JP2013234966A5 - - Google Patents
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- Publication number
- JP2013234966A5 JP2013234966A5 JP2012109021A JP2012109021A JP2013234966A5 JP 2013234966 A5 JP2013234966 A5 JP 2013234966A5 JP 2012109021 A JP2012109021 A JP 2012109021A JP 2012109021 A JP2012109021 A JP 2012109021A JP 2013234966 A5 JP2013234966 A5 JP 2013234966A5
- Authority
- JP
- Japan
- Prior art keywords
- detector
- detection
- apd
- photons
- pulse currents
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000098 azimuthal photoelectron diffraction Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012109021A JP5918009B2 (ja) | 2012-05-11 | 2012-05-11 | 欠陥検査方法および欠陥検査装置 |
| KR1020147028344A KR20140133925A (ko) | 2012-05-11 | 2013-04-23 | 결함 검사 방법 및 결함 검사 장치 |
| PCT/JP2013/061959 WO2013168557A1 (ja) | 2012-05-11 | 2013-04-23 | 欠陥検査方法および欠陥検査装置 |
| US14/399,972 US20150116702A1 (en) | 2012-05-11 | 2013-04-23 | Defect inspection method and defect inspection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012109021A JP5918009B2 (ja) | 2012-05-11 | 2012-05-11 | 欠陥検査方法および欠陥検査装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013234966A JP2013234966A (ja) | 2013-11-21 |
| JP2013234966A5 true JP2013234966A5 (enExample) | 2014-03-13 |
| JP5918009B2 JP5918009B2 (ja) | 2016-05-18 |
Family
ID=49550608
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012109021A Active JP5918009B2 (ja) | 2012-05-11 | 2012-05-11 | 欠陥検査方法および欠陥検査装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20150116702A1 (enExample) |
| JP (1) | JP5918009B2 (enExample) |
| KR (1) | KR20140133925A (enExample) |
| WO (1) | WO2013168557A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013178231A (ja) * | 2012-02-01 | 2013-09-09 | Canon Inc | 検査装置、検査方法、リソグラフィ装置及びインプリント装置 |
| JP6259669B2 (ja) | 2014-01-20 | 2018-01-10 | 株式会社日立ハイテクノロジーズ | 検査装置および計測装置 |
| US9784691B2 (en) * | 2014-07-31 | 2017-10-10 | Zeta Instruments, Inc. | Method and apparatus to optically detect defects in transparent solids |
| KR20160121716A (ko) | 2015-04-10 | 2016-10-20 | 한국교통대학교산학협력단 | 하이브리드 조명 기반 표면 검사 장치 |
| US10261027B2 (en) * | 2015-05-26 | 2019-04-16 | Hitachi High-Technologies Corporation | Inspection device |
| WO2017122320A1 (ja) | 2016-01-14 | 2017-07-20 | 株式会社日立ハイテクノロジーズ | 検査装置及び検出器 |
| WO2017144619A1 (en) * | 2016-02-26 | 2017-08-31 | Single Technologies Ab | Method and device for high throughput imaging |
| WO2018148609A2 (en) * | 2017-02-09 | 2018-08-16 | Essenlix Corporation | Colorimetric assays |
| WO2018216074A1 (ja) * | 2017-05-22 | 2018-11-29 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置及び欠陥検査方法 |
| JP7304970B2 (ja) * | 2019-11-14 | 2023-07-07 | 上▲海▼精▲測▼半▲導▼体技▲術▼有限公司 | 表面検出装置及び方法 |
| CN112730334B (zh) * | 2020-12-23 | 2024-03-22 | 之江实验室 | 基于电偶极旋转散射光探测的纳米微粒识别装置和方法 |
| US20240280483A1 (en) * | 2021-07-14 | 2024-08-22 | Hitachi High-Tech Corporation | Defect inspection device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4644329B2 (ja) * | 2000-02-24 | 2011-03-02 | 株式会社トプコン | 表面検査装置 |
| US6617603B2 (en) * | 2001-03-06 | 2003-09-09 | Hitachi Electronics Engineering Co., Ltd. | Surface defect tester |
| JP2008261790A (ja) * | 2007-04-13 | 2008-10-30 | Hitachi High-Technologies Corp | 欠陥検査装置 |
| JP2009236791A (ja) * | 2008-03-28 | 2009-10-15 | Hitachi High-Technologies Corp | 欠陥検査方法及び欠陥検査装置 |
| JP5568444B2 (ja) * | 2010-11-01 | 2014-08-06 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法、微弱光検出方法および微弱光検出器 |
-
2012
- 2012-05-11 JP JP2012109021A patent/JP5918009B2/ja active Active
-
2013
- 2013-04-23 KR KR1020147028344A patent/KR20140133925A/ko not_active Ceased
- 2013-04-23 US US14/399,972 patent/US20150116702A1/en not_active Abandoned
- 2013-04-23 WO PCT/JP2013/061959 patent/WO2013168557A1/ja not_active Ceased
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