WO2024038873A1 - Composé, composition, agent de traitement de surface, liquide de revêtement, article et procédé de fabrication d'un article - Google Patents

Composé, composition, agent de traitement de surface, liquide de revêtement, article et procédé de fabrication d'un article Download PDF

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WO2024038873A1
WO2024038873A1 PCT/JP2023/029592 JP2023029592W WO2024038873A1 WO 2024038873 A1 WO2024038873 A1 WO 2024038873A1 JP 2023029592 W JP2023029592 W JP 2023029592W WO 2024038873 A1 WO2024038873 A1 WO 2024038873A1
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group
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carbon atoms
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英一郎 安樂
貴史 川上
一麦 國府田
汐織 落合
啓吾 松浦
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Ａｇｃ株式会社
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C09D201/02—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16—Antifouling paints; Underwater paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

Definitions

  • the present invention relates to compounds, compositions, surface treatment agents, coating liquids, articles, and methods for producing articles.
  • a fluorine-containing compound having a fluorine-containing organic group such as a fluoroalkyl group or a fluoropolyether chain and a hydrolyzable silyl group can form a surface layer exhibiting high lubricity, water and oil repellency, etc. on the surface of a base material. Therefore, it is suitably used as a surface treatment agent.
  • Surface treatment agents containing fluorine-containing compounds have the ability, for example, to maintain water and oil repellency even when the surface layer is repeatedly rubbed with fingers (friction resistance), and to easily remove fingerprints attached to the surface layer by wiping. (fingerprint stain removability) is required to be maintained for a long period of time.
  • Patent Document 1 discloses a perfluoro(poly)ether group-containing silane compound having a specific fluoropolyether chain and a specific hydrolyzable silyl group.
  • glass-coated casings are sometimes used for mobile devices such as smartphones and tablet terminals, and the above-mentioned surface treatment agent is sometimes used on the casing side.
  • the surface layer formed by current surface treatment agents can be slippery, and there is a risk of the device slipping off when operating the device or placing it on a desk.
  • the present invention includes a compound, a composition, a surface treatment agent, a coating liquid, a surface layer formed from the compound, etc., which can form a surface layer that can suppress slipping while maintaining abrasion resistance and fingerprint stain removability.
  • the object of the present invention is to provide an article having excellent abrasion resistance, fingerprint stain removability, and slip-off prevention effect, and a method for manufacturing the article.
  • the present invention provides compounds, compositions, surface treatment agents, coating liquids, articles, and methods for producing articles having the following configurations [1] to [13].
  • T 1 a reactive group
  • R 1 is a hydrogen atom or a fluoroalkyl group
  • At least one carbon atom in formula (1) has a bond that is bonded to the reactive group (T 1 ) directly or via another group
  • m1 is an integer of 1 or more.
  • R f2 is a fluoroalkylene group having 1 to 6 carbon atoms
  • R f3 is a fluoroalkylene group having 1 to 6 carbon atoms
  • m2 is 0 or 1
  • m3 is an integer of 1 or more
  • the bond * is bonded to the carbon atom having the bond in the formula (1)
  • the bond ** is bonded to the reactive group (T 1 ) directly or via a linking group
  • the plurality of R f3s may be the same or different from each other.
  • R f6 is a fluoroalkyl group having 1 to 6 carbon atoms
  • R 10 is a hydrogen atom, an alkyl group or fluoroalkyl group having 1 to 6 carbon atoms which may have a substituent, or an aryl group which may have a substituent
  • Ar is an aryl group that may have a substituent
  • X 2 is an alkali metal ion or ammonium ion
  • X 3 is a halide ion
  • X 4 is a halogen atom
  • R a1 is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group
  • R a11 is a hydrocarbon group
  • z1 is an integer from 1 to 3
  • the plurality of R 10 , R a1 or R a11 may be the same or different from each other.
  • R f [-Q 1 (-T 1 ) x1 ] y1 ...(3) however, R f is a group containing a fluoroether ring which may have a substituent, Q 1 is a 1+x monovalent linking group, T 1 is a reactive group, x1 is an integer from 1 to 10, y1 is an integer from 1 to 6, When there is a plurality of Q 1 , T 1 , or x1, the plurality of Q 1 , T 1 , or x1 may be the same or different.
  • a surface treatment agent comprising the compound of any one of [1] to [7] or the composition of [8].
  • a coating liquid comprising the compound of any one of [1] to [7] or the composition of [8] and a liquid medium.
  • a method for manufacturing an article comprising forming a surface layer by a dry coating method using the surface treatment agent of [9] above.
  • a method for manufacturing an article comprising forming a surface layer by a wet coating method using the coating liquid of [10].
  • the present invention provides a surface layer formed from a compound, composition, surface treatment agent, coating liquid, compound, etc. that can form a surface layer that can suppress slipping while maintaining abrasion resistance and fingerprint stain removability. It is possible to provide an article with excellent abrasion resistance, fingerprint stain removability, and slip-off prevention effect, and a method for manufacturing the article.
  • FIG. 1 is a schematic cross-sectional view showing an example of the article of the present invention.
  • a (fluoro)alkyl group is a general term for an alkyl group and a fluoroalkyl group. This also applies to (fluoro)alkylene groups, etc.
  • the fluoroalkyl group is a general term for perfluoroalkyl groups and partial fluoroalkyl groups.
  • a perfluoroalkyl group means a group in which all hydrogen atoms of an alkyl group are substituted with fluorine atoms.
  • a partial fluoroalkyl group is an alkyl group in which one or more hydrogen atoms are substituted with a fluorine atom and has one or more hydrogen atoms. That is, a fluoroalkyl group is an alkyl group having one or more fluorine atoms.
  • “Reactive silyl group” is a general term for hydrolyzable silyl group and silanol group (Si-OH), and "hydrolyzable silyl group” refers to a group that can undergo a hydrolysis reaction to form a silanol group. means.
  • Organic group means a hydrocarbon group which may have a substituent and may have a heteroatom or other bond in the carbon chain.
  • a “hydrocarbon group” is a group consisting of carbon atoms and hydrogen atoms, including aliphatic hydrocarbon groups (straight-chain alkylene groups, branched alkylene groups, cycloalkylene groups, etc.), aromatic hydrocarbon groups (phenylene groups, etc.), and aromatic hydrocarbon groups (phenylene groups). etc.) and combinations thereof.
  • “Surface layer” means a layer formed on the surface of a base material.
  • the “molecular weight” of the polyfluoroether chain is the number average molecular weight calculated by determining the number (average value) of oxyfluoroalkylene units based on the terminal group by 1 H-NMR and 19 F-NMR. " ⁇ " indicating a numerical range means that the numerical values written before and after it are included as lower and upper limits.
  • the compound according to the present invention (hereinafter also referred to as the present compound) is characterized by having a group (R f ) containing a fluoroether ring that may have a substituent and a reactive group (T 1 ). shall be.
  • This compound has a reactive group (T 1 ).
  • This compound having a reactive group (T 1 ) has excellent abrasion resistance of the surface layer because the reactive group (T 1 ) and the base material are strongly bonded.
  • the present compound also has a group (R f ) containing a fluoroether ring. Since the fluoroether ring contains an oxyfluoroalkylene unit as a constituent unit, it has water and oil repellency and is excellent in removing fingerprint stains. On the other hand, it is presumed that the movement of the fluoroether ring in the surface layer is suppressed compared to the chain polyfluoroether. Therefore, it is estimated that the surface layer formed by this compound has a large coefficient of friction. As a result, articles such as mobile devices that include a surface layer formed of the present compound are prevented from sliding down (hereinafter also referred to as anti-slip properties).
  • the group (R f ) has at least a fluoroether ring.
  • the fluoroether ring includes a polyfluoroether ring, and represents a ring containing one or more oxyfluoroalkylene units as a constituent unit.
  • the fluoroether ring imparts water and oil repellency and anti-slip properties to the surface layer formed from the present compound.
  • the fluoroether ring is a residue having a bond that is bonded directly to the reactive group (T 1 ) or via another group. From the viewpoint of water and oil repellency and anti-slip properties, the fluoroether ring is preferably a ring represented by the following formula (1).
  • R 1 is a hydrogen atom or a fluoroalkyl group
  • At least one carbon atom in formula (1) has a bond that is bonded to the reactive group (T 1 ) directly or via another group
  • m1 is an integer of 1 or more.
  • the plurality of R f1 's may be the same or different from each other.
  • the fluoroalkylene group having 1 to 6 carbon atoms in R f1 may be a linear fluoroalkylene group or a branched fluoroalkylene group.
