JP2019023772A - Input device - Google Patents

Abstract

To provide an input device that can prevent a pattern formed on a substrate from being unintentionally exposed.SOLUTION: An input device of the present invention comprises: a position detection unit that is provided on a substrate and has a plurality of detection electrodes; an optical layer that is provided on the position detection unit; and a protective member that is provided on the optical layer. In such the input device, the optical layer includes a first optical layer that is provided on the position detection unit and has a first refractive index, a film-like second optical layer that is provided on the first optical layer and includes a reflection adjustment layer having a second refractive index, and a third optical layer that is provided on the second optical layer and has a third refractive index. The refractive index of a layer of the reflection adjustment layer in contact with the third optical layer is lower than the second refractive index by 0.25 or more.SELECTED DRAWING: Figure 2

Description

  The present invention relates to an input device, and more particularly, to an input device that can suppress unintentionally seeing a pattern formed on a substrate.

  In various information processing apparatuses, a translucent input device is arranged in front of a color liquid crystal display panel. This input device is called a touch panel. In the touch panel, a capacitance is formed between the electrodes, and the coordinates of the approach position of the finger are determined from the change in charge movement when the finger of the person approaches. In order to detect this change in charge movement, a capacitive sensor is used.

  Here, when an image is not displayed on the display panel, the wiring pattern of the touch panel may be seen due to reflection of light entering from the outside. Patent Document 1 includes a transparent conductive film patterned on at least one surface of a transparent substrate, a transmission spectrum of light transmitted through a pattern formation region where the transparent conductive film is formed through the transparent substrate, and a transparent substrate. A transparent planar body and a transparent touch switch that include a transmittance adjusting layer that approximates a transmission spectrum of light that has passed through a non-pattern forming region where a transparent conductive film is not formed are disclosed. With this transmittance adjusting layer, the visibility of the transparent planar body and the transparent touch switch can be improved.

  Patent Document 2 discloses a touch screen that includes a transparent conductor pattern as a touch sensing element and has a layer structure that suppresses the visibility of the transparent conductor pattern. The touch screen includes a coating covering the substrate, a transparent conductor pattern disposed on the coating, and a filling material that covers and contacts the transparent conductor pattern and a region of the coating not covered by the transparent conductor pattern. Is included. The filling material has a refractive index lower than that of the substrate and lower than that of the transparent conductor pattern.

International Publication WO2006 / 126604 Special table 2007-508639 gazette

  However, in such an input device, it is desired to reliably suppress the appearance of the pattern in various forms of the input device with respect to a phenomenon in which the pattern of the detection electrode or the like is seen by reflection (hereinafter also referred to as “pattern appearance”). ing.

  An object of this invention is to provide the input device which can suppress that the pattern formed on the base material looks unintentionally.

  In order to solve the above problems, an input device of the present invention is provided on a base material, and includes a position detection unit having a plurality of detection electrodes, an optical layer provided on the position detection unit, and an optical layer. And a protective member provided on the surface. In such an input device, the optical layer is provided on the position detection unit, and is provided on the first optical layer having the first refractive index, and on the first optical layer, and has the second refractive index. A film-like second optical layer including a reflection adjustment layer; and a third optical layer provided on the second optical layer and having a third refractive index. The third optical layer side of the reflection adjustment layer The refractive index of the layer in contact with the surface is characterized by being 0.25 or more lower than the second refractive index.

  According to such a configuration, the intensity of the reflected light at the boundary between the position detection unit and the first optical layer is relatively weakened by the reflected light at the boundary between the reflection adjusting layer and the third optical layer side. Thus, the pattern appearance of the plurality of detection electrodes in the position detection unit can be suppressed. In addition, since the reflection adjustment layer is in the form of a film, the boundary between the reflection adjustment layer and the third optical layer becomes flat, and the relative intensity of reflected light at this boundary is further increased, making it easier to suppress the pattern appearance.

  In the input device of the present invention, the thickness of the layer in contact with the surface on the third optical layer side of the reflection adjustment layer may be 1 μm or more. This makes it difficult for defects such as color unevenness caused by interference between the light reflected on the surface on the third optical layer side and the light reflected on the surface on the opposite side to occur.

