JP5912002B2 - 円板状ガラス基板、磁気ディスク用ガラス基板、磁気ディスク用ガラス基板の製造方法、磁気ディスク - Google Patents
円板状ガラス基板、磁気ディスク用ガラス基板、磁気ディスク用ガラス基板の製造方法、磁気ディスク Download PDFInfo
- Publication number
- JP5912002B2 JP5912002B2 JP2015524129A JP2015524129A JP5912002B2 JP 5912002 B2 JP5912002 B2 JP 5912002B2 JP 2015524129 A JP2015524129 A JP 2015524129A JP 2015524129 A JP2015524129 A JP 2015524129A JP 5912002 B2 JP5912002 B2 JP 5912002B2
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- polishing
- disk
- magnetic disk
- contour line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011521 glass Substances 0.000 title claims description 236
- 239000000758 substrate Substances 0.000 title claims description 221
- 238000000034 method Methods 0.000 title claims description 43
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 238000005498 polishing Methods 0.000 claims description 106
- 230000002093 peripheral effect Effects 0.000 claims description 89
- 238000007517 polishing process Methods 0.000 claims description 26
- 230000003746 surface roughness Effects 0.000 claims description 9
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 30
- 238000000227 grinding Methods 0.000 description 17
- 230000008569 process Effects 0.000 description 15
- 239000006061 abrasive grain Substances 0.000 description 14
- 239000000463 material Substances 0.000 description 13
- 238000003426 chemical strengthening reaction Methods 0.000 description 12
- 238000012545 processing Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000005354 aluminosilicate glass Substances 0.000 description 4
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 230000001050 lubricating effect Effects 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910018979 CoPt Inorganic materials 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 229920005830 Polyurethane Foam Polymers 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- -1 polybutylene terephthalate Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 239000011496 polyurethane foam Substances 0.000 description 2
- 235000010333 potassium nitrate Nutrition 0.000 description 2
- 239000004323 potassium nitrate Substances 0.000 description 2
- 238000007781 pre-processing Methods 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 235000010344 sodium nitrate Nutrition 0.000 description 2
- 239000004317 sodium nitrate Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910005335 FePt Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
- G11B5/82—Disk carriers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/005—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents using brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0081—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition having a magnetic crystal phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013135380 | 2013-06-27 | ||
| JP2013135380 | 2013-06-27 | ||
| PCT/JP2014/067134 WO2014208717A1 (ja) | 2013-06-27 | 2014-06-27 | 円板状ガラス基板、磁気ディスク用ガラス基板、磁気ディスク用ガラス基板の製造方法、磁気ディスク |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016068328A Division JP6360512B2 (ja) | 2013-06-27 | 2016-03-30 | 磁気ディスク用基板、磁気ディスク、磁気ディスク用基板の製造方法、円板状基板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP5912002B2 true JP5912002B2 (ja) | 2016-04-27 |
| JPWO2014208717A1 JPWO2014208717A1 (ja) | 2017-02-23 |
Family
ID=52142042
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015524129A Active JP5912002B2 (ja) | 2013-06-27 | 2014-06-27 | 円板状ガラス基板、磁気ディスク用ガラス基板、磁気ディスク用ガラス基板の製造方法、磁気ディスク |
| JP2016068328A Active JP6360512B2 (ja) | 2013-06-27 | 2016-03-30 | 磁気ディスク用基板、磁気ディスク、磁気ディスク用基板の製造方法、円板状基板の製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016068328A Active JP6360512B2 (ja) | 2013-06-27 | 2016-03-30 | 磁気ディスク用基板、磁気ディスク、磁気ディスク用基板の製造方法、円板状基板の製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9697862B2 (cg-RX-API-DMAC7.html) |
| JP (2) | JP5912002B2 (cg-RX-API-DMAC7.html) |
| CN (1) | CN105164751B (cg-RX-API-DMAC7.html) |
| MY (2) | MY176681A (cg-RX-API-DMAC7.html) |
| SG (1) | SG10201701244VA (cg-RX-API-DMAC7.html) |
| WO (1) | WO2014208717A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6020753B1 (ja) * | 2015-12-28 | 2016-11-02 | 旭硝子株式会社 | 磁気記録媒体用ガラス基板、磁気記録媒体 |
| SG11201908016WA (en) * | 2017-06-30 | 2019-09-27 | Hoya Corp | Substrate for magnetic disks, and magnetic disk |
