CN203350843U - Capacitive touch screen substrate and manufacturing device thereof - Google Patents
Capacitive touch screen substrate and manufacturing device thereof Download PDFInfo
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- CN203350843U CN203350843U CN 201320280047 CN201320280047U CN203350843U CN 203350843 U CN203350843 U CN 203350843U CN 201320280047 CN201320280047 CN 201320280047 CN 201320280047 U CN201320280047 U CN 201320280047U CN 203350843 U CN203350843 U CN 203350843U
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Abstract
Because transparent conducting film patterns are formed on a substrate which forms a display in an on-cell type capacitive touch screen, the problem that attractive effect of pictures is reduced occurs. In order to solve the problem, a capacitive touch screen substrate structurally comprises a first substrate 10 where optical glass is adopted, a first refractive index adjustment film 11 located on the first substrate 10 and made of materials lowering than the first substrate in refractive index, and a transparent conducting film 12p formed on the first refractive index adjustment film 11 or the capacitive touch screen substrate comprises a first substrate 10 where the optical glass is adopted, and a transparent conducting film 12p formed on the first substrate and having a film thickness less than 50nm.
Description
Technical field
The utility model relates to condenser type touch screen substrate and manufacturing installation thereof, specifically, relates to on-cell type condenser type touch screen substrate and manufacturing installation thereof.
Background technology
From station or service industry's articles for use such as the cashier's machine in the ticketing of fast food restaurant (certificate) machine, snacks shop or ATM (automatic teller machine), in the daily necessitiess such as controller of mobile phone, panel computer or household electrical appliance, touch-screen all is widely used.For the display device of liquid crystal display etc., touch-screen is divided into the externally positioned type of the outside surface that is assemblied in display and is built in the internally-arranged type of display from large aspect.
The externally positioned type touch-screen is current extensively universal type, and known for example have resistive film mode, capacitive way, optical mode, sound equipment mode or electromagnetic mode etc.Capacitive way particularly, surface type condenser type and projected capacitive are developed.
Described externally positioned type touch-screen is because be assemblied in touch-screen in the outside of display, and this structure can make whole equipment become thick and heavy.With respect to this, the internally-arranged type touch-screen is touch-screen to be built in to the inside of display, and such structure can be realized super book and lightweight compared with externally positioned type.
The internally-arranged type touch-screen, classify according to the position of liquid crystal pixel and touch panel, and in-cell type and on-cell type are arranged.(the in-cell type refers to that touch panel is embedded in liquid crystal pixel; The on-cell type refers to and configure touch sensor on touch panel.) as in-cell type touch-screen, such as contact, condenser type and the optical profile type etc. of developing are arranged; As on-cell type touch-screen, such as resistance-type, surface type condenser type and the porjection type condenser type etc. of developing are arranged.The capacitive touch-screen of on-cell type is a kind of like this formation, for example, forming on the substrate of display the pattern that is prepared with the nesa coatings such as tin indium oxide (Indium Tin Oxide, ITO) film, for detection of the position that goes out to touch.Form the substrate of display, and the substrate for preparing the electrically conducting transparent film figure thereon is referred to as touch screen base plate.
The touch-screen of relevant described on-cell type capacitive way is on the books in patent documentation 1-3.
The prior art document:
[patent documentation]
[patent documentation 1] JP 2011-165184 communique;
[patent documentation 2] JP 2011-222013 communique;
[patent documentation 3] JP 2012-43394 communique.
The utility model content
[problem to be solved in the utility model]
Problem to be solved in the utility model is: in the touch-screen of on-cell type capacitive way, the pattern of the nesa coating formed on the substrate that forms display can be found out in display screen, affects the problem attractive in appearance of display screen.
[the utility model solves the method for problem]
Condenser type touch screen substrate of the present utility model comprises:
Adopt the first substrate of optical glass;
Adjust film with the use first refractive rate that than the refractive index of described first substrate prepared by low material on described first substrate;
With the nesa coating prepared on described first refractive rate adjustment film.
Described condenser type touch screen substrate of the present utility model is used the low material than the refractive index of first substrate to be prepared with first refractive rate adjustment film on the first substrate that adopts optical glass, in the first refractive rate, adjusts on film and is prepared with nesa coating.
Described condenser type touch screen substrate of the present utility model, preferably, the thickness of described nesa coating is below 50nm.
Described condenser type touch screen substrate of the present utility model, preferably, it is the film prepared by the RF sputtering method that described first refractive rate is adjusted film.
Described condenser type touch screen substrate of the present utility model, preferably, the material that described first refractive rate is adjusted film is monox or magnesium fluoride.
Described condenser type touch screen substrate of the present utility model preferably, is prepared with the second refractive index and adjusts film between described first substrate and described first refractive rate adjustment film.
Described condenser type touch screen substrate of the present utility model, preferably, the refractive index of the described first substrate of refractive index ratio of described the second refractive index adjustment film is high.
Described condenser type touch screen substrate of the present utility model, preferably, the material that described first refractive rate is adjusted film is monox or magnesium fluoride material; The material that described the second refractive index is adjusted film is niobium oxide or tantalum oxide or titania or tin indium oxide.
Described condenser type touch screen substrate of the present utility model, preferably, described nesa coating comprises some nesa coating layerings, described nesa coating layering is superimposed by transparent adhesive.
Described condenser type touch screen substrate of the present utility model, preferably, the processed pattern of described nesa coating.
Described condenser type touch screen substrate of the present utility model, preferably, the described nesa coating of processed pattern by transparent adhesive together with other optical glass base plate bonding.
Also have, described condenser type touch screen substrate of the present utility model comprises:
Adopt the first substrate of optical glass;
Be less than the nesa coating of 50nm with the thickness prepared on described first substrate.
Described condenser type touch screen substrate of the present utility model preferably, is prepared with the nesa coating that thickness is less than 50nm on the first substrate that adopts optical glass.
Also have, the manufacturing installation of condenser type touch screen substrate of the present utility model comprises:
The plated film cavity;
Be arranged in the plated film cavity, for supporting the support component of the first substrate that adopts optical glass;
Be arranged in the plated film cavity, use the low material than the refractive index of described first substrate to prepare the first refractive rate adjustment membrane material supply part that the first refractive rate is adjusted film on first substrate;
Be arranged in the plated film cavity, prepare the electrically conducting transparent membrane material supply part of nesa coating on described first substrate.
The manufacturing installation of described condenser type touch screen substrate of the present utility model, the support component that supports the first substrate that adopts optical glass has been installed in the plated film cavity, with use, than the refractive index of described first substrate, low material prepares the first refractive rate adjustment membrane material supply part that the first refractive rate is adjusted film on first substrate, with the electrically conducting transparent membrane material supply part for preparing nesa coating on described first substrate, adopt the first substrate of optical glass in the support component upper support, on described first substrate, use the low material than the refractive index of described first substrate to prepare first refractive rate adjustment film, adjust on film and prepare nesa coating in the first refractive rate.
