JP6032271B2 - 透明電極の製造方法および有機電子素子の製造方法 - Google Patents

透明電極の製造方法および有機電子素子の製造方法 Download PDF

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Publication number
JP6032271B2
JP6032271B2 JP2014500171A JP2014500171A JP6032271B2 JP 6032271 B2 JP6032271 B2 JP 6032271B2 JP 2014500171 A JP2014500171 A JP 2014500171A JP 2014500171 A JP2014500171 A JP 2014500171A JP 6032271 B2 JP6032271 B2 JP 6032271B2
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Japan
Prior art keywords
group
transparent electrode
firing
layer
light
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Expired - Fee Related
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JP2014500171A
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English (en)
Japanese (ja)
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JPWO2013121912A1 (ja
Inventor
松村　智之
智之 松村
昌紀 後藤
昌紀 後藤
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Konica Minolta Inc
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Konica Minolta Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
    • H05B33/28—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode of translucent electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/81—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Non-Insulated Conductors (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2014500171A 2012-02-15 2013-02-04 透明電極の製造方法および有機電子素子の製造方法 Expired - Fee Related JP6032271B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012030354 2012-02-15
JP2012030354 2012-02-15
PCT/JP2013/052482 WO2013121912A1 (fr) 2012-02-15 2013-02-04 Procédé pour fabriquer une électrode transparente, électrode transparente et élément électronique organique

Publications (2)

Publication Number Publication Date
JPWO2013121912A1 JPWO2013121912A1 (ja) 2015-05-11
JP6032271B2 true JP6032271B2 (ja) 2016-11-24

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JP2014500171A Expired - Fee Related JP6032271B2 (ja) 2012-02-15 2013-02-04 透明電極の製造方法および有機電子素子の製造方法

Country Status (2)

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JP (1) JP6032271B2 (fr)
WO (1) WO2013121912A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015050081A1 (fr) * 2013-10-01 2015-04-09 コニカミノルタ株式会社 Substrat conducteur, procédé permettant de produire ce dernier et dispositif électronique organique comprenant ledit substrat conducteur
KR101627422B1 (ko) * 2014-09-30 2016-06-03 한양대학교 산학협력단 복합광원을 이용한 금속 나노와이어와 그래핀 옥사이드 기반의 투명전극 및 이의 제조방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3179879B2 (ja) * 1992-08-21 2001-06-25 積水化成品工業株式会社 正特性サーミスタ
JP2005072205A (ja) * 2003-08-22 2005-03-17 Seiko Epson Corp 熱処理方法、配線パターンの形成方法、電気光学装置の製造方法、電気光学装置及び電子機器
JP2005079010A (ja) * 2003-09-02 2005-03-24 Seiko Epson Corp 導電膜パターンの形成方法、電気光学装置及び電子機器
US8404160B2 (en) * 2007-05-18 2013-03-26 Applied Nanotech Holdings, Inc. Metallic ink
US10231344B2 (en) * 2007-05-18 2019-03-12 Applied Nanotech Holdings, Inc. Metallic ink
US8506849B2 (en) * 2008-03-05 2013-08-13 Applied Nanotech Holdings, Inc. Additives and modifiers for solvent- and water-based metallic conductive inks
US9730333B2 (en) * 2008-05-15 2017-08-08 Applied Nanotech Holdings, Inc. Photo-curing process for metallic inks
US20100000762A1 (en) * 2008-07-02 2010-01-07 Applied Nanotech Holdings, Inc. Metallic pastes and inks
JP2012022959A (ja) * 2010-07-16 2012-02-02 Konica Minolta Holdings Inc 透明電極の製造方法

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Publication number Publication date
WO2013121912A1 (fr) 2013-08-22
JPWO2013121912A1 (ja) 2015-05-11

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