JP6099372B2 - 半導体装置及び電子機器 - Google Patents

半導体装置及び電子機器 Download PDF

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Publication number
JP6099372B2
JP6099372B2 JP2012260451A JP2012260451A JP6099372B2 JP 6099372 B2 JP6099372 B2 JP 6099372B2 JP 2012260451 A JP2012260451 A JP 2012260451A JP 2012260451 A JP2012260451 A JP 2012260451A JP 6099372 B2 JP6099372 B2 JP 6099372B2
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Prior art keywords
transistor
wiring
potential
signal
gate
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JP2012260451A
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Japanese (ja)
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JP2013140340A (ja
JP2013140340A5 (enExample
Inventor
敦司 梅崎
敦司 梅崎
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2012260451A priority Critical patent/JP6099372B2/ja
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Publication of JP2013140340A5 publication Critical patent/JP2013140340A5/ja
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C19/00Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/18Digital stores in which the information is moved stepwise, e.g. shift registers using capacitors as main elements of the stages
    • G11C19/182Digital stores in which the information is moved stepwise, e.g. shift registers using capacitors as main elements of the stages in combination with semiconductor elements, e.g. bipolar transistors, diodes
    • G11C19/184Digital stores in which the information is moved stepwise, e.g. shift registers using capacitors as main elements of the stages in combination with semiconductor elements, e.g. bipolar transistors, diodes with field-effect transistors, e.g. MOS-FET
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C19/00Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/28Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/811Combinations of field-effect devices and one or more diodes, capacitors or resistors
    • H10D84/813Combinations of field-effect devices and capacitor only
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441Interconnections, e.g. scanning lines
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/471Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having different architectures, e.g. having both top-gate and bottom-gate TFTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/481Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs integrated with passive devices, e.g. auxiliary capacitors
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2310/00Command of the display device
    • G09G2310/02Addressing, scanning or driving the display screen or processing steps related thereto
    • G09G2310/0264Details of driving circuits
    • G09G2310/0267Details of drivers for scan electrodes, other than drivers for liquid crystal, plasma or OLED displays
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2310/00Command of the display device
    • G09G2310/02Addressing, scanning or driving the display screen or processing steps related thereto
    • G09G2310/0264Details of driving circuits
    • G09G2310/0286Details of a shift registers arranged for use in a driving circuit
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2320/00Control of display operating conditions
    • G09G2320/04Maintaining the quality of display appearance
    • G09G2320/043Preventing or counteracting the effects of ageing
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/22Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources
    • G09G3/30Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels
    • G09G3/32Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED]
    • G09G3/3208Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED]
    • G09G3/3266Details of drivers for scan electrodes

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)
  • Shift Register Type Memory (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Control Of El Displays (AREA)
  • Liquid Crystal Display Device Control (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)
  • Electronic Switches (AREA)
JP2012260451A 2011-12-05 2012-11-29 半導体装置及び電子機器 Active JP6099372B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012260451A JP6099372B2 (ja) 2011-12-05 2012-11-29 半導体装置及び電子機器

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011265799 2011-12-05
JP2011265799 2011-12-05
JP2012260451A JP6099372B2 (ja) 2011-12-05 2012-11-29 半導体装置及び電子機器

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JP2017029767A Division JP2017139049A (ja) 2011-12-05 2017-02-21 半導体装置

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JP2013140340A JP2013140340A (ja) 2013-07-18
JP2013140340A5 JP2013140340A5 (enExample) 2016-01-21
JP6099372B2 true JP6099372B2 (ja) 2017-03-22

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JP2017029767A Withdrawn JP2017139049A (ja) 2011-12-05 2017-02-21 半導体装置
JP2019012730A Withdrawn JP2019106230A (ja) 2011-12-05 2019-01-29 半導体装置
JP2021018144A Active JP7048779B2 (ja) 2011-12-05 2021-02-08 半導体装置
JP2022048367A Active JP7238188B2 (ja) 2011-12-05 2022-03-24 半導体装置
JP2023030780A Active JP7457178B2 (ja) 2011-12-05 2023-03-01 半導体装置
JP2024039960A Active JP7631584B2 (ja) 2011-12-05 2024-03-14 半導体装置
JP2025017403A Pending JP2025065292A (ja) 2011-12-05 2025-02-05 半導体装置

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JP2019012730A Withdrawn JP2019106230A (ja) 2011-12-05 2019-01-29 半導体装置
JP2021018144A Active JP7048779B2 (ja) 2011-12-05 2021-02-08 半導体装置
JP2022048367A Active JP7238188B2 (ja) 2011-12-05 2022-03-24 半導体装置
JP2023030780A Active JP7457178B2 (ja) 2011-12-05 2023-03-01 半導体装置
JP2024039960A Active JP7631584B2 (ja) 2011-12-05 2024-03-14 半導体装置
JP2025017403A Pending JP2025065292A (ja) 2011-12-05 2025-02-05 半導体装置