  • Specific examples of the fluoroalkylene group include -CF 2 -, -CHF-, -CF 2 CF 2 -, -CF 2 CHF-, -CF 2 CF 2 CF 2 -, -CF 2 CHFCF 2 -, -CF 2 CHFCHF-, -CF 2 CF (CF 3 )-, -CF 2 CF 2 CF 2 CF 2 -, -CF 2 CHFCF 2 CF 2 -, -CF 2 CF (CF 3 ) -CF 2 -, -CF 2 CHFCF 2 CF 2 -, -CF 2 CF (CF 3 ) -CF 2 -, -CF 2 C Examples include (CF 3 ) 2 -CF 2 -, -CF 2 CF 2 CF 2 CF 2 CF 2
  • the fluoroalkylene group is preferably a perfluoroalkylene group from the viewpoints of water and oil repellency, fingerprint stain removability, and anti-slip properties. Further, from the viewpoint of wear resistance, a linear fluoroalkylene group is preferable.
  • R 11 and R 12 are fluoroalkylene groups which may have a substituent having 1 to 11 carbon atoms, and the total number of carbon atoms of R 11 and R 12 is 2 to 12.
  • the fluoroalkylene group for R 11 and R 12 may be linear or branched, and a linear fluoroalkylene group is preferable from the viewpoint of wear resistance.
  • the fluoroalkyl group in R 1 may be linear or branched, and a linear fluoroalkyl group is preferable from the viewpoint of wear resistance.
  • the number of carbon atoms in R 1 , R 11 and R 12 is preferably independently 1 to 6, more preferably 1 to 3.
  • Examples of the fluoroalkylene group having 2 to 12 carbon atoms in which at least some of the carbon atoms constitute a ring and which may have a substituent in R f1 include a fluorocyclobutanediyl group, a fluorocyclohexanediyl group, a fluorocyclohexanediyl group, and a fluorocyclobutanediyl group. Examples thereof include a cyclopentanediyl group and a fluorophenylene group, and may have a fluorine atom, a fluoroalkyl group having 1 to 6 carbon atoms, etc. as a substituent.
  • R f1 is a straight chain or branched carbon atom having 1 to 1 carbon atoms that does not have the above-mentioned specific bond or ring structure.
  • a fluoroalkylene group of 6 is preferred, and a linear fluoroalkylene group is more preferred.
  • the fluoroether ring represented by formula (1) is preferably a ring represented by formula (G1) below.
  • G1 a ring represented by formula (G1) below.
  • G1 is a fluoroalkylene group having 1 carbon number
  • G f2 is a fluoroalkylene group having 2 carbon atoms
  • G f3 is a fluoroalkylene group having 3 carbon atoms
  • G f4 is a fluoroalkylene group having 4 carbon atoms
  • G f5 is a fluoroalkylene group having 5 carbon atoms
  • G f6 is a fluoroalkylene group having 6 carbon atoms
  • G f7
  • m11, m12, m13, m14, m15, m16, and m17 each independently represent an integer of 0 or 1 or more, and m11 + m12 + m13 + m14 + m15 + m16 + m17 (m1 in formula (1)) is preferably an integer of 1 to 200. Further, m17 is preferably an integer of 0 to 2. Note that the bonding order of (OG f1 ) to (OG f7 ) in formula (G1) is arbitrary. m11 to m17 in formula (G11) represent the numbers of (OG f1 ) to (OG f7 ), respectively, and do not represent the arrangement.
  • (OG f5 ) m5 represents that the number of (OG f5 ) is m15, and does not represent the block arrangement structure of (OG f5 ) m15 .
  • the order of (OG f1 ) to (OG f7 ) does not represent the bonding order of the respective units.
  • the above-mentioned fluoroalkylene group having 3 to 6 carbon atoms may be a linear fluoroalkylene group or a branched fluoroalkylene group.
  • G f1 examples include -CF 2 - and -CHF-.
  • G f2 examples include -CF 2 CF 2 -, -CHFCF 2 -, -CHFCHF-, -CH 2 CF 2 -, -CH 2 CHF-, and the like.
  • G f3 include -CF 2 CF 2 CF 2 -, -CF 2 CHFCF 2 -, -CF 2 CH 2 CF 2 -, -CHFCF 2 CF 2 -, -CHFCHFCF 2 -, -CHFCHFCHF-, - CHFCH 2 CF 2 -, -CH 2 CF 2 CF 2 -, -CH 2 CHFCF 2 -, -CH 2 CH 2 CF 2 -, -CH 2 CF 2 CHF-, -CH 2 CHFCHF-, -CH 2 CH 2 CHF-, -CF(CF 3 )-CF 2 -, -CF(CHF 2 )-CF 2 -, -CF(CH 2 F)-CF 2 -, -CF(CH 3 )-CF 2 -, -CF (CF 3 )-CHF-, -CF(CHF 2 )-CHF-, -CF(CH 2 F)-CF 2 -, -CF(CH 3
  • G f4 include -CF 2 CF 2 CF 2 CF 2 -, -CHFCF 2 CF 2 CF 2 -, -CH 2 CF 2 CF 2 -, -CF 2 CHFCF 2 CF 2 -, -CHFCHFCF 2 CF 2 -, -CH 2 CHFCF 2 CF 2 -, -CF 2 CH 2 CF 2 CF 2 -, -CHFCH 2 CF 2 CF 2 -, -CH 2 CH 2 CF 2 CF 2 -, -CHFCF 2 CHFCF 2 -, -CH 2 CHFCF 2 -, -CF 2 CHFCHF 2 -, -CHFCHFCF 2 -, -CH 2 CHFCHF 2 -, -CF 2 CH 2 CHFCF 2 -, -CHFCH 2 CHFCF 2 -, -CH 2 CH 2 CHFCF 2 -, -CF 2 CH 2 CF 2 -, -CHFCH 2 CHFCF 2 -
  • G f5 include -CF 2 CF 2 CF 2 CF 2 CF 2 -, -CHFCF 2 CF 2 CF 2 -, -CH 2 CHFCF 2 CF 2 CF 2 -, -CF 2 CHFCF 2 CF 2 CF 2 -, -CHFCHFCF 2 CF 2 CF 2 -, -CF 2 CH 2 CF 2 CF 2 -, -CHFCH 2 CF 2 CF 2 CF 2 -, -CH 2 CH 2 CF 2 CF 2 CF 2 -, -CF 2 CF 2 CHFCF 2 CF 2 -, -CHFCF 2 CHFCF 2 CF 2 -, -CH 2 CHFCF 2 CF 2 -, -CH 2 CF 2 CHFCF 2 CF 2 -, -CH 2 CF 2 CHFCF 2 CF 2 CH 2 -, -CF 2 C (C 2F 5 )FCF 2 - and the like.
  • G F6 is -cf 2 CF 2 CF 2 CF 2 CF 2 CF 2- , -cf 2 CF 2 CHFCHFCF 2 CF 2- , -CHFCF 2 CF 2 CF 2 CF 2 CF 2- , -CHFCHFCHFCHFCHFCHFF- , -CHFCF 2 CF 2 CF 2 CF 2 CH 2 -, -CH 2 CF 2 CF 2 CF 2 CH 2 -, and the like.
  • G f7 include perfluorocyclobutanediyl group (perfluorocyclobutane-1,2-diyl group, etc.), perfluorocyclopentanediyl group (perfluorocyclopentane-1,2-diyl group, perfluorocyclopentane-1,3-diyl group, etc.) diyl group, etc.), perfluorocyclohexanediyl group (perfluorocyclohexane-1,2-diyl group, perfluorocyclohexane-1,4-diyl group, etc.), -CF 2 CF 2 NHCF 2 CF 2 -, and the like.
  • the ring represented by formula (1) preferably has a structure represented by the following formulas (G2) to (G5) from the viewpoint of superior water and oil repellency, fingerprint stain removal properties, and slip-off prevention properties. is preferred.
  • the symbols in formulas (G2) to (G5) are the same as in formula (G1).
  • (G2) and (G3) the order in which (OG f1 ) and (OG f2 ) and (OG f2 ) and (OG f4 ) are combined is arbitrary.
  • (OG f1 ) and (OG f2 ) may be arranged alternately, (OG f1 ) and (OG f2 ) may be arranged in each block, or may be arranged randomly.
  • m11 is preferably 1 to 50, more preferably 2 to 30.
  • m12 is preferably 1 to 50, more preferably 2 to 30.
  • m12 is preferably 1 to 50, more preferably 2 to 30.
  • m14 is preferably 1 to 50, more preferably 2 to 30.
  • m13 is preferably 1 to 50, more preferably 2 to 30.
  • Formula (G5) represents crown ethers. From the viewpoint of ease of synthesis, m12 in formula (G5) is preferably 2 to 12, more preferably 4 to 8.
  • the group (R f ) containing a fluoroether ring preferably further includes a group represented by the following formula (2) from the viewpoint of abrasion resistance, water/oil repellency, and fingerprint stain removability.
  • R f2 is a fluoroalkylene group having 1 to 6 carbon atoms
  • R f3 is a fluoroalkylene group having 1 to 6 carbon atoms
  • m2 is 0 or 1
  • m3 is an integer of 1 or more
  • the bond * is bonded to the carbon atom having the bond in the formula (1)
  • the bond ** is bonded to the reactive group (T 1 ) directly or via a linking group
  • the plurality of R f3s may be the same or different from each other.
