JP5803986B2 - 設備管理システム - Google Patents

設備管理システム Download PDF

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Publication number
JP5803986B2
JP5803986B2 JP2013128640A JP2013128640A JP5803986B2 JP 5803986 B2 JP5803986 B2 JP 5803986B2 JP 2013128640 A JP2013128640 A JP 2013128640A JP 2013128640 A JP2013128640 A JP 2013128640A JP 5803986 B2 JP5803986 B2 JP 5803986B2
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JP
Japan
Prior art keywords
communication device
facility
analysis result
information
water treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013128640A
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English (en)
Japanese (ja)
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JP2015003279A (ja
JP2015003279A5 (https=
Inventor
信太郎 森
信太郎 森
幸祐 志村
幸祐 志村
福江　晋
晋 福江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kurita Water Industries Ltd
Original Assignee
Kurita Water Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurita Water Industries Ltd filed Critical Kurita Water Industries Ltd
Priority to JP2013128640A priority Critical patent/JP5803986B2/ja
Priority to PCT/JP2014/062575 priority patent/WO2014203651A1/ja
Priority to US14/893,387 priority patent/US20160096742A1/en
Priority to TW103117890A priority patent/TWI591464B/zh
Publication of JP2015003279A publication Critical patent/JP2015003279A/ja
Publication of JP2015003279A5 publication Critical patent/JP2015003279A5/ja
Application granted granted Critical
Publication of JP5803986B2 publication Critical patent/JP5803986B2/ja
Priority to US15/424,403 priority patent/US20170153216A1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/18—Water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B11/00—Automatic controllers
    • G05B11/01—Automatic controllers electric
    • G05B11/012—Automatic controllers electric details of the transmission means
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/023—Water in cooling circuits
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/008—Mobile apparatus and plants, e.g. mounted on a vehicle
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/005—Processes using a programmable logic controller [PLC]
    • C02F2209/008—Processes using a programmable logic controller [PLC] comprising telecommunication features, e.g. modems or antennas
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/08—Corrosion inhibition
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/14—Maintenance of water treatment installations
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/20—Prevention of biofouling
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/22—Eliminating or preventing deposits, scale removal, scale prevention

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Hydrology & Water Resources (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Food Science & Technology (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Testing And Monitoring For Control Systems (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
JP2013128640A 2013-06-19 2013-06-19 設備管理システム Active JP5803986B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2013128640A JP5803986B2 (ja) 2013-06-19 2013-06-19 設備管理システム
PCT/JP2014/062575 WO2014203651A1 (ja) 2013-06-19 2014-05-12 設備管理システム
US14/893,387 US20160096742A1 (en) 2013-06-19 2014-05-12 Facility management system
TW103117890A TWI591464B (zh) 2013-06-19 2014-05-22 Equipment Management System
US15/424,403 US20170153216A1 (en) 2013-06-19 2017-02-03 Facility management system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013128640A JP5803986B2 (ja) 2013-06-19 2013-06-19 設備管理システム

Publications (3)

Publication Number Publication Date
JP2015003279A JP2015003279A (ja) 2015-01-08
JP2015003279A5 JP2015003279A5 (https=) 2015-07-09
JP5803986B2 true JP5803986B2 (ja) 2015-11-04

Family

ID=52104393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013128640A Active JP5803986B2 (ja) 2013-06-19 2013-06-19 設備管理システム

Country Status (4)

Country Link
US (2) US20160096742A1 (https=)
JP (1) JP5803986B2 (https=)
TW (1) TWI591464B (https=)
WO (1) WO2014203651A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11521475B1 (en) * 2015-08-31 2022-12-06 Hitek Aqua Systems System for and method remotely monitoring chemistry of recreational water facilities
EP3686161A4 (en) * 2017-09-20 2021-07-14 Wota Corp. INFORMATION PROCESSING DEVICE
JP7105591B2 (ja) * 2018-03-28 2022-07-25 アクアス株式会社 試料水の管理システム及び試料水の管理方法

Family Cites Families (37)