[effect of the present utility model]
According to condenser type touch screen substrate of the present utility model, even by the processed pattern of nesa coating, on display screen, the pattern of nesa coating becomes and is difficult in sightly, can overcome the problem that the picture aesthetic descends.
According to the manufacturing installation of condenser type touch screen substrate of the present utility model, even by the processed pattern of nesa coating, on display screen, the pattern of nesa coating becomes and is difficult in sightly, can overcome the problem that the picture aesthetic descends.
The accompanying drawing explanation
Fig. 1 is in the first embodiment of the present utility model, has assembled the structural representation of the display of on-cell type condenser type touch screen substrate.
(a)-(d) of Fig. 2 is in the first embodiment of the present utility model, the process chart of the manufacture method of on-cell type condenser type touch screen substrate.
Fig. 3 is in the second embodiment of the present utility model, has assembled the structural representation of the display of on-cell type condenser type touch screen substrate.
(a)-(d) of Fig. 4 is in the second embodiment of the present utility model, the process chart of the manufacture method of on-cell type condenser type touch screen substrate.
Fig. 5 is in the 3rd embodiment of the present utility model, has assembled the structural representation of the display of on-cell type condenser type touch screen substrate.
Fig. 6 is in the 4th embodiment of the present utility model, has assembled the structural representation of the display of on-cell type condenser type touch screen substrate.
Fig. 7 is in the 5th embodiment of the present utility model, has assembled the structural representation of the display of on-cell type condenser type touch screen substrate.
Fig. 8 is in the 6th embodiment of the present utility model, has assembled the structural representation of the display of on-cell type condenser type touch screen substrate.
Fig. 9 is the thickness of test example one corresponding nesa coating of the present utility model and the graph of a relation of transmissivity and reflectivity.
Figure 10 (a)-(c) is the reflectivity of the corresponding touch screen base plate of tested object 1-3 in test example two of the present utility model and the mutual relationship figure of optical wavelength.
Figure 11 (a)-(c) is the reflectivity of the corresponding touch screen base plate of tested object 4-6 in test example two of the present utility model and the mutual relationship figure of optical wavelength.
Figure 12 (a)-(c) is the reflectivity of the corresponding touch screen base plate of tested object 1-3 in test example three of the present utility model and the mutual relationship figure of optical wavelength.
Figure 13 (a)-(c) is the reflectivity of the corresponding touch screen base plate of tested object 4-6 in test example three of the present utility model and the mutual relationship figure of optical wavelength.
Figure 14 (a) and (b) be to the energy profile of the contributive ion of plated film in test example four of the present utility model.
Figure 15 (a) and (b) be the X-ray diffraction spectrum of nesa coating in test example five of the present utility model.
Figure 16 (a) and (b) be the electron micrograph of nesa coating in test example six of the present utility model.
Figure 17 is the resistivity of nesa coating in test example seven of the present utility model and the graph of a relation between coating temperature.
Figure 18 be the transmissivity of nesa coating in test example eight of the present utility model and reflectivity and and optical wavelength between graph of a relation (optical absorption spectra).
In figure:
10 ... first substrate
11 ... the first refractive rate is adjusted film
12,12p ... nesa coating
12a, 12b ... the nesa coating layering
13,13a, 13b ... transparent adhesive
14 ... the 3rd substrate
15 ... the second refractive index is adjusted film
20 ... second substrate
30 ... liquid crystal layer
Embodiment
Embodiment referring to accompanying drawing to condenser type touch screen substrate of the present utility model and manufacture method and manufacturing installation describes.
The<the first embodiment >
" assembled the structure of the display of capacitive touch screen "
Fig. 1 is the structural representation that has assembled the display of on-cell condenser type touch screen substrate under the present embodiment.The display of the present embodiment is for example liquid crystal display.For example between first substrate 10 and second substrate 20, by the pad (not shown), certain gap being set is bonded together.First substrate and second substrate are all for example optical glass substrates separately.For example on the surface of the second substrate 20 towards first substrate 10 1 sides, be provided with the thin film transistor (TFT) (not shown) that drives pixel and the pixel electrode (not shown) of being distinguished by each pixel, and be provided with its surperficial alignment film (not shown) of covering.Also have, for example on the surface of the first substrate 10 towards second substrate 20 1 sides, be provided with anti-phase electrode (not shown) comprehensively, be provided with and cover its surperficial alignment film (not shown).Also having, is display screen side back to a side of the first substrate 10 of second substrate 20.Be provided with the liquid crystal layer 30 of enclosing liquid crystal material between first substrate 10 and second substrate 20.
In the formation of described display, first substrate 10 is the substrate that forms liquid crystal display on the one hand, is the capacitive touch screen base plate of on-cell simultaneously.On the surface of the first substrate 10 back to second substrate 20, be coated with the first refractive rate lower than first substrate refractive index and adjust film 11.The first refractive rate is adjusted film 11, is for example to be formed by monox or magnesium fluoride, and thickness is for example 5～100nm.
In the first refractive rate, adjust on film 11, preparation example is if any by materials such as ITO, forming nesa coating 12p, and thickness is for example 5～50nm.The described nesa coating 12p formed by materials such as ITO is for example the film that adopts reactive plasma deposition processes (Reactive Plasma Deposition, RPD) to form.
For example the present embodiment can be following formation, forms by monox the first refractive rate that 25nm is thick and adjusts film 11, by the ITO material, forms the nesa coating 12p that 10nm is thick.
For example, in order to form capacitive touch screen, described nesa coating 12p is processed to specified pattern.Further, for example, on the described nesa coating 12p that is processed to pattern, by transparent adhesive 13 and the 3rd substrate 14 that adopts glass substrate, be bonded together.
About the touch screen base plate of said structure, first substrate 10 and the 3rd substrate 14 are optical glass, and its refractive index for example is about 1.52.The first refractive rate is adjusted film 11, is for example in situation about being formed by monox, and its refractive index is about 1.45.Nesa coating 12p, be for example in situation about being formed by the ITO material, and its refractive index is about 1.95.Transparent adhesive 13, be optically transparent, and its refractive index is for example 1.48～1.56.
Structure based on above-mentioned, due to the nesa coating 12p that is formed with thin for example 5～50nm, further at first substrate 10 be processed between the nesa coating 12p of pattern be formed with the low first refractive rate of ratio first substrate 10 refractive indexes of being made by monox and adjust film 11, on display screen, the pattern of nesa coating 12p just becomes and is difficult to find out, can overcome the low problem of display screen aesthetic.Also have, due to the nesa coating 12p that is formed with thin for example 5～50nm, the reflectivity on touch screen base plate is reduced, and transmitance is high, and the characteristic of having assembled the display of touch-screen is enhanced.In the situation that the not enough 5nm of the thickness of nesa coating 12p, surface resistance uprises, and as its function of electrode, reduces, and effect is bad.Also have, if the thickness of nesa coating 12p exceeds 50nm, the effect that reflectivity reduces dies down, and effect is also bad.