  • the fluoroalkylene group having 1 to 6 carbon atoms in R f2 and R f3 may be linear or branched. Specific examples of the fluoroalkylene group having 1 to 6 carbon atoms include those listed above for G f1 to G f6 .
  • m2 is 0 or 1.
  • m2 is 0, the carbon atom of the fluoroether ring of formula (1) and the terminal oxygen atom of (OR f3 ) m3 are bonded.
  • m2 is 1, the carbon atom of the fluoroether ring of formula (1) and the carbon atom of R f2 are bonded. From the viewpoint of ease of synthesis and wear resistance, m2 is preferably 1.
  • (OR f3 ) m3 preferably has a structure represented by the following formula (G11). [(OG f11 ) m21 (OG f12 ) m22 (OG f13 ) m23 (OG f14 ) m24 (OG f15 ) m25 (OG f16 ) m26 ]
  • G f11 is a fluoroalkylene group having 1 carbon number
  • G f12 is a fluoroalkylene group having 2 carbon atoms
  • G f13 is a fluoroalkylene group having 3 carbon atoms
  • G f14 is a fluoroalkylene group having 4 carbon atoms
  • G f15 is a fluoroalkylene group having 5 carbon atoms
  • G f16 is a fluoroalkylene group having 6 carbon atoms
  • m21, m22, m23, m24, m25, and m26 each independently represent an integer of 0 or 1
  • (OR f3 ) m3 preferably has a structure represented by the following formulas (G12) to (G14) from the viewpoint of superior water and oil repellency, abrasion resistance, and fingerprint stain removability.
  • the symbols in formulas (G12) to (G14) are the same as in formula (G11).
  • formulas (G12) and (G13) the order in which (OG f11 ) and (OG f12 ) and (OG f12 ) and (OG f14 ) are combined is arbitrary.
  • (OG f1 ) and (OG f2 ) may be arranged alternately, (OG f11 ) and (OG f12 ) may be arranged in each block, or may be arranged randomly.
  • m21 is preferably 1 to 30, more preferably 1 to 20.
  • m22 is preferably 1 to 30, more preferably 1 to 20.
  • m22 is preferably 1 to 30, more preferably 1 to 20.
  • m24 is preferably 1 to 30, more preferably 1 to 20.
  • m23 is preferably 1 to 30, more preferably 1 to 20.
  • the group (R f ) containing a fluoroether ring is preferably a group represented by the following formula (11) from the viewpoint of excellent water and oil repellency, fingerprint stain removability, abrasion resistance, and slip prevention property.
  • R r1 is a y1-valent residue of the fluoroether ring represented by the above formula (1), y1 is an integer from 1 to 6, R f2 , R f3 , m2 and m3 are the same as those in the formula (2),
  • the bond ** is a bond that is bonded to the reactive group (T 1 ) directly or via a linking group.
  • y1 may be an integer of 1 to 6, preferably 1 to 3, and more preferably 1 to 2, from the viewpoint of excellent fingerprint stain removal properties and anti-slip effect, and ease of manufacturing the present compound.
  • the group (R f ) containing a fluoroether ring may have a hydrogen atom.
  • the proportion of fluorine atoms represented by the following formula (I) in R f is preferably 60% or more, more preferably 80% or more, and substantially It is even more preferable to have 100% perfluoropolyether chains. If the fluorine atom content is 60% or more, the amount of fluorine in the fluoropolyether chain increases, and the slipperiness and fingerprint removability are further improved.
  • Formula (I): Percentage of fluorine atoms (%) (number of fluorine atoms) / ⁇ (number of fluorine atoms) + (number of hydrogen atoms) ⁇ x 100
  • the molecular weight of the group (R f ) is preferably from 2,000 to 20,000, more preferably from 2,500 to 15,000, and more preferably from 2,500 to 15,000, from the viewpoint of achieving both fingerprint stain removability and slip resistance of the surface layer. ⁇ 10,000 is more preferable.
  • the molecular weight of R f is 2,000 or more, the flexibility of the fluoropolyether chain is improved, and the amount of fluorine in the molecule is increased, so that the finger slip property and fingerprint removability are further improved.
  • the molecular weight of the fluoropolyether chain is 20,000 or less, the surface layer will have better abrasion resistance.
  • R f include the following structures.
  • each n is independently an integer of 1 to 200.
  • F in the ring indicates that the ring has one or more F atoms. Note that Rf is not limited to these.
  • T 1 is a reactive group, and the present compound exhibits various functions due to the reactivity of T 1 .
  • Such functions include, for example, the function of improving adhesion to the surface of the substrate, the function of imparting photocurability or thermosetting property to the present compound, the function of imparting acidity/alkalinity to the present compound, and the function of imparting specific properties of the present compound. Examples include a function to adjust solubility in a solvent, and a function as a precursor when synthesizing other compounds.
  • the fluoroalkyl group for R 10 preferably has 1 to 6 carbon atoms.
  • the fluoroalkyl group may have other substituents.
  • This compound having a fluoroalkyl group as T1 has a high fluorine content, and has properties such as low refractive index, low dielectric constant, water and oil repellency, heat resistance, chemical resistance, chemical stability, and transparency. Excellent in various properties.
  • substituents that the fluoroalkyl group may have include halogen atoms such as fluorine atoms and chlorine atoms, alkyl groups having 1 to 6 carbon atoms, and the same substituents as those exemplified as the reactive group T1 . Things can be mentioned.
  • Examples of the aryl group for Ar and R10 include a phenyl group and a naphthyl group, and may further have a substituent.
  • substituents that the aryl group may have include halogen atoms such as fluorine atoms and chlorine atoms, alkyl groups having 1 to 6 carbon atoms, and those similar to those exemplified as the reactive group T1 . can be mentioned.
  • the alkyl group in R 10 preferably has 1 to 6 carbon atoms.
  • the alkyl group may have other substituents. Examples of substituents that the alkyl group may have include halogen atoms such as chlorine atoms, alkyl groups having 1 to 6 carbon atoms, and those similar to those exemplified as the reactive group T1 . .
  • T1 as hydroxy group, N-hydroxy group, aldehyde group, ketone group, amino group, quaternary ammonium group, nitrile group, imino group, diazo group, carboxy group, carboxylate, acid anhydride group, sulfo group, sulfone
  • This compound having an acid salt, a phosphoric acid group, or a phosphate has various properties such as acidity, alkalinity, and hydrophilicity due to the reactive group T1 , and for example, improves solubility in a specific solvent. It also provides functions such as improving adhesion to specific substrates.
  • Examples of the counter ion of the quaternary ammonium salt include halide ions.
  • Counter ions for carboxylates, sulfonates, and phosphates include alkali metal ions, ammonium ions, and the like.
  • Examples of the group having a carbon-carbon double bond include a vinyl group, an acryloyloxy group, a methacryloyloxy group, an olefin, and the like. This compound having a carbon-carbon double bond can be combined with a photoinitiator to prepare a photocurable composition, and the cured coating film obtained from the composition has water and oil repellency and hard coat properties. It has both.
  • this compound having an isocyanate group, an epoxy group, a glycidyl group, an oxetanyl group, or a mercapto group can be used in combination with an epoxy curing agent to prepare a thermosetting or photocurable composition, and the cured coating obtained from the composition can be used in combination with an epoxy curing agent.
  • the film has both water and oil repellency and hard coat properties.
  • the amide bond, ester bond, ether bond, thioether bond, siloxane bond, and urea bond in T 1 are bonds that connect the alkyl group, fluoroalkyl group, aryl group, heteroaryl group, etc. contained in T 1 . It may also have other functionality-imparting groups via these bonds.
  • the reactive group T 1 of the present compound is preferably a hydroxyl group, an amino group, or a group having a carbon-carbon double bond from the viewpoint of synthesis, chemical stability, adhesion to a substrate, and the like. Also, among the groups having a carbon-carbon double bond, acryloyl groups, methacryloyl groups, vinyl groups, allyl groups, or olefins are preferred.
  • T 1 is preferably a group having a reactive silyl group.
  • a group represented by the following formula (5) is preferable.
  • R a1 is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group
  • R a11 is a hydrocarbon group
  • z1 is an integer from 1 to 3
  • each of the multiple R a1 , R a11 , and z1 may be the same or different.
  • R a1 When R a1 is a hydroxyl group, it constitutes a silanol (Si-OH) group together with the Si atom.
  • a hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction.
  • the silanol groups further react intermolecularly to form Si--O--Si bonds. Further, the silanol group undergoes a dehydration condensation reaction with the hydroxyl group (base material -OH) on the surface of the base material to form a chemical bond (base material -O-Si). Since Compound 1 has T 1 of 1 or more, it has excellent wear resistance after the surface layer is formed.
  • Examples of the hydrolyzable group for R a1 include an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an acyloxy group, an isocyanate group (-NCO), and the like.
  • the alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms.
  • the acyl group is preferably an acyl group having 1 to 6 carbon atoms.
  • the acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.
  • the group having a hydrolyzable group for R a1 may be, for example, a group having a hydrolyzable group exemplified above.
  • the group having a hydrolyzable group is preferably -O-L A -L B.
