JP5999747B2 - 低温プラズマと触媒フィルターを用いるガス浄化方法及びその浄化装置 - Google Patents
低温プラズマと触媒フィルターを用いるガス浄化方法及びその浄化装置 Download PDFInfo
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- JP5999747B2 JP5999747B2 JP2010206073A JP2010206073A JP5999747B2 JP 5999747 B2 JP5999747 B2 JP 5999747B2 JP 2010206073 A JP2010206073 A JP 2010206073A JP 2010206073 A JP2010206073 A JP 2010206073A JP 5999747 B2 JP5999747 B2 JP 5999747B2
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Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Catalysts (AREA)
- Treating Waste Gases (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
Description
(実施例1)
無機微粒子1−bとして、市販の比表面積143m2/gの酸化セリウム微粒子(信越化学工業株式会社製、CeO2(BB))を用いた。この酸化セリウム微粒子に溶媒としてメタノールと、シランモノマーとして3−メタクリロキシプロピルトリメトキシシラン(信越化学工業株式会社製、KBM−503)を酸化セリウム微粒子に対して3.0質量%加えて、塩酸を用いてpHを3.0に調整した。調整後ビーズミルにより溶液中の酸化セリウム微粒子を粉砕分散した。その後、凍結乾燥機により固液分離して120℃で加熱し、シランモノマーを酸化セリウム微粒子の表面に脱水縮合反応により化学結合させて、酸化セリウム微粒子に対するシランモノマーによる被覆を形成した。得られた表面処理された酸化セリウム微粒子を、メタノールを溶媒として、ビーズミルにより平均粒子径45nmに再度粉砕分散しナノ粒子化した酸化セリウム微粒子の分散溶液を得た。
無機微粒子1−bとして、市販のジルコニア微粒子(日本電工株式会社製、PCS)をメタノールに10.0質量%分散して、塩酸でpHを4.0に調整した後、ビーズミルにより平均粒子径20nmに粉砕分散した。得られた分散溶液にシランモノマーとして不飽和結合を有する3−メタクリロキシプロピルトリメトキシシラン(信越化学工業株式会社製、KBM-503)を微粒子に対して5.0質量%加えた後、この粉砕分散溶液を、冷却管を備えたフラスコに移してフラスコをオイルバスで加熱し、4時間還流下で処理することによりジルコニア微粒子表面にシランモノマーを脱水縮合反応により化学結合させて被覆を形成した。
実施例1で得られた、シランモノマーで被覆された酸化セリウム微粒子の分散液に、基体10としてのポリフェニレンサルファイドからなるマルチフィラメント(株式会社KBセーレン製、グラディオ)で織られたフィルター(繊維構造体)を浸漬し、余剰分の分散液を除去後、120℃で、3分間乾燥した。次に、酸化セリウム微粒子を塗布した前記フィルターに電子線を200kVの加速電圧で5Mrad照射することで、酸化セリウム微粒子をシランモノマーのグラフト重合により前記フィルターに結合させた前駆体を得た。
反応性ホットメルト接着剤(ヘンケルジャパン株式会社製、ボンドマスター170-7310)をノズル径が2mmのホットメルトアプリケーターにて、吐出量80g/分で糸状に吐出して不織布状態とし、粘着性を有す間に、実施例1で用いた市販の比表面積143m2/gの酸化セリウム微粒子(信越化学工業株式会社製、CeO2(BB))を振りかけ、余剰分の触媒微粒子を除去した後、大気中で48時間放置して大気中の水分により反応性ホットメルトからなる不織布を反応硬化させ、酸化セリウム触媒微粒子を担持した不織布状のフィルターを得た。
無機微粒子として比表面積が130m2/gのγ−アルミナ(岩谷化学工業株式会社製、RK-30)4.41gを0.1mol/L濃度のCe(NO3)3水溶液32mL、0.1mol/L濃度のZrO(NO3)2水溶液8mL、および0.1mol/L濃度のBi(NO3)3水溶液10mLの混合液(溶媒)に分散し、80℃で6時間ホモジナイザーで分散した。溶媒と粉末を分離し、粉末を減圧乾燥後大気中、500℃で1時間焼成した。この試料1.46gと市販のポリビニルピロリドン保護白金コロイド溶液(田中貴金属工業株式会社製、Pt−PVPコロイドエタノール溶液、Pt、4.0質量%)0.93gおよび超純水20gを混合し、室温で6時間攪拌した。溶媒と粉末を分離し、粉末を減圧乾燥後、500℃、4時間焼成することで、γ―アルミナに、セリウム・ジルコニウム・ビスマス複合酸化物と白金ナノ粒子が担持された触媒微粒子を調製した。