  In the input device of the present invention, the thickness of the first optical layer may be 1 μm or more. Thereby, even if there is unevenness in the pattern of the position detection unit, the flatness of the surface of the first optical layer can be obtained. By flattening the surface of the first optical layer, the second optical layer provided thereon can be flattened, and it becomes easy to obtain reflected light that suppresses pattern appearance.

  In the input device of the present invention, the reflection adjustment layer may be in contact with the third optical layer, and the second refractive index may be 0.25 or more higher than the third refractive index. Thereby, it becomes easy to suppress the pattern appearance seen from the observation side by the reflected light at the boundary between the reflection adjusting layer and the third optical layer.

  In the input device of the present invention, the layer in contact with the surface on the third optical layer side of the reflection adjustment layer is a layer provided in the second optical layer, whereby the layer structure can be simplified.

  In the input device of the present invention, the first optical layer and the third optical layer may be optically transparent adhesive layers. The second optical layer may include a base film and a reflection adjustment layer provided on the base film. As this base film, you may provide the translucent film. This translucent film may contain 1 type (s) or 2 or more types chosen from the group which consists of a polyethylene terephthalate, a cycloolefin polymer, and a polycarbonate. The base film may include a translucent film and a layer including an acrylic resin provided on the translucent film.

  In the input device of the present invention, the reflection adjustment layer may have a laminated structure. The reflection adjustment layer may include a resin layer containing an oxide or an inorganic substance. The reflection adjustment layer may include an oxide layer or an inorganic layer.

  In the input device of the present invention, the protective member may have a curved surface on the surface opposite to the optical layer. If the protective member has a curved surface, the intensity of the reflected light on the curved surface is relatively lower than the intensity of the reflected light at the boundary between the position detection unit and the first optical layer, and pattern appearance occurs. It becomes easy. Even if such a curved surface is an input device, by providing a reflection adjustment layer, the position detection unit and the first optical layer are generated by the generation of reflected light at the boundary between the reflection adjustment layer and the third optical layer side. The relative intensity of the reflected light at the boundary between and can be reduced, and the pattern appearance can be effectively suppressed.

  In the input device of the present invention, the plurality of detection electrodes have a first electrode and a second electrode extending in a direction intersecting each other, and the first electrode is provided at an intersection position of the first electrode and the second electrode. A bridge wiring portion may be included. When the bridge wiring portion is provided, pattern appearance is likely to occur due to reflection by the unevenness. Even in an input device provided with such a bridge wiring portion, pattern appearance can be effectively suppressed by providing a reflection adjustment layer.

  ADVANTAGE OF THE INVENTION According to this invention, it becomes possible to suppress that the pattern formed on the base material looks unintentionally.

(A) And (b) is a top view which illustrates the capacitive sensor which concerns on 1st Embodiment. (A) And (b) is sectional drawing of a part of electrostatic capacitance type sensor. It is sectional drawing which illustrates about reflection of the light in an electrostatic capacitance type sensor. (A) And (b) is sectional drawing which shows the other structural example of an optical layer.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description, the same members are denoted by the same reference numerals, and the description of the members once described is omitted as appropriate.

(Configuration of input device)
FIG. 1A and FIG. 1B are plan views illustrating the capacitive sensor according to the first embodiment. FIG. 1A shows an overall view of the capacitance type sensor 1, and FIG. 1B shows an enlarged view of a portion A of FIG. 1A. In the present embodiment, the capacitive sensor 1 is an example of an input device. In this specification, “transparent” and “translucent” refer to a state where the visible light transmittance is 50% or more (preferably 80% or more). Further, it is preferable that the haze value is 6 or less.

  As shown in FIG. 1A, the capacitive sensor 1 according to this embodiment includes a first electrode 11 and a second electrode 12 provided in the position detection unit S of the base material 10. The substrate 10 is formed of a film-like transparent substrate such as polyethylene terephthalate (PET) or cycloolefin polymer (COP), a glass substrate, or the like. The first electrode 11 and the second electrode 12 are detection electrodes that detect a position where the finger contacts (approaches) in the position detection unit S. The first electrode 11 and the second electrode 12 are formed of a transparent conductive material such as ITO (Indium Tin Oxide) by sputtering or vapor deposition.