  • L A is an alkylene group which may have an etheric oxygen atom
  • L B is a hydrolyzable group.
  • the alkylene group preferably has 1 to 10 carbon atoms.
  • the alkylene group represented by L A may have an ether oxygen atom between carbon atoms. The number of the etheric oxygen atoms may be 1 or 2 or more.
  • L A is an alkylene group having an etheric oxygen atom
  • the atom bonded to the -O- side in -OLA -L B is a carbon atom constituting the alkylene group having an etheric oxygen atom. It is preferable.
  • the hydrolyzable group represented by L B has the same meaning as the hydrolyzable group represented by R a1 , and the preferred embodiments are also the same.
  • R a1 is particularly preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom.
  • the alkoxy group in R a1 is preferably an alkoxy group having 1 to 4 carbon atoms, since the storage stability of Compound 1 is excellent and outgassing during reaction is suppressed, and from the viewpoint of long-term storage stability, an ethoxy group is preferable. Particularly preferred is a methoxy group from the viewpoint of shortening the hydrolysis reaction time.
  • the halogen atom a chlorine atom is particularly preferable.
  • R a11 is a hydrocarbon group.
  • the hydrocarbon group include an alkyl group, a cycloalkyl group, an alkenyl group, an allyl group, and the like, and an alkyl group is preferable from the viewpoint of ease of synthesis.
  • the number of carbon atoms in the hydrocarbon group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2.
  • the number z1 of R a1 within one T 1 may be 1 to 3, preferably 2 or 3, and more preferably 3 from the viewpoint of adhesion to the base material.
  • Specific examples of T 1 include -Si(OCH 3 ) 3 , -SiCH 3 (OCH 3 ) 2 , -Si(OCH 2 CH 3 ) 3 , -SiCl 3 , -Si(OCOCH 3 ) 3 , -Si( NCO) 3 etc. From the viewpoint of ease of handling during production, -Si(OCH 3 ) 3 is particularly preferred.
  • the number of T 1 in one molecule of the present compound may be 1 to 20, preferably 1 to 12, and more preferably 1 to 6 from the viewpoint of ease of synthesis and ease of handling of the present compound. preferable.
  • the T 1 may have the same structure or different structures.
  • T 1 having no reactive silyl group include the following structures.
  • R a represents an alkyl group, a fluoroalkyl group, or an aryl group that may have a substituent
  • R b represents a fluoroalkyl group, or an aryl group that may have a substituent.
  • * indicates a bond.
  • the present compound having a group containing a fluoroether ring (R f ) and a reactive group (T 1 ) has excellent abrasion resistance, fingerprint stain removability, and slip-off prevention properties of the resulting surface layer, and From the viewpoint of ease of synthesis, a compound represented by the following formula (3) is preferred.
  • R f [-Q 1 (-T 1 ) x1 ] y1 ...(3) however, R f is a group containing a fluoroether ring which may have a substituent, Q 1 is a 1+x monovalent linking group, T 1 is a reactive group, x1 is an integer from 1 to 10, y1 is an integer from 1 to 6, When there is a plurality of Q 1 , T 1 , or x1, the plurality of Q 1 , T 1 , or x1 may be the same or different. Note that R f , T 1 , and y1 in formula (3) are as described above, so their explanations here will be omitted.
  • Q 1 is a 1+x1-valent linking group that connects the fluoroether ring-containing group (R f ) and the reactive group (T 1 ).
  • the structure of Q 1 is not particularly limited, but from the viewpoint of chemical stability and ease of synthesis of the present compound, it is represented by the following formula (4) as -Q 1 (-T 1 ) x1 .
  • the structure includes a structure.
  • R 2 is a single bond, a fluoroalkylene group having 1 to 20 carbon atoms, an alkylene group, or an alkylene group containing an ether oxygen atom between carbon atoms
  • L 1 is a single bond or a 1+x monovalent group
  • R 3 is an alkylene group or an alkylene group having an etheric oxygen atom
  • x1 is an integer from 1 to 10
  • the bond * connects with R f , When there is a plurality of R 3 or T 1 , the plurality of R 3 or T 1 may be the same or different.
  • R 2 is a single bond, a fluoroalkylene group having 1 to 20 carbon atoms, an alkylene group, or an alkylene group containing an ether oxygen atom between carbon atoms.
  • R f3 located at the terminal of (OR f3 ) m3 in R f has a structure in which it directly bonds with L 1 .
  • R 2 is an alkylene group
  • the alkylene group may be linear, branched, or have a ring structure, and may have an etheric oxygen atom between carbon atoms. May have.
  • R 2 is preferably a linear alkylene group from the viewpoint of wear resistance. Further, from the viewpoint of ease of synthesis, etc., the number of carbon atoms in the alkylene group is preferably 1 to 6, more preferably 1 to 3.
  • R 2 is a fluoroalkylene group
  • the alkylene group may be linear, branched, or have a ring structure.
  • L 1 is a 1+x1-valent group that may have a single bond or a heteroatom such as N, O, S, Si, etc., and may have a branch point. Atoms bonded to R 2 and R 3 in L 1 are each independently an N, O, S, Si atom, or a carbon atom constituting a branch point. When L 1 is a single bond, R 2 and R 3 in formula (4) are directly bonded. Further, when L 1 is a single bond and R 2 is a single bond, the present compound has a structure in which (OR f3 ) m3 and R 3 are directly bonded.
  • L 1 is at least one branch point (hereinafter referred to as "branched point") selected from the group consisting of C, N, Si, a ring structure, and a (1+x1)-valent organopolysiloxane residue. point P 1 ).
  • the branch point P 1 When N is a branch point P 1 , the branch point P 1 is expressed as *-N(-**) 2, for example. However, * is a bond on the R 2 side, and ** is a bond on the R 3 side. When C becomes a branch point P 1 , the branch point P 1 is represented by *-C(-**) 3 or *-CR 29 (-**) 2, for example. However, * is a bond on the R 2 side, ** is a bond on the R 3 side, and R 29 is a monovalent group, such as a hydrogen atom, a hydroxyl group, an alkyl group, an alkoxy group, etc.
  • the branch point P 1 is represented by *-Si(-**) 3 or *-SiR 29 (-**) 2, for example.
  • * is a bond on the R 2 side
  • ** is a bond on the R 3 side
  • R 29 is a monovalent group, such as a hydrogen atom, a hydroxyl group, an alkyl group, an alkoxy group, etc.
  • the ring structure constituting the branch point P1 is a 3- to 8-membered aliphatic ring, from the viewpoint of easy production of the present compound and superior abrasion resistance, light resistance, and chemical resistance of the surface layer;
  • One type selected from the group consisting of a 3- to 8-membered aromatic ring, a 3- to 8-membered heterocycle, and a fused ring consisting of two or more of these rings is preferred, and the ring listed in the following formula Structures are particularly preferred.
  • organopolysiloxane residue constituting the branch point P1 examples include the following groups.
  • R 25 in the following formula is a hydrogen atom, an alkyl group, an alkoxy group, or a phenyl group.
  • the number of carbon atoms in the alkyl group and alkoxy group of R 25 is preferably 1 to 10, more preferably 1.
  • L 1 having a valence of two or more is -C(O)N(R 26 )-, -N(R 26 )C(O)-, -C(O)O-, -OC(O)-, -C( O)-, -O-, -N(R 26 )-, -S-, -OC(O)O-, -NHC(O)O-, -OC(O)NH-, -NHC(O)N (R 26 )-, -SO 2 N(R 26 )-, -N(R 26 )SO 2 -, -Si(R 26 ) 2 -, -OSi(R 26 ) 2 -, -Si(CH 3 ) It may have at least one bond (hereinafter referred to as "bond B 4 ") selected from the group consisting of 2 -Ph-Si(CH 3 ) 2 - and divalent organopolysiloxane residues.
  • R 26 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and Ph is a phenylene group.
  • the number of carbon atoms in the alkyl group of R 26 is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2 from the viewpoint of ease of manufacturing the present compound.
  • Examples of the divalent organopolysiloxane residue include groups of the following formula.
  • R 27 in the following formula is a hydrogen atom, an alkyl group, an alkoxy group, or a phenyl group.
  • the number of carbon atoms in the alkyl group and alkoxy group of R 27 is preferably 1 to 10, more preferably 1.
  • Bond B 4 is composed of -C(O)NR 26 -, -N(R 26 )C(O)-, -C(O)-, and -NR 26 - from the viewpoint of easy production of the present compound. At least one type of bond selected from the group is preferred, and from the viewpoint of further improving the light resistance and chemical resistance of the surface layer, -C(O)NR 26 -, -N(R 26 )C(O)-, or -C (O)- is more preferred.
  • Specific examples of trivalent or higher L 1 include one or more branch points P 1 (for example, ⁇ *-P 1 (-**) x1 ⁇ ), one or more branch points P 1 and one or more bonds.
  • R 28 is a single bond or a divalent organic group
  • * is a bond on the R 2 side
  • ** is a bond on the R 3 side.
