JP6075611B2 - 成膜装置 - Google Patents
成膜装置 Download PDFInfo
- Publication number
- JP6075611B2 JP6075611B2 JP2012229250A JP2012229250A JP6075611B2 JP 6075611 B2 JP6075611 B2 JP 6075611B2 JP 2012229250 A JP2012229250 A JP 2012229250A JP 2012229250 A JP2012229250 A JP 2012229250A JP 6075611 B2 JP6075611 B2 JP 6075611B2
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- Prior art keywords
- substrate
- chamber
- film forming
- film
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000008021 deposition Effects 0.000 title claims description 3
- 239000000758 substrate Substances 0.000 claims description 121
- 238000010438 heat treatment Methods 0.000 claims description 96
- 238000004544 sputter deposition Methods 0.000 claims description 16
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 138
- 230000015572 biosynthetic process Effects 0.000 description 36
- 238000000137 annealing Methods 0.000 description 25
- 239000007789 gas Substances 0.000 description 15
- 230000007423 decrease Effects 0.000 description 6
- 238000005477 sputtering target Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- -1 for example Substances 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Electric Cables (AREA)
Description
11 基板搬入室
12 第1加熱室
13 第1成膜室
14 第2成膜室
15 第2加熱室
16 第3成膜室
17 基板搬出室
20 基板搬送手段
21 第1加熱手段
22 第2加熱手段
23 ターボ分子ポンプ
24 スパッタリングターゲット
31 第1層
32 第2層
33 第3層
Claims (3)
- 複数の成膜室を備え、基板上に複数層を形成するインライン式の成膜装置であって、
前記複数の成膜室よりも上流側に設けられ、搬送された前記基板を加熱する第1加熱室と、
前記複数の成膜室間に設けられ、搬送された前記基板を加熱する第2加熱室とを少なくとも備え、
前記第2加熱室の前記基板の搬送位置よりも天井面側及び床面側にそれぞれターボ分子ポンプが設けられていることを特徴とする成膜装置。 - 前記基板の厚みが2.8mm以上であることを特徴とする請求項1記載の成膜装置。
- 前記成膜室には、スパッタリング法により成膜を行う成膜手段が設けられていることを特徴とする請求項1又は2に記載の成膜装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012229250A JP6075611B2 (ja) | 2012-10-16 | 2012-10-16 | 成膜装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012229250A JP6075611B2 (ja) | 2012-10-16 | 2012-10-16 | 成膜装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014080655A JP2014080655A (ja) | 2014-05-08 |
JP6075611B2 true JP6075611B2 (ja) | 2017-02-08 |
Family
ID=50785113
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012229250A Active JP6075611B2 (ja) | 2012-10-16 | 2012-10-16 | 成膜装置 |
Country Status (1)
Country | Link |
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JP (1) | JP6075611B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102011248B1 (ko) * | 2016-09-12 | 2019-08-14 | 가부시키가이샤 아루박 | 투명 도전막 포함 기판의 제조 방법, 투명 도전막 포함 기판의 제조 장치, 및 투명 도전막 포함 기판 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3909888B2 (ja) * | 1996-04-17 | 2007-04-25 | キヤノンアネルバ株式会社 | トレイ搬送式インライン成膜装置 |
JPH10302648A (ja) * | 1997-04-30 | 1998-11-13 | Asahi Glass Co Ltd | プラズマディスプレイ用ガラス基板 |
DE10237311A1 (de) * | 2001-08-14 | 2003-05-22 | Samsung Corning Co | Vorrichtung und Verfahren zum Aufbringen von Dünnschichten auf einen Glasträger |
US20120064665A1 (en) * | 2010-09-13 | 2012-03-15 | Semiconductor Energy Laboratory Co., Ltd. | Deposition apparatus, apparatus for successive deposition, and method for manufacturing semiconductor device |
US20120024695A1 (en) * | 2011-03-14 | 2012-02-02 | Primestar Solar, Inc. | Systems and methods for high-rate deposition of thin film layers on photovoltaic module substrates |
-
2012
- 2012-10-16 JP JP2012229250A patent/JP6075611B2/ja active Active
Also Published As
Publication number | Publication date |
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JP2014080655A (ja) | 2014-05-08 |
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