  The first electrode 11 extends in the X direction along the surface of the substrate 10, and the second electrode 12 extends in the Y direction perpendicular to the X direction along the surface of the substrate 10. The first electrode 11 and the second electrode 12 are insulated from each other. In the present embodiment, a plurality of first electrodes 11 are arranged at a predetermined pitch in the Y direction, and a plurality of second electrodes 12 are arranged at a predetermined pitch in the X direction.

  The first electrode 11 has a plurality of first island-shaped electrode portions 111. In the present embodiment, the plurality of first island-shaped electrode portions 111 have a shape close to a rhombus and are arranged side by side in the X direction. The second electrode 12 has a plurality of second island-shaped electrode portions 121. The plurality of second island-shaped electrode portions 121 also have a shape close to a rhombus and are arranged side by side in the Y direction.

  Each of the plurality of first electrodes 11 is connected to a lead wiring 11 a that is led out of the position detection unit S. In addition, each of the plurality of second electrodes 12 is connected to a lead-out wiring 12 a that is led out to the outside of the position detection unit S. In the capacitive sensor 1, a change in current flowing through each of the lead wires 11a and 12a is detected by a detection circuit (not shown). For example, when a finger is brought close to the position detection unit S in a state where a predetermined potential is applied to the first electrode 11 and the second electrode 12, there is electrostatic between each of the first electrode 11 and the second electrode 12 and the finger. A capacity change occurs. By detecting the potential drop caused by this capacitance change, the X and Y coordinates in the position detection unit S where the finger is approaching are determined.

  As shown in FIG. 1B, the first electrode 11 and the second electrode 12 are connected to two adjacent first island-shaped electrode portions 111 and two adjacent second island-shaped electrode portions 121. It intersects with the connecting position. A bridge wiring portion 20 is provided at the intersecting portion via the island-shaped insulating portion 30 so that the first electrode 11 and the second electrode 12 do not contact at the intersecting portion.

  In the present embodiment, the bridge wiring portion 20 is provided so as to straddle between two adjacent second island-shaped electrode portions 121. The bridge wiring portion 20 is provided between the second island electrode portions 121 arranged in the Y direction. As a result, the plurality of second island-shaped electrode portions 121 become conductive. The island-shaped insulating portion 30 is provided between the bridge wiring portion 20 and the first electrode 11 and plays a role of insulating the first electrode 11 and the second electrode 12 at the intersection.

  2A and 2B are cross-sectional views of a part of the capacitive sensor. 2A shows the Y1-Y1 cross section of FIG. 1B, and FIG. 2B shows the X1-X1 cross section of FIG. 1B.

  On the surface 10 a of the substrate 10, the first island-shaped electrode portion 111 of the first electrode 11 and the second island-shaped electrode portion 121 of the second electrode 12 are disposed. Between the adjacent second island-shaped electrode portions 121, the bridge wiring portion 20 is provided via the island-shaped insulating portion 30. That is, the island-shaped insulating portion 30 is provided on the connecting portion 111 a of the first island-shaped electrode portion 111, and the bridge wiring portion 20 is provided on the island-shaped insulating portion 30. As described above, the island-shaped insulating portion 30 is interposed between the connecting portion 111a and the bridge wiring portion 20, and the first electrode 11 and the second electrode 12 are electrically insulated.

  For the island-like insulating portion 30, for example, a novolac resin is used. The thickness of the island-shaped insulating part 30 is about 1.5 μm. For the bridge wiring portion 20, for example, a laminated body of amorphous ITO / gold / amorphous ITO is used. The thickness of the bridge wiring portion 20 is about 50 nm.

  An optical layer 40 is provided on the first electrode 11, the second electrode 12, and the bridge wiring portion 20. The structure of the optical layer 40 will be described later. A protective member 50 is provided on the optical layer 40.

  The material of the protective member 50 is not particularly limited, but a glass substrate or a plastic substrate is preferably applied. A curved surface may be formed on the surface 50a of the protective member 50 opposite to the optical layer 40. Here, the curved surface is SR (radius of sphere) = 500 mm or less.

(Capacitance type sensor manufacturing method)
In order to manufacture the capacitive sensor 1 according to the present embodiment, first, the first island-shaped electrode portion 111 of the first electrode 11 and the second island of the second electrode 12 on the surface 10 a of the base material 10. The electrode part 121 is formed.

