JP5815616B2 - エバポレータ - Google Patents
エバポレータ Download PDFInfo
- Publication number
- JP5815616B2 JP5815616B2 JP2013169472A JP2013169472A JP5815616B2 JP 5815616 B2 JP5815616 B2 JP 5815616B2 JP 2013169472 A JP2013169472 A JP 2013169472A JP 2013169472 A JP2013169472 A JP 2013169472A JP 5815616 B2 JP5815616 B2 JP 5815616B2
- Authority
- JP
- Japan
- Prior art keywords
- containment vessel
- component
- crucible
- refractory ceramic
- ceramic material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
Claims (4)
- 基板に対する被覆の付与に使用する被覆材料を蒸発させるための格納容器であって、
a)蒸気流のための内部流路を画定する耐火性セラミック材料から作製された上部構成要素であって、蒸気流を制御するための比較的小さな内径を有する部分を有し、及び内方へテーパー付けされた外面を有する環状下部を含む、上部構成要素と、
b)蒸発させるべき被覆材料を収容するための内部空間を画定する耐火性セラミック材料から作製された下部構成要素であって、前記上部構成要素の前記下部の前記テーパー付けされた外面にぴったりと係合して機械的な結合を共に形成するよう構成された外方へテーパー付けされた内面を有する環状部分を含む上部を有する、下部構成要素とを備えている格納容器。 - 基板に対する被覆の付与に使用する被覆材料を蒸発させるための格納容器であって、
a)蒸気流のための内部流路を画定する耐火性セラミック材料から作製された上部構成要素であって、蒸気流を制御するための比較的小さな内径を有する部分を有し、及び内方へテーパー付けされた外面を有する環状下部を含む、上部構成要素と、
b)蒸発させるべき被覆材料を収容するための内部空間を画定する耐火性セラミック材料から作製された下部構成要素であって、環状部分を含む上部を有し、該環状部分は、前記上部構成要素の前記下部の前記外面のテーパーに対応する角度で外方へ広がっており、前記上部構成要素の前記下部の前記テーパー付けされた外面にぴったりと係合して機械的な結合を共に形成するよう構成されている、下部構成要素とを備えている格納容器。 - 前記上部構成要素の前記下部構成要素内への挿入深さが、3mm〜10mmの範囲である、請求項2に記載の格納容器。
- 前記耐火性セラミック材料が熱分解窒化ホウ素からなる、請求項1〜3の何れかに記載の格納容器。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/228,392 | 2008-08-12 | ||
US12/228,392 US8512806B2 (en) | 2008-08-12 | 2008-08-12 | Large volume evaporation source |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011522974A Division JP5603334B2 (ja) | 2008-08-12 | 2009-08-06 | エバポレータ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014029027A JP2014029027A (ja) | 2014-02-13 |
JP5815616B2 true JP5815616B2 (ja) | 2015-11-17 |
Family
ID=41070535
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011522974A Expired - Fee Related JP5603334B2 (ja) | 2008-08-12 | 2009-08-06 | エバポレータ |
JP2013169472A Expired - Fee Related JP5815616B2 (ja) | 2008-08-12 | 2013-08-19 | エバポレータ |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011522974A Expired - Fee Related JP5603334B2 (ja) | 2008-08-12 | 2009-08-06 | エバポレータ |
Country Status (5)
Country | Link |
---|---|
US (1) | US8512806B2 (ja) |
EP (1) | EP2310550A1 (ja) |
JP (2) | JP5603334B2 (ja) |
CN (1) | CN102177272A (ja) |
WO (1) | WO2010019200A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101265067B1 (ko) * | 2010-06-10 | 2013-05-16 | 한국과학기술연구원 | 측면 방출형 선형증발원, 그 제작 방법 및 선형증발기 |
FR2981667B1 (fr) * | 2011-10-21 | 2014-07-04 | Riber | Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide |
DE102014221561A1 (de) | 2014-10-23 | 2016-04-28 | Beijing Apollo Ding Rong Solar Technology Co., Ltd. | Vorrichtung zur Aufnahme von Verdampfungsgut und Verfahren zur Herstellung einer Vorrichtung |
EP3786311A1 (de) * | 2019-08-30 | 2021-03-03 | Theva Dünnschichttechnik GmbH | Vorrichtung, verfahren und system zur beschichtung eines substrats, insbesondere eines supraleitenden bandleiter sowie beschichteter supraleitender bandleiter |
CN116240500A (zh) * | 2021-12-07 | 2023-06-09 | 长州产业株式会社 | 蒸镀源和蒸镀装置 |
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DE1276421B (de) | 1966-08-24 | 1968-08-29 | Leybold Heraeus Gmbh & Co Kg | Verdampfungstiegel fuer Vakuum-Bandbedampfungsanlagen |
US4534099A (en) * | 1982-10-15 | 1985-08-13 | Standard Oil Company (Indiana) | Method of making multilayer photoelectrodes and photovoltaic cells |
JPS61132589A (ja) | 1984-11-30 | 1986-06-20 | Agency Of Ind Science & Technol | 蒸着用ルツボ |
JPS6353259A (ja) * | 1986-08-22 | 1988-03-07 | Mitsubishi Electric Corp | 薄膜形成方法 |
JP2786685B2 (ja) * | 1989-08-28 | 1998-08-13 | 株式会社東芝 | 金属の蒸発装置 |