無機微粒子として平均粒子径が0.3μmのα−アルミナ(住友化学株式会社製、AKP−30)を10gに対してPtの仕込み量が5wt%に相当する[Pt(C5H7O2)2]を測りとり、α−アルミナ10gと乳鉢で混合した。混合後、450℃で4時間焼成し、その後、水素ガス10%、窒素ガス90%の還元処理ガス中で450℃、4時間還元処理することで、α−アルミナに白金ナノ粒子が担持された触媒微粒子を調製した。
本発明の実施形態である浄化装置400の一例として図7で示す反応装置700を用いた。図7において、Aに反応装置700の断面図を、Bに反応装置700を上から見たときの断面図を示す。図7に示すように、反応装置700は、放電電極4と、アース電極5を備える。放電電極4は、純水を充填した円柱状のガラス管に高電圧電極を設けた内部電極である、アース電極5は、外壁に塗布された銀ペーストと銅テープにより電極を形成した外部電極である。アース電極5は、放電電極4の外側に、放電空間9を介して配置される。この放電電極4とアース電極5の間の放電空間9に、10cm×10cmの実施例1から実施例5の触媒固定化フィルター100 or 200を挿入する。なお、放電空間9は上述の実施形態における低温プラズマ反応層6である。
C2H4除去率(%)={(初期C2H4濃度 − 反応後C2H4濃度)/初期C2H4濃度}×100
CO生成率(%)=[(反応後CO濃度)/{(初期C2H4濃度)×2}]×100
CO2生成率(%)=[(反応後CO2濃度)/{(初期C2H4濃度)×2}]×100
副生成物生成率(%)=C2H4除去率(%)−CO生成率(%)−CO2生成率(%)
実施例2のフィルターを上記浄化装置700に入れ、プラズマを印加せずに、エチレン分解試験を実施した。
実施例6のフィルターを上記浄化装置700に入れ、プラズマを印加せずに、エチレン分解試験を実施した。
上記浄化装置700にフィルターを入れず、プラズマを印加させ、エチレン分解試験を実施した。
1−a 貴金属ナノ粒子
1−b 無機微粒子
2 シランモノマー
3 化学結合
10 基体
4 放電電極
5 アース電極
6 プラズマ反応層
7 高圧電源
8 誘電体
9 放電空間
Claims (8)
- 金、白金、またはその混合物である貴金属ナノ粒子がその表面に担持される、無機微粒子である触媒微粒子が担持された、シートまたは繊維構造体からなるフィルターが装填され、電圧の印加によりプラズマを発生する低温プラズマ反応層内に、有害である揮発性有機ガスを含む空気を通過させて、前記揮発性有機ガスを分解することを特徴とするガスの浄化方法。
- 前記フィルターは、
シートまたは繊維構造体からなる基体と、表面の少なくとも一部にシランモノマーの片末端のシラノール基が脱水縮合反応して共有結合した前記触媒微粒子と、を備え、
前記触媒微粒子は、前記シランモノマーの逆末端の不飽和結合部または反応性官能基と前記基体表面との化学結合を介して前記基体の表面に固定され、前記不飽和結合部または反応性官能基同士の化学結合により互いに結合してなることを特徴とする請求項1に記載のガスの浄化方法。 - 前記フィルターは、
シートまたは繊維構造体からなる基体と、前記触媒微粒子と、を備え、
前記触媒微粒子が、熱可塑性接着剤、ホットメルト接着剤、粒子線架橋接着剤の一種以上により前記基体に固定されていることを特徴とする請求項1に記載のガスの浄化方法。 - 電圧が印加されて放電することにより低温プラズマを発生させる低温プラズマ反応層と、
前記低温プラズマ反応層内に装填される、金、白金、またはその混合物である貴金属ナノ粒子がその表面に担持される、無機微粒子である触媒微粒子が担持された、シートまたは繊維構造体からなるフィルターと、を備えることを特徴とするガスの浄化装置。 - 前記フィルターは、
シートまたは繊維構造体からなる基体と、表面の少なくとも一部にシランモノマーの片末端のシラノール基が脱水縮合反応して共有結合した前記触媒微粒子と、を備え、
前記触媒微粒子は、前記シランモノマーの逆末端の不飽和結合部または反応性官能基と前記基体表面との化学結合を介して前記基体の表面に固定され、前記不飽和結合部または反応性官能基同士の化学結合により互いに結合してなることを特徴とする請求項4に記載のガスの浄化装置。 - 前記フィルターは、
シートまたは繊維構造体からなる基体と、前記触媒微粒子と、を備え、
前記触媒微粒子が、熱可塑性接着剤、ホットメルト接着剤、粒子線架橋接着剤の一種以上により前記基体に固定されていることを特徴とする請求項4に記載のガスの浄化装置。 - 前記低温プラズマ反応層は、放電のための電極と、前記フィルターとが交互に積層された、多層構造であることを特徴とする請求項4から6のいずれか1つに記載のガスの浄化装置。
- 前記放電が、無声放電、沿面放電、DCコロナ放電、DCバイアスにACあるいはパルスを重畳させた電源を用いた放電、パルス放電の少なくとも一種以上からなることを特徴とする請求項4から7のいずれかに記載のガスの浄化装置。
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