The display of described the present embodiment is liquid crystal display, in the both sides of liquid crystal layer 30, is provided with not shown light polarizing film.For example light polarizing film be arranged on second substrate 20 back to the surface of first substrate 10 with on the surface back to first substrate 10 of the 3rd substrate 14.Also have, the display of described the present embodiment is in the situation of color monitor, is provided with not shown color filter.Color filter is arranged on, such as the suitable positions such as surface by second substrate 20 1 sides of first substrate 10.In described structure, by the voltage be applied in, control the orientation of liquid crystal between pixel electrode and comparative electrode, can be on the display panel of liquid crystal display display pixel.
At the touch-screen of described the present embodiment, in built-in display, touch-screen is on-cell type capacitive touch screen.Be for example projected capacitive touch screen, with finger, wait on the surface of the 3rd substrate 14 and touch, in the electric capacity be processed between the nesa coating 12p of pattern, change, by the detection to this, the position that location is touched becomes possibility.At described touch-screen, the position be touched of locating by handle and the displaying contents of display carry out associated, can the input using touch-screen as display bring in use.
Touch screen base plate and the liquid crystal display of using this substrate according to the present embodiment, form the first refractive rate lower than the refractive index of first substrate and adjust film on first substrate, adjust on film and be formed with nesa coating in the first refractive rate, in addition, because nesa coating is done very thin, for example thickness is from 5 to 50nm, even the processed pattern of this nesa coating, the pattern of nesa coating also becomes and is difficult to be found out on display screen, can overcome the low problem of display frame aesthetic.
" manufacture method of touch screen base plate "
Next, the manufacture method of the touch screen base plate with regard to the present embodiment described.
At first, as shown in Figure 2 (a) shows, for example, by radio frequency (Radio Frequency, RF) sputtering method, on the surface of the first substrate 10 back to second substrate 20, form the first refractive rate by monox or the low material of refractive index of magnesium fluoride geometric ratio first substrate 10 and adjust film 11, its thickness is for example 5～10nm.Secondly, adjust the upper strata of film 11 in the first refractive rate, for example, by the reactive plasma deposition of RPD() method, by the ITO(tin indium oxide) etc. material form nesa coating 12, its thickness is 5～50nm.
Described RPD is, for example in film forming chamber, is provided with substrate for film deposition, ITO evaporation target and ion gun, and the ion that utilizes ion gun to produce is obtaining indium ion from ITO evaporation target and being that the tin ion oxidation forms oxide and deposits in substrate for film deposition.
Even give the voltage of ion gun, adjust the degree so low at 60-70V still passable, the indium ion obtained by plasma and the energy of tin ion are to be controlled at for example 30eV(electron-volt) below, compare with sputter and can reduce the damage of plasma to substrate.Because the feature of the ITO film formed by RPD is, the particle diameter of crystalline particle becomes large with comparing of forming by sputter, so obtain low surface resistance, can prepare the thinner film of thickness from 5nm to 50nm.Also have, because under large electric current and highdensity plasma, plasma reaction to the electrically conducting transparent membrane material of ITO etc. is very abundant, even the temperature of substrate for film deposition is reduced to for example low temperature of 100 degree left and right, also enough low resistivity can be obtained by very thin thickness, therefore concerning the substrates such as plastics, resin film, after plated film, the sub zero treatment operation can be adapted to.
Also have, it is also possible that the RPD method is carried out plated film under the hyperbar of for example 0.3Pa left and right, the coverage rate of ITO film is enhanced, to there being rough substrate for film deposition also can obtain the film of gapless densification, surface resistance is reduced, and can obtain the nesa coating of the ITO film etc. of good environmental resistance.
Next, as shown in Fig. 2 (b), for example on the upper strata of nesa coating 12, according to fixed pattern, form the etchant resist (not shown), the etchant resist obtained is carried out to the corrosion treatment of dry corrosion or wet corrosion etc., obtain the nesa coating 12P of processed pattern.Again etchant resist is removed afterwards.
Next, as shown in Fig. 2 (c), the method for example be coated with by high speed centrifugation, coat transparent adhesive is covered the nesa coating 12p of processed pattern and first refractive adjustment film 11 comprehensively, as shown in Figure 2 (d) shows, take transparent adhesive 13 on medium is bonding the 3rd substrate 14 of employing glass substrate.
Do according to above-mentioned method, can produce the touch screen base plate of using in the present embodiment.During liquid crystal display shown in shop drawings 1.For example on the opposing face of the face of the formation nesa coating 12p of the first substrate 10 that forms touch screen base plate, form reverse electrode, the touch screen base plate here is to obtain by above-mentioned method.Also have, form Thin Film Transistor (TFT) (Thin Film Transistor on second substrate 20, TFT) and pixel electrode, configuration alignment film etc., between first substrate 10 and second substrate 20, be adjusted in the ， gap, gap set and inject liquid crystal by the pad (not shown), can produce liquid crystal layer 30.
Manufacture method according to the touch screen base plate of the present embodiment, form the first refractive rate lower than the refractive index of first substrate and adjust film on first substrate, adjust on film and form nesa coating in the first refractive rate, further, owing to nesa coating being done very thin, for example thickness is 5～50nm, even the processed pattern of this nesa coating, the electrically conducting transparent film figure also becomes and is difficult to find out on display, can overcome the low problem of display frame aesthetic.
" manufacturing installation of touch screen base plate "
The touch screen base plate of described the present embodiment can be with following manufacturing installation manufacture.
The plated film cavity is for example arranged, with be installed in the plated film cavity for supporting the support component of first substrate, adjust the membrane material supply part with the use first refractive rate that the low materials such as monox deposit it on first substrate than the refractive index of first substrate, and be installed in the electrically conducting transparent membrane material supply part that makes the nesa coating deposition on the inherent first substrate of plated film cavity.
The plated film cavity is connecting vacuum pump by gas outlet, and the air pressure in cavity can be reduced to the force value of setting.By the RPD plated film time, the back pressure in the plated film cavity is for example about 0.3Pa.
On support component, will adopt the first substrate of optical glass to support, the force value of setting will be decompressed to as mentioned above in the plated film cavity, adjust the membrane material supply part from the first refractive rate and supply with first refractive rate adjustment membrane material, for example adopt the RF sputtering method to form the first refractive rate by silica material on first substrate and adjust film.Next, from electrically conducting transparent membrane material supply unit, supply with the electrically conducting transparent membrane material, for example adopt the RPD method to adjust on film and form nesa coating by the ITO material in the first refractive rate.According to the structure of described manufacturing installation, can for example adopt continuation mode to manufacture touch screen base plate.
Manufacturing installation according to the touch screen base plate of the present embodiment, form the first refractive rate lower than the refractive index of first substrate and adjust film on first substrate, adjust on film and form nesa coating in the first refractive rate, further, owing to nesa coating being done very thin, for example thickness is 5～50nm, even the processed pattern of this nesa coating, the electrically conducting transparent film figure also becomes and is difficult to find out on display, can overcome the low problem of display frame aesthetic.