  • the atoms bonded to R 2 and R 3 are each independently an N, O, S, Si atom, or a carbon atom having an oxo group ( ⁇ O). That is, the atoms adjacent to R 2 and R 3 are each constituent elements of bond B 4 .
  • Specific examples of divalent L 1 include a single bond, one or more bonds B 4 (for example, *-B 4 -**, *-B 4 -R 28 -B 4 -**), etc.
  • R 28 is a single bond or a divalent organic group
  • * is a bond on the R 2 side
  • ** is a bond on the R 3 side.
  • Examples of the divalent organic group in R 28 include divalent aliphatic hydrocarbon groups (alkylene group, cycloalkylene group, etc.), divalent aromatic hydrocarbon groups (phenylene group, etc.), and carbon It may have a bond B 4 between two or more carbon atoms of a hydrocarbon group.
  • the number of carbon atoms in the divalent organic group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4.
  • the above L 1 is preferably a group represented by any one of the following formulas (E1) to (E7) from the viewpoint of easy production of the present compound.
  • E 1 is a single bond, -B 5 -, -B 6 -R 40 -, or -B 6 -R 40 -B 5 -, and R 40 is an alkylene group or a group having 2 or more carbon atoms.
  • B 5 is -C(O)NR E6 -, -C(O)-, -NR E6 - or -O-
  • B 6 is -C(O)NR E6 -, -C(O)-, or -NR E6 -
  • E 2 is a single bond or -B 6 -R 40 -
  • E 3 is E 1 when the atom in Z 1 to which E 3 is bonded is a carbon atom, and is E 2 when the atom in Z 1 to which E 3 is bonded is a nitrogen atom
  • E 11 is a single bond, -O-, an alkylene group, or a bond between carbon atoms of an alkylene group having 2 or more carbon atoms -C(O)NR E6 -, -C(O)-, -NR
  • E 23 is a single bond or -R 40 -B 6 -, and two E 23s may be the same or different
  • E 24 is E 22 when the atom in Z 1 to which E 24 is bonded is a carbon atom
  • two or more E24s may be the same or different
  • E 25 is a single bond or -R 40 -B 6 -, and when it has two or more E 25s , two or more E 25s may be the same or different
  • E 26 is a single bond or -R 40 -B 6 -
  • Z 1 is a group having an (e4+1) valence ring structure having a carbon atom or nitrogen atom to which E 3 is directly bonded and a carbon atom or nitrogen atom to which E 24 is directly bonded
  • R E1 is a hydrogen atom or an alkyl group, and when it has two or more R E
  • the number of carbon atoms in the alkylene group of R 40 is preferably 1 to 10, more preferably 1 to 6, from the viewpoint of easy production of the present compound and superior abrasion resistance, light resistance, and chemical resistance of the surface layer. , 1 to 4 are more preferred. However, when the alkylene group has a specific bond between carbon atoms, the lower limit of the number of carbon atoms is 2.
  • Examples of the ring structure in Z 1 include the ring structures described above, and preferred forms are also the same. Note that since E 24 is directly bonded to the ring structure in Z 1 , for example, an alkylene group is not connected to the ring structure and E 24 is not connected to the alkylene group.
  • the number of carbon atoms in the alkyl group of R E1 , R E2 or R E3 is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2, from the viewpoint of ease of manufacturing the present compound.
  • the number of carbon atoms in the alkyl group portion of the acyloxy group in R E2 is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2, from the viewpoint of ease of manufacturing the present compound.
  • g4 is preferably 2 to 6, more preferably 2 to 4, and even more preferably 2 or 3, from the viewpoint of ease of manufacturing the present compound and superior abrasion resistance and fingerprint stain removability of the surface layer.
  • L 1 include groups represented by any of the following formulas (E11) to (E17).
  • E G is a group represented by the following formula (E G ), and two or more E Gs included in L 1 may be the same or different.
  • the symbols other than E G are the same as those in equations (E1) to (E7).
  • the Si side is connected to E 22 , E 23 , E 24 , E 25 or E 26
  • the E 3 side is connected to R 3 .
  • R 23 is an alkyl group.
  • E 3 is a single bond or -R 45 -B 6 -, R 45 is an alkylene group, or -C(O)NR 46 - between the carbon atoms of the alkylene group having 2 or more carbon atoms, A group having -C(O)-, -NR 46 - or -O-, or -(OSi(R 24 ) 2 ) p -O-, and two or more E 3s may be the same or different.
  • k is 2 or 3.
  • R 46 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.
  • R 24 is an alkyl group, a phenyl group, or an alkoxy group, and two R 24s may be the same or different.
  • p is an integer from 0 to 5, and when p is 2 or more, two or more (OSi(R 24 ) 2 ) may be the same or different.
  • the number of carbon atoms in the alkylene group of E 3 is preferably 1 to 10, more preferably 1 to 6, from the viewpoint of easy production of the present compound and superior abrasion resistance, light resistance, and chemical resistance of the surface layer. , 1 to 4 are more preferred. However, when the alkylene group has a specific bond between carbon atoms, the lower limit of the number of carbon atoms is 2.
  • the number of carbon atoms in the alkyl group of R 23 is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2 from the viewpoint of ease of manufacturing the present compound.
  • the number of carbon atoms in the alkyl group of R 24 is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2 from the viewpoint of ease of manufacturing the present compound.
  • the number of carbon atoms in the alkoxy group of R 24 is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2, from the viewpoint of excellent storage stability of the present compound.
  • p is preferably
  • R 3 is a single bond, an alkylene group, or an alkylene group having an ether oxygen atom.
  • the atom bonded to L 1 may be an etheric oxygen atom, or may have an etheric oxygen atom between carbon atoms.
  • the plural R 3s may be the same or different from each other.
  • the R 3 is preferably a group represented by the following formula (6).
  • R 41 is an alkylene group having 1 to 12 carbon atoms, and multiple R 41s may be the same or different from each other
  • R 42 is an alkylene group having 1 to 30 carbon atoms
  • a6 is 0 or 1
  • a7 is an integer greater than or equal to 0
  • * is a bond bonding to L 1
  • ** is a bond bonded to T1 .
  • a6 When a6 is 0, the atom having the bond * is a carbon atom, and when a6 is 1, the atom having the bond * is an oxygen atom.
  • a6 may be either 0 or 1, and may be selected as appropriate from the viewpoint of ease of synthesis.
  • a7 is the repeating number of R 41 O, and from the viewpoint of durability as a surface layer, it is preferably 0 to 6, more preferably 0 to 3, and even more preferably 0 to 1.
  • the alkylene group for R 41 may be any linear or branched alkylene group having 1 to 12 carbon atoms, preferably an alkylene group having 1 to 6 carbon atoms, and more preferably an alkylene group having 1 to 3 carbon atoms.
  • the alkylene group is preferably a straight chain alkylene group.
  • the alkylene group for R 42 may be any linear or branched alkylene group having 1 to 30 carbon atoms, preferably an alkylene group having 1 to 20 carbon atoms, and more preferably an alkylene group having 2 to 20 carbon atoms.
  • the alkylene group of R 42 may have 1 to 12 carbon atoms, 1 to 10 carbon atoms, 2 to 6 carbon atoms, or 2 to 3 carbon atoms. Further, the alkylene group is preferably a straight chain alkylene group.
  • -Q 1 (-T 1 ) x1 include the following structures. Note that -Q 1 (-T 1 ) x1 is not limited to these.
  • ⁇ in the above (CH 2 ) ⁇ is an integer representing the number of methylene groups, preferably from 1 to 30, more preferably from 1 to 20, even more preferably from 2 to 20, may be from 2 to 10, and from 2 to 30. It may be 6. Examples include 2, 3, 8, 9, and 11. Further, the number of carbon atoms may be 1 to 10.
  • a plurality of ⁇ 's contained in the same compound may be the same or different, but are preferably the same. For example, all of the plurality of ⁇ s contained in the same compound are 2, 3, 8, 9, and 11.
  • Compound 3 includes the following. Note that n and m in the following formula each independently represent an integer of 1 to 200.
  • the method for producing the present compound includes, for example, (I) adding a fluoroether ring to a linear polyfluoroether chain to synthesize a group (R f ) containing a fluoroether ring, and adding a reactive group to the R f .
  • (II) A method of cyclizing a branched polyfluoroether chain to synthesize a group (R f ) containing a fluoroether ring, and adding a reactive group T 1 to the R f ; etc. can be mentioned.
  • the methods (I) and (II) above will be specifically explained, but the method for producing the present compound is not limited thereto.
  • examples of the method for synthesizing R f include a method of reacting a compound represented by the following formula (21) with a compound represented by the following formula (22).
  • R r2 - (D 1 ) y1 formula (21) D 2 -(OR f3 ) m3 -D 3 formula (22) however, R r2 is a y1-valent residue of a (fluoro)ether ring, D 1 is a group containing a group capable of reacting with D 2 , D2 is a group containing a group capable of reacting with D1 , D 3 is -Q 1 (-T 1 ) x1 or a group into which -Q 1 (-T 1 ) x1 can be introduced by subsequent operation, D 1 and D 2 are groups that become R f2 in formula (11) after the reaction.