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US (2) US8872299B2 (enExample)
JP (8) JP6099372B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8736315B2 (en) 2011-09-30 2014-05-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US9742378B2 (en) 2012-06-29 2017-08-22 Semiconductor Energy Laboratory Co., Ltd. Pulse output circuit and semiconductor device
US9070546B2 (en) 2012-09-07 2015-06-30 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US9495894B2 (en) * 2013-01-21 2016-11-15 Sharp Kabushiki Kaisha Display device, and data processing method in display device
JP6475424B2 (ja) 2013-06-05 2019-02-27 株式会社半導体エネルギー研究所 半導体装置
CN105590601B (zh) * 2015-12-18 2018-06-26 上海中航光电子有限公司 驱动电路、阵列基板及显示装置
CN107958656B (zh) * 2018-01-08 2019-07-02 武汉华星光电技术有限公司 Goa电路
JP2020202613A (ja) 2019-06-06 2020-12-17 国立大学法人 東京大学 静電型デバイスおよび静電型デバイス製造方法

Family Cites Families (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7030921B2 (en) * 2000-02-01 2006-04-18 Minolta Co., Ltd. Solid-state image-sensing device
JP4785271B2 (ja) 2001-04-27 2011-10-05 株式会社半導体エネルギー研究所 液晶表示装置、電子機器
US6788108B2 (en) * 2001-07-30 2004-09-07 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
TW564429B (en) * 2002-08-08 2003-12-01 Au Optronics Corp Shift register circuit
KR100797522B1 (ko) 2002-09-05 2008-01-24 삼성전자주식회사 쉬프트 레지스터와 이를 구비하는 액정 표시 장치
JP4425547B2 (ja) * 2003-01-17 2010-03-03 株式会社半導体エネルギー研究所 パルス出力回路、シフトレジスタ、および電子機器
US7369111B2 (en) * 2003-04-29 2008-05-06 Samsung Electronics Co., Ltd. Gate driving circuit and display apparatus having the same
KR100965161B1 (ko) * 2003-06-12 2010-06-24 삼성전자주식회사 유기전계발광 구동회로와, 이를 갖는 표시패널 및 표시장치
KR101057297B1 (ko) * 2004-08-31 2011-08-22 엘지디스플레이 주식회사 내장형 게이트 드라이버 및 이를 구비한 표시장치
JP2006164477A (ja) * 2004-12-10 2006-06-22 Casio Comput Co Ltd シフトレジスタ、該シフトレジスタの駆動制御方法及び該シフトレジスタを備えた表示駆動装置
JP4111205B2 (ja) * 2005-05-23 2008-07-02 日本電気株式会社 半導体装置、液晶ディスプレイパネル及び電子機器並びに半導体装置の設計方法及び製造方法
EP1998373A3 (en) 2005-09-29 2012-10-31 Semiconductor Energy Laboratory Co, Ltd. Semiconductor device having oxide semiconductor layer and manufacturing method thereof
KR101437086B1 (ko) * 2006-01-07 2014-09-03 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체장치와, 이 반도체장치를 구비한 표시장치 및 전자기기
JP5164383B2 (ja) * 2006-01-07 2013-03-21 株式会社半導体エネルギー研究所 半導体装置、表示装置、液晶表示装置、表示モジュール及び電子機器
TWI347577B (en) * 2006-09-01 2011-08-21 Au Optronics Corp Shift register with low stress
JP5468196B2 (ja) * 2006-09-29 2014-04-09 株式会社半導体エネルギー研究所 半導体装置、表示装置及び液晶表示装置
JP5116277B2 (ja) 2006-09-29 2013-01-09 株式会社半導体エネルギー研究所 半導体装置、表示装置、液晶表示装置、表示モジュール及び電子機器
JP4990034B2 (ja) * 2006-10-03 2012-08-01 三菱電機株式会社 シフトレジスタ回路およびそれを備える画像表示装置
JP5079301B2 (ja) * 2006-10-26 2012-11-21 三菱電機株式会社 シフトレジスタ回路およびそれを備える画像表示装置
CN101785065B (zh) * 2007-09-12 2013-05-15 夏普株式会社 移位寄存器
JP2010033690A (ja) * 2008-06-30 2010-02-12 Mitsubishi Electric Corp シフトレジスタ回路
JP5434007B2 (ja) * 2008-08-01 2014-03-05 カシオ計算機株式会社 フリップフロップ回路、シフトレジスタ及び電子機器
CN103928476A (zh) 2008-10-03 2014-07-16 株式会社半导体能源研究所 显示装置及其制造方法
CN102509736B (zh) 2008-10-24 2015-08-19 株式会社半导体能源研究所 半导体器件和用于制造该半导体器件的方法
KR101634411B1 (ko) 2008-10-31 2016-06-28 가부시키가이샤 한도오따이 에네루기 켄큐쇼 구동 회로, 표시 장치 및 전자 장치
JP5436049B2 (ja) * 2009-05-29 2014-03-05 三菱電機株式会社 シフトレジスタ回路、シフトレジスタ回路の設計方法及び半導体装置