The<the second embodiment >
" assembled the structure of the display of capacitive touch screen "
Fig. 3 is the structural representation that has assembled the display of on-cell condenser type touch screen substrate under the present embodiment.
The display of the present embodiment is for example liquid crystal display.As shown in FIG. 3:
At the first substrate 10 that adopts optical glass with formed 23 first refractive rates by monox and adjust between films 11 and increased by the second refractive index and adjust film 15, in addition, identical with the structure of the display of the first embodiment in essence.
In the structure of described display, first substrate 10 is the substrate that forms liquid crystal display on the one hand, is also the capacitive touch screen base plate of on-cell simultaneously.On the surface of the first substrate 10 of second substrate 20, for example, by ITO, niobium pentaoxide (Nb
2o
5), tantalum pentoxide (Ta
2o
5) or titania (TiO
2) to be formed with thickness be that 5～100nm the second refractive index is adjusted film 15 for the high material of refractive index of geometric ratio first substrate 10.Adjust the upper strata of film 15 in the second refractive index, be formed with the first refractive rate lower than the refractive index of first substrate 10 and adjust film 11.The first refractive rate is adjusted film 11, is for example to be formed by monox or magnesium fluoride, and thickness is for example 5～100nm.
In the first refractive rate, adjust on film 11, such as by materials such as ITO, forming nesa coating 12p, thickness is for example 5～50nm.The described nesa coating 12p formed by materials such as ITO is for example the film that adopts the RPD method to form.
For example can adopt following scheme: it is 10nm that the second refractive index adjustment film 15 forms thickness by ITO, and it is 50nm that first refractive rate adjustment film 11 forms thickness by monox, and it is 10nm that nesa coating 12p forms thickness by ITO.
Described nesa coating 12p for example, for the member as capacitive touch screen, processed specific pattern.Further, for example, on the nesa coating 12p of described processed pattern, by the 3rd substrate 14 of the bonding upper employing glass substrate of transparent adhesive 13.
In the touch screen base plate of said structure, first substrate 10 and the 3rd substrate 14 are optical glass, and its refractive index is for example 1.52 left and right.The second refractive index is adjusted film 15, and for example, in situation about being formed by ITO, its refractive index is 1.95 left and right, and in situation about being formed by niobium pentaoxide, its refractive index is 2.3 left and right.The first refractive rate is adjusted film 11, and for example, in situation about being formed by monox, its refractive index is 1.45 left and right.Nesa coating 12p, for example, in situation about being formed by ITO, its refractive index is approximately 1.95.Transparent adhesive 13, be the transparent bonding agent of optics, and its refractive index is for example 1.48～1.56.
In described structure, between the nesa coating 12p of first substrate 10 and processed pattern, there is the second refractive index that the refractive index of the ratio first substrate 10 formed by the ITO material is high to adjust film 15 and the low first refractive rate adjustment film 11 of refractive index of the ratio first substrate 10 that formed by materials such as monox, in addition, owing to nesa coating being done very thin, thickness is 5～50nm, even the processed pattern of this nesa coating 12p, the electrically conducting transparent film figure also becomes and is difficult to be found out on display, can overcome the low problem of display frame aesthetic.Also have, because the nesa coating 12p of preparation is thin, for example, from 5nm to 50nm, the reflectivity on touch screen base plate is reduced, and transmitance is high, and the characteristic of having assembled the display of touch-screen is enhanced.In the situation that the not enough 5nm of the thickness of nesa coating 12p, surface resistance uprises, and as its miopragia of electrode, effect is bad.Also have, if the thickness of nesa coating 12p exceeds 50nm, the effect that reflectivity reduces dies down, and effect is also bad.
Except above explanation, identical with the structure of the first embodiment.Touch screen base plate and the liquid crystal display of using this substrate according to the present embodiment, form second refractive index higher than first substrate refractive index and adjust film on first substrate, adjust on film and form the first refractive rate adjustment film lower than first substrate refractive index in the second refractive index, in addition, because nesa coating is done very thin, for example thickness is from 5nm to 50nm, even this nesa coating is made pattern, the pattern of nesa coating also becomes and is difficult to find out on display screen, can overcome the low problem of display frame aesthetic.
" manufacture method of touch screen base plate "
Next, the manufacture method of the touch screen base plate of the present embodiment described.
At first, as shown in Figure 4 (a), for example adopt the RPD method on the surface of the first substrate 10 back to second substrate 20, form the second refractive index by the high material of refractive index of the ratio first substrate 10 of ITO or niobium pentaoxide etc. and adjust film 15, its film thickness is for example 5～100nm.Secondly, for example adopt and carry the RF sputtering method, adjust the upper strata of film 15 in the second refractive index, by the low material of refractive index of the ratio first substrate 10 of monox or magnesium fluoride etc., forms first refractive rate adjustment film 11, its film thickness is for example 5～100nm.Again, on the first refractive rate is adjusted film 11, for example adopt the RPD method, by the ITO(tin indium oxide) etc. material form nesa coating 12, its thickness is 5～50nm.
The ITO film that adopts the RPD method to form, because the particle diameter that forms its crystalline particle is compared and become large with the employing sputtering method, so obtain low surface resistance, can prepare the thinner film of thickness from 5nm to 50nm.Also have, because under large electric current and highdensity plasma, plasma reaction to the electrically conducting transparent membrane material of ITO etc. is very abundant, even the temperature of substrate for film deposition is reduced to for example low temperature of 100 degree left and right, also enough low resistivity can be obtained by very thin thickness, therefore concerning the substrates such as plastics, resin film, after plated film, the sub zero treatment operation can be adapted to.
Next, as shown in Figure 4 (b), for example on the upper strata of nesa coating 12, according to fixed pattern, form the etchant resist (not shown), the etchant resist obtained is carried out to the corrosion treatment of dry corrosion or wet corrosion etc., obtain the nesa coating 12P of processed pattern.Again etchant resist is removed afterwards.
Next, as shown in Figure 4 (c), the method for example be coated with by high speed centrifugation, coat transparent adhesive is covered the nesa coating 12p of processed pattern and first refractive adjustment film 11 comprehensively, as shown in Fig. 4 (d), take transparent adhesive 13 on medium is bonding the 3rd substrate 14 of employing glass substrate.
Do according to above-mentioned method, can produce the touch screen base plate of using in the present embodiment.During liquid crystal display shown in shop drawings 1.For example on the opposing face of the face of the formation nesa coating 12p of the first substrate 10 that forms touch screen base plate, form reverse electrode, the touch screen base plate here is to obtain by above-mentioned method.Also have, form TFT and pixel electrode on second substrate 20, configuration alignment film etc., between first substrate 10 and second substrate 20, be adjusted into by the pad (not shown) in the ， gap, gap set and inject liquid crystal, can produce liquid crystal layer 30.
