JP5840847B2 - Glass substrate surface cleaning method and cleaning belt - Google Patents

Glass substrate surface cleaning method and cleaning belt Download PDF

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JP5840847B2
JP5840847B2 JP2011043513A JP2011043513A JP5840847B2 JP 5840847 B2 JP5840847 B2 JP 5840847B2 JP 2011043513 A JP2011043513 A JP 2011043513A JP 2011043513 A JP2011043513 A JP 2011043513A JP 5840847 B2 JP5840847 B2 JP 5840847B2
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glass substrate
cleaning
abrasive
glass
groove
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JP2012179539A (en
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道広 大石
道広 大石
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3M Innovative Properties Co
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3M Innovative Properties Co
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Priority to JP2011043513A priority Critical patent/JP5840847B2/en
Priority to PCT/US2012/026004 priority patent/WO2012118651A2/en
Priority to KR1020137025354A priority patent/KR20140014193A/en
Priority to CN2012800108922A priority patent/CN103402657A/en
Priority to TW101106571A priority patent/TW201240742A/en
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    • B08B1/32
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • B08B1/20
    • B08B1/30
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075Cleaning of glass
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Cleaning In General (AREA)
  • Surface Treatment Of Glass (AREA)
  • Liquid Crystal (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Detergent Compositions (AREA)

Description

本発明は、ガラス基板を分断する分断装置において発生するガラス基板上に付着した異物(主として、ガラスカレット)のガラス基板表面清掃装置及びガラス基板表面清掃方法に関するもので、特に液晶パネルの製造工程において、偏光板の貼り付け工程前に液晶パネルを構成するガラス基板表面清掃装置、方法に関するものある。   The present invention relates to a glass substrate surface cleaning device and a glass substrate surface cleaning method for foreign matter (mainly glass cullet) adhered to a glass substrate generated in a cutting device for cutting a glass substrate, and particularly in a manufacturing process of a liquid crystal panel. Further, the present invention relates to a glass substrate surface cleaning apparatus and method for forming a liquid crystal panel before a polarizing plate attaching step.

ガラス基板を分断する基板分断装置に付随するガラス基板上に付着した異物(主として、ガラスカレット)の清掃装置、方法としては、現在、ガラス基板に真空吸引手段を用いた装置、方法もしくは研磨材を用いた装置、方法等が知られている(例えば、特許文献1、特許文献2)。   As a cleaning device and method for foreign matter (mainly glass cullet) attached to the glass substrate accompanying the substrate cutting device for cutting the glass substrate, currently, a device, method or abrasive using a vacuum suction means on the glass substrate is used. The apparatus and method used are known (for example, Patent Document 1 and Patent Document 2).

特開2008−94690号公報JP 2008-94690 A 特開2005−81297号公報JP-A-2005-81297

本発明の解決しようとする課題は、ガラス基板上に存在する異物(主としてガラスカレット)の各種サイズ(例えば、10μmから1000μmの範囲)に適宜対応しうる清掃機能を有するガラス基板表面清掃装置、方法を提供することにある。   A problem to be solved by the present invention is a glass substrate surface cleaning apparatus and method having a cleaning function that can appropriately cope with various sizes (for example, a range of 10 μm to 1000 μm) of foreign matters (mainly glass cullet) existing on a glass substrate. Is to provide.

発明の一態様、ガラス基板支持搬送機構を用いて第一の方向にガラス基板を搬送する工程、前記ガラス基板表面に付着した異物を除去するためにガラス基板清掃機構有する清掃ベルトを、前記ガラス基板の表面上で前記第一の方向に対し交差する第二の方向に摺動させる工程を含み、前記清掃ベルトが、その表面に複数の三次元構造研磨材塗膜とそれら三次元構造研磨材塗膜の間の溝とを有する、ガラス基板表面清掃方法であって、同一製造ロットの複数のガラス基板について、それらガラス基板の表面に付着した異物の外形幅寸法を調査する工程と、調査した前記異物の外形幅寸法に基づき、前記製造ロットにおける前記異物の外形幅寸法の最大値を予測する工程と、前記溝の溝幅が、予測した前記異物の外形幅寸法の最大値以上である前記清掃ベルトを用意する工程と、を含むことを特徴とするガラス基板表面清掃方法である。
本発明の別の態様は、上記ガラス基板表面清掃方法に使用される清掃ベルトである。
One aspect of the present invention, a cleaning belt having a glass substrate cleaning mechanism for removing a step of conveying the glass substrate in a first direction using a glass substrate support transfer mechanism, a foreign substance attached to the surface of the glass substrate a saw including a second step of sliding in the direction of crossing to the first direction on the surface of the glass substrate, wherein the cleaning belt, those a plurality of three-dimensional structure abrasive coating on the surface thereof A method for cleaning the surface of a glass substrate having a groove between three-dimensional structured abrasive coatings, wherein a plurality of glass substrates of the same production lot are examined for external width dimensions of foreign matters adhering to the surfaces of the glass substrates. A step of predicting a maximum value of the outer width dimension of the foreign matter in the manufacturing lot based on the measured outer width dimension of the foreign matter, and a groove width of the groove is a maximum of the predicted outer width dimension of the foreign matter. Less than A step of preparing the cleaning belt is, Ru glass substrate surface cleaning method der, which comprises a.
Another aspect of the present invention is a cleaning belt used in the glass substrate surface cleaning method.

この発明にかかるガラス基板表面清掃方法によれば、ガラス基板上の広範なサイズの異物(主としてガラスカレット)を、適宜効率的にかつ確実に除去することができる。 According to the glass substrate surface Kiyoshi 掃方 method according to the present invention, a wide range of size on the glass substrate foreign matter (mainly glass cullet) can suitably be efficiently and reliably removed.