  • the compound represented by the above formula (21) for example, a commercially available crown ether having a substituent can be used.
  • the compound represented by formula (21) may be fluorinated, and may be fluorinated after the above reaction.
  • the compound represented by the above formula (22) may be a commercially available product or may be synthesized.
  • reaction conditions for the above reaction may be adjusted as appropriate depending on the combination of D 1 and D 2 .
  • reaction conditions for the above reaction may be adjusted as appropriate depending on the combination of D 1 and D 2 .
  • R 31 is a hydrogen atom, a fluorine atom, or a (fluoro)alkylene group having 1 to 6 carbon atoms
  • D 11 is a group containing a group capable of reacting with D 12
  • D 13 is -Q 1 (-T 1 ) x1 or a group into which -Q 1 (-T 1 ) x1 can be introduced by subsequent operation
  • R f4 is a (fluoro)alkylene group having 1 to 6 carbon atoms
  • m4 is an integer of 1 or more.
  • a group D14 capable of reacting with each other is introduced into the terminal of the compound represented by the above formula (33), and the polyfluoroether chain is represented by the following formula (34).
  • Examples include a method in which the D 14s are made into a compound and then reacted with each other. [D 14 -(R f4 O) m4 -] 2 CR 31 -D 13 Formula (34)
  • Examples of D 14 include groups containing a carbon-carbon double bond.
  • composition contains one or more fluorine-containing ether compounds, which are the present compounds, and other fluorine-containing ether compounds other than the present compound. In addition, this composition does not contain the liquid medium mentioned later.
  • fluorine-containing ether compounds include both compounds that are unavoidably included and compounds that are used in combination depending on the application.
  • Compounds used in combination with the present compound include known fluorine-containing ether compounds and fluorine-containing oils.
  • fluorine-containing oils examples include polytetrafluoroethylene (PTFE), ethylene-chlorotrifluoroethylene copolymer (ECTFE), polyvinylidene fluoride (PVDF), polyvinyl fluoride (PVF), and polychlorotrifluoroethylene (PCTFE).
  • PTFE polytetrafluoroethylene
  • ECTFE ethylene-chlorotrifluoroethylene copolymer
  • PVDF polyvinylidene fluoride
  • PVF polyvinyl fluoride
  • PCTFE polychlorotrifluoroethylene
  • examples of known fluorine-containing ether compounds include fluorine-containing ether compounds that are commercially available as surface treatment agents. When the present composition contains a known fluorine-containing ether compound, new effects such as supplementing the properties of the present compound may be exhibited.
  • Examples of known fluorine-containing ether compounds include those described in the following literature. perfluoropolyether-modified aminosilane described in Japanese Patent Application Publication No. 11-029585, Silicon-containing organic fluorine-containing polymer described in Japanese Patent No. 2874715, Organosilicon compounds described in Japanese Patent Application Publication No. 2000-144097, perfluoropolyether-modified aminosilane described in Japanese Patent Application Publication No.
  • Examples include AF series, Optool (registered trademark) DSX, Optool (registered trademark) AES, Optool (registered trademark) UF503, Optool (registered trademark) UD509, and Optool (registered trademark) UD120 manufactured by Daikin Industries.
  • the content ratio when the present compound is combined with a known fluorine-containing ether compound, the content ratio may be adjusted as appropriate depending on the use and the like.
  • the content of the present compound in the composition is preferably 10 to 90% by mass, more preferably 20 to 80% by mass, and even more preferably 25 to 75% by mass.
  • Examples of compounds that are unavoidably included include fluorine-containing ether compounds (hereinafter also referred to as "by-product fluorine-containing ether compounds”) that are by-produced in the manufacturing process of the present compound.
  • Examples of the by-product fluorine-containing ether compound include an unreacted fluorine-containing ether compound and a fluorine-containing ether compound in which a part of the allyl group is isomerized to an inner olefin during hydrosilylation in the production of the present compound.
  • the present composition contains a by-product fluorine-containing ether compound
  • the by-product fluorine-containing ether compound can be removed by purification, but it may be added to the present composition to the extent that the properties of the present compound can be fully exhibited. May contain. Thereby, the purification process of the by-product fluorine-containing ether compound can be simplified.
  • the content of this compound in this composition is preferably 60% by mass or more and less than 100% by mass, more preferably 70% by mass or more and less than 100% by mass, and 80% by mass or more and less than 100% by mass. Particularly preferred.
  • the content of the by-product fluorine-containing ether compound is preferably more than 0% by mass and not more than 40% by mass, more preferably more than 0% by mass and not more than 30% by mass, particularly more than 0% by mass and not more than 20% by mass. preferable. If the content of the present compound and the content of the by-product fluorine-containing ether compound are within the above ranges, the initial water and oil repellency, abrasion resistance, fingerprint stain removability, light resistance and chemical resistance of the surface layer will further improve. Excellent.
  • examples of compounds that are inevitably included include additives such as acid catalysts and basic catalysts that promote hydrolysis and condensation reactions of hydrolyzable silyl groups.
  • the acid catalyst include hydrochloric acid, nitric acid, acetic acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid.
  • the basic catalyst include sodium hydroxide, potassium hydroxide, and ammonia. The content of these in the present composition is preferably 0 to 9.999% by mass, particularly preferably 0 to 0.99% by mass.
  • the surface treatment agent containing this compound (hereinafter also referred to as the present surface treatment agent) has the property that the water and oil repellency does not easily deteriorate even when the surface layer is repeatedly rubbed with fingers (friction resistance), and the surface layer can be easily rubbed by wiping.
  • Applications that require the ability to easily remove attached fingerprints (fingerprint smudge removability) to be maintained over a long period of time such as surface treatment of components that make up the surface of touch panels that are touched by fingers, glasses lenses, and displays of wearable terminals. It is suitably used as an agent.
  • the surface layer obtained using the present compound has excellent anti-slipping properties, it can be suitably used as a surface treatment agent for the housing of electronic devices and the like.
  • the coating liquid of the present invention contains the present compound and a liquid medium.
  • the present coating liquid may be in a liquid form, and may be a solution or a dispersion.
  • the present coating liquid only needs to contain the present fluorine-containing ether compound, and may contain impurities such as by-products generated in the manufacturing process of the present fluorine-containing ether compound.
  • the concentration of the present fluorine-containing ether compound in the present coating liquid is preferably 0.001 to 40% by mass, preferably 0.01 to 20% by mass, and more preferably 0.1 to 10% by mass.
  • an organic solvent is preferred.
  • the organic solvent may be a fluorine-containing organic solvent, a non-fluorine organic solvent, or may contain both solvents.
  • the fluorine-containing organic solvent include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines, fluoroalcohols, and the like.
  • the fluorinated alkane compounds having 4 to 8 carbon atoms are preferred.
  • C 6 F 13 H manufactured by AGC Corporation, Asahiklin (registered trademark) AC-2000
  • C 6 F 13 C 2 H 5 manufactured by AGC Corporation, Asahiklin (registered trademark) AC-6000
  • C 2 F 5 CHFCHFCF 3 manufactured by Chemours, Bartrel (registered trademark) XF
  • fluorinated aromatic compound examples include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, and bis(trifluoromethyl)benzene.
  • fluoroalkyl ether compounds having 4 to 12 carbon atoms are preferred.
  • CF 3 CH 2 OCF 2 CF 2 H manufactured by AGC, Asahiklin (registered trademark) AE-3000
  • C 4 F 9 OCH 3 manufactured by 3M, Novec (registered trademark) 7100
  • C 4 F 9 OC 2 H 5 manufactured by 3M Company, Novec (registered trademark) 7200
  • C 2 F 5 CF OH 3 )C 3 F 7
  • fluorinated alkylamine include perfluorotripropylamine and perfluorotributylamine.
  • fluoroalcohol examples include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol, and hexafluoroisopropanol.
  • non-fluorine organic solvents compounds consisting only of hydrogen atoms and carbon atoms, and compounds consisting only of hydrogen atoms, carbon atoms, and oxygen atoms are preferable, such as hydrocarbon-based organic solvents, alcohol-based organic solvents, ketone-based organic solvents, Examples include ether organic solvents and ester organic solvents.
  • the present coating liquid preferably contains the liquid medium in an amount of 75 to 99.999% by mass, preferably 85 to 99.99% by mass, and particularly preferably 90 to 99.9% by mass.
  • the present coating liquid may contain other components to the extent that the effects of the present invention are not impaired.
  • other components include known additives such as acid catalysts and basic catalysts that promote hydrolysis and condensation reactions of hydrolyzable silyl groups.
  • the content of other components in this coating liquid is preferably 10% by mass or less, more preferably 1% by mass or less.
  • the total concentration of the present compound and other components (hereinafter also referred to as solid content concentration) of the present coating liquid is preferably 0.001 to 40% by mass, more preferably 0.01 to 20% by mass, and 0.01% by mass. It is more preferably from 10% by weight, and particularly preferably from 0.01 to 1% by weight.