Manufacture method according to the touch screen base plate of the present embodiment, form second refractive index higher than the refractive index of first substrate and adjust film on first substrate, adjust on film and form the first refractive rate adjustment film lower than the refractive index of first substrate in the second refractive index, adjust on film and form nesa coating in the first refractive rate, further, by nesa coating being done very thin, for example thickness is 5～50nm, even the processed pattern of this nesa coating, the electrically conducting transparent film figure also becomes and is difficult to find out on display, can overcome the low problem of display frame aesthetic.
" manufacturing installation of touch screen base plate "
The touch screen base plate of described the present embodiment can be with following manufacturing installation manufacture.
The plated film cavity is for example arranged, with the support component that is installed in the support first substrate in the plated film cavity, with use, than the refractive index of first substrate, the high materials such as ITO make it deposit second refractive index adjustment membrane material supply part that the second refractive index is adjusted film on first substrate, with use, than the refractive index of first substrate, the low materials such as monox make it deposit first refractive rate adjustment membrane material supply part that the first refractive rate is adjusted film on first substrate, and are installed in the electrically conducting transparent membrane material supply part of deposition of transparent conductive film in the plated film cavity, on first substrate.
The plated film cavity is connecting vacuum pump by gas outlet, and the air pressure in cavity can be reduced to the force value of setting.By the RPD plated film time, the back pressure in the plated film cavity is for example about 0.3Pa.
On support component, will adopt the first substrate of optical glass to support, the force value of setting will be decompressed to as mentioned above in the plated film cavity, adjust the membrane material supply part from the second refractive index and supply with the second refractive index adjustment membrane material, for example adopt the RPD method to form the second refractive index by ITO on first substrate and adjust film.Secondly, supply with the first refractive rate from first refractive rate adjustment membrane material supply part and adjust membrane material, such as adopting the RF sputtering method to adjust on film and form first refractive rate adjustment film by materials such as monox in the second refractive index.Next, from electrically conducting transparent membrane material supply unit, supply with the electrically conducting transparent membrane material, for example adopt the RPD method to adjust on film and form nesa coating by the ITO material in the first refractive rate.According to the formation of described manufacturing installation, can for example adopt continuation mode to manufacture touch screen base plate.
Manufacturing installation according to the touch screen base plate of the present embodiment, form second refractive index higher than the refractive index of first substrate and adjust film on first substrate, adjust on film and form the first refractive rate adjustment film lower than the refractive index of first substrate in the second refractive index, adjust on film and form nesa coating in the first refractive rate, further, by nesa coating being done very thin, for example thickness is 5～50nm, even the processed pattern of this nesa coating, the electrically conducting transparent film figure also becomes and is difficult to find out on display, can overcome the low problem of display frame aesthetic.
The<the three embodiment >
" assembled the structure of the display of capacitive touch screen "
Fig. 5 is the structural representation that has assembled the display of on-cell condenser type touch screen substrate in the present embodiment.The display of the present embodiment is for example liquid crystal display.In the structure of described display, first substrate 10 is the substrate that forms liquid crystal display on the one hand, is the capacitive touch screen base plate of on-cell simultaneously.On the surface of the first substrate 10 of second substrate 20, such as by materials such as ITO, forming nesa coating 12p, thickness is for example 5～50nm.The described nesa coating 12p formed by materials such as ITO is for example the film that adopts the PRD method to form.
Described nesa coating 12p for example, for the member as capacitive touch screen, processed specific pattern.Further, for example, on the nesa coating 12p of described processed pattern, by the 3rd substrate of the bonding employing glass substrate of transparent adhesive 13.
In the touch screen base plate of said structure, first substrate 10 and the 3rd substrate 14 are optical glass, and its refractive index is for example 1.52 left and right.Nesa coating 12p, for example, in situation about being formed by ITO, its refractive index is approximately 1.95.Transparent adhesive 13, be the transparent bonding agent of optics, and its refractive index is for example 1.48～1.56.
In described structure, due to the preparation nesa coating 12p very thin, for example from 5nm to 50nm the left and right, the pattern of nesa coating 12p becomes and is difficult to find out on display screen, can overcome the low problem of picture aesthetic.Also have, because the nesa coating 12p of preparation is very thin, left and right from 5nm to 50nm for example, the reflectivity on touch screen base plate is reduced, and transmitance is high, and the characteristic of having assembled the display of touch-screen is enhanced.In the situation that the not enough 5nm of the thickness of nesa coating 12p, surface resistance uprises, and as its miopragia of electrode, effect is bad.Also have, if the thickness of nesa coating 12p exceeds 50nm, the effect that reflectivity reduces dies down, and effect is also bad.
Except above explanation, identical with the structure of the first embodiment.According to the touch screen base plate of the present embodiment with by the liquid crystal display of its manufacture, because nesa coating is done very thin, thickness is for example from 5nm to 50nm, even this nesa coating is made pattern, the pattern of nesa coating also becomes and is difficult to find out on display screen, can overcome the low problem of display frame aesthetic.
" manufacture method of touch screen base plate "
Next, the manufacture method of the touch screen base plate of the present embodiment described.
At first, on first substrate 10, for example adopt the RPD method, by materials such as ITO, form the nesa coating 12 that 5～50nm is thick.
The ITO film that adopts the RPD method to form, because the particle diameter that forms its crystalline particle is compared and become large with the employing sputtering method, so obtain low surface resistance, can prepare the thinner film of thickness from 5nm to 50nm.Also have, compare with sputtering method and can reduce the damage of plasma to substrate, because even the temperature of plated film object substrate is reduced to for example low temperature of 100 degree left and right, also enough low resistivity can be obtained by very thin thickness, therefore concerning the substrates such as plastics, resin film, after plated film, the sub zero treatment operation can be adapted to.Coverage rate is enhanced in addition, to rough film forming object substrate is arranged, also can obtain the film of gapless densification, and surface resistance is reduced, and can obtain the nesa coating of the ITO film etc. of good environmental resistance.
Operation about after above-mentioned, can adopt with the first embodiment same procedure and carry out.
Manufacture method according to the touch screen base plate of the present embodiment, because do very thinly by nesa coating, for example thickness is 5～50nm, even the processed pattern of this nesa coating, the electrically conducting transparent film figure also becomes and is difficult to find out on display, can overcome the low problem of display frame aesthetic.
The<the four embodiment >
Fig. 6 is the structural representation that has assembled the display of on-cell condenser type touch screen substrate in the present embodiment.
The display of the present embodiment is for example liquid crystal display.As shown in Figure 6, use transparent adhesive (13a, 13b) that some nesa coating layerings (12a, 12b) are superimposed and become described nesa coating 12p, in addition, identical with the display of the first embodiment on structure.Some nesa coating layerings (12a, 12b) of the present embodiment be for example to nesa coating layering 12a along X-direction deep processing pattern, to nesa coating layering 12b along y direction of principal axis deep processing pattern.