図1は、本発明にかかるガラス基板表面清掃装置の全体構成を示す斜視図である。FIG. 1 is a perspective view showing an overall configuration of a glass substrate surface cleaning apparatus according to the present invention. 図2は、本発明にかかるガラス基板表面清掃装置の全体構成を示す正面図である。FIG. 2 is a front view showing the overall configuration of the glass substrate surface cleaning apparatus according to the present invention. 図3は、本発明にかかるガラス基板表面清掃装置のガラス基板の搬送方向(第一の方向、M)と清掃ベルトの摺動方向(第二の方向、N)との関係を示す平面図である。FIG. 3 is a plan view showing the relationship between the glass substrate transport direction (first direction, M) and the cleaning belt sliding direction (second direction, N) of the glass substrate surface cleaning apparatus according to the present invention. is there. 図4は、本発明にかかるガラス基板表面清掃装置が具備した清掃ベルトの表面に設けられた構造化された複数の三次元構造研磨材塗膜を有した三次元構造研磨材層の一部を示す平面図である。FIG. 4 shows a part of a three-dimensional structured abrasive layer having a plurality of structured three-dimensional structured abrasive coatings provided on the surface of a cleaning belt provided in the glass substrate surface cleaning apparatus according to the present invention. FIG. 図5は、図4における切断線X−Xに沿った横断面図である。FIG. 5 is a cross-sectional view taken along a cutting line XX in FIG. 図6は、清掃ベルトの三次元構造研磨材層に設けられた溝の溝幅がガラス基板表面に付着した異物(ガラスカレット)の外形幅寸法より広い場合の異物と溝との作用関係を示す模式断面図である。FIG. 6 shows an operational relationship between the foreign matter and the groove when the groove width of the groove provided in the three-dimensional structure abrasive layer of the cleaning belt is wider than the outer width of the foreign matter (glass cullet) adhering to the glass substrate surface. It is a schematic cross section. 図7は、清掃ベルトの三次元構造研磨材層に設けられた溝の溝幅がガラス基板表面に付着した異物(ガラスカレット)の外形幅寸法より狭い場合の異物と溝との作用関係を示す模式断面図である。FIG. 7 shows the relationship between the foreign matter and the groove when the groove width of the groove provided in the three-dimensional structure abrasive layer of the cleaning belt is smaller than the outer width of the foreign matter (glass cullet) attached to the glass substrate surface. It is a schematic cross section.

次に本発明の実施の形態を、図面を参照しながら詳細に説明するが、本発明は以下の実施形態に限定されることなく、本発明の趣旨を逸脱しない範囲で当業者の通常の知識に基づいて適宜設計の変更、改良等が加えることができると理解されるべきである。
本発明に関連するガラス基板表面清掃装置の一実施形態は、ガラス基板50を支持し、第一の方向(図3中M)に前記ガラス基板を搬送するためのガラス基板支持搬送機構20と、前記第一の方向に対し交差する第二の方向(図3中N)に前記ガラス基板の表面上で摺動させて、前記ガラス基板表面に付着した異物300を除去するための清掃ベルト11を有するガラス基板清掃機構10とを有するガラス基板表面清掃装置100であって、前記清掃ベルト11が、当該表面に複数の三次元構造研磨材塗膜70と、当該塗膜間に位置する溝60とを有し、前記溝60の溝幅62が前記ガラス基板表面に付着した異物300の外形幅寸法より広いガラス基板表面清掃装置100である。
ここに、「清掃」とは、ガラス基板上の異物(主としてガラスカレット)を除去することを意味する。「異物の外形幅寸法」とは、清掃ベルトをガラス基板上で摺動させる第二の方向(図3中N)における異物の最大外周幅を意味する。「溝」とは、三次元構造研磨材塗膜とそれに隣り合う他の三次元構造研磨材塗膜間に構成される隙間を意味する。「溝幅」とは、三次元構造研磨材塗膜の上部72とそれに隣り合う他の三次元構造研磨材塗膜の上部72との間隔を意味する。ガラスカレットとは、ガラス製品を破砕、切断等した際に生じるガラス屑を意味する。
Next, embodiments of the present invention will be described in detail with reference to the drawings. However, the present invention is not limited to the following embodiments, and the general knowledge of those skilled in the art without departing from the spirit of the present invention. It should be understood that design changes, improvements, and the like can be made as appropriate based on the above.
One embodiment of a glass substrate surface cleaning apparatus related to the present invention supports a glass substrate 50, and a glass substrate support transport mechanism 20 for transporting the glass substrate in a first direction (M in FIG. 3), A cleaning belt 11 is slid on the surface of the glass substrate in a second direction (N in FIG. 3) intersecting the first direction to remove the foreign matter 300 adhering to the surface of the glass substrate. A glass substrate surface cleaning device 100 having a glass substrate cleaning mechanism 10 having the cleaning belt 11 having a plurality of three-dimensional structure abrasive coatings 70 on the surface and grooves 60 positioned between the coatings. The glass substrate surface cleaning device 100 has a groove width 62 of the groove 60 wider than the outer width of the foreign material 300 attached to the glass substrate surface.
Here, “cleaning” means removing foreign matter (mainly glass cullet) on the glass substrate. The “external width dimension of foreign matter” means the maximum outer peripheral width of the foreign matter in the second direction (N in FIG. 3) in which the cleaning belt slides on the glass substrate. “Groove” means a gap formed between a three-dimensional structured abrasive coating and another three-dimensional structured abrasive coating adjacent thereto. “Groove width” means the distance between the upper part 72 of the three-dimensional structured abrasive coating and the upper part 72 of another three-dimensional structured abrasive coating adjacent thereto. Glass cullet means glass waste produced when a glass product is crushed, cut or the like.

