JP5918009B2 - 欠陥検査方法および欠陥検査装置 - Google Patents

欠陥検査方法および欠陥検査装置 Download PDF

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Publication number
JP5918009B2
JP5918009B2 JP2012109021A JP2012109021A JP5918009B2 JP 5918009 B2 JP5918009 B2 JP 5918009B2 JP 2012109021 A JP2012109021 A JP 2012109021A JP 2012109021 A JP2012109021 A JP 2012109021A JP 5918009 B2 JP5918009 B2 JP 5918009B2
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Prior art keywords
sample
illumination light
detection
scattered light
irradiated
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JP2012109021A
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English (en)
Japanese (ja)
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JP2013234966A (ja
JP2013234966A5 (enExample
Inventor
松本　俊一
俊一 松本
本田　敏文
敏文 本田
雄太 浦野
雄太 浦野
神宮　孝広
孝広 神宮
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2012109021A priority Critical patent/JP5918009B2/ja
Priority to US14/399,972 priority patent/US20150116702A1/en
Priority to KR1020147028344A priority patent/KR20140133925A/ko
Priority to PCT/JP2013/061959 priority patent/WO2013168557A1/ja
Publication of JP2013234966A publication Critical patent/JP2013234966A/ja
Publication of JP2013234966A5 publication Critical patent/JP2013234966A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/18—Measuring radiation intensity with counting-tube arrangements, e.g. with Geiger counters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/20—Measuring radiation intensity with scintillation detectors
    • G01T1/2018—Scintillation-photodiode combinations
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4709—Backscatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4735—Solid samples, e.g. paper, glass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Molecular Biology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2012109021A 2012-05-11 2012-05-11 欠陥検査方法および欠陥検査装置 Active JP5918009B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012109021A JP5918009B2 (ja) 2012-05-11 2012-05-11 欠陥検査方法および欠陥検査装置
US14/399,972 US20150116702A1 (en) 2012-05-11 2013-04-23 Defect inspection method and defect inspection device
KR1020147028344A KR20140133925A (ko) 2012-05-11 2013-04-23 결함 검사 방법 및 결함 검사 장치
PCT/JP2013/061959 WO2013168557A1 (ja) 2012-05-11 2013-04-23 欠陥検査方法および欠陥検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012109021A JP5918009B2 (ja) 2012-05-11 2012-05-11 欠陥検査方法および欠陥検査装置

Publications (3)

Publication Number Publication Date
JP2013234966A JP2013234966A (ja) 2013-11-21
JP2013234966A5 JP2013234966A5 (enExample) 2014-03-13
JP5918009B2 true JP5918009B2 (ja) 2016-05-18

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JP2012109021A Active JP5918009B2 (ja) 2012-05-11 2012-05-11 欠陥検査方法および欠陥検査装置

Country Status (4)

Country Link
US (1) US20150116702A1 (enExample)
JP (1) JP5918009B2 (enExample)
KR (1) KR20140133925A (enExample)
WO (1) WO2013168557A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013178231A (ja) * 2012-02-01 2013-09-09 Canon Inc 検査装置、検査方法、リソグラフィ装置及びインプリント装置
JP6259669B2 (ja) * 2014-01-20 2018-01-10 株式会社日立ハイテクノロジーズ 検査装置および計測装置
US9784691B2 (en) * 2014-07-31 2017-10-10 Zeta Instruments, Inc. Method and apparatus to optically detect defects in transparent solids
KR20160121716A (ko) 2015-04-10 2016-10-20 한국교통대학교산학협력단 하이브리드 조명 기반 표면 검사 장치
US10261027B2 (en) * 2015-05-26 2019-04-16 Hitachi High-Technologies Corporation Inspection device
US11047805B2 (en) 2016-01-14 2021-06-29 Hitachi High-Tech Corporation Inspection device and detector
EP3420338B1 (en) 2016-02-26 2023-05-03 Single Technologies AB Method and apparatus for high throughput imaging
CA3053120A1 (en) * 2017-02-09 2018-08-16 Essenlix Corporation Colorimetric assays
WO2018216074A1 (ja) * 2017-05-22 2018-11-29 株式会社日立ハイテクノロジーズ 欠陥検査装置及び欠陥検査方法
KR102757215B1 (ko) * 2019-11-14 2025-01-21 샹하이 프리시전 메져먼트 세미콘덕터 테크놀러지 인코포레이티드 표면 검출 장치 및 방법
CN112730334B (zh) * 2020-12-23 2024-03-22 之江实验室 基于电偶极旋转散射光探测的纳米微粒识别装置和方法
US20240280483A1 (en) * 2021-07-14 2024-08-22 Hitachi High-Tech Corporation Defect inspection device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4644329B2 (ja) * 2000-02-24 2011-03-02 株式会社トプコン 表面検査装置
US6617603B2 (en) * 2001-03-06 2003-09-09 Hitachi Electronics Engineering Co., Ltd. Surface defect tester
JP2008261790A (ja) * 2007-04-13 2008-10-30 Hitachi High-Technologies Corp 欠陥検査装置
JP2009236791A (ja) * 2008-03-28 2009-10-15 Hitachi High-Technologies Corp 欠陥検査方法及び欠陥検査装置
JP5568444B2 (ja) * 2010-11-01 2014-08-06 株式会社日立ハイテクノロジーズ 欠陥検査方法、微弱光検出方法および微弱光検出器

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Publication number Publication date
US20150116702A1 (en) 2015-04-30
KR20140133925A (ko) 2014-11-20
JP2013234966A (ja) 2013-11-21
WO2013168557A1 (ja) 2013-11-14

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