  For the base material 10, for example, glass, acrylic resin, or resin sheet is used. The first electrode 11 and the second electrode 12 are formed by photolithography, etching, or screen printing. For example, when forming by photolithography and etching, for example, an ITO (Indium Tin Oxide) layer is formed on the substrate 10 by sputtering, and a resist is formed thereon. After patterning by exposing and developing the resist, the ITO layer is etched. Thereafter, the resist is peeled off. Thereby, the 1st electrode 11 and the 2nd electrode 12 which consist of an ITO layer patterned on the base material 10 are formed.

  Next, the island-shaped insulating portion 30 is formed on the connecting portion 111 a at the intersection position of the first electrode 11 and the second electrode 12. The island-like insulating part 30 is formed by screen printing, dry film resist, or liquid resist. In the case of forming by screen printing, for example, an insulating material (optical material) having high translucency is applied by screen printing and annealed. In the case of forming with a dry film resist, for example, a light-transmitting dry film resist is attached, and then exposure and development are performed. In the case of forming with a liquid resist, for example, after applying a liquid resist having translucency, exposure and development are performed.

  Next, the bridge wiring part 20 is formed so as to straddle the island-like insulating part 30. The bridge wiring portion 20 is formed by photolithography, etching, or screen printing. When the bridge wiring portion 20 is formed by photolithography and etching, for example, a laminate of an ITO layer, a metal layer, and an ITO layer is formed by sputtering, and a resist is formed thereon. After the resist is exposed and developed and patterned, the laminate is etched. Thereafter, the resist is peeled off. As a result, the bridge wiring portion 20 is formed that is connected to the two second island-shaped electrode portions 121 that are adjacent to each other on both sides of the island-shaped insulating portion 30.

  When the bridge wiring part 20 is formed by screen printing, for example, a conductive film containing silver nanowires is screen-printed on the island-like insulating part 30. Then, the silver nanowire conductive film is annealed and roll-pressed. Here, flash lamp annealing may be performed. Thereby, the bridge wiring part 20 is formed on the island-like insulating part 30.

  Next, the optical layer 40 is formed so as to cover the entire surface on the first electrode 11, the second electrode 12, the island-shaped insulating portion 30, and the bridge wiring portion 20. Then, a protective member 50 is attached on the optical layer 40. Thereby, the capacitive sensor 1 is completed.

(Configuration example of optical layer)
The optical layer 40 includes a first optical layer 41, a second optical layer 42, and a third optical layer 43. The first optical layer 41 is formed so as to cover the first electrode 11, the second electrode 12, the island-like insulating part 30, and the bridge wiring part 20. The first optical layer 41 may be provided so as to be in contact with the first electrode 11, the second electrode 12, the island-shaped insulating portion 30, and the bridge wiring portion 20, or the first electrode 11, the second electrode 12, and the island shape A layer capable of optical interference with these layers may be provided between the insulating unit 30 and the bridge wiring unit 20 and the first optical layer 41. The first optical layer 41 has a first refractive index. In the present specification, the refractive index means a value in the visible light region.

  The thickness of the first optical layer 41 may be 1 μm or more. Thereby, even if there are irregularities in the first electrode 11, the second electrode 12, the island-like insulating part 30, and the bridge wiring part 20 that are the patterns of the position detection part, the first optical layer 41 is not affected by the irregularities. The flatness of the surface can be obtained.

  The second optical layer 42 is provided on the first optical layer 41. The second optical layer 42 is a film-like layer and includes a reflection adjustment layer having a second refractive index. The reflection adjustment layer may be the entire second optical layer 42 or a part thereof.

  The second optical layer 42 may include a base film and a reflection adjustment layer provided on the base film. As a base film, it is desirable to provide a translucent film. The translucent film contains, for example, one or more selected from the group consisting of polyethylene terephthalate (PET), cycloolefin polymer (COP), and polycarbonate (PC). Moreover, the base film may be provided with the translucent film and the layer containing the acrylic resin provided on the translucent film. The layer containing the acrylic resin is a so-called hard coat and may have a laminated structure.

  Since the second optical layer 42 is in the form of a film, it has a thickness of 0.1 μm or more. For this reason, light interference by the second optical layer 42 can be substantially ignored.