図1、図2は、例えば、特開2005−81297号公報に記載されている液晶パネルの製造工程における偏光板の貼り付け工程前に液晶パネルを構成するガラス基板の表面を清掃するに供する本発明の清掃装置を示したものである。図1において、ガラス基板表面清掃装置100は、ガラス基板支持搬送機構20とガラス基板清掃機構10とを備えている。ガラス基板支持搬送装置20は、ガラス基板を下方面側から支持し、ガラス基板を第一の方向(図3中M)に搬送するための搬入ローラシャフト21と搬出ローラシャフト22及びガイド23を有する。ガラス基板清掃機構10は、基板支持搬送装置20のほぼ中央上方に設けられ、無縁軌道を有する清掃ベルト11と、当該清掃ベルトに所定のテンションを与えながら回転させる為の従動ガイドプーリ13,14,15と駆動ガイドプーリ12を有して構成されている。駆動ガイドプーリは、駆動ガイドプーリに駆動力を与えるべく駆動モータ18に連結されている。また、清掃ベルト11は、ガラス基板の搬送方向(第一の方向、図3中M)に対して、交差する方向(第二の方向、図3中N)に配置されている。   1 and 2 are books used for cleaning the surface of a glass substrate constituting a liquid crystal panel before a polarizing plate attaching step in a liquid crystal panel manufacturing step described in, for example, JP-A-2005-81297. 1 shows a cleaning device of the invention. In FIG. 1, the glass substrate surface cleaning apparatus 100 includes a glass substrate support transport mechanism 20 and a glass substrate cleaning mechanism 10. The glass substrate supporting / conveying device 20 has a carry-in roller shaft 21, a carry-out roller shaft 22 and a guide 23 for supporting the glass substrate from the lower surface side and carrying the glass substrate in a first direction (M in FIG. 3). . The glass substrate cleaning mechanism 10 is provided substantially above the center of the substrate support / conveyor 20 and has a cleaning belt 11 having an edgeless track, and driven guide pulleys 13 and 14 for rotating the cleaning belt while applying a predetermined tension. 15 and a drive guide pulley 12. The drive guide pulley is connected to the drive motor 18 to apply a drive force to the drive guide pulley. Moreover, the cleaning belt 11 is arrange | positioned in the direction (2nd direction, N in FIG. 3) which cross | intersects with respect to the conveyance direction (1st direction, M in FIG. 3) of a glass substrate.

図2に示すように、摺動時に清掃ベルト11はガラス基板50上面に接して配置されており、また清掃ベルト直上には清掃ベルトにガラス基板への押付力を付加すべく荷重負荷装置30が配置されている。荷重負荷装置30としては、エアブロアタイプ、水圧タイプ等必要に応じていずれのものも用いることができる。荷重負荷は、0.01kg/cmから3kg/cmの範囲で調整できる。 As shown in FIG. 2, the cleaning belt 11 is disposed in contact with the upper surface of the glass substrate 50 when sliding, and a load load device 30 is provided immediately above the cleaning belt to apply a pressing force to the glass substrate to the cleaning belt. Has been placed. As the load device 30, any one such as an air blower type or a hydraulic type can be used as necessary. Load bearing can be adjusted in the range of 0.01 kg / cm 2 of 3 kg / cm 2.

図3は、上記ガラス基板清掃装置においてガラスの搬送方向(第一の方向、図3中M)と清掃ベルトの摺動方向(第二の方向)との関係を示したものである。図3に示すように清掃ベルトのガラス基板上での摺動方向(第二の方向、図3中N)は、ガラス基板の搬送方向(第一の方向、図3中M)に対して交差する方向に設けられている。このように清掃ベルトを交差して配置するのは、ガラス基板に対し摺動面を広くとれ、またガラス基板の清掃ベルトへの突入時における衝撃を緩和させる為である。当該交差角度θ(図3)は、具体的には、約70°〜85°、もしくは、95°〜110°程度に設けられている。   FIG. 3 shows the relationship between the glass conveyance direction (first direction, M in FIG. 3) and the cleaning belt sliding direction (second direction) in the glass substrate cleaning apparatus. As shown in FIG. 3, the sliding direction of the cleaning belt on the glass substrate (second direction, N in FIG. 3) intersects the transport direction of the glass substrate (first direction, M in FIG. 3). It is provided in the direction to do. The reason why the cleaning belts are arranged in such a manner is that the sliding surface can be widened with respect to the glass substrate and the impact when the glass substrate enters the cleaning belt is reduced. Specifically, the intersection angle θ (FIG. 3) is set to about 70 ° to 85 ° or about 95 ° to 110 °.

ベルト摺動速度、ガラス基板搬送速度は、ガラス基板の生産性、異物除去の程度を考慮して決められる。具体的には、ガラス基板の第二の方向(図3中N)のベルト摺動速度は、通常毎分10mから500mの範囲で調整でき、ガラス基板の第一の方向(図3中M)の搬送速度は、通常毎分0.1mから10mの範囲で調整できる。摺動速度/搬送速度の比の値は、通常、2から100である。よって、当該ガラス基板表面清掃装置において、異物除去は、主として第二の方向(図3中N)の清掃ベルトの摺動によりなされることになる。   The belt sliding speed and the glass substrate transport speed are determined in consideration of the productivity of the glass substrate and the degree of foreign matter removal. Specifically, the belt sliding speed in the second direction of the glass substrate (N in FIG. 3) can usually be adjusted in the range of 10 m to 500 m per minute, and the first direction of the glass substrate (M in FIG. 3). The conveyance speed can be adjusted in the range of usually 0.1 m to 10 m per minute. The value of the ratio of sliding speed / conveying speed is usually 2 to 100. Therefore, in the said glass substrate surface cleaning apparatus, foreign material removal is made | formed mainly by sliding of the cleaning belt of a 2nd direction (N in FIG. 3).

図4、5は、本発明の一実施態様として、ガラス基板清掃機構10に用いられる清掃ベルト11を示したものである。図4、5に示すように、本発明において用いられる清掃ベルト11は、表面に複数の三次元構造研磨材塗膜70と当該複数の三次元構造研磨材塗膜間に構成される溝60を有する研磨材層80と表面の背面側に研磨層を保持するバッキング層90から構成される。   4 and 5 show the cleaning belt 11 used in the glass substrate cleaning mechanism 10 as one embodiment of the present invention. As shown in FIGS. 4 and 5, the cleaning belt 11 used in the present invention has a plurality of three-dimensional structured abrasive coatings 70 and grooves 60 formed between the plurality of three-dimensional structured abrasive coatings on the surface. It comprises an abrasive layer 80 having a backing layer 90 that holds the abrasive layer on the back side of the surface.

研磨材層は、前記したようにバッキング層90の上面に搭載された三次元構造研磨材塗膜70と溝から構成されている。   As described above, the abrasive layer is composed of the three-dimensional structure abrasive coating film 70 mounted on the upper surface of the backing layer 90 and the groove.

