JP5935202B2 - 静電チャック装置及びその製造方法 - Google Patents
静電チャック装置及びその製造方法 Download PDFInfo
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- JP5935202B2 JP5935202B2 JP2011119498A JP2011119498A JP5935202B2 JP 5935202 B2 JP5935202 B2 JP 5935202B2 JP 2011119498 A JP2011119498 A JP 2011119498A JP 2011119498 A JP2011119498 A JP 2011119498A JP 5935202 B2 JP5935202 B2 JP 5935202B2
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
そこで、第1及び第2の接着剤層5及び6のうち、第2の接着剤層を形成しているシリコーン系接着剤TSE3221(モメンティブ社製)からの放出ガスを不活性ガス、ここでは、アルゴン(Ar)ガス雰囲気で測定した。
2 静電チャック部
3 温度調整用ベース部
4 温度調整用基材
5 低温対応有機系接着剤層
6 接着剤層
11 載置板
11a 載置面
12 支持板
13 静電吸着用内部電極
14 絶縁材層
15 給電用端子
16 突起部
17 碍子
21 流路
22 凹部
31 凹部
32 溝
41 静電チャック装置
42 温度調整用基材
43 流路
W 板状試料
50 接着剤サンプル
52 反応管
54 MFC
V1,V2,V3 バルブ
P1 ポンプ
Claims (10)
- 試料を載置する載置面を有するとともに静電吸着用内部電極を内蔵した静電チャック部と、該静電チャック部の前記載置面とは反対側に設けられ、冷却媒体を流動させる流路を有する温度調整用ベース部と、当該温度調整用ベース部に接着された温度調整用基材と、前記静電チャック部と前記温度調整用基材との間に設けられ、−270℃〜120℃の耐熱温度を有する第1の接着剤層、及び、前記温度調整用ベース部と前記温度調整用基材との間に設けられ、−100〜120℃の耐熱温度を有する第2の接着剤層とを備え、前記第1及び第2の接着剤層は、互いに異なる接着剤によって構成されると共に、前記第1及び第2の接着剤層から質量数200以上のガス放出が無いことを特徴とする静電チャック装置。
- 前記第1及び前記第2の接着剤層のうち、前記第2の接着剤層は、シリコーン系接着剤によって形成されており、質量数15、90、121、及び163のガスのうち、少なくとも、質量数15及び163のガスの放出がないことを特徴する請求項1記載の静電チャック装置。
- 前記第1の接着剤層は、エポキシ系接着剤によって形成されていることを特徴とする請求項1または2記載の静電チャック装置。
- 試料を載置する載置面を有し、静電吸着用内部電極を内蔵した静電チャック部、該静電チャック部の前記載置面とは反対側に設けられ、冷却媒体を流動させる流路を有する温度調整用ベース部、当該温度調整用ベース部に結合された温度調整用基材、及び、前記静電チャック部と前記温度調整用基材との間に設けられた第1の接着剤層、前記温度調整用ベース部と前記温度調整用基材との間に設けられ、前記第1の接着剤層とは異なる第2の接着剤層を有する静電チャックの製造方法であって、120℃〜140℃の温度で2時間以上加熱することによって、前記第1及び第2の接着剤層の少なくとも一方から質量数200以上のガスが放出されなくなるまで不活性雰囲気で前記第1及び第2の接着剤層を乾燥処理することを特徴とする静電チャック装置の製造方法。
- 前記第1の接着剤層は、エポキシ系接着剤によって形成され、前記第2の接着剤層はシリコーン系接着剤によって形成されていることを特徴とする請求項4記載の静電チャック装置の製造方法。
- 前記第2の接着剤層の前記加熱処理は、大気圧雰囲気で120℃〜140℃の温度範囲で少なくとも2時間行われることを特徴とする請求項4又は5記載の静電チャック装置の製造方法。
- 前記第2の接着剤層の前記加熱処理はアルゴンを流した状態で行われることを特徴とする請求項6記載の静電チャック装置の製造方法。
- 前記第2の接着剤層の前記加熱処理は、2時間〜8.5時間行われることを特徴とする請求項6又は7記載の静電チャック装置の製造方法。
- 前記第2の接着剤層の前記加熱処理は、減圧下で120℃〜140℃の温度範囲で行われることを特徴とする請求項5又は6記載の静電チャック装置の製造方法。
- 前記第2の接着剤層の前記加熱処理は、8時間行われることを特徴とする請求項9記載の静電チャック装置の製造方法。
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JP5935202B2 true JP5935202B2 (ja) | 2016-06-15 |
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Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US10079167B2 (en) | 2014-11-20 | 2018-09-18 | Sumitomo Osaka Cement Co., Ltd. | Electrostatic chucking device |
JP2017219401A (ja) * | 2016-06-07 | 2017-12-14 | アズビル株式会社 | 熱式流量センサの製造方法 |
JP7221737B2 (ja) | 2019-03-04 | 2023-02-14 | 日本碍子株式会社 | ウエハ載置装置 |
TWI725792B (zh) * | 2019-03-28 | 2021-04-21 | 日商Toto股份有限公司 | 靜電吸盤 |
JP2023103728A (ja) * | 2022-01-14 | 2023-07-27 | 日本特殊陶業株式会社 | 保持装置 |
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JP2008042137A (ja) * | 2006-08-10 | 2008-02-21 | Tokyo Electron Ltd | 静電チャック装置 |
KR101658758B1 (ko) * | 2009-02-20 | 2016-09-21 | 엔지케이 인슐레이터 엘티디 | 세라믹스-금속 접합체 및 그 제조 방법 |
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