At the touch-screen of above-mentioned the present embodiment, in built-in display, touch-screen is the capacitive touch screen of on-cell type.Be for example projected capacitive touch screen, with finger, wait on the surface of the 3rd substrate 14 and touch, the electric capacity between the nesa coating 12p of processed pattern changes, and by the detection to this, can locate the coordinate (X, Y) of the position that is touched.In above-mentioned touch-screen, it is associated that the position be touched of locating by handle and displaying contents carry out, and can the input using touch-screen as display bring in use.
Touch screen base plate and the liquid crystal display of using this substrate according to the present embodiment, form the first refractive rate lower than the refractive index of first substrate and adjust film on first substrate, adjust on film and be formed with nesa coating in the first refractive rate, in addition, because nesa coating is done very thin, for example thickness is from 5nm to 50nm, even this nesa coating is made pattern, the pattern of nesa coating also becomes and is difficult to find out on display screen, can overcome the low problem of display frame aesthetic.
The touch screen base plate of the present embodiment, when forming the electrically conducting transparent membrane process, to the nesa coating layering, 12a processes pattern along X-direction, after thereon transparent adhesive 13a painting being put down, to the nesa coating layering, 12b processes pattern along the y direction of principal axis, transparent adhesive 13b is coated with again flatly thereon, in addition, can similarly manufactures with the manufacture method of the touch screen base plate of the first embodiment.
The<the five embodiment >
Fig. 7 is the structural representation that has assembled the display of on-cell condenser type touch screen substrate in the present embodiment.
The display of the present embodiment is for example liquid crystal display.As shown in Figure 7, use transparent adhesive (13a, 13b) that some nesa coating layerings (12a, 12b) are superimposed and become described nesa coating 12p, in addition, identical with the display of the second embodiment on structure.Some nesa coating layerings (12a, 12b) of the present embodiment be for example to nesa coating layering 12a along X-direction deep processing pattern, to nesa coating layering 12b along y direction of principal axis deep processing pattern.
The display that the touch-screen of above-mentioned the present embodiment is built-in, touch-screen is the capacitive touch screen of on-cell type.Be for example projected capacitive touch screen, with finger, wait on the surface of the 3rd substrate 14 and touch, the electric capacity between the nesa coating 12p of processed pattern changes, and by the detection to this, can locate the coordinate (X, Y) of the position that is touched.At above-mentioned touch-screen, it is associated that the position be touched of locating by handle and displaying contents carry out, and can the input using touch-screen as display bring in use.
Touch screen base plate and the liquid crystal display of using this substrate according to the present embodiment, form second refractive index higher than first substrate refractive index and adjust film on first substrate, adjust on film and form the first refractive rate adjustment film lower than first substrate refractive index in the second refractive index, in addition, because nesa coating is done very thin, for example thickness is from 5nm to 50nm, even this nesa coating is made pattern, the pattern of nesa coating also becomes and is difficult to find out on display screen, can overcome the low problem of display frame aesthetic.
The touch screen base plate of the present embodiment, when forming the electrically conducting transparent membrane process, to the nesa coating layering, 12a processes pattern along X-direction, after thereon transparent adhesive 13a painting being put down, to the nesa coating layering, 12b processes pattern along the y direction of principal axis, transparent adhesive 13b is coated with again flatly thereon, in addition, can similarly manufactures with the manufacture method of the touch screen base plate of the second embodiment.
The<the six embodiment >
Fig. 8 is the structural representation that has assembled the display of on-cell condenser type touch screen substrate in the present embodiment.
The display of the present embodiment is for example liquid crystal display.As shown in 8, use transparent adhesive (13a, 13b) that some nesa coating layerings (12a, 12b) are superimposed and become described nesa coating 12p, in addition, identical with the display of the 3rd embodiment on structure.Some nesa coating layerings (12a, 12b) of the present embodiment are, for example to nesa coating layering 12a along X-direction deep processing pattern, to nesa coating layering 12b along y direction of principal axis deep processing pattern.
The display that the touch-screen of the above embodiments is built-in, touch-screen is the capacitive touch screen of on-cell type.Be for example projected capacitive touch screen, with finger, wait on the surface of the 3rd substrate 14 and touch, the electric capacity between the nesa coating 12p of processed pattern changes, and by the detection to this, can locate the coordinate (X, Y) of the position that is touched.At above-mentioned touch-screen, it is associated that the position be touched of locating by handle and displaying contents carry out, and can the input using touch-screen as display bring in use.
Touch screen base plate and the liquid crystal display of using this substrate according to the present embodiment, because nesa coating is done very thin, for example thickness is from 5nm to 50nm, even this nesa coating is made pattern, the pattern of nesa coating also becomes and is difficult to find out on display screen, can overcome the low problem of display frame aesthetic.
The touch screen base plate of the present embodiment, when forming the electrically conducting transparent membrane process, to the nesa coating layering, 12a processes pattern along X-direction, after thereon transparent adhesive 13a painting being put down, to the nesa coating layering, 12b processes pattern along the y direction of principal axis, transparent adhesive 13b is coated with again flatly thereon, in addition, can similarly manufactures with the manufacture method of the touch screen base plate of the 3rd embodiment.
<test example one >
Fig. 9 is the thickness of test example one corresponding nesa coating of the present utility model and the graph of a relation of transmissivity and reflectivity.On optical glass, adopt the RPD method to form the ITO film, the bonding optical glass of layer obtains tested object thereon, measures thickness and projection ratio T(%) and reflectivity R(%) mutual relationship.
Reflectivity R is along with the thickness attenuation, and it is worth step-down, when the ITO thickness, during at 70nm, reaches peak value.At the following reflectivity of 50nm during lower than 4%, 20nm approximately 1%, can be reduced to approximately 0.2% during 10nm.
As above confirmed at touch screen base plate and used on the liquid crystal display of this substrate, because nesa coating is done very thin, for example thickness is from 5nm to 50nm, even the processed pattern of this nesa coating, the pattern of nesa coating also becomes and is difficult to find out on display screen, can overcome the low problem of display frame aesthetic.
<test example two >
Figure 10 (a)-(c) is the reflectivity of the corresponding touch screen base plate of tested object 1-3 in test example two of the present utility model and the mutual relationship figure of optical wavelength.Also have, Figure 11 (a)-(c) is the reflectivity of the corresponding touch screen base plate of tested object 4-6 in test example two of the present utility model and the mutual relationship figure of optical wavelength.
Figure 10 (a) adopts the RPD method to form the reflectance spectrum of the tested object 1 obtained after the ITO film that 10nm is thick on optical glass, Figure 10 (b) adopts the RF sputtering method to form the thick silicon oxide film of 25nm on optical glass, layer adopts the RPD method to form the reflectance spectrum of the tested object 2 obtained after the ITO film that 10nm is thick thereon again, Figure 10 (c) adopts the RPD method to form the thick ITO film of 10nm on optical glass, layer adopts the RF sputtering method to form the thick silicon oxide film of 25nm thereon, the reflectance spectrum of the tested object 3 that layer adopts the thick ITO film of RPD method formation 10nm to obtain thereon again.Figure 11 (a)-(c) is corresponding diagram 10(a)-tested object 1-3 in (c), bonding thereon after optical glass, the reflectance spectrum of the tested object 4-6 obtained.