三次元構造研磨材塗膜70の幾何学的形状は、立方体状、角柱状、円柱状、円錐状、角錐状、切頭角錐(角錐台)状、切頭円錐(円錐台)状などからなる群から選択される。これらの中で、好ましいのは、平坦な上面を有する切頭角錐・切頭円錐の形態を有したものである。切頭角錐・切頭円錐であれば、三次元研磨材塗膜の上面がガラス基板と面接触しガラス基板上に付着する異物除去が促進されるからである。
当該切頭角錐・切頭円錐の三次元構造研磨材塗膜70は、通常、精密成型により形成される。ここで、「精密成型」とは、国際公開第WO98/39142号に記載されているものと同じ意味であり、砥粒を含むバインダー前駆物質をバッキング層90上に製造ツールを用いて成型し、その後、バインダー前駆物質を硬化させて、三次元形状体を形成することをいう。
The geometric shape of the three-dimensional structure abrasive coating 70 is a cubic shape, a prismatic shape, a cylindrical shape, a conical shape, a pyramid shape, a truncated pyramid shape, a truncated cone shape, or the like. Selected from the group. Of these, preferred are those having the form of a truncated pyramid and truncated cone having a flat upper surface. This is because if the truncated pyramid / conical cone is used, the upper surface of the coating film of the three-dimensional abrasive is brought into surface contact with the glass substrate, and the removal of foreign matter adhering to the glass substrate is promoted.
The truncated pyramid / conical three-dimensional structure abrasive coating 70 is usually formed by precision molding. Here, “precision molding” has the same meaning as described in International Publication No. WO 98/39142, and a binder precursor containing abrasive grains is molded on the backing layer 90 using a manufacturing tool, Thereafter, the binder precursor is cured to form a three-dimensional shape.

このように精密成型された各切頭角錐の上部72の面積は、0.2mmから20mm、好ましくは、1mmから10mmである。当該切頭角錐の下部74は、上部より最大60%、より好ましくは最大40%、もっとも好ましくは最大20%大きい表面を有する。また、切頭角錐・円錐の高さ(図5中H)は、0.2mmから5mm、より好ましくは、0.3mmから3mmである。これら三次元研磨材塗膜70の形態は、最終的には、除去する異物の状態、すなわち異物の大きさ、基板への付着強度等を考慮して決められる。 The area of the upper portion 72 of each truncated pyramid thus precisely formed is 0.2 mm 2 to 20 mm 2 , preferably 1 mm 2 to 10 mm 2 . The lower portion 74 of the truncated pyramid has a surface that is up to 60% larger, more preferably up to 40%, most preferably up to 20% larger than the top. The height of the truncated pyramid / cone (H in FIG. 5) is 0.2 mm to 5 mm, more preferably 0.3 mm to 3 mm. The form of the three-dimensional abrasive coating 70 is finally determined in consideration of the state of the foreign matter to be removed, that is, the size of the foreign matter, the adhesion strength to the substrate, and the like.

上記複数の三次元研磨材塗膜70は、バッキング層90の上面に通常第二の方向(図3中N)に等間隔で格子状、千鳥状等の規則性を持って整然と配置される。このように配置を、国際公開第WO98/39142号に記載されているものと同じ意味で「構造」と称するのでそれに対応して本明細書では、研磨材層、研磨材塗膜を三次元「構造」研磨材層、三次元「構造」研磨材塗膜と呼ぶ。
清掃ベルト11の構成材料はバッキング層90と三次元構造研磨材層80からなり、三次元構造研磨材層80は砥粒とバインダーから成る。
The plurality of three-dimensional abrasive coatings 70 are regularly arranged on the upper surface of the backing layer 90 with regularity such as a lattice shape and a staggered shape at regular intervals in the second direction (N in FIG. 3). Thus, the arrangement is referred to as “structure” in the same meaning as described in International Publication No. WO 98/39142. Accordingly, in this specification, the abrasive layer and the abrasive coating film are referred to as “three-dimensional“ Called “structure” abrasive layer, three-dimensional “structure” abrasive coating.
The constituent material of the cleaning belt 11 includes a backing layer 90 and a three-dimensional structure abrasive layer 80, and the three-dimensional structure abrasive layer 80 includes abrasive grains and a binder.

バッキング層90は、清掃ベルトが長持ちし、異物除去(主としてガラスカレット)300が、ベルト全幅にわたって均一に行い得るように強度があり耐久性がある必要がある。清掃ベルト11がガラス基板に均一に合致し、もしくは、密着することができるように、強度があり可撓性、柔軟性が必要である。バッキング層の材料としては、ポリマーフィルム、紙、布、金属フィルム、バルカナイズドファイバー、及びこれらの積層体、処理品等を用いることができる。ポリマーフィルムの例は、ポリエステルフィルム、コポリエステルフィルム、ポリイミドフィルム、ポリアミドフィルム等である。紙の例は、強度向上のため、樹脂を含浸させたもの等である。布の例としては、樹脂繊維、綿繊維、ガラス繊維、及びこれらを組み合わせた繊維等から選択された繊維を用い、織布またはニット等をもちいることができる。尚、ポリマーフィルムについては、三次元構造研磨材塗膜の基材に対する接着を促進するためにエチレンアクリル酸共重合体のような材料で下塗りしてもよい。   The backing layer 90 needs to be strong and durable so that the cleaning belt can last for a long time and the foreign matter removal (mainly glass cullet) 300 can be performed uniformly over the entire width of the belt. The cleaning belt 11 needs to be strong and flexible and flexible so that the cleaning belt 11 can be uniformly matched or adhered to the glass substrate. As a material for the backing layer, polymer film, paper, cloth, metal film, vulcanized fiber, laminates thereof, processed products, and the like can be used. Examples of the polymer film are a polyester film, a copolyester film, a polyimide film, a polyamide film, and the like. Examples of paper are those impregnated with a resin to improve strength. As an example of the cloth, a fiber selected from resin fibers, cotton fibers, glass fibers, and a combination of these can be used, and a woven fabric or a knit can be used. In addition, about a polymer film, in order to accelerate | stimulate adhesion | attachment with respect to the base material of a three-dimensional structure abrasive coating film, you may undercoat with materials, such as an ethylene acrylic acid copolymer.

三次元構造研磨材層80はバインダーのマトリックスとその中に分散させた砥粒とを含む研磨材コンポジットを構成成分として有している。   The three-dimensional structured abrasive layer 80 has an abrasive composite containing a binder matrix and abrasive grains dispersed therein as a constituent component.