WO2011010546A1 (en) * 2009-07-24 2011-01-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
EP2284891B1 (en) * 2009-08-07 2019-07-24 Semiconductor Energy Laboratory Co, Ltd. Semiconductor device and manufacturing method thereof
CN102012591B (zh) * 2009-09-04 2012-05-30 北京京东方光电科技有限公司 移位寄存器单元及液晶显示器栅极驱动装置
KR101746198B1 (ko) * 2009-09-04 2017-06-12 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시장치 및 전자기기
KR101882350B1 (ko) 2009-10-09 2018-07-27 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시 장치
JP2011085680A (ja) * 2009-10-14 2011-04-28 Epson Imaging Devices Corp 液晶表示装置、走査線駆動回路および電子機器
IN2012DN01823A (enExample) 2009-10-16 2015-06-05 Semiconductor Energy Lab
WO2011048929A1 (en) 2009-10-21 2011-04-28 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
KR101669476B1 (ko) 2009-10-30 2016-10-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 논리 회로 및 반도체 장치
WO2011070929A1 (en) * 2009-12-11 2011-06-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and electronic device
CN105429621B (zh) 2009-12-23 2019-03-19 株式会社半导体能源研究所 半导体装置
WO2011078373A1 (en) 2009-12-25 2011-06-30 Semiconductor Energy Laboratory Co., Ltd. Memory device, semiconductor device, and electronic device
CN102804603B (zh) 2010-01-20 2015-07-15 株式会社半导体能源研究所 信号处理电路及其驱动方法
WO2011096153A1 (en) * 2010-02-05 2011-08-11 Semiconductor Energy Laboratory Co., Ltd. Display device
KR101791713B1 (ko) 2010-02-05 2017-10-30 가부시키가이샤 한도오따이 에네루기 켄큐쇼 전계 효과 트랜지스터 및 반도체 장치
JP5465029B2 (ja) * 2010-02-09 2014-04-09 株式会社ジャパンディスプレイ 表示装置および電子機器
KR102586642B1 (ko) 2010-02-18 2023-10-11 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR102151495B1 (ko) * 2010-02-23 2020-09-03 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제조 방법
DE112011100749B4 (de) * 2010-03-02 2015-06-11 Semiconductor Energy Laboratory Co., Ltd. Impulssignal-Ausgangsschaltung und Schieberegister
DE112011106185B3 (de) * 2010-03-02 2023-05-04 Semiconductor Energy Laboratory Co., Ltd. Impulssignal-Ausgangsschaltung und Schieberegister
KR101767037B1 (ko) 2010-03-02 2017-08-10 가부시키가이샤 한도오따이 에네루기 켄큐쇼 승압 회로 및 승압 회로를 포함하는 rfid 태그
KR101674690B1 (ko) * 2010-03-30 2016-11-09 가부시키가이샤 제이올레드 인버터 회로 및 표시 장치
US8300039B2 (en) * 2010-03-30 2012-10-30 Sony Corporation Inverter circuit and display
JP5678730B2 (ja) * 2010-03-30 2015-03-04 ソニー株式会社 インバータ回路および表示装置
TWI427587B (zh) * 2010-05-11 2014-02-21 Innolux Corp 顯示器
US8664658B2 (en) 2010-05-14 2014-03-04 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP5714973B2 (ja) 2010-05-21 2015-05-07 株式会社半導体エネルギー研究所 半導体装置
JP2013009285A (ja) 2010-08-26 2013-01-10 Semiconductor Energy Lab Co Ltd 信号処理回路及びその駆動方法
JP5827520B2 (ja) 2010-09-13 2015-12-02 株式会社半導体エネルギー研究所 半導体記憶装置
TWI543158B (zh) 2010-10-25 2016-07-21 半導體能源研究所股份有限公司 半導體儲存裝置及其驅動方法
TWI632551B (zh) 2010-12-03 2018-08-11 半導體能源研究所股份有限公司 積體電路,其驅動方法,及半導體裝置
JP5859839B2 (ja) 2011-01-14 2016-02-16 株式会社半導体エネルギー研究所 記憶素子の駆動方法、及び、記憶素子
US8736315B2 (en) * 2011-09-30 2014-05-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device

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US9245909B2 (en) 2016-01-26
JP2013140340A (ja) 2013-07-18
JP2019106230A (ja) 2019-06-27
JP2023080066A (ja) 2023-06-08
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