JP5935163B2 - レジスト密着性向上剤及び銅配線製造方法 - Google Patents

レジスト密着性向上剤及び銅配線製造方法 Download PDF

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Publication number
JP5935163B2
JP5935163B2 JP2012079466A JP2012079466A JP5935163B2 JP 5935163 B2 JP5935163 B2 JP 5935163B2 JP 2012079466 A JP2012079466 A JP 2012079466A JP 2012079466 A JP2012079466 A JP 2012079466A JP 5935163 B2 JP5935163 B2 JP 5935163B2
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JP
Japan
Prior art keywords
resist
acid
copper
adhesion improver
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012079466A
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English (en)
Japanese (ja)
Other versions
JP2013211346A (ja
Inventor
了 吉崎
了 吉崎
瑞樹 武井
瑞樹 武井
秀国 安江
秀国 安江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nagase Chemtex Corp
Original Assignee
Nagase Chemtex Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nagase Chemtex Corp filed Critical Nagase Chemtex Corp
Priority to JP2012079466A priority Critical patent/JP5935163B2/ja
Priority to PCT/JP2013/055339 priority patent/WO2013146060A1/ja
Priority to CN201380014226.0A priority patent/CN104246017A/zh
Priority to KR1020147028201A priority patent/KR20140143780A/ko
Priority to TW102107590A priority patent/TW201348887A/zh
Publication of JP2013211346A publication Critical patent/JP2013211346A/ja
Application granted granted Critical
Publication of JP5935163B2 publication Critical patent/JP5935163B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
    • C23C22/48—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates
    • C23C22/52—Treatment of copper or alloys based thereon
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0392—Pretreatment of metal, e.g. before finish plating, etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0789—Aqueous acid solution, e.g. for cleaning or etching

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • ing And Chemical Polishing (AREA)
  • Materials For Photolithography (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP2012079466A 2012-03-30 2012-03-30 レジスト密着性向上剤及び銅配線製造方法 Expired - Fee Related JP5935163B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012079466A JP5935163B2 (ja) 2012-03-30 2012-03-30 レジスト密着性向上剤及び銅配線製造方法
PCT/JP2013/055339 WO2013146060A1 (ja) 2012-03-30 2013-02-28 レジスト密着性向上剤及び銅配線製造方法
CN201380014226.0A CN104246017A (zh) 2012-03-30 2013-02-28 抗蚀剂密合性提高剂和铜配线制造方法
KR1020147028201A KR20140143780A (ko) 2012-03-30 2013-02-28 레지스트 밀착성 향상제 및 구리 배선 제조 방법
TW102107590A TW201348887A (zh) 2012-03-30 2013-03-05 抗蝕劑密接性提升劑及銅配線製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012079466A JP5935163B2 (ja) 2012-03-30 2012-03-30 レジスト密着性向上剤及び銅配線製造方法

Publications (2)

Publication Number Publication Date
JP2013211346A JP2013211346A (ja) 2013-10-10
JP5935163B2 true JP5935163B2 (ja) 2016-06-15

Family

ID=49259335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012079466A Expired - Fee Related JP5935163B2 (ja) 2012-03-30 2012-03-30 レジスト密着性向上剤及び銅配線製造方法

Country Status (5)

Country Link
JP (1) JP5935163B2 (zh)
KR (1) KR20140143780A (zh)
CN (1) CN104246017A (zh)
TW (1) TW201348887A (zh)
WO (1) WO2013146060A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6338232B1 (ja) * 2017-09-22 2018-06-06 メック株式会社 銅表面の粗化方法および配線基板の製造方法
WO2020079977A1 (ja) * 2018-10-17 2020-04-23 株式会社Adeka 表面処理液及びニッケル含有材料の表面処理方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0634443B2 (ja) * 1985-01-14 1994-05-02 株式会社日立製作所 プリント配線板の製造方法
JP3387529B2 (ja) * 1992-10-06 2003-03-17 朝日化学工業株式会社 銅および銅合金の化学溶解液
GB9425090D0 (en) * 1994-12-12 1995-02-08 Alpha Metals Ltd Copper coating
JPH10209604A (ja) * 1997-01-17 1998-08-07 Hitachi Ltd プリント配線基板の製造方法並びにそれに用いる粗化液及び粗化液の調製方法
CN1299546C (zh) * 2000-10-26 2007-02-07 奥克一三井有限公司 在印刷电路板制造中利用对铜箔的金属化处理来产生细线条并替代氧化过程
EP1894230A2 (en) * 2005-06-13 2008-03-05 Advanced Technology Materials, Inc. Compositions and methods for selective removal of metal or metal alloy after metal silicide formation
CN101457360B (zh) * 2008-12-22 2010-11-10 深圳市板明科技有限公司 一种有机酸型粗化液

Also Published As

Publication number Publication date
WO2013146060A1 (ja) 2013-10-03
KR20140143780A (ko) 2014-12-17
CN104246017A (zh) 2014-12-24
TW201348887A (zh) 2013-12-01
JP2013211346A (ja) 2013-10-10

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