JP5920590B2 - 含フッ素高分岐ポリマー及びそれを含む光カチオン重合性組成物 - Google Patents

含フッ素高分岐ポリマー及びそれを含む光カチオン重合性組成物 Download PDF

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JP5920590B2
JP5920590B2 JP2012546940A JP2012546940A JP5920590B2 JP 5920590 B2 JP5920590 B2 JP 5920590B2 JP 2012546940 A JP2012546940 A JP 2012546940A JP 2012546940 A JP2012546940 A JP 2012546940A JP 5920590 B2 JP5920590 B2 JP 5920590B2
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group
monomer
fluorine
highly branched
branched polymer
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JP2012546940A
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Japanese (ja)
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JPWO2012074064A1 (ja
Inventor
朋子 三崎
朋子 三崎
将幸 原口
将幸 原口
元信 松山
元信 松山
小澤　雅昭
雅昭 小澤
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Nissan Chemical Corp
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Nissan Chemical Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2012546940A 2010-12-01 2011-12-01 含フッ素高分岐ポリマー及びそれを含む光カチオン重合性組成物 Expired - Fee Related JP5920590B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010268866 2010-12-01
JP2010268866 2010-12-01
PCT/JP2011/077824 WO2012074064A1 (ja) 2010-12-01 2011-12-01 含フッ素高分岐ポリマー及びそれを含む光カチオン重合性組成物

Publications (2)

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JPWO2012074064A1 JPWO2012074064A1 (ja) 2014-05-19
JP5920590B2 true JP5920590B2 (ja) 2016-05-18

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JP2012546940A Expired - Fee Related JP5920590B2 (ja) 2010-12-01 2011-12-01 含フッ素高分岐ポリマー及びそれを含む光カチオン重合性組成物

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JP (1) JP5920590B2 (zh)
TW (1) TWI555760B (zh)
WO (1) WO2012074064A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190087172A (ko) * 2018-01-16 2019-07-24 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물
JP7145585B2 (ja) 2014-02-28 2022-10-03 プロジェクト・フェニックス・エルエルシー ポンプ、及び流体をポンプの第１のポートから第２のポートへ移動させる方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2647673A4 (en) * 2010-12-01 2016-02-10 Nissan Chemical Ind Ltd CURABLE COMPOSITION FOR A COATING CONTAINING A HYPER-RAMIFIED POLYMER CONTAINING FLUORINE
WO2015073534A1 (en) 2013-11-13 2015-05-21 Orthogonal, Inc. Branched fluorinated photopolymers
CN106662808A (zh) 2014-02-07 2017-05-10 正交公司 可交联的氟化光聚合物
JP6754424B2 (ja) * 2016-03-30 2020-09-09 富士フイルム株式会社 保護膜形成用組成物、保護膜形成用組成物の製造方法、パターン形成方法、および、電子デバイスの製造方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1123803A (ja) * 1997-07-01 1999-01-29 Fuji Photo Film Co Ltd 反射防止膜およびそれを配置した表示装置
JP2004271807A (ja) * 2003-03-07 2004-09-30 Konica Minolta Holdings Inc 感光性組成物及び平版印刷版材料、並びに平版印刷版材料の処理方法、画像形成方法
JP2004277540A (ja) * 2003-03-14 2004-10-07 Sumitomo Chem Co Ltd 重合体、硬化性材料及び硬化被膜が形成された透明基材
JP2005343978A (ja) * 2004-06-02 2005-12-15 Nippon Kayaku Co Ltd 低屈折率樹脂組成物およびその塗膜
JP2006257190A (ja) * 2005-03-16 2006-09-28 Nippon Kayaku Co Ltd 光硬化性樹脂組成物
JP2008231173A (ja) * 2007-03-19 2008-10-02 Toray Fine Chemicals Co Ltd アクリルエマルジョン塗料組成物
JP2010237303A (ja) * 2009-03-30 2010-10-21 Fujifilm Corp ネガ型平版印刷版原版

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52138070A (en) * 1976-02-17 1977-11-17 Cosmo Co Ltd Membrane for improved electrolytic cell
JPS60248713A (ja) * 1984-05-24 1985-12-09 Central Glass Co Ltd 含フツ素共重合体の製造方法
JPH05239155A (ja) * 1992-02-28 1993-09-17 Toagosei Chem Ind Co Ltd 低粘度熱硬化性樹脂組成物
JP3108550B2 (ja) * 1992-11-11 2000-11-13 株式会社メニコン 軟質眼用レンズ材料
JPH07252325A (ja) * 1994-03-15 1995-10-03 Nitto Denko Corp 半導体装置
JP3569373B2 (ja) * 1995-02-15 2004-09-22 株式会社メニコン 含水性ソフトコンタクトレンズ
JP3641110B2 (ja) * 1997-08-20 2005-04-20 株式会社メニコン 軟質眼内レンズ用材料
KR100442865B1 (ko) * 2001-11-07 2004-08-02 삼성전자주식회사 플루오르화된 에틸렌 글리콜기를 가지는 감광성 폴리머 및이를 포함하는 화학증폭형 레지스트 조성물
CA2595818C (en) * 2004-12-30 2014-04-08 3M Innovative Properties Company Stain-resistant fluorochemical compositions
JP2009256552A (ja) * 2008-04-21 2009-11-05 Fujifilm Corp 光硬化性コーティング組成物、オーバープリント及びその製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1123803A (ja) * 1997-07-01 1999-01-29 Fuji Photo Film Co Ltd 反射防止膜およびそれを配置した表示装置
JP2004271807A (ja) * 2003-03-07 2004-09-30 Konica Minolta Holdings Inc 感光性組成物及び平版印刷版材料、並びに平版印刷版材料の処理方法、画像形成方法
JP2004277540A (ja) * 2003-03-14 2004-10-07 Sumitomo Chem Co Ltd 重合体、硬化性材料及び硬化被膜が形成された透明基材
JP2005343978A (ja) * 2004-06-02 2005-12-15 Nippon Kayaku Co Ltd 低屈折率樹脂組成物およびその塗膜
JP2006257190A (ja) * 2005-03-16 2006-09-28 Nippon Kayaku Co Ltd 光硬化性樹脂組成物
JP2008231173A (ja) * 2007-03-19 2008-10-02 Toray Fine Chemicals Co Ltd アクリルエマルジョン塗料組成物
JP2010237303A (ja) * 2009-03-30 2010-10-21 Fujifilm Corp ネガ型平版印刷版原版

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7145585B2 (ja) 2014-02-28 2022-10-03 プロジェクト・フェニックス・エルエルシー ポンプ、及び流体をポンプの第１のポートから第２のポートへ移動させる方法
KR20190087172A (ko) * 2018-01-16 2019-07-24 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물
KR102330078B1 (ko) 2018-01-16 2021-11-25 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물

Also Published As

Publication number Publication date
JPWO2012074064A1 (ja) 2014-05-19
TWI555760B (zh) 2016-11-01
WO2012074064A1 (ja) 2012-06-07
TW201235369A (en) 2012-09-01

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