JP6107659B2 - 含フッ素エーテル化合物、コーティング液、および表面処理層を有する基材の製造方法 - Google Patents
含フッ素エーテル化合物、コーティング液、および表面処理層を有する基材の製造方法 Download PDFInfo
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- JP6107659B2 JP6107659B2 JP2013534743A JP2013534743A JP6107659B2 JP 6107659 B2 JP6107659 B2 JP 6107659B2 JP 2013534743 A JP2013534743 A JP 2013534743A JP 2013534743 A JP2013534743 A JP 2013534743A JP 6107659 B2 JP6107659 B2 JP 6107659B2
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- fluorine
- compound
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- containing ether
- ether compound
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- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 title claims description 124
- -1 ether compound Chemical class 0.000 title claims description 120
- 229910052731 fluorine Inorganic materials 0.000 title claims description 111
- 239000011737 fluorine Substances 0.000 title claims description 109
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims description 105
- 239000000758 substrate Substances 0.000 title claims description 78
- 238000000576 coating method Methods 0.000 title claims description 77
- 239000007788 liquid Substances 0.000 title claims description 75
- 239000011248 coating agent Substances 0.000 title claims description 53
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- 238000004519 manufacturing process Methods 0.000 title claims description 37
- 238000000034 method Methods 0.000 claims description 58
- 239000000463 material Substances 0.000 claims description 40
- 239000003960 organic solvent Substances 0.000 claims description 28
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 16
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 11
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 8
- 150000001491 aromatic compounds Chemical class 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 7
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 claims description 5
- 239000011347 resin Substances 0.000 claims description 5
- 229920005989 resin Polymers 0.000 claims description 5
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- 229910052751 metal Inorganic materials 0.000 claims description 3
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- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
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- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 16
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- 239000006227 byproduct Substances 0.000 description 15
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- PYOKUURKVVELLB-UHFFFAOYSA-N trimethyl orthoformate Chemical compound COC(OC)OC PYOKUURKVVELLB-UHFFFAOYSA-N 0.000 description 14
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- XXZOEDQFGXTEAD-UHFFFAOYSA-N 1,2-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1C(F)(F)F XXZOEDQFGXTEAD-UHFFFAOYSA-N 0.000 description 9
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
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- 239000010702 perfluoropolyether Substances 0.000 description 5
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- 125000005843 halogen group Chemical group 0.000 description 4
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- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 4
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 4
- 229910052723 transition metal Inorganic materials 0.000 description 4
- 150000003624 transition metals Chemical class 0.000 description 4
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 4
- 239000005052 trichlorosilane Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
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- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
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- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
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- 125000006017 1-propenyl group Chemical group 0.000 description 2
- OFWDLJKVZZRPOX-UHFFFAOYSA-N 2,2,3,3-tetrafluorooxetane Chemical compound FC1(F)COC1(F)F OFWDLJKVZZRPOX-UHFFFAOYSA-N 0.000 description 2
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 2
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 2
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
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- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 229910003849 O-Si Inorganic materials 0.000 description 2
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- 229910008051 Si-OH Inorganic materials 0.000 description 2
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- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
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- ZQBFAOFFOQMSGJ-UHFFFAOYSA-N hexafluorobenzene Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1F ZQBFAOFFOQMSGJ-UHFFFAOYSA-N 0.000 description 2
