JP6031650B2 - 表示装置およびその製造方法、並びに電子機器 - Google Patents
表示装置およびその製造方法、並びに電子機器 Download PDFInfo
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- JP6031650B2 JP6031650B2 JP2013073053A JP2013073053A JP6031650B2 JP 6031650 B2 JP6031650 B2 JP 6031650B2 JP 2013073053 A JP2013073053 A JP 2013073053A JP 2013073053 A JP2013073053 A JP 2013073053A JP 6031650 B2 JP6031650 B2 JP 6031650B2
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- insulating layer
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Images
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- Electroluminescent Light Sources (AREA)
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Thin Film Transistor (AREA)
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| CN201410108560.9A CN104078487B (zh) | 2013-03-29 | 2014-03-21 | 显示单元、该显示单元的制造方法和电子装置 |
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| KR20180010370A (ko) * | 2016-07-20 | 2018-01-31 | 삼성디스플레이 주식회사 | 디스플레이 장치 |
| WO2018055902A1 (ja) * | 2016-09-21 | 2018-03-29 | ソニーセミコンダクタソリューションズ株式会社 | 表示装置及び電子機器 |
| US11889728B2 (en) * | 2018-08-28 | 2024-01-30 | Sharp Kabushiki Kaisha | Display device |
| CN109524576B (zh) * | 2018-12-13 | 2020-12-29 | 合肥鑫晟光电科技有限公司 | 一种oled显示基板及其制备方法、显示装置 |
| KR20200076148A (ko) * | 2018-12-19 | 2020-06-29 | 엘지디스플레이 주식회사 | 베젤이 감소된 표시장치 및 그 제조방법 |
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| JPH11109413A (ja) * | 1997-10-01 | 1999-04-23 | Sanyo Electric Co Ltd | 液晶表示装置の製造方法 |
| JP3406222B2 (ja) * | 1998-03-27 | 2003-05-12 | シャープ株式会社 | アクティブマトリクス基板の製造方法 |
| JP2004342457A (ja) * | 2003-05-15 | 2004-12-02 | Sanyo Electric Co Ltd | 表示パネルの製造方法および表示パネル |
| JP2007279616A (ja) * | 2006-04-12 | 2007-10-25 | Sony Corp | 駆動基板の製造方法および駆動基板 |
| KR101346246B1 (ko) * | 2006-08-24 | 2013-12-31 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시장치 제작방법 |
| JP5605097B2 (ja) * | 2010-09-03 | 2014-10-15 | ソニー株式会社 | 電子素子の製造方法 |
| KR101746617B1 (ko) * | 2010-09-24 | 2017-06-28 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
| KR101910113B1 (ko) * | 2012-03-16 | 2018-10-22 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
| KR101976066B1 (ko) * | 2012-06-08 | 2019-08-29 | 삼성디스플레이 주식회사 | 쇼트 불량 리페어 방법, 상기 리페어 방법에 의해 제조된 표시 장치 및 유기 발광 표시 장치 |
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