JP5799503B2 - 液中プラズマ発生装置、液中プラズマ処理装置、液中プラズマ発生方法、および液中プラズマ処理方法 - Google Patents

液中プラズマ発生装置、液中プラズマ処理装置、液中プラズマ発生方法、および液中プラズマ処理方法 Download PDF

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JP5799503B2
JP5799503B2 JP2010293135A JP2010293135A JP5799503B2 JP 5799503 B2 JP5799503 B2 JP 5799503B2 JP 2010293135 A JP2010293135 A JP 2010293135A JP 2010293135 A JP2010293135 A JP 2010293135A JP 5799503 B2 JP5799503 B2 JP 5799503B2
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liquid
unit
microwave
electric field
plasma
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JP2012142150A (ja
JP2012142150A5 (enrdf_load_stackoverflow
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イヴァン　ペトロフ　ガナシェフ
ペトロフ ガナシェフ イヴァン
秀郎 菅井
秀郎 菅井
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Shibaura Mechatronics Corp
Chubu University
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Shibaura Mechatronics Corp
Chubu University
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JP2010293135A 2010-12-28 2010-12-28 液中プラズマ発生装置、液中プラズマ処理装置、液中プラズマ発生方法、および液中プラズマ処理方法 Active JP5799503B2 (ja)

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JP2010293135A JP5799503B2 (ja) 2010-12-28 2010-12-28 液中プラズマ発生装置、液中プラズマ処理装置、液中プラズマ発生方法、および液中プラズマ処理方法

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JP2010293135A JP5799503B2 (ja) 2010-12-28 2010-12-28 液中プラズマ発生装置、液中プラズマ処理装置、液中プラズマ発生方法、および液中プラズマ処理方法

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JP2012142150A JP2012142150A (ja) 2012-07-26
JP2012142150A5 JP2012142150A5 (enrdf_load_stackoverflow) 2014-02-13
JP5799503B2 true JP5799503B2 (ja) 2015-10-28

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6083047B2 (ja) * 2011-09-16 2017-02-22 株式会社マイクロエミッション プラズマ発生装置及び発光分光分析装置
JP6244141B2 (ja) * 2013-08-30 2017-12-06 国立大学法人名古屋大学 プラズマ発生装置およびその利用
KR101600522B1 (ko) * 2014-11-14 2016-03-21 주식회사 플래닛 유해가스 처리장치
JP6667166B2 (ja) 2016-06-15 2020-03-18 パナソニックＩｐマネジメント株式会社 改質液生成装置および改質液生成方法
WO2017217170A1 (ja) * 2016-06-15 2017-12-21 パナソニックＩｐマネジメント株式会社 改質液生成装置および改質液生成方法
JP6579587B2 (ja) * 2017-09-20 2019-09-25 住友理工株式会社 プラズマ処理装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4107736B2 (ja) * 1998-11-16 2008-06-25 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JP2000173797A (ja) * 1998-12-01 2000-06-23 Sumitomo Metal Ind Ltd マイクロ波プラズマ処理装置
JP2004306029A (ja) * 2003-03-27 2004-11-04 Techno Network Shikoku Co Ltd 化学反応装置および有害物質分解方法
JP4735095B2 (ja) * 2005-07-15 2011-07-27 東京エレクトロン株式会社 リモートプラズマ発生ユニットの電界分布測定装置、リモートプラズマ発生ユニット、処理装置及びリモートプラズマ発生ユニットの特性調整方法
JP4852934B2 (ja) * 2005-08-26 2012-01-11 パナソニック電工株式会社 微細気泡発生装置
JP2007059317A (ja) * 2005-08-26 2007-03-08 Honda Electronic Co Ltd プラズマ発生装置、及びプラズマ発生方法
JP4982658B2 (ja) * 2007-09-21 2012-07-25 本多電子株式会社 液中プラズマ処理装置、及び液中プラズマ処理方法
JP4849382B2 (ja) * 2008-02-18 2012-01-11 株式会社安川電機 水処理装置

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