US5031229A (en) * | 1989-09-13 | 1991-07-09 | Chow Loren A | Deposition heaters |
US5395180A (en) * | 1993-12-14 | 1995-03-07 | Advanced Ceramics Corporation | Boron nitride vaporization vessel |
WO1996021749A1 (en) * | 1994-09-28 | 1996-07-18 | Advanced Ceramics Corporation | High density flash evaporator |
US5495550A (en) * | 1994-09-28 | 1996-02-27 | Advanced Ceramics Corporation | Graphite flash evaporator having at least one intermediate layer and a pyrolytic boron nitride coating |
US5493630A (en) * | 1994-09-28 | 1996-02-20 | Advanced Ceramics Corporation | Pyrolytic boron nitride coated flash evaporator |
US5827371A (en) | 1995-05-03 | 1998-10-27 | Chorus Corporation | Unibody crucible and effusion source employing such a crucible |
US5820681A (en) * | 1995-05-03 | 1998-10-13 | Chorus Corporation | Unibody crucible and effusion cell employing such a crucible |
JP2000012218A (ja) * | 1998-06-23 | 2000-01-14 | Tdk Corp | 有機el素子の製造装置および製造方法 |
JP2003077662A (ja) * | 2001-06-22 | 2003-03-14 | Junji Kido | 有機エレクトロルミネッセンス素子の製造方法および製造装置 |
JP3616586B2 (ja) * | 2001-07-19 | 2005-02-02 | 株式会社日本ビーテック | 薄膜堆積用分子線源セル |
JP4002769B2 (ja) | 2002-03-01 | 2007-11-07 | 株式会社アルバック | 蒸発容器とその蒸発容器を有する成膜装置 |
JP2004027252A (ja) * | 2002-06-21 | 2004-01-29 | Samsung Nec Mobile Display Co Ltd | 有機薄膜形成装置の加熱容器 |
US20040144321A1 (en) * | 2003-01-28 | 2004-07-29 | Eastman Kodak Company | Method of designing a thermal physical vapor deposition system |
US20050064247A1 (en) * | 2003-06-25 | 2005-03-24 | Ajit Sane | Composite refractory metal carbide coating on a substrate and method for making thereof |
CN100557068C (zh) | 2004-01-22 | 2009-11-04 | 双叶电子工业株式会社 | 真空沉积方法和真空沉积用密封型蒸发源设备 |
US20060127067A1 (en) * | 2004-12-13 | 2006-06-15 | General Electric Company | Fast heating and cooling wafer handling assembly and method of manufacturing thereof |
US7166169B2 (en) | 2005-01-11 | 2007-01-23 | Eastman Kodak Company | Vaporization source with baffle |
US7221860B2 (en) * | 2005-04-22 | 2007-05-22 | Momentive Performance Materials Inc. | Vacuum insulated heater assembly |
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JP4728882B2 (ja) * | 2006-06-09 | 2011-07-20 | 長州産業株式会社 | 薄膜堆積用分子線源用坩堝の製造方法 |
US8747554B2 (en) * | 2006-06-20 | 2014-06-10 | Momentive Performance Materials Inc. | Multi-piece ceramic crucible and method for making thereof |
US7901509B2 (en) * | 2006-09-19 | 2011-03-08 | Momentive Performance Materials Inc. | Heating apparatus with enhanced thermal uniformity and method for making thereof |
JP2008174803A (ja) * | 2007-01-19 | 2008-07-31 | Seiko Epson Corp | 蒸着用蒸気流放出装置、および蒸着装置 |
EP1967605A1 (en) * | 2007-03-08 | 2008-09-10 | Applied Materials, Inc. | Evaporation tube and evaporation apparatus with adapted evaporation characteristic |
-
2008
- 2008-08-12 US US12/228,392 patent/US8512806B2/en not_active Expired - Fee Related
-
2009
- 2009-08-06 EP EP09789079A patent/EP2310550A1/en not_active Withdrawn
- 2009-08-06 CN CN2009801402803A patent/CN102177272A/zh active Pending
- 2009-08-06 WO PCT/US2009/004524 patent/WO2010019200A1/en active Application Filing
- 2009-08-06 JP JP2011522974A patent/JP5603334B2/ja not_active Expired - Fee Related
-
2013
- 2013-08-19 JP JP2013169472A patent/JP5815616B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP5603334B2 (ja) | 2014-10-08 |
WO2010019200A1 (en) | 2010-02-18 |
JP2011530660A (ja) | 2011-12-22 |
JP2014029027A (ja) | 2014-02-13 |
EP2310550A1 (en) | 2011-04-20 |
US20100040780A1 (en) | 2010-02-18 |
US8512806B2 (en) | 2013-08-20 |
CN102177272A (zh) | 2011-09-07 |
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