JP5810667B2 - 光デバイス及び検出装置 - Google Patents

光デバイス及び検出装置 Download PDF

Info

Publication number
JP5810667B2
JP5810667B2 JP2011139526A JP2011139526A JP5810667B2 JP 5810667 B2 JP5810667 B2 JP 5810667B2 JP 2011139526 A JP2011139526 A JP 2011139526A JP 2011139526 A JP2011139526 A JP 2011139526A JP 5810667 B2 JP5810667 B2 JP 5810667B2
Authority
JP
Japan
Prior art keywords
optical device
metal
period
metal nanoparticles
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011139526A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013007614A5 (enExample
JP2013007614A (ja
Inventor
尼子 淳
淳 尼子
山田 耕平
耕平 山田
達徳 宮澤
達徳 宮澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2011139526A priority Critical patent/JP5810667B2/ja
Priority to US13/530,741 priority patent/US8836946B2/en
Publication of JP2013007614A publication Critical patent/JP2013007614A/ja
Publication of JP2013007614A5 publication Critical patent/JP2013007614A5/ja
Application granted granted Critical
Publication of JP5810667B2 publication Critical patent/JP5810667B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65Raman scattering
    • G01N21/658Raman scattering enhancement Raman, e.g. surface plasmons
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y15/00Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biophysics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Optics & Photonics (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
JP2011139526A 2011-06-23 2011-06-23 光デバイス及び検出装置 Active JP5810667B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011139526A JP5810667B2 (ja) 2011-06-23 2011-06-23 光デバイス及び検出装置
US13/530,741 US8836946B2 (en) 2011-06-23 2012-06-22 Optical device and detection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011139526A JP5810667B2 (ja) 2011-06-23 2011-06-23 光デバイス及び検出装置

Publications (3)

Publication Number Publication Date
JP2013007614A JP2013007614A (ja) 2013-01-10
JP2013007614A5 JP2013007614A5 (enExample) 2014-07-24
JP5810667B2 true JP5810667B2 (ja) 2015-11-11

Family

ID=47361557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011139526A Active JP5810667B2 (ja) 2011-06-23 2011-06-23 光デバイス及び検出装置

Country Status (2)

