JP5752712B2 - セラミック材料から作られる本体 - Google Patents
セラミック材料から作られる本体 Download PDFInfo
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- JP5752712B2 JP5752712B2 JP2012550378A JP2012550378A JP5752712B2 JP 5752712 B2 JP5752712 B2 JP 5752712B2 JP 2012550378 A JP2012550378 A JP 2012550378A JP 2012550378 A JP2012550378 A JP 2012550378A JP 5752712 B2 JP5752712 B2 JP 5752712B2
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Description
この劣化は、材料の表面から内部に進行し、そして、ミクロ及びマクロ的なクラッキングを伴い、その結果、材料の割れ強さが低下する結果となる。
この結果、表面領域は、表面から所定深さに到達する。この深さは、本体の特定目的により変えることができる。
この結果、付加的材料の個別の被膜がセラミック本体上に付加される時に一般的に、見られるように、付加された安定剤の割れがなくなる。
上記説明された方法を考慮して、本発明は、また、上記方法によって得られる本体に関係する。
本発明は、さらに、次の例示によって説明される。
複数のディスクの準備
約1mmの厚さで約5mmの直径を有する、イットリア−安定化ジルコニア(CeramTec AG 社のZIOLOX[登録商標] MZ111 HIP; AZP 2009-0315)の複数のディスクが、上記材料から作られたロッドを切断することによって用意された。このディスクは、95℃で10分間、フッ化水素酸(40%)を含むエッチング溶液内でエッチングされた。
前記ディスクは、それぞれ、ガス流によるスパッタリングを用いて、セリウム、酸化セリウム、イットリウム、及び酸化イットリウムでコーティングされている。ガス流によるスパッタリングは、80リッターの容積を有し、かつガス流のスパッタリング源を備えた真空室内で実行された。スパッタリング源は、それぞれ、金属製のセリウム又はイットリウムのターゲット(純度>99.9%)を含んでいる。
ソースジェネレータ: ENI DCジェネレータ DCG100 最大10kW
ヒートジェネレータ: エレクトロニック メジャーメンツの電源ユニット
ムーブコントローラ: ISEL CNC−コントローラ C10C-E/A
ガス流コントローラ: MKS マルチ−ガスコントローラ 647B
温度コントローラ : KS 90−1温度コントローラ
処理パラメータは、一般的に次のように設定された。
スパッターターゲット セリウム: 純度>99.9%
スパッターターゲット イットリウム: 純度>99.9%
ターゲット寸法: 中空シリンダ(長さ:60mm;内径:40mm)
単斜晶の結晶構造の割合を決定するために、被膜は、さらに、X線回折(XRD)により分析された。ブラッカー D8GADDS 型の回折計は、10°の固定入射角度を有し、かつ共通のアノード(co-anode)(30kV/30mA)を備え、グラファイトの主要なモノクロメータが用いられた。300μmの開口を有する500μmの単一毛細管光学を用いて、サンプル上にX線ビームの焦点を合わせた。
単斜晶の割合は、次式によって決定することができる。
これらのサンプルは、約1250℃の温度で3時間、加熱することにより、熱処理された。加熱は、炉内(Mihm-Vogt GmbH & Co.KG)で実行された。温度は、基本材料の焼結温度(約1280℃である)を僅かに下回る温度に設定された。その結果、基本本体の材料内に被膜材料の拡散をできるだけ高めることができる。
熱処理されたサンプルのXPS分析に関して、その結果は、表5に与えられている。
Claims (18)
- 安定剤によって安定化されるセラミック材料から作られる本体であって、
該本体は、本体の表面から所定の深さまで伸びている表面領域を含み、前記安定剤は、前記表面領域内を強化しており、
前記表面領域において、安定剤の割合が、前記所定の深さから前記表面に向かって連続的に増加していることを特徴とする本体。 - 前記表面領域において、セラミック材料の安定剤の割合が、本体の残りの部分よりも高いことを特徴とする請求項1に記載の本体。
- 前記安定剤は、イットリウム、セリウム、及びそれらの各酸化物を含む群から選択されることを特徴とする請求項1または2に記載の本体。
- 前記表面領域は、前記本体の表面から少なくとも20nmの深さに伸びていることを特徴とする請求項1〜3のいずれかに記載の本体。
- 前記表面領域は、前記本体の表面から少なくとも50nmの深さに伸びていることを特徴とする請求項4に記載の本体。
- 前記表面領域は、前記本体の表面から少なくとも100nmの深さに伸びていることを特徴とする請求項5に記載の本体。
- 前記本体の表面の少なくとも一部は、表面あらさを有することを特徴とする請求項1〜6のいずれかに記載の本体。
- 前記本体は、ジルコニアを含むセラミック材料から作られることを特徴とする請求項1〜7のいずれかに記載の本体。
- 前記ジルコニアは、イットリア−安定化されていることを特徴とする請求項8に記載の本体。
- 前記表面領域におけるセラミック材料の結晶構造は、単斜晶の割合が前記本体の残りの部分より最大限同じ高さにあることを特徴とする請求項1〜9のいずれかに記載の本体。
- 前記表面領域におけるセラミック材料の結晶構造は、単斜晶の割合が20%より少ないことを特徴とする請求項10に記載の本体。
- 請求項1〜11のいずれかに記載の本体を用意するための方法であって、
該方法は、
セラミック材料から作られた基本本体の表面に安定剤を付加し、
前記安定剤の少なくとも一部分がセラミック材料の中に拡散する温度で、前記安定剤が付加された前記基本本体を加熱する、各工程を含むことを特徴とする方法。 - 前記安定剤を付加する前にサブトラクティブ処理によって、前記基本本体の表面の少なくとも一部を粗面処理する工程をさらに含むことを特徴とする請求項12に記載の方法。
- 前記サブトラクティブ処理は、エッチング工程を含むことを特徴とする請求項13に記載の方法。
- 前記サブトラクティブ処理は、さらに、エッチング工程の前にサンドブラスト工程を含むことを特徴とする請求項14に記載の方法。
- 前記安定剤は、ゾルゲル法によって、前記基本本体の表面に付加されることを特徴とする請求項12〜15のいずれかに記載の方法。
- 前記安定剤は、ディップコーティング法、化学蒸着法、物理的蒸着法、および/または、イオン注入法によって、前記基本本体の表面に付加されることを特徴とする請求項16に記載の方法。
- 請求項12〜17のいずれかに記載の方法によって得られる本体。
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EP10003578A EP2371344A1 (en) | 2010-03-31 | 2010-03-31 | Body made of a ceramic material |
PCT/EP2011/001205 WO2011120628A1 (en) | 2010-03-31 | 2011-03-11 | Body made of a ceramic material |
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DE102016119934A1 (de) | 2016-10-19 | 2018-05-03 | Degudent Gmbh | Verfahren zur Herstellung eines Rohlings, Rohling sowie eine dentale Restauration |
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EP4014949A1 (en) | 2020-12-15 | 2022-06-22 | DENTSPLY SIRONA Inc. | Method for producing a ceramic multilayer blank |
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US20130011610A1 (en) | 2013-01-10 |
KR101916967B1 (ko) | 2018-11-08 |
EP2552379B1 (en) | 2020-02-05 |
US20160002112A1 (en) | 2016-01-07 |
US9255038B2 (en) | 2016-02-09 |
JP2015199666A (ja) | 2015-11-12 |
EP2371344A1 (en) | 2011-10-05 |
CA2793702A1 (en) | 2011-10-06 |
CN103037830B (zh) | 2016-01-20 |
JP2013517860A (ja) | 2013-05-20 |
WO2011120628A1 (en) | 2011-10-06 |
EP2552379A1 (en) | 2013-02-06 |
KR20130040814A (ko) | 2013-04-24 |
AU2011234931A1 (en) | 2012-08-02 |
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