  The thickness of the layer in contact with the surface on the third optical layer 43 side of the reflection adjusting layer may be 1 μm or more. As a result, defects (color unevenness, etc.) due to interference between the light reflected by the surface on the third optical layer 43 side and the light reflected by the surface on the opposite side are less likely to occur.

  The third optical layer 43 is provided on the second optical layer 42. The refractive index of the layer in contact with the surface on the third optical layer 43 side of the reflection adjusting layer in the second optical layer 42 is 0.25 or more lower than the second refractive index. In the present embodiment, the reflection adjustment layer of the second optical layer 42 is provided in contact with the third optical layer 43. Therefore, the refractive index (second refractive index) in the reflection adjustment layer is 0.25 or more higher than the refractive index (third refractive index) in the third optical layer 43.

  The layer in contact with the surface on the third optical layer 43 side of the reflection adjusting layer may be a layer provided in the second optical layer 42. Thereby, the layer structure can be simplified. The reflection adjustment layer may have a laminated structure. Further, the reflection adjusting layer may include a resin layer containing an oxide or an inorganic material, or may include an oxide layer or an inorganic material layer.

  In the capacitance type sensor 1 according to the present embodiment, the optical layer 40 is configured as described above, so that the position detection unit (by the reflected light at the boundary between the reflection adjustment layer and the third optical layer 43) The relative intensity of the reflected light at the boundary between the first electrode 11, the second electrode 12, the island-shaped insulating portion 30 and the bridge wiring portion 20) and the first optical layer 41 is weakened. Thereby, the pattern appearance of the plurality of detection electrodes in the position detection unit can be suppressed. Further, since the reflection adjustment layer (for example, the second optical layer 42) is in the form of a film, the flatness of the boundary between the reflection adjustment layer and the third optical layer 43 can be improved. Thereby, the relative intensity | strength of the reflected light in a reflection adjustment layer can be raised, and pattern appearance can be suppressed effectively.

FIG. 3 is a cross-sectional view illustrating light reflection in a capacitive sensor.
In the example shown in FIG. 3, OCA (Optical Clear Adhesive) is used as the first optical layer 41 and the third optical layer 43, and a film material having a refractive index difference of 0.25 or more from OCA is used as the second optical layer. . OCA is an acrylic adhesive, a double-sided adhesive tape, or the like. In this example, the refractive index of OCA is 1.45, for example. Further, ITO is used for the first electrode 11 and the second electrode 12. The refractive index of ITO is about 1.9. A novolac resin is used for the island-shaped insulating portion 30. The refractive index of the novolak resin in the island-shaped insulating part 30 is 1.6, for example. A laminated body of amorphous ITO / gold / amorphous ITO is used for the bridge wiring portion 20.

  In this example, when light is incident on the capacitive sensor 1 from the outside, the light reflected at the boundary between the position detection unit (the first electrode 11, the second electrode 12, etc.) and the first optical layer 41 is reflected light. R1, reflected light R2 reflected at the boundary between the reflection adjustment layer (second optical layer 42) and the third optical layer 43, and light reflected from the surface of the protective member 50 are referred to as reflected light R3.

  Here, when the reflected light with respect to the axis AX1 perpendicular to the capacitive sensor 1 is considered, if the surface 50a of the protective member 50 is a curved surface, the reflection angle of the reflected light R3 is the reflected light R1 and It is different from the reflection angle of the reflected light R2. Therefore, when the capacitive sensor 1 is viewed from above the protective member 50 at a specific angle, the reflected lights R1 and R2 feel stronger than the reflected light R3. That is, the reflected lights R1 and R2 from the inside of the capacitive sensor 1 are more conspicuous than the reflected light R3 on the surface of the protective member 50.

  In the present embodiment, a film-like reflection adjustment layer (second optical layer 42) is provided, and the refractive index difference between the first optical layer 41 and the reflection adjustment layer (second optical layer 42) is 0.25 or more. Therefore, the relative intensity of the reflected light R1 is weakened by the reflected light R2. Therefore, the reflected light R1 is less noticeable than the reflected light R2, and the pattern appearance is suppressed.

  In particular, when the surface 50a of the protective member 50 is a curved surface, if the reflection adjustment layer is not provided, the reflected light R1 at the position detection unit is relatively stronger than the reflected light R3 at the surface 50a. Pattern appearance is likely to occur. However, by providing the reflection adjustment layer, the reflected light R2 is generated, and the relative intensity of the reflected light R1 is weakened. Thereby, the pattern appearance is suppressed. The effect of suppressing the appearance of the pattern appears remarkably when the surface 50a of the protective member 50 is a curved surface.