Country Link
US (1) US8836946B2 (enExample)
JP (1) JP5810667B2 (enExample)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5928026B2 (ja) * 2012-03-15 2016-06-01 セイコーエプソン株式会社 センサーチップおよびその製造方法並びに検出装置
JP5304939B1 (ja) 2012-05-31 2013-10-02 大日本印刷株式会社 光学積層体、偏光板、偏光板の製造方法、画像表示装置、画像表示装置の製造方法及び画像表示装置の視認性改善方法
JP2014163868A (ja) * 2013-02-27 2014-09-08 Seiko Epson Corp 光学素子、分析装置、分析方法、および電子機器
JP2014163869A (ja) * 2013-02-27 2014-09-08 Seiko Epson Corp 光学素子、分析装置、分析方法、および電子機器
KR101542142B1 (ko) * 2013-02-27 2015-08-05 한국과학기술원 나노리소그래피용 마이크로팁 어레이, 이의 제조방법 및 이를 이용한 나노리소그래피 방법
JP5737635B2 (ja) * 2013-03-01 2015-06-17 大日本印刷株式会社 金属粒子が担持されたフィルムおよびフィルム製造方法
JP2014169955A (ja) * 2013-03-05 2014-09-18 Seiko Epson Corp 分析装置、分析方法、これらに用いる光学素子および電子機器、並びに光学素子の設計方法
JP2014173920A (ja) * 2013-03-07 2014-09-22 Seiko Epson Corp 分析装置、分析方法、これらに用いる光学素子および電子機器、並びに光学素子の設計方法
JP6248403B2 (ja) * 2013-03-28 2017-12-20 セイコーエプソン株式会社 検出装置及び電子機器
TWI498540B (zh) * 2013-05-30 2015-09-01 Univ Nat Cheng Kung 具不對稱粒子形狀之定域化表面電漿共振檢測系統
JP6252053B2 (ja) * 2013-09-09 2017-12-27 大日本印刷株式会社 表面増強ラマン散乱測定用基板、及びその製造方法
JP6365817B2 (ja) 2014-02-17 2018-08-01 セイコーエプソン株式会社 分析装置、及び電子機器
JP2015152492A (ja) * 2014-02-17 2015-08-24 セイコーエプソン株式会社 分析装置、及び電子機器
JP2015215178A (ja) 2014-05-08 2015-12-03 セイコーエプソン株式会社 電場増強素子、分析装置及び電子機器
JP6456683B2 (ja) * 2014-12-25 2019-01-23 富士電機株式会社 光増強素子及び分析装置
JP2016142617A (ja) * 2015-02-02 2016-08-08 セイコーエプソン株式会社 電場増強素子、分析装置、及び電子機器
US9778183B2 (en) 2015-08-20 2017-10-03 Industrial Technology Research Institute Sensing chip
JP6613736B2 (ja) * 2015-09-07 2019-12-04 セイコーエプソン株式会社 物質検出方法および物質検出装置
JP6586867B2 (ja) * 2015-12-08 2019-10-09 セイコーエプソン株式会社 電場増強素子およびラマン分光装置
CN105576497A (zh) * 2016-03-01 2016-05-11 中国科学院半导体研究所 表面增强的相干反斯托克斯拉曼散射的结构
JP6792341B2 (ja) * 2016-03-30 2020-11-25 キッコーマン株式会社 金属ナノ構造体アレイ及び電場増強デバイス
JP6714427B2 (ja) * 2016-05-17 2020-06-24 アズビル株式会社 粒子検出装置及び粒子検出装置の検査方法
US10371874B2 (en) * 2016-06-20 2019-08-06 Yonsei University, University—Industry Foundation (UIF) Substrate unit of nanostructure assembly type, optical imaging apparatus including the same, and controlling method thereof
US20180059026A1 (en) * 2016-08-23 2018-03-01 Optokey, Inc. Surface Enhanced Raman Spectroscopy (SERS) Structure For Double Resonance Output
KR101935892B1 (ko) * 2016-10-05 2019-01-07 이화여자대학교 산학협력단 인광 발광 구조체 및 이의 제조방법
US10408752B2 (en) * 2016-10-18 2019-09-10 National Taiwan University Plasmonic sensor
US10371642B2 (en) * 2016-12-08 2019-08-06 The Board Of Trustees Of The Leland Stanford Junior University Raman topography system and methods of imaging
CN106645093A (zh) * 2017-03-21 2017-05-10 中国工程物理研究院材料研究所 一种拉曼光谱面成像设备
CN106950218B (zh) * 2017-04-28 2023-11-14 南方科技大学 一种表面增强拉曼散射基底及其制备方法
CN107389656A (zh) * 2017-07-31 2017-11-24 江南大学 拉曼光谱表征反复冻融过程中牛肉脂肪品质变化的方法
US10620122B2 (en) * 2018-04-05 2020-04-14 Picoyune, Llc Equilibrium plasmonic mercury sensing apparatus and methods
US20240159671A1 (en) * 2018-04-05 2024-05-16 Jay James Equilibrium Plasmonic Analyte Sensing Apparatus and Methods
CN111610177B (zh) * 2020-06-11 2023-03-24 北京大学 一种micro LED芯片的拉曼增强的检测方法及其装置
CN112072319B (zh) * 2020-08-31 2022-03-01 泉州师范学院 一种金属等离激元纳米光学天线的制备方法
CN112304493B (zh) * 2020-10-29 2022-04-15 西北工业大学 一种基于ccd相机的光学压敏涂料幅频特性检测方法
US12235236B2 (en) * 2021-05-28 2025-02-25 Northeastern University Sensors with capacitive transduction via metamaterials for gas detection
US11959859B2 (en) 2021-06-02 2024-04-16 Edwin Thomas Carlen Multi-gas detection system and method

