JP5918858B2 - マイクロリソグラフィ投影露光装置の光変調器及び照明系 - Google Patents

マイクロリソグラフィ投影露光装置の光変調器及び照明系 Download PDF

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JP5918858B2
JP5918858B2 JP2014541542A JP2014541542A JP5918858B2 JP 5918858 B2 JP5918858 B2 JP 5918858B2 JP 2014541542 A JP2014541542 A JP 2014541542A JP 2014541542 A JP2014541542 A JP 2014541542A JP 5918858 B2 JP5918858 B2 JP 5918858B2
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mirror
light
modulator
substrate
micromirrors
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Japanese (ja)
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JP2014533441A (ja
JP2014533441A5 (https=
Inventor
ヴェルベル アルミン
ヴェルベル アルミン
ヴァルディス ゼヴェリン
ヴァルディス ゼヴェリン
バッハ フロリアン
バッハ フロリアン
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014541542A 2011-11-15 2011-11-15 マイクロリソグラフィ投影露光装置の光変調器及び照明系 Active JP5918858B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2011/005737 WO2013071940A1 (en) 2011-11-15 2011-11-15 Light modulator and illumination system of a microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2014533441A JP2014533441A (ja) 2014-12-11
JP2014533441A5 JP2014533441A5 (https=) 2015-01-29
JP5918858B2 true JP5918858B2 (ja) 2016-05-18

Family

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Family Applications (1)

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JP2014541542A Active JP5918858B2 (ja) 2011-11-15 2011-11-15 マイクロリソグラフィ投影露光装置の光変調器及び照明系

Country Status (3)

Country Link
US (1) US9274434B2 (https=)
JP (1) JP5918858B2 (https=)
WO (1) WO2013071940A1 (https=)

Families Citing this family (11)

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DE102013212613B4 (de) * 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
DE102013219057A1 (de) * 2013-09-23 2015-03-26 Carl Zeiss Smt Gmbh Facettenspiegel für eine Projektionsbelichtungsanlage
JP6558528B2 (ja) * 2015-03-30 2019-08-14 株式会社ニコン 空間光変調器及びその使用方法、変調方法、露光方法及び装置、並びにデバイス製造方法
JP6558529B2 (ja) * 2015-03-30 2019-08-14 株式会社ニコン 空間光変調器及びその使用方法、変調方法、露光方法及び装置、並びにデバイス製造方法
US11307335B2 (en) * 2017-08-09 2022-04-19 Maradin Ltd. Optical apparatus and methods and computer program products useful for manufacturing same
DE102020123024B4 (de) * 2020-09-03 2024-12-24 Universität Kassel Spiegel-Shutter-System
DE102020211173A1 (de) * 2020-09-04 2022-03-10 Robert Bosch Gesellschaft mit beschränkter Haftung Mikrospiegelanordnung
DE102021211619A1 (de) 2021-10-14 2023-04-20 Carl Zeiss Smt Gmbh EUV- Mehrfachspiegelanordnung
TWI842293B (zh) * 2021-12-30 2024-05-11 南韓商細美事有限公司 遮罩處理設備及基板處理設備
DE102022213143A1 (de) * 2022-12-06 2024-06-06 Carl Zeiss Smt Gmbh Spiegelanordnung zur Absorption von Strahlung und Lithographiesystem
US20250044602A1 (en) * 2023-08-01 2025-02-06 Lumentum Operations Llc Optical module with tilted-plane optical paths

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US5719695A (en) * 1995-03-31 1998-02-17 Texas Instruments Incorporated Spatial light modulator with superstructure light shield
US6275325B1 (en) * 2000-04-07 2001-08-14 Microsoft Corporation Thermally activated microelectromechanical systems actuator
JP2001356282A (ja) * 2000-06-13 2001-12-26 Ricoh Co Ltd 表示媒体
US7300162B2 (en) 2000-08-30 2007-11-27 Texas Instruments Incorporated Projection display
JP4401060B2 (ja) 2001-06-01 2010-01-20 エーエスエムエル ネザーランズ ビー．ブイ． リトグラフ装置、およびデバイス製造方法
US6728023B1 (en) * 2002-05-28 2004-04-27 Silicon Light Machines Optical device arrays with optimized image resolution
KR100480620B1 (ko) 2002-09-19 2005-03-31 삼성전자주식회사 마이크로 미러 어레이를 구비한 노광 장치 및 이를 이용한노광 방법
US6844959B2 (en) * 2002-11-26 2005-01-18 Reflectivity, Inc Spatial light modulators with light absorbing areas
US7483198B2 (en) * 2003-02-12 2009-01-27 Texas Instruments Incorporated Micromirror device and method for making the same
US7714983B2 (en) 2003-09-12 2010-05-11 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure installation
US20060087634A1 (en) 2004-10-25 2006-04-27 Brown Jay M Dynamic illumination uniformity and shape control for lithography
US7502155B2 (en) 2005-03-15 2009-03-10 Texas Instruments Incorporated Antireflective coating for semiconductor devices and method for the same
WO2008131928A1 (en) 2007-04-25 2008-11-06 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic exposure apparatus
WO2008131930A1 (en) 2007-04-25 2008-11-06 Carl Zeiss Smt Ag Mirror matrix for a microlithographic projection exposure apparatus
JP2009075557A (ja) * 2007-06-26 2009-04-09 Carl Zeiss Smt Ag リソグラフィのための複数のアクチュエータおよび照明装置を制御する方法および装置
SG185313A1 (en) * 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
JP5582287B2 (ja) 2007-11-06 2014-09-03 株式会社ニコン 照明光学装置及び露光装置
WO2009078223A1 (ja) * 2007-12-17 2009-06-25 Nikon Corporation 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2011528449A (ja) * 2008-07-15 2011-11-17 フサオ イシイ 凹凸のない平面ミラーを有するミラー素子
DE102008050446B4 (de) 2008-10-08 2011-07-28 Carl Zeiss SMT GmbH, 73447 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln

Also Published As

Publication number Publication date
WO2013071940A1 (en) 2013-05-23
US9274434B2 (en) 2016-03-01
JP2014533441A (ja) 2014-12-11
US20140218708A1 (en) 2014-08-07

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