(Other structural examples of the optical layer)
4A and 4B are cross-sectional views showing other examples of the configuration of the optical layer.
In the example shown in FIG. 4A, the second optical layer 42 is composed of three layers. That is, the second optical layer 42 includes a cycloolefin polymer layer 421 provided on the first optical layer 41, an acrylic resin layer 422 provided on the cycloolefin polymer layer 421, and a reflection adjusting resin layer 423. And have.

  The reflection adjustment resin layer 423 is a reflection adjustment layer included in the second optical layer 42 and includes an oxide or an inorganic substance. The reflection adjusting resin layer 423 becomes a high refractive index material by containing an oxide or an inorganic substance. Examples of the oxide include zirconium oxide and niobium oxide, and examples of the inorganic substance include zirconium.

  In the example shown in FIG. 4B, the second optical layer 42 is composed of four layers. That is, the second optical layer 42 includes a cycloolefin polymer layer 421 provided on the first optical layer 41, an acrylic resin layer 422 provided on the cycloolefin polymer layer 421, and a reflection adjusting resin layer 423. And an ITO layer 424. The reflection adjustment resin layer 423 is a reflection adjustment layer. When the ITO layer 424 is thick enough to cause optical interference with the reflection adjustment resin layer 423, a laminated structure including the reflection adjustment resin layer 423 and the ITO layer 424 becomes the reflection adjustment layer.

(sensory test)
For the capacitive sensor 1 using the optical layer 40 having various layer configurations, a sensory inspection for pattern appearance was performed. The sensory test was performed with the capacitance type sensors 1 of the following comparative example, first example, and second example.
In the comparative example, the following materials are used in the layer configuration shown in FIG.
First optical layer 41 ... OCA (refractive index (hereinafter referred to as “n”) = 1.45, thickness (hereinafter referred to as “t”) = 25 μm)
Second optical layer 42: polyethylene terephthalate (PET) (n = 1.64, t = 50 μm)
Third optical layer 43 ... OCA (n = 1.45, t = 75 μm)
Protective member 50... Surface 50a is a curved surface

In the first embodiment, the following materials are used in the layer configuration shown in FIG.
First optical layer 41 ... OCA (n = 1.45, t = 25 μm)
Second optical layer 42...
Cycloolefin polymer layer 421 (n = 1.54, t = 50 μm)
Acrylic resin layer 422 (n = 1.43, t = 1 μm)
Reflection adjusting resin layer 423 (containing zirconium oxide, n = 1.8, t = 60 nm)
Third optical layer 43 ... OCA (n = 1.45, t = 75 μm)
Protective member 50... Surface 50a is a curved surface

In the second embodiment, the following materials are used in the layer configuration shown in FIG.
First optical layer 41 ... OCA (n = 1.45, t = 25 μm)
Second optical layer 42...
Cycloolefin polymer layer 421 (n = 1.54, t = 50 μm)
Acrylic resin layer 422 (n = 1.43, t = 1 μm)
Reflection adjusting resin layer 423 (containing zirconium oxide, n = 1.8, t = 60 nm)
ITO layer 424 (n = 2.0, t = 24 nm)
Third optical layer 43 ... OCA (n = 1.45, t = 75 μm)
Protective member 50... Surface 50a is a curved surface

  Table 1 shows the results of the sensory test.

  In the sensory test, the appearance of the detection electrodes (first electrode 11 and second electrode 12) and the insulating portion (island-like insulating portion 30) when the capacitive sensor 1 is viewed from above the protective member 50. The appearance of was evaluated by numerical values. The smaller the value, the easier it is to see, and the larger the value, the less visible. A symbol with “+” next to a numerical value indicates that it is between that numerical value and the next numerical value. It also shows a comprehensive evaluation showing the overall appearance.

  As shown in Table 1, in the comparative example, the first example, and the second example, the layer configuration of the first example and the second example can suppress the pattern appearance compared to the layer configuration of the comparative example. I understand that

  As described above, according to the present embodiment, it is possible to suppress unintentionally visible patterns of detection electrodes and the like (first electrode 11, second electrode 12, etc.) formed on the base material 10. be able to. In particular, the pattern appearance is likely to occur when the surface 50a of the protection member 50 is a curved surface, but in this embodiment, even if the surface 50a of the protection member 50 is a curved surface, the pattern appearance is effectively suppressed. It becomes possible.

  Although the present embodiment has been described above, the present invention is not limited to these examples. For example, when the second optical layer 42 has a stacked structure, the stacking order may be reversed. Even in this case, a layer having a refractive index lower by 0.25 or more should be provided on the reflection adjustment layer. Specifically, the refractive index of the acrylic resin layer 422 in the second optical layer 42 only needs to be 0.25 or more lower than the refractive index of the reflection adjustment resin layer 423. In the above description, the reflection adjustment layer is formed of the reflection adjustment resin layer 423, but may be formed of an oxide layer such as ITO or an inorganic layer. Further, those in which those skilled in the art appropriately added, deleted, and changed the design of each of the above-described embodiments, and combinations of the features of each embodiment as appropriate, also have the gist of the present invention. As long as they are within the scope of the present invention.

DESCRIPTION OF SYMBOLS 1 ... Capacitance type sensor 10 ... Base material 10a ... Surface 11 ... 1st electrode 11a ... Lead-out wiring 12 ... 2nd electrode 12a ... Lead-out wiring 20 ... Bridge wiring part 30 ... Island-like insulating part 40 ... Optical layer 41 ... First DESCRIPTION OF SYMBOLS 1 optical layer 42 ... 2nd optical layer 43 ... 3rd optical layer 50 ... Protection member 50a ... Surface 111 ... 1st island electrode part 111a ... Connection part 121 ... 2nd island electrode part 421 ... Cycloolefin polymer layer 422 ... Acrylic resin layer 423 ... reflection adjustment resin layer 424 ... ITO layer AX1 ... axis R1 ... reflected light R2 ... reflected light R3 ... reflected light S ... position detector

Claims (15)

A position detector provided on a substrate and having a plurality of detection electrodes;
An optical layer provided on the position detection unit;
A protective member provided on the optical layer;
With
The optical layer is
A first optical layer provided on the position detection unit and having a first refractive index;
A film-like second optical layer provided on the first optical layer and including a reflection adjusting layer having a second refractive index;
A third optical layer provided on the second optical layer and having a third refractive index,
The input device according to claim 1, wherein a refractive index of a layer in contact with the surface on the third optical layer side of the reflection adjusting layer is 0.25 or more lower than the second refractive index.   2. The input device according to claim 1, wherein the thickness of the layer in contact with the surface on the third optical layer side of the reflection adjusting layer is 1 μm or more.   The input device according to claim 1, wherein the thickness of the first optical layer is 1 μm or more.   The input device according to claim 1, wherein the reflection adjustment layer is in contact with the third optical layer, and the second refractive index is 0.25 or more higher than the third refractive index.   The input device according to any one of claims 1 to 3, wherein a layer in contact with the surface on the third optical layer side of the reflection adjustment layer is a layer included in the second optical layer.   The input device according to claim 1, wherein the first optical layer and the third optical layer are optically transparent adhesive layers.   The input device according to claim 1, wherein the second optical layer includes a base film and the reflection adjustment layer provided on the base film.   The input device according to claim 7, wherein the base film includes a translucent film.   The input device according to claim 8, wherein the translucent film includes one or more selected from the group consisting of polyethylene terephthalate, cycloolefin polymer, and polycarbonate.   The input device according to claim 8 or 9, wherein the base film includes the translucent film and a layer including an acrylic resin provided on the translucent film.   The input device according to claim 1, wherein the reflection adjustment layer has a laminated structure.   The input device according to claim 1, wherein the reflection adjustment layer includes a resin layer containing an oxide or an inorganic substance.   The input device according to claim 1, wherein the reflection adjustment layer includes an oxide layer or an inorganic layer.   The input device according to claim 1, wherein the protective member has a curved surface on a surface opposite to the optical layer. The plurality of detection electrodes include a first electrode and a second electrode extending in directions intersecting each other,
The input device according to claim 1, wherein the first electrode has a bridge wiring portion provided at an intersection position between the first electrode and the second electrode.