As shown in Figure 11 (a) shows, the ITO thickness is made 10nm when thick, from 0.8% downward, as shown in Figure 11 (b), form the thick monox of 25nm in the whole regional reflex rate of visible ray between glass substrate and ITO film, whole regional reflex rate at visible ray is downward from 0.6%, as shown in Figure 11 (c), form thick ITO film and the thick silicon oxide film of 25nm of 10nm between glass substrate and ITO film, downward from 0.05% in the whole regional reflex rate of visible ray.
From this experimental example, because nesa coating is done very thin, and be formed with the first refractive rate lower than first substrate refractive index and adjust film, or be formed with high the second refractive index than first substrate refractive index adjust film on first substrate, adjust on film and be formed with the first refractive rate adjustment film lower than first substrate refractive index in the second refractive index, therefore, even the processed pattern of this nesa coating, the pattern of nesa coating also becomes and is difficult to find out on display screen, has verified and can overcome the low problem of display frame aesthetic.
<test example three >
Figure 12 (a)-(c) is the reflectivity of the corresponding touch screen base plate of tested object 1-3 in test example three and the mutual relationship figure of optical wavelength.Also have, Figure 13 (a)-(c) is the reflectivity of the corresponding touch screen base plate of tested object 4-6 in test example three and the mutual relationship figure of optical wavelength.On optical glass, adopt the RF sputtering method to form the thick silicon oxide film of 25nm, layer adopts a RPD method to form the thick ITO film of 10nm thereon, more bonding optical glass thereon, with this, makes tested object 1-6, has measured its reflectivity R(%).
Figure 12 (a) is the average reflectance (a1) that the thickness of ITO that makes tested object 1 is obtained during with 5% variation, and minimum reflectivity is (a2), and maximum reflectivity is (a3).Figure 12 (b) is the average reflectance (b1) that the thickness of monox that makes tested object 2 is obtained during with 5% variation, and minimum reflectivity is (b2), and maximum reflectivity is (b3).Figure 12 (c) is the average reflectance (c1) that the thickness that makes the ITO film of tested object 3 and monox is obtained during all with 5% variation, and minimum reflectivity is (c2), and maximum reflectivity is (c3).As shown in Figure 12 (b), even the variation in thickness of silicon oxide film, the change of its reflectivity is very little, has determined that the reflectivity shown in itself and Figure 12 (a) and Figure 12 (c) is basic identical.That is, adjust the variation of the thickness of film for the first refractive rate, reflectivity has this fact of very high stability to obtain confirmation.
Figure 13 (a) is the average reflectance (a1) that the ITO thickness that makes tested object 4 is obtained during with 10% variation, and minimum reflectivity is (a2), and maximum reflectivity is (a3).Figure 13 (b) is the average reflectance (b1) that the thickness of monox that makes tested object 5 is obtained during with 10% variation, and minimum reflectivity is (b2), and maximum reflectivity is (b3).Figure 12 (c) is the average reflectance (c1) that the thickness that makes the ITO of tested object 6 and monox is obtained during all with 10% variation, and minimum reflectivity is (c2), and maximum reflectivity is (c3).Identical with above-mentioned situation, as shown in Figure 13 (b), even the variation in thickness of silicon oxide film, the change of its reflectivity is very little, has confirmed that the reflectivity shown in itself and Figure 13 (a) and Figure 13 (c) is basic identical.That is, adjust the change of the thickness of film for the first refractive rate, reflectivity has this fact of very high stability to obtain confirmation.
<test example four >
Figure 14 (a) and (b) be to the energy profile of the contributive ion of plated film in test example four.
Figure 14 (a) has meaned indium ion (In in the RPD method
+) concentration and the distribution relation of its ENERGY E (eV).Visible in the RPD method, the particle that energy exceeds 100eV does not have, and being in fact energy mostly has been identified lower than this fact of particle of 30eV.Also have, Figure 14 (b) has meaned argon ion (Ar in sputtering method
+) concentration and the distribution of its ENERGY E (eV).In sputtering method, the macro-energy particle that energy exceeds 100eV exists.That is, the RPD method is compared with sputtering method, can reduce plasma this fact of damage of substrate has been identified.
<test example five >
Figure 15 (a) and (b) be the X-ray diffraction spectrum of nesa coating in test example five.
Adopt the ITO film of RPD or sputtering method formation 300nm on optical glass, using it as tested object.Figure 15 (a) is the X-ray diffraction spectrum that adopts the ITO film of RPD method formation.By the RPD method, the peak value in (222) crystal orientation is very strong, and this fact of ITO film that can form single crystal orientation has been identified.Figure 15 (b) is the X-ray diffraction spectrum that adopts the ITO film of sputtering method formation.By sputtering method, a plurality of crystal orientation have appearred, the ITO film crystal orientation of the formation of comparing with the RPD method is many, little this fact of crystal grain has been identified.
<test example six >
Figure 16 (a) and (b) be the electron micrograph of nesa coating in test example six.
Adopt the ITO film of RPD or sputtering method formation 300nm on optical glass, using it as tested object.Figure 16 (a) is the electron micrograph that adopts the ITO film of RPD method formation, and by the RPD method, the particle diameter of crystallization is large, can form the film that surfaceness is 8nm, and little this fact of its surfaceness of film formed by the RPD method has been identified.Figure 16 (b) is the electron micrograph that adopts the ITO film of sputtering method formation, and by sputtering method, the particle diameter of crystallization is little, and the surfaceness of the film of formation is 30nm, so large this fact of its surfaceness of the film formed by sputtering method has been identified.
<test example seven >
Figure 17 is the resistivity of nesa coating in test example seven and the graph of a relation between coating temperature.
On optical glass, adopt RPD method or sputtering method various temperature (℃) the lower ITO of formation film, using this as tested object, tested its resistivity (μ Ω m).By the RPD method, can obtain ITO film this fact lower than sputtering method resistivity and be identified.Particularly, in order to obtain the ITO film that surface resistance is 10 Ω/, adopt the RPD method at the temperature of 100 ℃, the thickness of ITO is 200nm, and adopts more than the thickness of sputtering method ITO need to reach 300nm.
<test example eight >
Figure 18 is the transmissivity of nesa coating in test example eight and the graph of a relation (optical absorption spectra) between reflectivity sum and optical wavelength.
On optical glass, adopt the RPD method to form the ITO film of various thickness, measure its transmissivity T(%) and reflectivity R(%).In Figure 18, the longitudinal axis is transmissivity T and reflectivity R sum.Be less than 100% part and mean absorbed light.With respect to optical glass itself (a), formed ITO thickness 25nm(b), 50nm(c), 100nm(d), 150nm(e), 200nm(f) and 250nm(g).The ITO film that adopts RPD to form, along with the increase of film thickness, the absorption quantitative change of light is large.The zone of thickness below 50nm for example, light absorption line is almost that this fact of level has been identified.Being that the ITO thickness is less than 50nm, is transparent film for visible ray in essence.