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- NBUKAOOFKZFCGD-UHFFFAOYSA-N 2,2,3,3-tetrafluoropropan-1-ol Chemical compound OCC(F)(F)C(F)F NBUKAOOFKZFCGD-UHFFFAOYSA-N 0.000 description 1
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- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
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- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
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- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- JAJLKEVKNDUJBG-UHFFFAOYSA-N perfluorotripropylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)F JAJLKEVKNDUJBG-UHFFFAOYSA-N 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
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- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G2650/28—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
- C08G2650/46—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing halogen
- C08G2650/48—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing halogen containing fluorine, e.g. perfluropolyethers
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Polyethers (AREA)
- Paints Or Removers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2011206032 | 2011-09-21 | ||
JP2011206032 | 2011-09-21 | ||
PCT/JP2012/074078 WO2013042732A1 (fr) | 2011-09-21 | 2012-09-20 | Composé d'éther contenant du fluor, fluide de revêtement, et procédé pour fabriquer un substrat ayant une couche traitée en surface |
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JPWO2013042732A1 JPWO2013042732A1 (ja) | 2015-03-26 |
JP6107659B2 true JP6107659B2 (ja) | 2017-04-05 |
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JP2013534743A Expired - Fee Related JP6107659B2 (ja) | 2011-09-21 | 2012-09-20 | 含フッ素エーテル化合物、コーティング液、および表面処理層を有する基材の製造方法 |
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JP (1) | JP6107659B2 (fr) |
TW (1) | TW201319120A (fr) |
WO (1) | WO2013042732A1 (fr) |
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JP6547629B2 (ja) * | 2013-12-13 | 2019-07-24 | Agc株式会社 | ケイ素化合物の製造方法 |
WO2016076245A1 (fr) * | 2014-11-12 | 2016-05-19 | 住友化学株式会社 | Composition de revêtement hydrofuge/oléofuge et film transparent |
WO2016121211A1 (fr) | 2015-01-29 | 2016-08-04 | ダイキン工業株式会社 | Agent de traitement de surface |
JP6098749B2 (ja) * | 2015-08-31 | 2017-03-22 | ダイキン工業株式会社 | パーフルオロ(ポリ)エーテル基含有シラン化合物 |
JP6741074B2 (ja) * | 2016-10-31 | 2020-08-19 | Agc株式会社 | 含フッ素エーテル組成物、コーティング液および物品 |
EP3643495B1 (fr) | 2017-06-21 | 2023-11-01 | AGC Inc. | Article comportant une couche hydrophobe et oléophobe, et son procédé de fabrication |
JP7056462B2 (ja) * | 2017-08-31 | 2022-04-19 | Agc株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法 |
CN113039307B (zh) | 2018-11-13 | 2023-11-28 | Agc株式会社 | 带拒水拒油层的基材、蒸镀材料及带拒水拒油层的基材的制造方法 |
KR20210105884A (ko) | 2018-12-26 | 2021-08-27 | 에이지씨 가부시키가이샤 | 발수 발유층 형성 기재, 및 그 제조 방법 |
CN118307391A (zh) | 2019-02-08 | 2024-07-09 | Agc株式会社 | 含氟醚化合物、含氟醚组合物、涂布液、物品、物品的制造方法和含氟化合物的制造方法 |
EP3978232B1 (fr) | 2019-05-31 | 2024-06-05 | Agc Inc. | Substrat transparent pourvu d'un film antisalissure |
CN114450325B (zh) | 2019-09-20 | 2024-10-29 | Agc株式会社 | 含氟醚化合物、表面处理剂、含氟醚组合物、涂覆液、物品和化合物 |
JP6758725B1 (ja) * | 2019-10-11 | 2020-09-23 | 株式会社ハーベス | 含フッ素シラン化合物、表面処理剤、及び該表面処理剤を用いた物品 |
JP6758735B1 (ja) * | 2020-04-06 | 2020-09-23 | 株式会社ハーベス | 含フッ素シラン化合物 |
WO2023074874A1 (fr) | 2021-10-29 | 2023-05-04 | Agc株式会社 | Composé, composition, agent de traitement de surface, liquide de revêtement, article et procédé de fabrication d'un article |
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JPS63255288A (ja) * | 1987-04-10 | 1988-10-21 | Shin Etsu Chem Co Ltd | 含フッ素有機ケイ素化合物の製造方法 |
JP3494195B2 (ja) * | 1995-06-15 | 2004-02-03 | 住友化学工業株式会社 | 反射防止フィルター |
JP4174867B2 (ja) * | 1998-09-17 | 2008-11-05 | 凸版印刷株式会社 | 防汚層の形成方法 |
JP4412450B2 (ja) * | 2001-10-05 | 2010-02-10 | 信越化学工業株式会社 | 反射防止フィルター |
US6592659B1 (en) * | 2001-11-15 | 2003-07-15 | 3M Innovative Properties Company | Compositions for aqueous delivery of fluorinated silanes |
JP4857528B2 (ja) * | 2004-06-11 | 2012-01-18 | 旭硝子株式会社 | シランカップリング基含有含フッ素エーテル化合物、溶液組成物、コーティング膜および物品 |
WO2009008380A1 (fr) * | 2007-07-06 | 2009-01-15 | Asahi Glass Company, Limited | Agent de traitement de surface, article et nouveau composé éther contenant du fluor |
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2012
- 2012-09-20 TW TW101134452A patent/TW201319120A/zh unknown
- 2012-09-20 JP JP2013534743A patent/JP6107659B2/ja not_active Expired - Fee Related
- 2012-09-20 WO PCT/JP2012/074078 patent/WO2013042732A1/fr active Application Filing
Also Published As
Publication number | Publication date |
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TW201319120A (zh) | 2013-05-16 |
WO2013042732A1 (fr) | 2013-03-28 |
JPWO2013042732A1 (ja) | 2015-03-26 |
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