  • the solid content concentration of the coating liquid is a value calculated from the mass of the coating liquid before heating and the mass after heating in a convection dryer at 120° C. for 4 hours.
  • FIG. 1 is a schematic cross-sectional view showing an example of the article of the present invention.
  • a first article of the present invention is an article 20 having a base material 12, a base layer 14, and a surface layer 22 in this order, the base layer 14 containing an oxide containing silicon, and the surface layer 22. contains a condensate of the present composition.
  • the material and shape of the base material 12 in the first article may be appropriately selected depending on the use of the article 20, etc.
  • Examples of the material of the base material 12 include glass, resin, sapphire, metal, ceramic, stone, and composite materials thereof.
  • the glass may be chemically strengthened.
  • examples of the base material 12 required to have water and oil repellency include base materials for touch panels, base materials for displays, and base materials constituting the housings of electronic devices.
  • the base material for a touch panel and the base material for a display have translucency. "Having light transmittance" means that the perpendicular incidence type visible light transmittance according to JIS R3106:1998 (ISO 9050:1990) is 25% or more.
  • As the material for the touch panel base material glass or transparent resin is preferable.
  • the surface of the base material 12 on which the base layer 14 is provided may be subjected to surface treatment such as corona discharge treatment, plasma treatment, plasma graft polymerization treatment, etc.
  • surface treatment such as corona discharge treatment, plasma treatment, plasma graft polymerization treatment, etc.
  • the surface that has been subjected to surface treatment has even better adhesion between the base material 12 and the base layer 14, and as a result, the abrasion resistance of the surface layer 22 is further improved.
  • corona discharge treatment or plasma treatment is preferable since the wear resistance of the surface layer 22 is further excellent.
  • the base layer 14 is a layer containing at least an oxide containing silicon, and may further contain other elements. Since the base layer 14 contains silicon oxide, T1 of the present composition is dehydrated and condensed, and Si--O--Si bonds are formed with the base layer 14, resulting in a surface layer 22 having excellent wear resistance. It is formed.
  • the content of silicon oxide in the base layer 14 may be 65% by mass or more, preferably 80% by mass or more, more preferably 85% by mass or more, and even more preferably 90% by mass or more.
  • the content of silicon oxide is the remainder obtained by subtracting the total content of other elements (in the case of oxides, the amount converted into oxides) from the mass of the base layer 14.
  • the oxides in the base layer 14 further include alkali metal elements, alkaline earth metal elements, platinum group elements, boron, aluminum, phosphorus, titanium, zirconium, iron, nickel, and chromium. , molybdenum, and tungsten. By containing these elements, the bond between the base layer 14 and the present composition is strengthened, and wear resistance is improved.
  • the base layer 14 contains one or more selected from iron, nickel, and chromium
  • the total content thereof is preferably 10 to 1,100 ppm by mass relative to silicon oxide, and 50 to 1,100 mass ppm. ppm is more preferable, even more preferably 50 to 500 ppm by mass, and particularly preferably 50 to 250 ppm by mass.
  • the base layer 14 contains one or more selected from aluminum and zirconium
  • the total content thereof is preferably 10 to 2,500 ppm by mass, more preferably 15 to 2,000 ppm by mass, and 20 to 2,000 ppm by mass. More preferably 1,000 ppm by mass.
  • the base layer 14 contains an alkali metal element
  • the total content thereof is preferably 0.05 to 15% by mass, more preferably 0.1 to 13% by mass, and further preferably 1.0 to 10% by mass. preferable.
  • examples of the alkali metal elements include lithium, sodium, potassium, rubidium, and cesium.
  • platinum group elements the total content thereof is preferably 0.02 to 800 mass ppm, more preferably 0.04 to 600 mass ppm, and still more preferably 0.7 to 200 mass ppm. preferable.
  • platinum group elements include platinum, rhodium, ruthenium, palladium, osmium, and iridium.
  • the base layer 14 contains one or more selected from boron and phosphorus
  • the total content of these is determined by the total content of boron and phosphorus relative to the molar concentration of silicon, from the viewpoint of wear resistance of the surface layer 22.
  • the molar concentration ratio is preferably 0.003 to 9, preferably 0.003 to 2, and more preferably 0.003 to 0.5.
  • the base layer 14 contains alkaline earth metal elements
  • the total content of these elements is determined by the total molar concentration of the alkaline earth metal elements relative to the molar concentration of silicon, from the viewpoint of the wear resistance of the surface layer 22.
  • the ratio is preferably 0.005 to 5, preferably 0.005 to 2, and more preferably 0.007 to 2.
  • alkaline earth metal elements include lithium, sodium, potassium, rubidium, and cesium.
  • the base layer 14 is preferably a silicon oxide layer containing alkali metal atoms.
  • the average concentration of alkali metal atoms in a region with a depth of 0.1 to 0.3 nm from the surface in contact with the surface layer 22 is 2.0 ⁇ 10 19 atoms/cm 3 or more. It is preferable that there be.
  • the average concentration of the alkali metal atoms is preferably 4.0 ⁇ 10 22 atoms/cm 3 or less.
  • the thickness of the base layer 14 is preferably 1 to 200 nm, particularly preferably 2 to 20 nm. If the thickness of the base layer 14 is at least the lower limit of the above range, the effect of improving the adhesion by the base layer 14 is likely to be sufficiently achieved. If the thickness of the base layer 14 is less than or equal to the upper limit of the above range, the wear resistance of the base layer 14 itself will be high. Examples of methods for measuring the thickness of the base layer 14 include a method of observing a cross section of the base layer 14 using an electron microscope (SEM, TEM, etc.), a method using an optical interference film thickness meter, a spectroscopic ellipsometer, a step meter, etc. .
  • Examples of the method for forming the base layer 14 include a method of depositing a vapor deposition material having a desired composition of the base layer 14 onto the surface of the base material 12.
  • An example of the vapor deposition method is a vacuum vapor deposition method.
  • the vacuum evaporation method is a method in which a evaporation material is evaporated in a vacuum chamber and adhered to the surface of the base material 12.
  • the temperature during vapor deposition eg, the temperature of the boat on which the vapor deposition material is placed when using a vacuum vapor deposition apparatus
  • the temperature during vapor deposition is preferably 100 to 3,000°C, particularly preferably 500 to 3,000°C.
  • the pressure during vapor deposition (for example, when using a vacuum vapor deposition apparatus, the absolute pressure in the tank in which the vapor deposition material is placed) is preferably 1 Pa or less, particularly preferably 0.1 Pa or less.
  • one vapor deposition material may be used, or two or more vapor deposition materials containing different elements may be used.
  • Methods for evaporating the evaporation material include the resistance heating method, in which the evaporation material is melted and evaporated on a resistance heating boat made of high-melting point metal, and the evaporation material is irradiated with an electron beam to directly heat the evaporation material, melting the surface.
  • An example of this is the electron gun method, which involves evaporation.
  • the method of evaporating the evaporation material is that it can evaporate high-melting-point substances because it can locally heat the material, and because the area not hit by the electron beam is at a low temperature, there is no risk of reaction with the container or contamination with impurities. Gun law is preferred.
  • molten granules or sintered bodies are preferable because they are difficult to scatter even when air currents are generated.
  • the surface layer 22 on the base layer 14 contains a condensate of the compounds contained in the present composition.
  • a silanol group Si-OH
  • Si-OH silanol group
  • Si-OH silanol group
  • Si-OM groups where M is an alkali metal element
  • the surface layer 22 may contain a condensate of a fluorine-containing ether compound other than the compound contained in the present composition. That is, the surface layer 22 contains a fluorine-containing ether compound having a reactive silyl group in a state where some or all of the reactive silyl groups of the fluorine-containing ether compound have undergone a condensation reaction.
  • the thickness of the surface layer 22 is preferably 1 to 100 nm, particularly preferably 1 to 50 nm. If the thickness of the surface layer 22 is at least the lower limit of the above range, the effect of the surface layer 22 can be sufficiently obtained. If the thickness of the surface layer 22 is less than or equal to the upper limit of the above range, the utilization efficiency is high.
  • the thickness of the surface layer 22 is the thickness obtained with an X-ray diffractometer for thin film analysis.
  • the thickness of the surface layer 22 can be calculated from the vibration period of the interference pattern obtained by obtaining an interference pattern of reflected X-rays by the X-ray reflectance method using an X-ray diffractometer for thin film analysis.
  • a second article of the present invention is an article 20 having a base layer-coated base material 10 and a surface layer 22 in this order, wherein the base layer-coated base material 10 contains an oxide containing silicon, and the surface layer No. 22 contains the condensate of the present composition.
  • the wear resistance of the surface layer 22 is improved even if the surface layer 22 is directly formed on the base material 10 with a base layer. Excellent in sex.
  • the material of the base layer-attached base material 10 in the second article may be any material as long as it has the composition of the base layer 14, and may be, for example, a glass base material.
  • the details of the material of the base material 10 with a base layer are the same as those of the base material 12 and the base layer 14, so the description thereof will be omitted here. Further, since the structure of the surface layer 22 is also the same as that of the first article, a description thereof will be omitted here.