* Cited by examiner, † Cited by third party
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JP2581833B2 (ja) * 1989-09-11 1997-02-12 株式会社日立製作所 プラントの運転状態監視システム
US5774529A (en) * 1994-09-28 1998-06-30 Johannsen; James Apparatus to provide a remote display of the operating condition of a water treatment system
JPH08309334A (ja) * 1995-05-19 1996-11-26 Kurita Water Ind Ltd 携帯型水処理診断装置
US6290908B1 (en) * 1998-03-30 2001-09-18 Hitachi, Ltd. Water quality meter and water monitoring system
US8958917B2 (en) * 1998-12-17 2015-02-17 Hach Company Method and system for remote monitoring of fluid quality and treatment
US7454295B2 (en) * 1998-12-17 2008-11-18 The Watereye Corporation Anti-terrorism water quality monitoring system
US9056783B2 (en) * 1998-12-17 2015-06-16 Hach Company System for monitoring discharges into a waste water collection system
US6408227B1 (en) * 1999-09-29 2002-06-18 The University Of Iowa Research Foundation System and method for controlling effluents in treatment systems
JP2001205249A (ja) * 2000-01-24 2001-07-31 Ffc:Kk 水質管理サービス提供システム
JP2001263605A (ja) * 2000-03-17 2001-09-26 Kurita Water Ind Ltd 設備機器管理システム
JP2001265427A (ja) * 2000-03-17 2001-09-28 Kurita Water Ind Ltd 情報収集システム
CN1235105C (zh) * 2000-07-04 2006-01-04 旭化成工程株式会社 用于诊断、管理装置和诊断装置的系统
JP2003114718A (ja) * 2001-10-04 2003-04-18 Kurita Water Ind Ltd 設備管理システム
US20050015269A1 (en) * 2002-01-09 2005-01-20 Paul Polizzotto Apparatus and methods for reducing contaminants in water systems using information distribution
US6845336B2 (en) * 2002-06-25 2005-01-18 Prasad S. Kodukula Water treatment monitoring system
AU2002952554A0 (en) * 2002-10-31 2002-11-21 Carter, Peter John Mr Monitower
JP2004267865A (ja) * 2003-03-06 2004-09-30 Hitachi Ltd 水処理プロセスの支援システム
JP2004280411A (ja) * 2003-03-14 2004-10-07 Morinaga Milk Ind Co Ltd 遠隔監視システムおよびアフターサービス提供方法
JP2004326468A (ja) * 2003-04-25 2004-11-18 Kubota Corp 環境プラント設備の運転保守支援システム
JP2005052697A (ja) * 2003-08-06 2005-03-03 Hitachi Ltd 水質監視システム
JP2005188824A (ja) * 2003-12-25 2005-07-14 Nippon Rensui Co Ltd 水処理監視制御システム、移動型水処理監視サーバ、冷却塔装置、水処理監視方法、およびプログラム
US20060031040A1 (en) * 2004-08-03 2006-02-09 Wolfe Thomas D System for real-time contaminant detection in a water distribution system
US7767093B2 (en) * 2005-01-21 2010-08-03 Bernard Frank Method for end-to-end control of water quality
US20060276967A1 (en) * 2005-06-06 2006-12-07 Warner Chris J Method and apparatus for collecting and distributing beach water quality alerts
US7734379B2 (en) * 2006-10-23 2010-06-08 Service Pro Monitoring, Llc System, method, and apparatus for managing wastewater treatment installation
JP2008250805A (ja) * 2007-03-30 2008-10-16 Kurita Water Ind Ltd 水処理プラントの運転管理装置
US20090123340A1 (en) * 2007-05-04 2009-05-14 H2Observe, Llc Water quality monitoring device and method
JP2009181436A (ja) * 2008-01-31 2009-08-13 Mitsubishi Electric Corp 水処理プラント監視システム
US20100143187A1 (en) * 2008-10-24 2010-06-10 Ulrich Reimann-Philipp Drinking water systems monitoring and cleaning method
JP5171729B2 (ja) * 2009-05-18 2013-03-27 フジクリーン工業株式会社 水質管理システム
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US9100728B2 (en) * 2010-06-10 2015-08-04 Hach Company Server monitoring of flow and sampling apparatus and/or logger
US20120013483A1 (en) * 2010-07-17 2012-01-19 Jung Sungeun Water Supply Maintenance System
US20130079936A1 (en) * 2011-09-13 2013-03-28 Brian Cullen Remote access for water infrastructure management
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US9551982B2 (en) * 2013-04-26 2017-01-24 Kabushiki Kaisha Toshiba Water treatment control apparatus and water treatment system

Also Published As

Publication number Publication date
JP2015003279A (ja) 2015-01-08
WO2014203651A1 (ja) 2014-12-24
TWI591464B (zh) 2017-07-11
US20170153216A1 (en) 2017-06-01
TW201512798A (zh) 2015-04-01
US20160096742A1 (en) 2016-04-07

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