JP5758842B2 - 単一の記録マスタから両面テンプレートを作成する方法および装置ならびに第二面テンプレート - Google Patents
単一の記録マスタから両面テンプレートを作成する方法および装置ならびに第二面テンプレート Download PDFInfo
- Publication number
- JP5758842B2 JP5758842B2 JP2012108414A JP2012108414A JP5758842B2 JP 5758842 B2 JP5758842 B2 JP 5758842B2 JP 2012108414 A JP2012108414 A JP 2012108414A JP 2012108414 A JP2012108414 A JP 2012108414A JP 5758842 B2 JP5758842 B2 JP 5758842B2
- Authority
- JP
- Japan
- Prior art keywords
- template
- replica
- duty cycle
- master
- predetermined
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 99
- 238000012545 processing Methods 0.000 claims description 27
- 239000011651 chromium Substances 0.000 claims description 24
- 238000001459 lithography Methods 0.000 claims description 14
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 9
- 229920002120 photoresistant polymer Polymers 0.000 claims description 9
- 229910052804 chromium Inorganic materials 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 7
- 238000012546 transfer Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 description 22
- 238000010586 diagram Methods 0.000 description 16
- 239000000758 substrate Substances 0.000 description 11
- 239000010410 layer Substances 0.000 description 10
- 239000012790 adhesive layer Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000003848 UV Light-Curing Methods 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- 238000004380 ashing Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/21—Circular sheet or circular blank
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201113149768A | 2011-05-31 | 2011-05-31 | |
| US13/149,768 | 2011-05-31 | ||
| US13/197,059 | 2011-08-03 | ||
| US13/197,059 US8895127B2 (en) | 2011-05-31 | 2011-08-03 | Method of creating two-sided template from a single recorded master |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012252771A JP2012252771A (ja) | 2012-12-20 |
| JP2012252771A5 JP2012252771A5 (enExample) | 2013-03-28 |
| JP5758842B2 true JP5758842B2 (ja) | 2015-08-05 |
Family
ID=47261896
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012108414A Expired - Fee Related JP5758842B2 (ja) | 2011-05-31 | 2012-05-10 | 単一の記録マスタから両面テンプレートを作成する方法および装置ならびに第二面テンプレート |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8895127B2 (enExample) |
| JP (1) | JP5758842B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2846946B2 (ja) | 1990-11-30 | 1999-01-13 | 株式会社トーエネック | 多導体用懸垂ヨーク金具への線条取付方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115190837A (zh) * | 2020-02-28 | 2022-10-14 | 奇跃公司 | 制造用于形成具有一体间隔件的目镜的模具的方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02154344A (ja) * | 1988-12-05 | 1990-06-13 | Ricoh Co Ltd | 両面型スタンパおよびその製造方法 |
| US7036209B1 (en) * | 2002-07-01 | 2006-05-02 | Seagate Technology Llc | Method of simultaneously forming magnetic transition patterns of a dual side recording medium |
| US20080128944A1 (en) * | 2006-12-01 | 2008-06-05 | Seagate Technology Llc | Injection molded polymeric stampers/imprinters for fabricating patterned recording media |
| US20100020443A1 (en) | 2008-07-22 | 2010-01-28 | Thomas Robert Albrecht | Creation of mirror-image patterns by imprint and image tone reversal |
-
2011
- 2011-08-03 US US13/197,059 patent/US8895127B2/en active Active
-
2012
- 2012-05-10 JP JP2012108414A patent/JP5758842B2/ja not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2846946B2 (ja) | 1990-11-30 | 1999-01-13 | 株式会社トーエネック | 多導体用懸垂ヨーク金具への線条取付方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US8895127B2 (en) | 2014-11-25 |
| US20120308783A1 (en) | 2012-12-06 |
| JP2012252771A (ja) | 2012-12-20 |
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