conductive film formed by patterning on the first substrate;
A first refractive index adjusting film made of a material having a refractive index lower than that of the first substrate formed between the first substrate and the transparent conductive film;
A second refractive index adjusting film having a refractive index higher than that of the first substrate formed between the first substrate and the first refractive index adjusting film ;
Have
The transparent conductive film is
Is formed by reactive plasma deposition, the particle diameter of crystal grains constituting greater than film by sputtering, the surface roughness is rather small,
The second refractive index adjusting film is a film formed by reactive plasma deposition;
A capacitive touch panel substrate, wherein the first refractive index adjusting film is a film formed by sputtering . The transparent conductive film is made of indium tin oxide,
The first refractive index adjustment film is made of silicon oxide or magnesium fluoride,
The capacitive touch panel substrate according to claim 2, wherein the second refractive index adjustment film is made of niobium oxide, tantalum oxide, titanium oxide, or indium tin oxide. The capacitive touch panel substrate according to claim 2 or 3, wherein the transparent conductive film has a thickness of 10 nm. The capacitive touch panel substrate according to claim 1, wherein the transparent conductive film is substantially transparent to the entire visible light region. The capacitive touch panel substrate according to claim 1, wherein another substrate made of optical glass is bonded to the patterned transparent conductive film via a transparent adhesive. The capacitive touch panel substrate according to any one of claims 1 to 6, wherein a plurality of transparent conductive films are laminated as transparent conductive films via a transparent adhesive. Having a step of forming a patterned transparent conductive film on a first substrate made of optical glass;
In the step of forming the transparent conductive film,
A transparent conductive film is formed by reactive plasma deposition, the crystal grain size of the constituent is larger than the film by sputtering, the surface roughness is reduced ,
A method for manufacturing a capacitive touch panel substrate, wherein the transparent conductive film is formed with a thickness of 10 nm . Having a step of forming a patterned transparent conductive film on a first substrate made of optical glass;
Before the step of forming the transparent conductive film, further comprising a step of forming a first refractive index adjustment film made of a material having a refractive index lower than that of the first substrate on the first substrate;
In the step of forming the transparent conductive film, the transparent conductive film is formed on the first refractive index adjustment film,
Before the step of forming the first refractive index adjustment film, further comprising the step of forming a second refractive index adjustment film having a higher refractive index than the first substrate on the first substrate;
In the step of forming the first refractive index adjustment film, the first refractive index adjustment film is formed on the second refractive index adjustment film,
In the step of forming the transparent conductive film,
A transparent conductive film is formed by reactive plasma deposition, the crystal grain size of the constituent is larger than the film by sputtering, the surface roughness is reduced ,
In the step of forming the second refractive index adjustment film, the second refractive index adjustment film is formed by reactive plasma deposition,
In the step of forming the first refractive index adjustment film, the first refractive index adjustment film is formed by sputtering,
In the step of forming the transparent conductive film, a method of manufacturing a capacitive touch panel substrate in which the transparent conductive film is formed by reactive plasma deposition . In the step of forming the transparent conductive film, the transparent conductive film is formed from indium tin oxide,
In the step of forming the first refractive index adjustment film, the first refractive index adjustment film is formed from silicon oxide or magnesium fluoride,
10. The capacitive touch panel substrate according to claim 9, wherein in the step of forming the second refractive index adjustment film, the second refractive index adjustment film is formed of niobium oxide, tantalum oxide, titanium oxide, or indium tin oxide. Manufacturing method. The method of manufacturing a capacitive touch panel substrate according to claim 9 or 10, wherein the transparent conductive film is formed with a thickness of 10 nm. The method for manufacturing a capacitive touch panel substrate according to claim 8, wherein the transparent conductive film is substantially transparent to the entire visible light region. 13. The method according to claim 8, further comprising a step of bonding another substrate made of optical glass on the patterned transparent conductive film via a transparent adhesive after the step of forming the transparent conductive film. The manufacturing method of the electrostatic capacitance type touch panel substrate of description. The capacitive touch panel substrate according to claim 8, wherein in the step of forming the transparent conductive film, a plurality of transparent conductive films are stacked as the transparent conductive film via a transparent adhesive. Production method. A deposition chamber;
A holding unit for holding a first substrate made of optical glass provided in the film forming chamber ;
Before provided KiNarumaku chamber, and a first transparent conductive material supply unit for depositing a transparent conductive film on a substrate,
A first substrate made of optical glass is held in the holding part, and a transparent conductive film is formed on the first substrate by patterning,
In forming the transparent conductive film,
A transparent conductive film is formed by reactive plasma deposition, the crystal grain size of the constituent is larger than the film by sputtering, the surface roughness is reduced ,
An apparatus for manufacturing a capacitive touch panel substrate, wherein a film thickness of the transparent conductive film is 10 nm . A deposition chamber;
A holding unit for holding a first substrate made of optical glass provided in the film forming chamber;
A second refractive index adjusting film material supply unit provided in the film forming chamber and depositing a second refractive index adjusting film made of a material higher than the refractive index of the first substrate on the first substrate;
A first refractive index adjusting film material supply unit provided in the film forming chamber and depositing a first refractive index adjusting film made of a material lower than the refractive index of the first substrate on the first substrate;
A transparent conductive film material supply unit provided in the film forming chamber and depositing a transparent conductive film on the first substrate;
Have
A first substrate made of optical glass is held by the holding unit, a second refractive index adjusting film made of a material higher than the refractive index of the first substrate is formed on the first substrate, and the second refractive index adjusting film is formed on the second substrate. Forming a first refractive index adjustment film made of a material lower than the refractive index of the first substrate, patterning a transparent conductive film on the first refractive index adjustment film,
Forming the second refractive index adjusting film by reactive plasma deposition;
Forming the first refractive index adjusting film by sputtering;
An apparatus for manufacturing a capacitive touch panel substrate in which a transparent conductive film is formed by reactive plasma vapor deposition, and the crystal grain size of the transparent conductive film is larger than that of a film formed by sputtering and the surface roughness is reduced . The apparatus for manufacturing a capacitive touch panel substrate according to claim 16, wherein the transparent conductive film is formed with a thickness of 10 nm .