JP6047885B2 - 着色感光性樹脂組成物 - Google Patents

着色感光性樹脂組成物 Download PDF

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Publication number
JP6047885B2
JP6047885B2 JP2012021776A JP2012021776A JP6047885B2 JP 6047885 B2 JP6047885 B2 JP 6047885B2 JP 2012021776 A JP2012021776 A JP 2012021776A JP 2012021776 A JP2012021776 A JP 2012021776A JP 6047885 B2 JP6047885 B2 JP 6047885B2
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Japan
Prior art keywords
group
copolymer
formula
resin composition
photosensitive resin
Prior art date
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Active
Application number
JP2012021776A
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English (en)
Japanese (ja)
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JP2012198508A (ja
Inventor
公之 城内
公之 城内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2012021776A priority Critical patent/JP6047885B2/ja
Publication of JP2012198508A publication Critical patent/JP2012198508A/ja
Application granted granted Critical
Publication of JP6047885B2 publication Critical patent/JP6047885B2/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2012021776A 2011-03-08 2012-02-03 着色感光性樹脂組成物 Active JP6047885B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012021776A JP6047885B2 (ja) 2011-03-08 2012-02-03 着色感光性樹脂組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011049964 2011-03-08
JP2011049964 2011-03-08
JP2012021776A JP6047885B2 (ja) 2011-03-08 2012-02-03 着色感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JP2012198508A JP2012198508A (ja) 2012-10-18
JP6047885B2 true JP6047885B2 (ja) 2016-12-21

Family

ID=46813466

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012021776A Active JP6047885B2 (ja) 2011-03-08 2012-02-03 着色感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP6047885B2 (ko)
KR (1) KR101929279B1 (ko)
CN (1) CN102681345B (ko)
TW (1) TWI566045B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102914943B (zh) * 2011-08-04 2018-01-12 住友化学株式会社 着色固化性树脂组合物
JP5776717B2 (ja) * 2013-03-18 2015-09-09 コニカミノルタ株式会社 静電荷像現像用トナー、その製造方法、及び画像形成方法
JP6601037B2 (ja) * 2014-07-29 2019-11-06 住友化学株式会社 着色硬化性樹脂組成物

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2460491A1 (de) * 1974-12-20 1976-07-01 Hoechst Ag Verfahren zur herstellung von xanthenfarbstoffen
JPH10148711A (ja) * 1996-11-20 1998-06-02 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ
JP2002122987A (ja) * 2000-10-16 2002-04-26 Kansai Paint Co Ltd ネガ型感光性樹脂組成物、ネガ型感光性ドライフィルム、その組成物を使用して得られる材料及びパターン形成方法
TW508985B (en) * 2000-12-19 2002-11-01 Kolon Inc Method of using dry film photoresist to manufacture print circuit board
JP4098550B2 (ja) * 2002-04-15 2008-06-11 富士フイルム株式会社 感光性樹脂組成物及び感光転写シート
JP2007156011A (ja) * 2005-12-02 2007-06-21 Fujifilm Corp フォトスペーサ用感光性樹脂組成物、スペーサ付き基板及びその製造方法並びに液晶表示装置
JP2008024915A (ja) * 2006-06-23 2008-02-07 Jsr Corp スペーサー用感放射線性樹脂組成物ならびにスペーサーおよびその形成方法
JP2008122924A (ja) * 2006-10-17 2008-05-29 Jsr Corp スペーサー形成用感放射線性樹脂組成物、スペーサーおよびその形成方法
JP5205940B2 (ja) * 2006-12-22 2013-06-05 住友化学株式会社 感光性樹脂組成物
JP4748322B2 (ja) * 2007-03-01 2011-08-17 Ｊｓｒ株式会社 感放射線性樹脂組成物およびスペーサーの形成方法
JP5137611B2 (ja) * 2007-03-28 2013-02-06 富士フイルム株式会社 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子
JP2009080194A (ja) * 2007-09-25 2009-04-16 Fujifilm Corp 重合性樹脂組成物、転写材料、カラーフィルタ及びその製造方法、液晶表示装置用スペーサ及びその製造方法、並びに液晶表示装置
JP2010015025A (ja) * 2008-07-04 2010-01-21 Adeka Corp 特定の光重合開始剤を含有する感光性組成物
CN101625525B (zh) 2008-07-11 2013-06-12 住友化学株式会社 感光性树脂组合物
TWI466964B (zh) * 2008-10-28 2015-01-01 Sumitomo Chemical Co 著色組成物之製造方法
TWI464189B (zh) * 2008-11-14 2014-12-11 Sumitomo Chemical Co Hardened resin composition
TWI475320B (zh) * 2009-02-13 2015-03-01 Sumitomo Chemical Co 著色感光性樹脂組成物及彩色濾光片
JP2010224204A (ja) * 2009-03-24 2010-10-07 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP5498724B2 (ja) * 2009-05-15 2014-05-21 凸版印刷株式会社 カラーフィルタ、及び液晶表示装置
TW201111447A (en) * 2009-07-14 2011-04-01 Sumitomo Chemical Co Production method of pigment dispersion solution

Also Published As

Publication number Publication date
KR20120102531A (ko) 2012-09-18
JP2012198508A (ja) 2012-10-18
TW201243499A (en) 2012-11-01
CN102681345B (zh) 2016-12-14
TWI566045B (zh) 2017-01-11
KR101929279B1 (ko) 2018-12-14
CN102681345A (zh) 2012-09-19

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