The utility model is not limited to above explanation.Form for liquid crystal display for example has been described in an embodiment by touch screen base plate, but be not limited to this, also can be useful in the LED(light emitting diode) display device, organic EL(Electro Luminescence) etc. EL display device, VFD(fluorescent display tube) display device and PDP(plasma display panel) and the display device of liquid crystal indicator etc. on.Be touch screen base plate of the present utility model by the substrate that forms various display device, can make the display device of the touch pad of built-in on-cell type.
In addition, all within spirit of the present utility model and principle, any modification of doing, be equal to replacement, improvement etc., within all should being included in protection domain of the present utility model.
Claims (12)
1. condenser type touch screen substrate is characterized in that: comprising:
Adopt the first substrate of optical glass;
Adjust film with the first refractive rate that by the refractive index than described first substrate prepared by low material on described first substrate;
With the nesa coating prepared on described first refractive rate adjustment film.
2. according to the condenser type touch screen substrate described in claim 1, it is characterized in that: the thickness of described nesa coating is below 50nm.
3. according to the condenser type touch screen substrate described in claim 1, it is characterized in that: it is the film prepared by the RF sputtering method that described first refractive rate is adjusted film.
4. according to the condenser type touch screen substrate described in claim 1, it is characterized in that: the material that described first refractive rate is adjusted film is monox or magnesium fluoride.
5. according to the condenser type touch screen substrate described in claim 1, it is characterized in that: be prepared with the second refractive index and adjust film between described first substrate and described first refractive rate adjustment film.
6. according to the condenser type touch screen substrate described in claim 5, it is characterized in that: the refractive index of the described first substrate of refractive index ratio of described the second refractive index adjustment film is high.
7. according to the condenser type touch screen substrate described in claim 6, it is characterized in that: the material that described the second refractive index is adjusted film is niobium oxide or tantalum oxide or titania or tin indium oxide.
8. according to the condenser type touch screen substrate described in claim 1, it is characterized in that: described nesa coating comprises some nesa coating layerings, and described nesa coating layering is superimposed by transparent adhesive.
9. according to the described condenser type touch screen substrate of any one in claim 1～8, it is characterized in that: the processed pattern of described nesa coating.
10. according to the condenser type touch screen substrate described in claim 9, it is characterized in that: the described nesa coating of processed pattern by transparent adhesive together with other optical glass base plate bonding.
11. condenser type touch screen substrate is characterized in that: comprising:
Adopt the first substrate of optical glass;
Be less than the nesa coating of 50nm with the thickness prepared on described first substrate.
12. the manufacturing installation of condenser type touch screen substrate is characterized in that: comprising:
The plated film cavity;
Be arranged in described plated film cavity, for supporting the support component of the first substrate that adopts optical glass;
Be arranged in the plated film cavity, use the low material than the refractive index of described first substrate to prepare the first refractive rate adjustment membrane material supply part that the first refractive rate is adjusted film on first substrate;
Be arranged in the plated film cavity, prepare the electrically conducting transparent membrane material supply part of nesa coating on described first substrate.
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| JP2012-116533 | 2012-05-22 | ||
| JP2012116533A JP6122253B2 (en) | 2012-05-22 | 2012-05-22 | Capacitive touch panel substrate, manufacturing method and manufacturing apparatus thereof |
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| CN2013101901655A Pending CN103257779A (en) | 2012-05-22 | 2013-05-21 | A capacitive touch screen substrate and a manufacture method and a manufacture device thereof |
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| CN103257779A (en) * | 2012-05-22 | 2013-08-21 | 光驰科技(上海)有限公司 | A capacitive touch screen substrate and a manufacture method and a manufacture device thereof |
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| US10007380B2 (en) | 2013-07-29 | 2018-06-26 | Hideep Inc. | Touch input device with edge support member |
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| KR101681305B1 (en) | 2014-08-01 | 2016-12-02 | 주식회사 하이딥 | Touch input device |
| KR101712346B1 (en) | 2014-09-19 | 2017-03-22 | 주식회사 하이딥 | Touch input device |
| CN106062684B (en) * | 2014-03-05 | 2019-03-12 | 三菱电机株式会社 | Display panel and display device |
| JP6418631B2 (en) * | 2014-06-17 | 2018-11-07 | 株式会社アルバック | Transparent conductive substrate, method for manufacturing the same, and touch panel |
| JP6527343B2 (en) | 2014-08-01 | 2019-06-05 | 株式会社 ハイディープＨｉＤｅｅｐ Ｉｎｃ． | Touch input device |
| JP5845371B1 (en) | 2014-09-19 | 2016-01-20 | 株式会社 ハイディープ | smartphone |
| JP2016153963A (en) * | 2015-02-20 | 2016-08-25 | 大日本印刷株式会社 | Touch panel |
| CN104766546A (en) * | 2015-04-15 | 2015-07-08 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN104850266B (en) * | 2015-06-05 | 2018-06-15 | 京东方科技集团股份有限公司 | Touch display panel and its manufacturing method and display device |
| TW201702848A (en) * | 2015-07-09 | 2017-01-16 | 達鴻先進科技股份有限公司 | Capacitive touch panel |
| KR101583765B1 (en) | 2015-07-27 | 2016-01-08 | 주식회사 하이딥 | Smartphone |
| JP2019023772A (en) * | 2015-12-18 | 2019-02-14 | アルプス電気株式会社 | Input device |
| JP2019023773A (en) * | 2015-12-18 | 2019-02-14 | アルプス電気株式会社 | Input device |
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| CN110634621A (en) * | 2019-09-25 | 2019-12-31 | 天津大学 | Flexible transparent touch screen based on AgNWs and preparation method thereof |
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| JP2001195190A (en) * | 2000-01-11 | 2001-07-19 | Yazaki Corp | Input device and its manufacture |
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| JP6122253B2 (en) * | 2012-05-22 | 2017-04-26 | 株式会社オプトラン | Capacitive touch panel substrate, manufacturing method and manufacturing apparatus thereof |
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2013
- 2013-05-21 CN CN 201320280047 patent/CN203350843U/en not_active Expired - Lifetime
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| CN103257779A (en) * | 2012-05-22 | 2013-08-21 | 光驰科技(上海)有限公司 | A capacitive touch screen substrate and a manufacture method and a manufacture device thereof |
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| JP2013242770A (en) | 2013-12-05 |
| JP6122253B2 (en) | 2017-04-26 |
| CN103257779A (en) | 2013-08-21 |
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Effective date of registration: 20190716 Address after: 523838 Room 101, Building 2, Yanwu Longyuan Road, Dalingshan Town, Dongguan City, Guangdong Province Patentee after: Dongguan Huichi Vacuum Manufacturing Co.,Ltd. Address before: No. 267 Yin Road, Baoshan City Industrial Park, Shanghai, 2004 Patentee before: Optorun (Shanghai) Co.,Ltd. |
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