  • a method for manufacturing an article according to the present invention is a method of forming a surface layer by a dry coating method or a wet coating method using the fluorine-containing ether compound, the surface treatment agent, or the coating liquid.
  • the present fluorine-containing ether compound and the present surface treatment agent can be used as they are in the dry coating method. Further, the present composition and the present surface treatment agent are suitable for forming a surface layer with excellent adhesion by a dry coating method. Examples of the dry coating method include vacuum deposition, CVD, and sputtering. A vacuum evaporation method is preferably used from the viewpoint of suppressing decomposition of the present composition and the simplicity of the apparatus. For vacuum deposition, a pellet-like substance in which the present composition is supported on a metal porous body made of a metal material such as iron or steel may be used. A pellet-like substance supporting the present composition can be produced by impregnating a porous metal body with a solution of the present composition and drying to remove the liquid medium. The present coating liquid can be used as the solution of the present composition.
  • This coating liquid can be suitably used in a wet coating method.
  • Wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet, flow coating, roll coating, casting, Langmuir-Blodgett, and gravure. Examples include the coating method.
  • an operation may be performed to promote the reaction between the present composition and the base material, if necessary.
  • Such operations include heating, humidification, light irradiation, and the like.
  • a hydrolysis reaction of hydrolyzable groups, a reaction between hydroxyl groups, etc. on the surface of the base material and silanol groups, and a condensation reaction of silanol groups are performed. It can promote reactions such as the formation of siloxane bonds.
  • compounds in the surface layer that are not chemically bonded to other compounds or the base material may be removed as necessary. Specific methods include, for example, a method of pouring a solvent onto the surface layer, a method of wiping it off with a cloth impregnated with a solvent, and the like.
  • n2 8.
  • Example 2 a ring with F attached thereto indicates that it has the following structure.
  • n2 8.
  • n2 8.
  • n2 8.
  • Example 5 (Synthesis example 5-1) 5.0 g of tetrahydrofuran and 10 g of AE-3000 were placed in a 200 mL eggplant flask equipped with a stirrer, and 6.0 mL of 0.7 mol/L allylmagnesium bromide was added dropwise. Furthermore, 5.1 g of compound (1-8) was added dropwise, and the mixture was stirred at 55°C for 12 hours. The mixture was cooled to 25° C., and 12 mL of 1N aqueous hydrochloric acid solution was added to stop the reaction. The obtained lower phase was purified by column chromatography to obtain 3.7 g of compound (5-1).
  • Example 8 (Synthesis example 8-1) 6.0 g of compound (1-1), 200 mL of dichloromethane, and 5.2 g of 2,6-lutidine were added to a 500 mL eggplant flask equipped with a stirrer, and the mixture was stirred in an ice bath. 12.5 g of trifluoromethanesulfonic anhydride was slowly added to the liquid phase while stirring was continued. After stirring for 1 hour, 200 mL of water was added and the mixture was separated. The organic layer was washed with saturated aqueous sodium bicarbonate, aqueous ammonium chloride, and brine. It was dried over anhydrous sodium sulfate and concentrated using an evaporator. The obtained crude liquid was purified by column chromatography to obtain 3.2 g of compound (8-1).
  • Example 9 A perfluoropolyether group-containing silane compound (9-1) was obtained according to Synthesis Example 2 of International Publication No. 2018/143433. CF 3 O(CF 2 CF 2 O) 20 (CF 2 O) 16 CF 2 CONHCH 2 C[CH 2 CH 2 CH 2 Si(OCH 3 ) 3 ] 3 ...(9-1)
  • a substrate was surface-treated using the compounds and compositions obtained in each of the above examples to obtain articles.
  • the surface treatment method the following dry coating method and wet coating method were used for each example. Chemically strengthened glass was used as the base material.
  • the obtained article was evaluated by the following method. The results are shown in the table.
  • the dry coating was performed using a vacuum evaporation device (VTR350M, manufactured by ULVAC) (vacuum evaporation method).
  • VTR350M vacuum evaporation device
  • 0.5 g of each compound was filled into a molybdenum boat in a vacuum evaporation apparatus, and the inside of the vacuum evaporation apparatus was evacuated to 1 ⁇ 10 ⁇ 3 Pa or less.
  • the boat containing the compound or composition is heated at a temperature increase rate of 10° C./min or less, and when the deposition rate exceeds 1 nm/sec using a crystal oscillation type film thickness meter, the shutter is opened to deposit the compound or composition on the surface of the substrate. Film production has started.
  • the shutter was closed to complete the film formation on the surface of the substrate.
  • the base material on which the compound or composition has been deposited is heat-treated at 200°C for 30 minutes, and washed with C 6 F 13 H (AGC Co., Ltd., Asahi Clean (registered trademark) AC-2000) to remove the base material.
  • C 6 F 13 H APC Co., Ltd., Asahi Clean (registered trademark) AC-2000
  • the initial water contact angle and the initial n-hexadecane contact angle were measured using the measurement method described above.
  • the evaluation criteria are as follows.
  • Initial n-hexadecane contact angle A (excellent): 66 degrees or higher.
  • ⁇ Slip resistance> The coefficient of dynamic friction of the surface layer against artificial skin (manufactured by Idemitsu Technofine Co., Ltd., PBZ13001) was measured using a variable load abrasion test system (manufactured by Shinto Kagakusha Co., Ltd., HHS2000) under conditions of contact area: 3 cm x 3 cm, load 0.98 N. It was measured with The larger the coefficient of dynamic friction, the better the slip resistance.
  • the evaluation criteria are as follows. A (excellent): Dynamic friction coefficient is 0.6 or more. B (Good): Dynamic friction coefficient is 0.5 or more and less than 0.6. C (acceptable): Dynamic friction coefficient is 0.4 or more and less than 0.5. D (impossible): Dynamic friction coefficient is less than 0.4.
  • the haze value was measured for each round trip of wiping, and the number of times the haze became 10% or less from the initial value was measured. The fewer the number of times of wiping, the easier fingerprint stains can be removed, and the fingerprint stain removability is excellent.
  • the evaluation criteria are as follows. A (Excellent): The number of times of wiping was 3 or less. B (Good): Wiping was performed 4 to 5 times. C (Acceptable): The number of times of wiping is 6 to 8 times. D (impossible): The number of times of wiping is 9 or more.
  • Examples of articles equipped with a surface layer containing the present compound include optical articles used as parts of the following products, touch panels, antireflection films, antireflection glasses, SiO2- treated glass, tempered glass, and sapphire glass. It is useful as a quartz substrate, mold metal, etc.
  • Products Car navigation, mobile phones, digital cameras, digital video cameras, personal digital assistants (PDAs), portable audio players, car audio, game equipment, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment (gastrocameras, etc.) ), copying machines, personal computers (PCs), liquid crystal displays, organic EL displays, plasma displays, touch panel displays, protective films, anti-reflection films, anti-reflection glass, nanoimprint templates, molds, etc.

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Abstract

L'invention concerne : un composé, une composition, un agent de traitement de surface et un liquide de revêtement pouvant former une couche de surface dans laquelle la dégradation est supprimée tandis que des propriétés anti-frottement et des propriétés d'élimination de salissures des empreintes digitales sont maintenues ; un article qui est pourvu d'une couche de surface formée à partir dudit composé ou similaire et qui est excellent en termes de propriétés anti-frottement, de propriétés d'élimination de salissures des empreintes digitales et d'un effet de suppression de dégradation ; et un procédé de production dudit article.　Le composé comprend : un groupe (Rf) qui comprend un cycle fluoroéther éventuellement substitué ; et un groupe réactif (T1).
PCT/JP2023/029592 2022-08-18 2023-08-16 Composé, composition, agent de traitement de surface, liquide de revêtement, article et procédé de fabrication d'un article WO2024038873A1 (fr)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013514999A (ja) * 2009-12-17 2013-05-02 ワシントン・ユニバーシティ 抗血栓性ナノ粒子
WO2020071330A1 (fr) * 2018-10-05 2020-04-09 Ａｇｃ株式会社 Composition d'éther contenant du fluor, liquide de revêtement, article et procédé de production associé
WO2020162371A1 (fr) * 2019-02-08 2020-08-13 Ａｇｃ株式会社 Composé éther fluoré, composition d'éther fluoré, liquide de revêtement, article ainsi que procédé de fabrication de celui-ci, et procédé de fabrication de composé fluoré

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013514999A (ja) * 2009-12-17 2013-05-02 ワシントン・ユニバーシティ 抗血栓性ナノ粒子
WO2020071330A1 (fr) * 2018-10-05 2020-04-09 Ａｇｃ株式会社 Composition d'éther contenant du fluor, liquide de revêtement, article et procédé de production associé
WO2020162371A1 (fr) * 2019-02-08 2020-08-13 Ａｇｃ株式会社 Composé éther fluoré, composition d'éther fluoré, liquide de revêtement, article ainsi que procédé de fabrication de celui-ci, et procédé de fabrication de composé fluoré

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