砥粒の寸法はガラス表面に深い傷を発生させないよう、細かいことが好ましい。例えば、その寸法は、平均粒径0.01〜10μm、好ましくは0.01〜5μmさらに好ましくは0.01〜3μmである。本発明に適する砥粒の例には、ダイヤモンド、立方晶窒化ホウ素、酸化セリウム、溶融酸化アルミニウム、熱処理酸化アルミニウム、ゾルゲル酸化アルミニウム、シリコンカーバイド、酸化クロム、シリカ、ジルコニア、アルミナジルコニア、酸化鉄、ガーネット、炭酸カルシウムおよびこれらの混合物が含まれる。特に好ましいものは、モース硬度6以上のダイヤモンド、立方晶窒化ホウ素、酸化アルミニウム、シリコンカーバイド、酸化セリウム、シリカである。   The size of the abrasive grains is preferably fine so as not to cause deep scratches on the glass surface. For example, the dimension is an average particle diameter of 0.01 to 10 μm, preferably 0.01 to 5 μm, more preferably 0.01 to 3 μm. Examples of abrasive grains suitable for the present invention include diamond, cubic boron nitride, cerium oxide, molten aluminum oxide, heat treated aluminum oxide, sol-gel aluminum oxide, silicon carbide, chromium oxide, silica, zirconia, alumina zirconia, iron oxide, garnet. , Calcium carbonate and mixtures thereof. Particularly preferred are diamond having a Mohs hardness of 6 or more, cubic boron nitride, aluminum oxide, silicon carbide, cerium oxide, and silica.

バインダーは硬化またはゲル化することにより研磨材層を形成する。本発明に好ましいバインダーの例には、フェノール樹脂、レゾール−フェノール樹脂、アミノプラスト樹脂、ウレタン樹脂、エポキシ樹脂、アクリレート樹脂、ポリエステル樹脂、ビニル樹脂、メラミン樹脂、アクリレート化イソシアヌレート樹脂、尿素−ホルムアルデヒド樹脂、イソシアヌレート樹脂、アクリレート化ウレタン樹脂、アクリレート化エポキシ樹脂およびこれらの混合物が含まれる。バインダーは熱可塑性樹脂でもよい。   The binder forms an abrasive layer by curing or gelation. Examples of preferred binders for the present invention include phenol resins, resol-phenol resins, aminoplast resins, urethane resins, epoxy resins, acrylate resins, polyester resins, vinyl resins, melamine resins, acrylated isocyanurate resins, urea-formaldehyde resins. , Isocyanurate resins, acrylated urethane resins, acrylated epoxy resins and mixtures thereof. The binder may be a thermoplastic resin.

特に好ましいものは、フェノール樹脂、レゾール−フェノール樹脂、エポキシ樹脂、アクリレート樹脂、ウレタン樹脂である。   Particularly preferred are phenol resins, resol-phenol resins, epoxy resins, acrylate resins and urethane resins.

バインダーは照射硬化性であってもよい。照射硬化性結合剤は照射エネルギーにより少なくとも部分的に硬化されるか、または少なくとも部分的に重合されうるいずれかのバインダーである。用いられるバインダーに依存して、熱、赤外線、電子線、紫外線照射または可視光照射のようなエネルギー源が用いられる。   The binder may be radiation curable. A radiation curable binder is any binder that can be at least partially cured or at least partially polymerized by irradiation energy. Depending on the binder used, energy sources such as heat, infrared, electron beam, ultraviolet irradiation or visible light irradiation are used.

典型的には、これらのバインダーはフリーラジカル機構により重合される。好ましくは、これらは、アクリレート化ウレタン、アクリレート化エポキシ、α,β−不飽和カルボニル基を有するアミノプラスト誘導体、エチレン性不飽和化合物、少なくとも1個のアクリレート基を有するイソシアヌレート誘導体、少なくとも1個のアクリレート基を有するイソシアネート、およびこれらの混合物からなる群から選択される。   Typically, these binders are polymerized by a free radical mechanism. Preferably, these are acrylated urethanes, acrylated epoxies, aminoplast derivatives having an α, β-unsaturated carbonyl group, ethylenically unsaturated compounds, isocyanurate derivatives having at least one acrylate group, at least one It is selected from the group consisting of isocyanates having acrylate groups, and mixtures thereof.

バインダーが紫外線照射により硬化される場合は、フリーラジカル重合を開始させるために光開始剤を必要とする。この目的に好ましい光開始剤の例には、有機パーオキシド、アゾ化合物、キノン、ベンゾフェノン、ニトロソ化合物、アクリルハライド、ヒドラゾン、メルカプト化合物、ピリリウム化合物、トリアクリルイミダゾール、ビスイミダゾール、クロロアルキルトリアジン、ベンゾインエーテル、ベンジルケタール、チオキサントンおよびアセトフェノン誘導体が含まれる。好ましい光開始剤は2,2−ジメトキシ−1,2−ジフェニル−1−エタノン、2−メチル−1−(4−メチルチオフェニル)−2−モルフォリノプロパン−1−オンである。   When the binder is cured by UV irradiation, a photoinitiator is required to initiate free radical polymerization. Examples of preferred photoinitiators for this purpose include organic peroxides, azo compounds, quinones, benzophenones, nitroso compounds, acrylic halides, hydrazones, mercapto compounds, pyrylium compounds, triacrylimidazoles, bisimidazoles, chloroalkyltriazines, benzoin ethers, Benzyl ketal, thioxanthone and acetophenone derivatives are included. Preferred photoinitiators are 2,2-dimethoxy-1,2-diphenyl-1-ethanone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one.

バインダーが可視光照射で硬化される場合は、光開始剤はフリーラジカル重合を開始させることが必要とされる。この目的のために好ましい光開始剤の例は、ここに参照として挙げる米国特許第4,735,632号、第3欄、第25行から第4欄第10行、第5欄第1〜7行、第6欄第1〜35行に記載されている。   When the binder is cured by visible light irradiation, the photoinitiator is required to initiate free radical polymerization. Examples of preferred photoinitiators for this purpose are U.S. Pat. No. 4,735,632, column 3, lines 25 to 4, line 10, columns 5-7, which are hereby incorporated by reference. Line, column 6, lines 1-35.