| TWI727683B (zh) * | 2020-02-27 | 2021-05-11 | 態金材料科技股份有限公司 | 抗反射光學玻璃之製法及其製品 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004079009A (ja) * | 2002-08-09 | 2004-03-11 | Nippon Sheet Glass Co Ltd | 情報記録媒体用ガラス基板及びその製造方法並びにその研削装置 |
| WO2009081565A1 (ja) * | 2007-12-25 | 2009-07-02 | Hoya Corporation | 磁気ディスク用ガラス基板の製造方法 |
| JP2013093091A (ja) * | 2011-10-05 | 2013-05-16 | Hoya Corp | 磁気ディスク用ガラス基板および磁気記録媒体 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07230621A (ja) * | 1993-07-07 | 1995-08-29 | A G Technol Kk | 磁気ディスク用ガラス基板およびその製造方法 |
| US5569518A (en) * | 1993-07-07 | 1996-10-29 | Ag Technology Co., Ltd. | Glass substrate for a magnetic disk with roughened edges |
| WO2005005099A1 (ja) * | 2003-07-15 | 2005-01-20 | Hoya Corporation | 磁気ディスク用基板の製造方法、磁気ディスク用基板の製造装置及び磁気ディスクの製造方法 |
| US7727645B2 (en) * | 2005-07-08 | 2010-06-01 | Showa Denko K.K. | Substrate for magnetic recording medium, magnetic recording medium, and magnetic recording and reproducing apparatus |
| SG10201501752PA (en) * | 2007-02-20 | 2015-05-28 | Hoya Corp | Magnetic disc substrate, magnetic disc, and magnetic disc device |
| JP2011198429A (ja) * | 2010-03-23 | 2011-10-06 | Hoya Corp | 磁気ディスク用ガラス基板およびその評価方法 |
| SG187536A1 (en) * | 2010-08-31 | 2013-03-28 | Hoya Corp | Method for manufacturing glass substrate for magnetic disk, and method for manufacturing magnetic disk |
| JP5902914B2 (ja) * | 2010-11-02 | 2016-04-13 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| US9564166B2 (en) * | 2012-08-29 | 2017-02-07 | Hoya Corporation | Magnetic-disk glass substrate and magnetic disk |
-
2014
- 2014-06-27 CN CN201480023887.4A patent/CN105164751B/zh active Active
- 2014-06-27 JP JP2015524129A patent/JP5912002B2/ja active Active
- 2014-06-27 US US14/894,859 patent/US9697862B2/en active Active
- 2014-06-27 MY MYPI2018001352A patent/MY176681A/en unknown
- 2014-06-27 SG SG10201701244VA patent/SG10201701244VA/en unknown
- 2014-06-27 WO PCT/JP2014/067134 patent/WO2014208717A1/ja not_active Ceased
- 2014-06-27 MY MYPI2015704252A patent/MY167362A/en unknown
-
2016
- 2016-03-30 JP JP2016068328A patent/JP6360512B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004079009A (ja) * | 2002-08-09 | 2004-03-11 | Nippon Sheet Glass Co Ltd | 情報記録媒体用ガラス基板及びその製造方法並びにその研削装置 |
| WO2009081565A1 (ja) * | 2007-12-25 | 2009-07-02 | Hoya Corporation | 磁気ディスク用ガラス基板の製造方法 |
| JP2013093091A (ja) * | 2011-10-05 | 2013-05-16 | Hoya Corp | 磁気ディスク用ガラス基板および磁気記録媒体 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105164751B (zh) | 2018-11-13 |
| JPWO2014208717A1 (ja) | 2017-02-23 |
| US20160163344A1 (en) | 2016-06-09 |
| JP2016146231A (ja) | 2016-08-12 |
| CN105164751A (zh) | 2015-12-16 |
| MY176681A (en) | 2020-08-19 |
| WO2014208717A1 (ja) | 2014-12-31 |
| SG10201701244VA (en) | 2017-04-27 |
| US9697862B2 (en) | 2017-07-04 |
| JP6360512B2 (ja) | 2018-07-18 |
| MY167362A (en) | 2018-08-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10580448B2 (en) | Magnetic-disk glass substrate, magnetic disk and method for manufacturing magnetic-disk glass substrate | |
| US10431252B2 (en) | Substrate for magnetic disk and magnetic disk | |
| US11024335B2 (en) | Magnetic-disk glass substrate | |
| US11211090B2 (en) | Magnetic-disk glass substrate, magnetic-disk glass substrate intermediate, and method for manufacturing magnetic-disk glass substrate | |
| JP6360512B2 (ja) | 磁気ディスク用基板、磁気ディスク、磁気ディスク用基板の製造方法、円板状基板の製造方法 | |
| JP5661950B2 (ja) | 磁気ディスク用ガラス基板の製造方法 | |
| CN103400588B (zh) | 磁记录介质用玻璃基板的制造方法及磁记录介质用玻璃基板 | |
| JP2011198428A (ja) | 磁気ディスク用ガラス基板およびその評価方法 | |
| JP2015011735A (ja) | 磁気ディスク用ガラス基板の製造方法、及び、磁気ディスクの製造方法 | |
| JP5494747B2 (ja) | 磁気記録媒体用ガラス基板の製造方法、及び、磁気記録媒体用ガラス基板 | |
| JP6225248B2 (ja) | 磁気ディスク用ガラス基板、熱アシスト磁気記録用磁気ディスク、及び、熱アシスト磁気記録用磁気ディスクの製造方法 | |
| JP6193388B2 (ja) | 磁気ディスク用ガラス基板の製造方法、ガラス基板の製造方法及び磁気ディスクの製造方法、並びに固定砥粒砥石 | |
| WO2013146132A1 (ja) | 情報記録媒体用ガラス基板の製造方法および情報記録媒体 | |
| JP2015011743A (ja) | 情報記録媒体用ガラス基板の製造方法 | |
| JP2015011744A (ja) | 情報記録媒体用ガラス基板の製造方法 | |
| WO2013146131A1 (ja) | 情報記録媒体用ガラス基板の製造方法および情報記録媒体 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160308 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20160330 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5912002 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |