JP5814547B2 - 高周波スイッチ - Google Patents
高周波スイッチ Download PDFInfo
- Publication number
- JP5814547B2 JP5814547B2 JP2010283709A JP2010283709A JP5814547B2 JP 5814547 B2 JP5814547 B2 JP 5814547B2 JP 2010283709 A JP2010283709 A JP 2010283709A JP 2010283709 A JP2010283709 A JP 2010283709A JP 5814547 B2 JP5814547 B2 JP 5814547B2
- Authority
- JP
- Japan
- Prior art keywords
- mosfet
- switch
- terminal
- port
- frequency switch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005540 biological transmission Effects 0.000 claims description 53
- 239000003990 capacitor Substances 0.000 claims description 26
- 230000003071 parasitic effect Effects 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 230000000903 blocking effect Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 11
- 210000000746 body region Anatomy 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 230000005405 multipole Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/687—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
- H03K17/693—Switching arrangements with several input- or output-terminals, e.g. multiplexers, distributors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B1/00—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
- H04B1/38—Transceivers, i.e. devices in which transmitter and receiver form a structural unit and in which at least one part is used for functions of transmitting and receiving
- H04B1/40—Circuits
- H04B1/44—Transmit/receive switching
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Networks & Wireless Communication (AREA)
- Signal Processing (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electronic Switches (AREA)
Description
100A、100B スイッチ部、
110 アンテナ。
Claims (5)
- アンテナへ送信信号が出力される共通ポートと、
前記送信信号が入力される送信ポートと、
複数の前記送信ポートと前記共通ポートとの間にそれぞれ接続され、各送信ポートから前記共通ポートへの前記送信信号を導通または遮断する複数のスイッチ部と、を有し、
前記スイッチ部はシリコン基板に形成された一以上のMOSFETを有し、前記MOSFETのうち前記共通ポートに接続された先頭MOSFETのボディ端子と前記共通ポートに接続された端子との間にキャパシタが接続され、
前記キャパシタは、前記先頭MOSFETの前記共通ポートに接続されたドレイン端子と、前記先頭MOSFETのボディ端子との間のPN接合による寄生ダイオードが、前記先頭MOSFETの非導通時に、前記ドレイン端子に印加された電圧により導通しないように、前記ドレイン端子に印加された電圧を前記ボディ端子にフィードフォワードさせることを特徴とする高周波スイッチ。 - 前記スイッチ部はそれぞれ複数の前記MOSFETが直列に接続されてなり、前記MOSFETのうち前記アンテナに接続された前記MOSFETにのみ前記キャパシタが接続されたことを特徴とする請求項1に記載の高周波スイッチ。
- 前記MOSFETの前記ボディ端子にはそれぞれ抵抗器を介して基板電位が供給されることを特徴とする請求項1または2に記載の高周波スイッチ。
- 前記シリコン基板はSOI基板であることを特徴とする請求項1〜3のいずれか一項に記載の高周波スイッチ。
- 前記シリコン基板はバルク基板であることを特徴とする請求項1〜3のいずれか一項に記載の高周波スイッチ。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010283709A JP5814547B2 (ja) | 2010-12-20 | 2010-12-20 | 高周波スイッチ |
KR1020110087272A KR101218993B1 (ko) | 2010-12-20 | 2011-08-30 | 고주파 스위치 |
US13/355,292 US8779840B2 (en) | 2010-12-20 | 2012-01-20 | High frequency switch |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010283709A JP5814547B2 (ja) | 2010-12-20 | 2010-12-20 | 高周波スイッチ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012134665A JP2012134665A (ja) | 2012-07-12 |
JP5814547B2 true JP5814547B2 (ja) | 2015-11-17 |
Family
ID=46233583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010283709A Expired - Fee Related JP5814547B2 (ja) | 2010-12-20 | 2010-12-20 | 高周波スイッチ |
Country Status (3)
Country | Link |
---|---|
US (1) | US8779840B2 (ja) |
JP (1) | JP5814547B2 (ja) |
KR (1) | KR101218993B1 (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10056895B2 (en) * | 2010-04-27 | 2018-08-21 | Qorvo Us, Inc. | High power FET switch |
US9035716B2 (en) * | 2012-01-20 | 2015-05-19 | Samsung Electro-Mechanics Co., Ltd. | High frequency switch |
US9628075B2 (en) | 2012-07-07 | 2017-04-18 | Skyworks Solutions, Inc. | Radio-frequency switch having dynamic body coupling |