研磨材コンポジットは、未硬化または未ゲル化状態のバインダー中に分散された複数の砥粒を含有するスラリーから形成される。硬化またはゲル化において、研磨材コンポジットは固形化、すなわち予め定められた形状および予め定められた構造に固定される。   The abrasive composite is formed from a slurry containing a plurality of abrasive grains dispersed in an uncured or ungelled binder. In curing or gelling, the abrasive composite is solidified, i.e., fixed to a predetermined shape and predetermined structure.

研磨材コンポジットにおける砥粒のバインダーに対する混合比は、一般に、バインダー100質量部に対して約50〜1000質量部の砥粒、好ましくはバインダー100質量部に対して約100〜700質量部の砥粒の範囲である。この割合は砥粒の種類とサイズおよび用いるバインダーの種類に依存して変化する。   The mixing ratio of the abrasive grains to the binder in the abrasive composite is generally about 50 to 1000 parts by weight of abrasive grains, preferably about 100 to 700 parts by weight of abrasive grains relative to 100 parts by weight of the binder. Range. This ratio varies depending on the type and size of the abrasive grains and the type of binder used.

研磨コンポジットは砥粒およびバインダー以外の材料を含んでよい。例えば、カップリング剤、湿潤剤、染料、顔料、可塑剤、フィラー、剥離剤、研磨補助剤およびこれらの混合物のような通常の添加剤である。   The abrasive composite may include materials other than abrasive grains and a binder. For example, conventional additives such as coupling agents, wetting agents, dyes, pigments, plasticizers, fillers, release agents, polishing aids and mixtures thereof.

研磨コンポジットはカップリング剤を含むことができる。カップリング剤を添加することにより、研磨コンポジットを形成するために用いるスラリーの粘度を低下させうる。本発明に好ましいこのようなカップリング剤の例には、有機シラン、ジルコアルミネートおよびチタネートが含まれる。カップリング剤の量は、一般に、砥粒の5質量%未満、好ましくは2質量%未満である。   The abrasive composite can include a coupling agent. By adding a coupling agent, the viscosity of the slurry used to form the abrasive composite can be reduced. Examples of such coupling agents preferred for the present invention include organosilanes, zircoaluminates and titanates. The amount of coupling agent is generally less than 5% by weight, preferably less than 2% by weight of the abrasive.

清掃ベルト11の三次元構造研磨材層80の溝60は、複数の三次元構造研磨材塗膜70間に形成されており、溝の形状は、バッキング層90の上面に搭載され構造化された三次元構造研磨材塗膜70の外周そのものとなる。よって、溝の深さは、切頭角錐の高さと同じ、0.2mmから5mmであり、好ましくは、0.3mmから3mmである。また、溝の幅は、0.3mm以上、好ましくは0.5mm以上、さらに好ましくは1mm以上である。   The groove 60 of the three-dimensional structure abrasive layer 80 of the cleaning belt 11 is formed between a plurality of three-dimensional structure abrasive coatings 70, and the shape of the groove is mounted on the upper surface of the backing layer 90 and structured. It becomes the outer periphery itself of the three-dimensional structure abrasive coating film 70. Thus, the depth of the groove is the same as the height of the truncated pyramid, 0.2 mm to 5 mm, and preferably 0.3 mm to 3 mm. The width of the groove is 0.3 mm or more, preferably 0.5 mm or more, and more preferably 1 mm or more.

発明にかかる清掃装置の清掃ベルトの溝寸法は、除去すべき異物(主としてガラスカレット)の寸法を考慮して決められる。図6、図7は、清掃装置の稼働時の異物(ガラスカレット)と清掃ベルトの溝60との関係を模式的に示したものである。図6に示すような溝幅がガラス基板表面に付着した異物(ガラスカレット)の外形幅寸法より広い場合、最初、ガラス基板上の異物(ガラスカレット)300の上部が研磨材層の構造化された複数の三次元構造研磨材塗膜70の上部72と接触しているに過ぎない(図6(a)参照)が、清掃ベルトがガラス基材上を摺動することで、清掃ベルト11の良好な可撓性に起因して異物(ガラスカレット)300は、溝内に包含され、溝に嵌合することになる(図6(b)参照)。ここで、「異物が溝に嵌合する」とは、異物の少なくとも上部の一部が三次元構造研磨材塗膜間に構成される溝内に包含され、ベルトの摺動により三次元構造研磨材塗膜より第二の方向(図3中N)に剪断力を受け得るようになる状態を言う。   The groove size of the cleaning belt of the cleaning device according to the invention is determined in consideration of the size of the foreign matter (mainly glass cullet) to be removed. 6 and 7 schematically show the relationship between the foreign matter (glass cullet) during operation of the cleaning device and the groove 60 of the cleaning belt. When the groove width as shown in FIG. 6 is wider than the outer width of the foreign matter (glass cullet) adhering to the glass substrate surface, the upper part of the foreign matter (glass cullet) 300 on the glass substrate is first structured into an abrasive layer. In addition, the cleaning belt 11 is only in contact with the upper portions 72 of the three-dimensional structural abrasive coatings 70 (see FIG. 6A), but the cleaning belt 11 slides on the glass substrate, Due to the good flexibility, the foreign material (glass cullet) 300 is contained in the groove and fits into the groove (see FIG. 6B). Here, “foreign matter fits into the groove” means that at least a part of the foreign matter is included in the groove formed between the coating films of the three-dimensional structure and the three-dimensional structure is polished by sliding the belt. This refers to the state in which shearing force can be applied in the second direction (N in FIG. 3) from the material coating film.

その後、溝内の異物(ガラスカレット)は、溝の側壁、すなわち良好な形状維持性を有する三次元研磨材塗膜70の側壁に衝突し(図6(c)参照)、最終的に異物(ガラスカレット)は、ガラス基板上から剥ぎ取られ溝内を移動して除去される(図6(d)参照)ことになる。   Thereafter, the foreign matter (glass cullet) in the groove collides with the side wall of the groove, that is, the side wall of the three-dimensional abrasive coating film 70 having good shape maintaining property (see FIG. 6C), and finally the foreign matter ( The glass cullet is removed from the glass substrate and moved in the groove (see FIG. 6D).

