JP2014533441A5 - - Google Patents

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Publication number
JP2014533441A5
JP2014533441A5 JP2014541542A JP2014541542A JP2014533441A5 JP 2014533441 A5 JP2014533441 A5 JP 2014533441A5 JP 2014541542 A JP2014541542 A JP 2014541542A JP 2014541542 A JP2014541542 A JP 2014541542A JP 2014533441 A5 JP2014533441 A5 JP 2014533441A5
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JP
Japan
Prior art keywords
modulator
range
tilt
modulator according
mirrors
Prior art date
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JP2014541542A
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English (en)
Japanese (ja)
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JP2014533441A (ja
JP5918858B2 (ja
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Priority claimed from PCT/EP2011/005737 external-priority patent/WO2013071940A1/en
Publication of JP2014533441A publication Critical patent/JP2014533441A/ja
Publication of JP2014533441A5 publication Critical patent/JP2014533441A5/ja
Application granted granted Critical
Publication of JP5918858B2 publication Critical patent/JP5918858B2/ja
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JP2014541542A 2011-11-15 2011-11-15 マイクロリソグラフィ投影露光装置の光変調器及び照明系 Active JP5918858B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2011/005737 WO2013071940A1 (en) 2011-11-15 2011-11-15 Light modulator and illumination system of a microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2014533441A JP2014533441A (ja) 2014-12-11
JP2014533441A5 true JP2014533441A5 (https=) 2015-01-29
JP5918858B2 JP5918858B2 (ja) 2016-05-18

Family

ID=44983490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014541542A Active JP5918858B2 (ja) 2011-11-15 2011-11-15 マイクロリソグラフィ投影露光装置の光変調器及び照明系

Country Status (3)

Country Link
US (1) US9274434B2 (https=)
JP (1) JP5918858B2 (https=)
WO (1) WO2013071940A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013212613B4 (de) * 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
DE102013219057A1 (de) * 2013-09-23 2015-03-26 Carl Zeiss Smt Gmbh Facettenspiegel für eine Projektionsbelichtungsanlage
JP6558528B2 (ja) * 2015-03-30 2019-08-14 株式会社ニコン 空間光変調器及びその使用方法、変調方法、露光方法及び装置、並びにデバイス製造方法
JP6558529B2 (ja) * 2015-03-30 2019-08-14 株式会社ニコン 空間光変調器及びその使用方法、変調方法、露光方法及び装置、並びにデバイス製造方法
US11307335B2 (en) * 2017-08-09 2022-04-19 Maradin Ltd. Optical apparatus and methods and computer program products useful for manufacturing same
DE102020123024B4 (de) * 2020-09-03 2024-12-24 Universität Kassel Spiegel-Shutter-System
DE102020211173A1 (de) * 2020-09-04 2022-03-10 Robert Bosch Gesellschaft mit beschränkter Haftung Mikrospiegelanordnung
DE102021211619A1 (de) 2021-10-14 2023-04-20 Carl Zeiss Smt Gmbh EUV- Mehrfachspiegelanordnung
TWI842293B (zh) * 2021-12-30 2024-05-11 南韓商細美事有限公司 遮罩處理設備及基板處理設備
DE102022213143A1 (de) * 2022-12-06 2024-06-06 Carl Zeiss Smt Gmbh Spiegelanordnung zur Absorption von Strahlung und Lithographiesystem
US20250044602A1 (en) * 2023-08-01 2025-02-06 Lumentum Operations Llc Optical module with tilted-plane optical paths

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5719695A (en) * 1995-03-31 1998-02-17 Texas Instruments Incorporated Spatial light modulator with superstructure light shield
US6275325B1 (en) * 2000-04-07 2001-08-14 Microsoft Corporation Thermally activated microelectromechanical systems actuator
JP2001356282A (ja) * 2000-06-13 2001-12-26 Ricoh Co Ltd 表示媒体
US7300162B2 (en) 2000-08-30 2007-11-27 Texas Instruments Incorporated Projection display
JP4401060B2 (ja) 2001-06-01 2010-01-20 エーエスエムエル ネザーランズ ビー．ブイ． リトグラフ装置、およびデバイス製造方法
US6728023B1 (en) * 2002-05-28 2004-04-27 Silicon Light Machines Optical device arrays with optimized image resolution
KR100480620B1 (ko) 2002-09-19 2005-03-31 삼성전자주식회사 마이크로 미러 어레이를 구비한 노광 장치 및 이를 이용한노광 방법
US6844959B2 (en) * 2002-11-26 2005-01-18 Reflectivity, Inc Spatial light modulators with light absorbing areas
US7483198B2 (en) * 2003-02-12 2009-01-27 Texas Instruments Incorporated Micromirror device and method for making the same
US7714983B2 (en) 2003-09-12 2010-05-11 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure installation
US20060087634A1 (en) 2004-10-25 2006-04-27 Brown Jay M Dynamic illumination uniformity and shape control for lithography
US7502155B2 (en) 2005-03-15 2009-03-10 Texas Instruments Incorporated Antireflective coating for semiconductor devices and method for the same
WO2008131928A1 (en) 2007-04-25 2008-11-06 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic exposure apparatus
WO2008131930A1 (en) 2007-04-25 2008-11-06 Carl Zeiss Smt Ag Mirror matrix for a microlithographic projection exposure apparatus
JP2009075557A (ja) * 2007-06-26 2009-04-09 Carl Zeiss Smt Ag リソグラフィのための複数のアクチュエータおよび照明装置を制御する方法および装置
SG185313A1 (en) * 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
JP5582287B2 (ja) 2007-11-06 2014-09-03 株式会社ニコン 照明光学装置及び露光装置
WO2009078223A1 (ja) * 2007-12-17 2009-06-25 Nikon Corporation 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2011528449A (ja) * 2008-07-15 2011-11-17 フサオ イシイ 凹凸のない平面ミラーを有するミラー素子
DE102008050446B4 (de) 2008-10-08 2011-07-28 Carl Zeiss SMT GmbH, 73447 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln

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