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3452837B2 (ja) 1999-06-14 2003-10-06 理化学研究所 局在プラズモン共鳴センサー
JP2002357543A (ja) * 2001-06-01 2002-12-13 Mitsubishi Chemicals Corp 分析素子、並びにそれを用いた試料の分析方法
JP4231701B2 (ja) 2002-01-08 2009-03-04 富士フイルム株式会社 プラズモン共鳴デバイス
US7079250B2 (en) 2002-01-08 2006-07-18 Fuji Photo Film Co., Ltd. Structure, structure manufacturing method and sensor using the same
JP3897703B2 (ja) 2002-01-11 2007-03-28 キヤノン株式会社 センサ装置およびそれを用いた検査方法
US7399445B2 (en) 2002-01-11 2008-07-15 Canon Kabushiki Kaisha Chemical sensor
NZ551786A (en) * 2004-05-19 2011-03-31 Vp Holding Llc Optical sensor with layered plasmon structure for enhanced detection of chemical groups by surface enhanced raman scattering
GB0424458D0 (en) 2004-11-04 2004-12-08 Mesophotonics Ltd Metal nano-void photonic crystal for enhanced raman spectroscopy
GB2419940B (en) 2004-11-04 2007-03-07 Mesophotonics Ltd Metal nano-void photonic crystal for enhanced raman spectroscopy
JP2007240361A (ja) 2006-03-09 2007-09-20 Sekisui Chem Co Ltd 局在プラズモン増強センサ
JP4994682B2 (ja) 2006-03-16 2012-08-08 キヤノン株式会社 検知素子、該検知素子を用いた標的物質検知装置及び標的物質を検知する方法
JP5286515B2 (ja) 2006-05-11 2013-09-11 国立大学法人秋田大学 センサチップ及びセンサチップ製造方法
JP2008196898A (ja) * 2007-02-09 2008-08-28 Osaka Prefecture プラズモン共鳴構造体及びその制御方法
JP2009250951A (ja) * 2008-04-11 2009-10-29 Fujifilm Corp 電場増強光デバイス
JP2010025753A (ja) 2008-07-18 2010-02-04 Hokkaido Univ 表面増強ラマン分光法、及び当該表面増強ラマン分光法を可能にする微細構造体
US8384892B2 (en) 2008-10-03 2013-02-26 Board Of Trustees Of The University Of Illinois Surface enhanced raman spectroscopy on optical resonator (e.g., photonic crystal) surfaces
JP2010096645A (ja) * 2008-10-17 2010-04-30 National Institute Of Advanced Industrial Science & Technology 周期構造を有するマイクロプレート、並びに、それを用いた表面プラズモン励起増強蛍光顕微鏡、蛍光マイクロプレートリーダーおよび特異的な抗原抗体反応の検出方法
JP5621394B2 (ja) 2009-11-19 2014-11-12 セイコーエプソン株式会社 センサーチップ、センサーカートリッジ及び分析装置
EP2325635B1 (en) 2009-11-19 2017-05-03 Seiko Epson Corporation Sensor chip, sensor cartridge, and analysis apparatus
JP5589656B2 (ja) 2009-12-11 2014-09-17 セイコーエプソン株式会社 センサーチップ、センサーカートリッジ及び分析装置

Also Published As

Publication number Publication date
US20120327417A1 (en) 2012-12-27
US8836946B2 (en) 2014-09-16
JP2013007614A (ja) 2013-01-10

Similar Documents

Publication Publication Date Title
JP5810667B2 (ja) 光デバイス及び検出装置
JP5821511B2 (ja) 光デバイス及び検出装置
US9404861B2 (en) Nanostructure diffraction gratings for integrated spectroscopy and sensing
JP5609241B2 (ja) 分光方法及び分析装置
US9151666B2 (en) Sensor chip, sensor cartridge, and analysis apparatus
JP5565215B2 (ja) センサーチップ、センサーカートリッジ及び分析装置
US10627335B2 (en) Structure for use in infrared spectroscopy and infrared spectroscopy method using same
Williams et al. Accessing surface plasmons with Ni microarrays for enhanced IR absorption by monolayers
JP5655435B2 (ja) センサーチップ、センサーカートリッジ及び分析装置
JP5560891B2 (ja) 光デバイス及び分析装置
JP2015055482A (ja) 分析装置、分析方法、これらに用いる光学素子及び電子機器
US8837039B2 (en) Multiscale light amplification structures for surface enhanced Raman spectroscopy
Bouhelier et al. Excitation of broadband surface plasmon polaritons: Plasmonic continuum spectroscopy
JP2010531995A (ja) 電界強化構造、及び該構造を利用した検出装置
JP2013007614A5 (enExample)
US20140242573A1 (en) Optical element, analysis device, analysis method and electronic apparatus
US20140242571A1 (en) Optical element, analysis equipment, analysis method and electronic apparatus
JP5796395B2 (ja) 光学デバイス、検出装置及び検出方法
JP2013096939A (ja) 光デバイス及び検出装置
Jin et al. Large-area nanogap plasmon resonator arrays for plasmonics applications
CN103018211A (zh) 传感器芯片、传感器盒及分析装置
US9880100B2 (en) Electronic field enhancement element, analysis device, and electronic apparatus
JP7598614B2 (ja) ラマン分光測定装置、ラマン分光測定方法および表面増強ラマン散乱デバイス
Mousavi et al. Lab-on-A-chip compatible design laying over nanostructured silicon
JP2017173084A (ja) 表面増強ラマン散乱分析用基板、その製造方法およびその使用方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140611

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140611

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20150218

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150310

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150511

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150818

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150831

R150 Certificate of patent (=grant) or registration of utility model

Ref document number: 5810667

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350