一方、図7に示すような溝幅がガラス基板表面に付着した異物(ガラスカレット)300の外形幅寸法より狭い場合、最初、ガラス基板上の異物(ガラスカレット)の上部が研磨層の三次元構造研磨材塗膜70の上部72と接触している状態から、その後、清掃ベルトが摺動することで、異物(ガラスカレット)が、溝に到達しても、溝内に包含されることなく、研磨複合体の上部を滑るだけで、異物(ガラスカレット)は、ガラス基板上から剥ぎ取られることはなく、ガラス基板上に残留することになる。   On the other hand, when the groove width as shown in FIG. 7 is narrower than the external width dimension of the foreign material (glass cullet) 300 attached to the glass substrate surface, the upper part of the foreign material (glass cullet) on the glass substrate is initially three-dimensional of the polishing layer Even if the foreign matter (glass cullet) reaches the groove from the state where it is in contact with the upper portion 72 of the structural abrasive coating 70, the cleaning belt is slid without being included in the groove. The foreign substance (glass cullet) is not peeled off from the glass substrate and remains on the glass substrate only by sliding on the upper part of the polishing composite.

具体的ガラス基板表面清掃方法の一例は、次のようになる。本発明にかかるガラス基板表面清掃装置は、次の手順で操作される。
(1)最初に、ガラス基板50の同一製造ロットからガラス基板上の異物発生状況検査の為、サンプリングを行い、サンプルについて、異物の存在個数、異物の外形寸法を調査し、異物に関する情報を得る。
ここで、異物発生状況検査としては、光学顕微鏡による検査、画像処理装置を用いての検査等で行うことができる。
(2)清掃ベルトの摺動方向(第二の方向)における異物の外形幅寸法の製造ロットにおける最大値を予測し、その値以上の溝幅を有する清掃ベルトを選択し、清掃装置に装着する。
(3)一番目のガラス基板を搬送装置上に配置した後、ガラス基板表面清掃の作業効率等を考慮して、搬送方向(第一の方向、図3中M)に対する清掃ベルトの摺動方向(第二の方向、図3中N)の交差条件を決める。
(4)清掃ベルトをガラス基板の長手方向端部に、密着させた後、ガラス基板を搬送方向(第一の方向、図3中M)に搬送するとともに、清掃ベルトを摺動方向(第二の方向、図3中N)に摺動させる。
(5)一番目のガラス基板のガラス基板表面の清掃終了後、二番目以降のガラス基板を搬送装置上に配置し、以下(3)(4)の工程を繰り返す。
An example of a specific glass substrate surface cleaning method is as follows. The glass substrate surface cleaning apparatus according to the present invention is operated by the following procedure.
(1) First, sampling is performed for inspection of the occurrence of foreign matter on the glass substrate from the same production lot of the glass substrate 50, and the number of foreign matters and the external dimensions of the foreign matter are investigated for the sample to obtain information on the foreign matters. .
Here, the foreign matter occurrence state inspection can be performed by an inspection using an optical microscope, an inspection using an image processing apparatus, or the like.
(2) Predict the maximum value in the production lot of the outer width of the foreign material in the sliding direction (second direction) of the cleaning belt, select a cleaning belt having a groove width greater than that value, and attach it to the cleaning device .
(3) After placing the first glass substrate on the conveying device, the sliding direction of the cleaning belt with respect to the conveying direction (first direction, M in FIG. 3) in consideration of the work efficiency of the glass substrate surface cleaning, etc. The intersection condition (second direction, N in FIG. 3) is determined.
(4) After the cleaning belt is brought into close contact with the longitudinal end of the glass substrate, the glass substrate is transported in the transport direction (first direction, M in FIG. 3), and the cleaning belt is slid in the sliding direction (second And slide in the direction N) in FIG.
(5) After finishing the cleaning of the glass substrate surface of the first glass substrate, the second and subsequent glass substrates are arranged on the transfer device, and the following steps (3) and (4) are repeated.

次に、本発明の実施例について比較例と併せて説明する。 Next, examples of the present invention will be described together with comparative examples.

(1)試験サンプル準備
1)実施例1、2
本発明にかかるガラス基板表面清掃方法用いるに適した三次元構造研磨材層を有する清掃ベルトを以下の方法で作製した。
(1) Test sample preparation 1) Examples 1 and 2
A cleaning belt having a three-dimensional structured abrasive layer suitable for use in the glass substrate surface cleaning method according to the present invention was produced by the following method.

表1の配合の研磨材塗液をナイフコーターにより高さ約0.5mm、1辺の長さ約2mmの正方形の上部を有する切頭四角錐(四角錐台)の表面形状を有し、切頭四角錐(四角錐台)間の距離が約1.6mmのパターンを形成するためのポリプロピレン製の賦形フィルム(2MM−30−500)上に塗布し、その上に裏面に炭酸カルシウム粒子とウレタン樹脂を含む滑り防止コーティングを有する厚さ125μmの易接着処理ポリエステルフィルムをラミネートし紫外線を照射して接着剤を硬化させ、研磨フィルムと賦形フィルムとを分離した。この研磨フィルムを110℃で24時間加熱処理した後、室温に冷却して研磨フィルムを作製した。尚、易接着処理としては、エチレンアクリル酸共重合体で下塗りしたものである。   The abrasive coating liquid of the composition shown in Table 1 has a surface shape of a truncated quadrangular pyramid (square pyramid) having a square upper part of about 0.5 mm in height and about 2 mm in length by a knife coater. It was applied on a polypropylene shaped film (2MM-30-500) for forming a pattern having a distance of about 1.6 mm between the head quadrangular pyramids (square pyramid frustum), and calcium carbonate particles on the back surface. A 125 μm thick easily-adhesive polyester film having an anti-slip coating containing a urethane resin was laminated and irradiated with ultraviolet rays to cure the adhesive, thereby separating the abrasive film and the shaped film. This polishing film was heat-treated at 110 ° C. for 24 hours, and then cooled to room temperature to produce a polishing film. In addition, as an easy-adhesion process, it coats with an ethylene acrylic acid copolymer.