US9276570B2 (en) | 2012-07-07 | 2016-03-01 | Skyworks Solutions, Inc. | Radio-frequency switch having gate node voltage compensation network |
US8975950B2 (en) | 2012-07-07 | 2015-03-10 | Skyworks Solutions, Inc. | Switching device having a discharge circuit for improved intermodulation distortion performance |
TWI628840B (zh) * | 2012-07-07 | 2018-07-01 | 西凱渥資訊處理科技公司 | 與基於射頻開關之絕緣體上矽相關之電路、裝置、方法及其組合 |
US9148194B2 (en) | 2012-07-07 | 2015-09-29 | Skyworks Solutions, Inc. | Radio-frequency switch system having improved intermodulation distortion performance |
US9160328B2 (en) | 2012-07-07 | 2015-10-13 | Skyworks Solutions, Inc. | Circuits, devices, methods and applications related to silicon-on-insulator based radio-frequency switches |
US10147724B2 (en) | 2012-07-07 | 2018-12-04 | Skyworks Solutions, Inc. | Feed-forward circuit to improve intermodulation distortion performance of radio-frequency switch |
US9059702B2 (en) | 2012-07-07 | 2015-06-16 | Skyworks Solutions, Inc. | Switch linearization by non-linear compensation of a field-effect transistor |
KR101378866B1 (ko) * | 2012-08-23 | 2014-03-27 | 주식회사 하이딥 | 저전력 rf 스위치 |
US9013225B2 (en) | 2013-02-04 | 2015-04-21 | Skyworks Solutions, Inc. | RF switches having increased voltage swing uniformity |
KR101952857B1 (ko) * | 2013-12-20 | 2019-02-27 | 삼성전기주식회사 | 스위칭 회로 및 이를 포함하는 고주파 스위치 |
US20160085256A1 (en) * | 2014-02-18 | 2016-03-24 | Acco | Body Biasing for RF Switch Optimization |
US9641201B2 (en) * | 2014-04-29 | 2017-05-02 | Infineon Technologies Ag | System and method for a radio frequency integrated circuit |
KR101901694B1 (ko) | 2014-05-09 | 2018-09-27 | 삼성전기 주식회사 | 고주파 스위치 |
US9503074B2 (en) | 2015-03-06 | 2016-11-22 | Qualcomm Incorporated | RF circuit with switch transistor with body connection |
KR101670167B1 (ko) * | 2015-03-25 | 2016-10-27 | 삼성전기주식회사 | 고주파 스위치 회로 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2964975B2 (ja) * | 1997-02-26 | 1999-10-18 | 日本電気株式会社 | 高周波スイッチ回路 |
JP3736356B2 (ja) | 2001-02-01 | 2006-01-18 | 日本電気株式会社 | 高周波スイッチ回路 |
US6804502B2 (en) | 2001-10-10 | 2004-10-12 | Peregrine Semiconductor Corporation | Switch circuit and method of switching radio frequency signals |
JP2005348206A (ja) * | 2004-06-04 | 2005-12-15 | Matsushita Electric Ind Co Ltd | 高周波スイッチ回路及びそれを用いた半導体装置 |
DE112007000404B4 (de) | 2006-02-17 | 2022-03-31 | Fairchild Semiconductor Corporation | Verfahren zur Reduzierung von Einfügungsverlust und Bereitstellung von Abschaltschutz für MOSFET-Schalter |
US7890063B2 (en) * | 2006-10-03 | 2011-02-15 | Samsung Electro-Mechanics | Systems, methods, and apparatuses for complementary metal oxide semiconductor (CMOS) antenna switches using body switching in multistacking structure |
WO2008133620A1 (en) * | 2007-04-26 | 2008-11-06 | University Of Florida | High power t/r switch using stacked transistors |
JP2010212801A (ja) * | 2009-03-06 | 2010-09-24 | Renesas Electronics Corp | スイッチ回路 |
US8395435B2 (en) * | 2009-07-30 | 2013-03-12 | Qualcomm, Incorporated | Switches with bias resistors for even voltage distribution |
JP5476198B2 (ja) * | 2010-04-19 | 2014-04-23 | ルネサスエレクトロニクス株式会社 | 高周波スイッチ回路 |
-
2010
- 2010-12-20 JP JP2010283709A patent/JP5814547B2/ja not_active Expired - Fee Related
-
2011
- 2011-08-30 KR KR1020110087272A patent/KR101218993B1/ko active IP Right Grant
-
2012
- 2012-01-20 US US13/355,292 patent/US8779840B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US8779840B2 (en) | 2014-07-15 |
JP2012134665A (ja) | 2012-07-12 |
KR20120069525A (ko) | 2012-06-28 |
US20120154017A1 (en) | 2012-06-21 |
KR101218993B1 (ko) | 2013-01-21 |
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