JP6047885B2 - 着色感光性樹脂組成物 - Google Patents
着色感光性樹脂組成物 Download PDFInfo
- Publication number
- JP6047885B2 JP6047885B2 JP2012021776A JP2012021776A JP6047885B2 JP 6047885 B2 JP6047885 B2 JP 6047885B2 JP 2012021776 A JP2012021776 A JP 2012021776A JP 2012021776 A JP2012021776 A JP 2012021776A JP 6047885 B2 JP6047885 B2 JP 6047885B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- copolymer
- formula
- resin composition
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 0 C=C1C(OC2C(C3)C(CC4OC44)C4C3C2)=*1 Chemical compound C=C1C(OC2C(C3)C(CC4OC44)C4C3C2)=*1 0.000 description 2
- GNCBXIMFAMITHI-UHFFFAOYSA-N C=C(CO)C(OC1C(C2)C(CC3OC33)C3C2C1)=O Chemical compound C=C(CO)C(OC1C(C2)C(CC3OC33)C3C2C1)=O GNCBXIMFAMITHI-UHFFFAOYSA-N 0.000 description 1
- DQPOFJIJXXEKNC-UHFFFAOYSA-N C[O](C1=C)=C1OC1C(C2)C(CC3OC33)C3C2C1 Chemical compound C[O](C1=C)=C1OC1C(C2)C(CC3OC33)C3C2C1 DQPOFJIJXXEKNC-UHFFFAOYSA-N 0.000 description 1
- XHPJGNHTZSLIBY-UHFFFAOYSA-N C[O](C1=C)=C1OCC(C1)C2C(CC3OC33)C3C1C2 Chemical compound C[O](C1=C)=C1OCC(C1)C2C(CC3OC33)C3C1C2 XHPJGNHTZSLIBY-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012021776A JP6047885B2 (ja) | 2011-03-08 | 2012-02-03 | 着色感光性樹脂組成物 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011049964 | 2011-03-08 | ||
JP2011049964 | 2011-03-08 | ||
JP2012021776A JP6047885B2 (ja) | 2011-03-08 | 2012-02-03 | 着色感光性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012198508A JP2012198508A (ja) | 2012-10-18 |
JP6047885B2 true JP6047885B2 (ja) | 2016-12-21 |
Family
ID=46813466
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012021776A Active JP6047885B2 (ja) | 2011-03-08 | 2012-02-03 | 着色感光性樹脂組成物 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6047885B2 (zh) |
KR (1) | KR101929279B1 (zh) |
CN (1) | CN102681345B (zh) |
TW (1) | TWI566045B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102914943B (zh) * | 2011-08-04 | 2018-01-12 | 住友化学株式会社 | 着色固化性树脂组合物 |
JP5776717B2 (ja) * | 2013-03-18 | 2015-09-09 | コニカミノルタ株式会社 | 静電荷像現像用トナー、その製造方法、及び画像形成方法 |
JP6601037B2 (ja) * | 2014-07-29 | 2019-11-06 | 住友化学株式会社 | 着色硬化性樹脂組成物 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2460491A1 (de) * | 1974-12-20 | 1976-07-01 | Hoechst Ag | Verfahren zur herstellung von xanthenfarbstoffen |
JPH10148711A (ja) * | 1996-11-20 | 1998-06-02 | Toyo Ink Mfg Co Ltd | カラーフィルタ用着色組成物およびカラーフィルタ |
JP2002122987A (ja) * | 2000-10-16 | 2002-04-26 | Kansai Paint Co Ltd | ネガ型感光性樹脂組成物、ネガ型感光性ドライフィルム、その組成物を使用して得られる材料及びパターン形成方法 |
TW508985B (en) * | 2000-12-19 | 2002-11-01 | Kolon Inc | Method of using dry film photoresist to manufacture print circuit board |
JP4098550B2 (ja) * | 2002-04-15 | 2008-06-11 | 富士フイルム株式会社 | 感光性樹脂組成物及び感光転写シート |
JP2007156011A (ja) * | 2005-12-02 | 2007-06-21 | Fujifilm Corp | フォトスペーサ用感光性樹脂組成物、スペーサ付き基板及びその製造方法並びに液晶表示装置 |
JP2008024915A (ja) * | 2006-06-23 | 2008-02-07 | Jsr Corp | スペーサー用感放射線性樹脂組成物ならびにスペーサーおよびその形成方法 |
JP2008122924A (ja) * | 2006-10-17 | 2008-05-29 | Jsr Corp | スペーサー形成用感放射線性樹脂組成物、スペーサーおよびその形成方法 |
JP5205940B2 (ja) * | 2006-12-22 | 2013-06-05 | 住友化学株式会社 | 感光性樹脂組成物 |
JP4748322B2 (ja) * | 2007-03-01 | 2011-08-17 | Jsr株式会社 | 感放射線性樹脂組成物およびスペーサーの形成方法 |
JP5137611B2 (ja) * | 2007-03-28 | 2013-02-06 | 富士フイルム株式会社 | 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子 |
JP2009080194A (ja) * | 2007-09-25 | 2009-04-16 | Fujifilm Corp | 重合性樹脂組成物、転写材料、カラーフィルタ及びその製造方法、液晶表示装置用スペーサ及びその製造方法、並びに液晶表示装置 |
JP2010015025A (ja) * | 2008-07-04 | 2010-01-21 | Adeka Corp | 特定の光重合開始剤を含有する感光性組成物 |
CN101625525B (zh) | 2008-07-11 | 2013-06-12 | 住友化学株式会社 | 感光性树脂组合物 |
TWI466964B (zh) * | 2008-10-28 | 2015-01-01 | Sumitomo Chemical Co | 著色組成物之製造方法 |
TWI464189B (zh) * | 2008-11-14 | 2014-12-11 | Sumitomo Chemical Co | Hardened resin composition |
TWI475320B (zh) * | 2009-02-13 | 2015-03-01 | Sumitomo Chemical Co | 著色感光性樹脂組成物及彩色濾光片 |
JP2010224204A (ja) * | 2009-03-24 | 2010-10-07 | Sumitomo Chemical Co Ltd | 着色感光性樹脂組成物 |
JP5498724B2 (ja) * | 2009-05-15 | 2014-05-21 | 凸版印刷株式会社 | カラーフィルタ、及び液晶表示装置 |
TW201111447A (en) * | 2009-07-14 | 2011-04-01 | Sumitomo Chemical Co | Production method of pigment dispersion solution |
-
2012
- 2012-02-03 JP JP2012021776A patent/JP6047885B2/ja active Active
- 2012-02-07 TW TW101103847A patent/TWI566045B/zh active
- 2012-03-07 CN CN201210069251.6A patent/CN102681345B/zh active Active
- 2012-03-07 KR KR1020120023226A patent/KR101929279B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
TWI566045B (zh) | 2017-01-11 |
CN102681345A (zh) | 2012-09-19 |
KR101929279B1 (ko) | 2018-12-14 |
TW201243499A (en) | 2012-11-01 |
JP2012198508A (ja) | 2012-10-18 |
KR20120102531A (ko) | 2012-09-18 |
CN102681345B (zh) | 2016-12-14 |
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