2)実施例3、比較例1
住友スリーエム株式会社製 トライザクト(登録商標)ラッピングフィルム 5ミル 3ミクロン 酸化アルミニウム タイプ2
2) Example 3 and Comparative Example 1
Sumitomo 3M Co., Ltd. TRIZET (registered trademark) wrapping film 5 mil 3 micron aluminum oxide type 2

この研磨材は実施例1と同一のフィルム基材上に高さ約0.35mm、1辺の長さ約1.3mmの正方形の上面を有する切頭四角錐(四角錐台)の表面形状の研磨材層を有し、切頭四角錐(四角錐台)の距離が約0.5mmであって平均粒径3μmの酸化アルミニウムを砥粒として含む。
(2)評価試験方法と評価試験結果
1)ガラス基板を用意し、その上で同一のガラス板2枚のエッジ同士を擦らせてガラスカレットを発生させてガラス基板の上に落とし、しばらく放置して付着させた。ガラス基板を、ガラス基板に付着したガラスカレットの寸法(外形幅寸法)が1.5mm以下で0.5mm以上の群と0.5mm未満の群に分類して、試験に供した。
This abrasive has a surface shape of a truncated quadrangular pyramid (square pyramid) having a square upper surface with a height of about 0.35 mm and a side length of about 1.3 mm on the same film substrate as in Example 1. An abrasive layer is included, and aluminum oxide having a truncated quadrangular pyramid (square pyramid) distance of about 0.5 mm and an average particle diameter of 3 μm is included as abrasive grains.
(2) Evaluation test method and evaluation test result 1) Prepare a glass substrate, then rub the edges of two identical glass plates to generate a glass cullet, drop it on the glass substrate, and leave it for a while. Attached. The glass substrate was classified into a group in which the size of the glass cullet (outer width dimension) attached to the glass substrate was 1.5 mm or less and 0.5 mm or more, and a group less than 0.5 mm, and was subjected to the test.

2)実施例1、2,3及び比較例1の研磨フィルムを幅約30mm、長さ2080mmのエンドレスベルトに加工し、清掃ベルトを作製した。この清掃ベルトを清掃装置に装着し、交差角度θ(図3)を、80°設定し、ベルト摺動速度は、100m/分の速度で走行させ、その下方にカレットを付着させた表面が研磨材表面に当たるようにガラス基板を搬送速度約6m/分で通過させた。このときベルトの背面から圧力約0.1MPaで水を供給してベルトに荷重をかけ研磨材表面をガラス基板の表面に押し当て、ガラス基板の表面にさらに水を供給してカレットを付着させた表面を清掃した。清掃後のガラス表面のカレットの残存の程度を表2に示した。   2) The polishing films of Examples 1, 2, 3 and Comparative Example 1 were processed into endless belts having a width of about 30 mm and a length of 2080 mm to prepare cleaning belts. This cleaning belt is attached to the cleaning device, the crossing angle θ (FIG. 3) is set to 80 °, the belt sliding speed is 100 m / min, and the surface with the cullet attached below is polished. The glass substrate was passed at a conveyance speed of about 6 m / min so as to hit the surface of the material. At this time, water was supplied from the back surface of the belt at a pressure of about 0.1 MPa, a load was applied to the belt, the abrasive surface was pressed against the surface of the glass substrate, and water was further supplied to the surface of the glass substrate to attach the cullet. The surface was cleaned. Table 2 shows the degree of cullet remaining on the glass surface after cleaning.

10 ガラス基板清掃機構
11 清掃ベルト
12 駆動ガイドプーリ
13、14,15 従動ガイドプーリ
18 駆動モータ
20 ガラス基板支持搬送機構
21 搬入ローラシャフト
22 搬出ローラシャフト
23 ガイド
30 荷重付加装置
50 ガラス基板
60 溝
62 溝幅
70 三次元構造研磨材塗膜
72 (三次元構造研磨材塗膜の)上部
74 (三次元構造研磨材塗膜の)下部
80 三次元構造研磨材層
90 バッキング層
100 ガラス基板表面清掃装置
300 異物(主としてガラスカレット)
DESCRIPTION OF SYMBOLS 10 Glass substrate cleaning mechanism 11 Cleaning belt 12 Drive guide pulley 13, 14, 15 Drive guide pulley
18 drive motor 20 glass substrate support and conveyance mechanism 21 carry-in roller shaft 22 carry-out roller shaft 23 guide 30 load applying device 50 glass substrate 60 groove 62 groove width 70 three-dimensional structure abrasive coating 72 (of three-dimensional structure abrasive coating) Upper part 74 Lower part of three-dimensional structure abrasive coating film 80 Three-dimensional structure abrasive layer 90 Backing layer 100 Glass substrate surface cleaning device 300 Foreign matter (mainly glass cullet)

Claims (2)

ガラス基板支持搬送機構を用いて第一の方向にガラス基板を搬送する工程、前記ガラス基板表面に付着した異物を除去するためにガラス基板清掃機構有する清掃ベルトを、前記ガラス基板の表面上で前記第一の方向に対し交差する第二の方向に摺動させる工程を含み、前記清掃ベルトが、その表面に複数の三次元構造研磨材塗膜とそれら三次元構造研磨材塗膜の間の溝とを有する、ガラス基板表面清掃方法であって、
同一製造ロットの複数のガラス基板について、それらガラス基板の表面に付着した異物の外形幅寸法を調査する工程と、
調査した前記異物の外形幅寸法に基づき、前記製造ロットにおける前記異物の外形幅寸法の最大値を予測する工程と、
前記溝の溝幅が、予測した前記異物の外形幅寸法の最大値以上である前記清掃ベルトを用意する工程と、
を含むことを特徴とするガラス基板表面清掃方法。
A step of conveying the glass substrate in a first direction using a glass substrate support transfer mechanism, a cleaning belt having a glass substrate cleaning mechanism for removing foreign matters adhering to the surface of the glass substrate, the surface of the glass substrate look including the step of sliding in a second direction intersecting to said first direction on said cleaning belt, they three-dimensional structured abrasive material coating and a plurality of three-dimensional structure abrasive coating on the surface thereof A glass substrate surface cleaning method having a groove between films ,
For a plurality of glass substrates in the same production lot, a step of examining the outer width of foreign substances attached to the surfaces of the glass substrates,
A step of predicting a maximum value of the outer width dimension of the foreign matter in the manufacturing lot based on the outer width dimension of the foreign matter investigated;
A step of preparing the cleaning belt, wherein the groove width of the groove is equal to or greater than the predicted maximum width of the foreign substance;
The glass substrate surface cleaning method characterized by including .
請求項1に記載のガラス基板表面清掃方法に使用される清掃ベルト。The cleaning belt used for the glass substrate surface cleaning method of Claim 1.
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