JP5948746B2 - 検出装置 - Google Patents
検出装置 Download PDFInfo
- Publication number
- JP5948746B2 JP5948746B2 JP2011151897A JP2011151897A JP5948746B2 JP 5948746 B2 JP5948746 B2 JP 5948746B2 JP 2011151897 A JP2011151897 A JP 2011151897A JP 2011151897 A JP2011151897 A JP 2011151897A JP 5948746 B2 JP5948746 B2 JP 5948746B2
- Authority
- JP
- Japan
- Prior art keywords
- detection
- sensor chamber
- light
- target substance
- detected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001514 detection method Methods 0.000 title claims description 104
- 239000000126 substance Substances 0.000 claims description 80
- 239000012530 fluid Substances 0.000 claims description 39
- 239000002184 metal Substances 0.000 claims description 31
- 229910052751 metal Inorganic materials 0.000 claims description 31
- 238000004445 quantitative analysis Methods 0.000 claims description 30
- 238000003795 desorption Methods 0.000 claims description 23
- 239000002086 nanomaterial Substances 0.000 claims description 23
- 239000013076 target substance Substances 0.000 claims description 20
- 238000009792 diffusion process Methods 0.000 claims description 13
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 description 18
- 238000001069 Raman spectroscopy Methods 0.000 description 15
- KZMAWJRXKGLWGS-UHFFFAOYSA-N 2-chloro-n-[4-(4-methoxyphenyl)-1,3-thiazol-2-yl]-n-(3-methoxypropyl)acetamide Chemical compound S1C(N(C(=O)CCl)CCCOC)=NC(C=2C=CC(OC)=CC=2)=C1 KZMAWJRXKGLWGS-UHFFFAOYSA-N 0.000 description 14
- 230000005684 electric field Effects 0.000 description 10
- 238000001179 sorption measurement Methods 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 description 10
- 239000002082 metal nanoparticle Substances 0.000 description 8
- 238000004364 calculation method Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000004566 IR spectroscopy Methods 0.000 description 2
- 238000001237 Raman spectrum Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- 238000003841 Raman measurement Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003905 indoor air pollution Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 208000008842 sick building syndrome Diseases 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011151897A JP5948746B2 (ja) | 2011-07-08 | 2011-07-08 | 検出装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011151897A JP5948746B2 (ja) | 2011-07-08 | 2011-07-08 | 検出装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013019720A JP2013019720A (ja) | 2013-01-31 |
| JP2013019720A5 JP2013019720A5 (enExample) | 2014-08-14 |
| JP5948746B2 true JP5948746B2 (ja) | 2016-07-06 |
Family
ID=47691307
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011151897A Expired - Fee Related JP5948746B2 (ja) | 2011-07-08 | 2011-07-08 | 検出装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5948746B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017138340A (ja) * | 2017-05-22 | 2017-08-10 | セイコーエプソン株式会社 | 検出装置 |
| KR102469917B1 (ko) * | 2021-05-24 | 2022-11-23 | 한국과학기술원 | 입자 측정장치 및 입자 측정방법 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3482128B2 (ja) * | 1998-06-30 | 2003-12-22 | 三菱電機株式会社 | 異常検出装置 |
| US7361313B2 (en) * | 2003-02-18 | 2008-04-22 | Intel Corporation | Methods for uniform metal impregnation into a nanoporous material |
| US20050266582A1 (en) * | 2002-12-16 | 2005-12-01 | Modlin Douglas N | Microfluidic system with integrated permeable membrane |
| JP4926780B2 (ja) * | 2007-03-27 | 2012-05-09 | 東京瓦斯株式会社 | ガス導管内の物性変化推定方法、物性変化推定プログラム、及び物性変化推定装置 |
| JP2009109395A (ja) * | 2007-10-31 | 2009-05-21 | Fujifilm Corp | 微細構造体の作製方法、微細構造体、ラマン分光用デバイス、ラマン分光装置、分析装置、検出装置、および質量分析装置 |
| US20100285612A1 (en) * | 2008-01-16 | 2010-11-11 | Yuzuru Iwasaki | Flow rate measurement apparatus, antigen concentration measurement apparatus, flow cell, flow rate measurement method, and antigen concentration measuring method |
| US8564781B2 (en) * | 2008-09-01 | 2013-10-22 | Hitachi Chemical Company, Ltd. | SPR sensor |
-
2011
- 2011-07-08 JP JP2011151897A patent/JP5948746B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013019720A (ja) | 2013-01-31 |
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