JP5749071B2 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
JP5749071B2
JP5749071B2 JP2011106983A JP2011106983A JP5749071B2 JP 5749071 B2 JP5749071 B2 JP 5749071B2 JP 2011106983 A JP2011106983 A JP 2011106983A JP 2011106983 A JP2011106983 A JP 2011106983A JP 5749071 B2 JP5749071 B2 JP 5749071B2
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Japan
Prior art keywords
upper electrode
plasma processing
processing apparatus
present
atmosphere
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Expired - Fee Related
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JP2011106983A
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Japanese (ja)
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JP2012004108A5 (OSRAM
JP2012004108A (ja
Inventor
太一 野澤
太一 野澤
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication of JP2012004108A5 publication Critical patent/JP2012004108A5/ja
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JP2011106983A 2010-05-18 2011-05-12 プラズマ処理装置 Expired - Fee Related JP5749071B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011106983A JP5749071B2 (ja) 2010-05-18 2011-05-12 プラズマ処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010114377 2010-05-18
JP2010114377 2010-05-18
JP2011106983A JP5749071B2 (ja) 2010-05-18 2011-05-12 プラズマ処理装置

Publications (3)

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JP2012004108A JP2012004108A (ja) 2012-01-05
JP2012004108A5 JP2012004108A5 (OSRAM) 2014-06-19
JP5749071B2 true JP5749071B2 (ja) 2015-07-15

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JP2011106983A Expired - Fee Related JP5749071B2 (ja) 2010-05-18 2011-05-12 プラズマ処理装置

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JP (1) JP5749071B2 (OSRAM)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120043636A (ko) * 2010-10-26 2012-05-04 가부시키가이샤 한도오따이 에네루기 켄큐쇼 플라즈마 처리 장치 및 플라즈마 ｃｖｄ 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60114577A (ja) * 1983-11-26 1985-06-21 Matsushita Electric Ind Co Ltd 化学処理装置
JP4499005B2 (ja) * 2004-09-29 2010-07-07 積水化学工業株式会社 プラズマ処理装置
JP5122805B2 (ja) * 2006-12-20 2013-01-16 株式会社アルバック 成膜装置
JP2008186939A (ja) * 2007-01-29 2008-08-14 Tokyo Electron Ltd プラズマ処理装置及びプラズマ処理方法並びに記憶媒体
US8247315B2 (en) * 2008-03-17 2012-08-21 Semiconductor Energy Laboratory Co., Ltd. Plasma processing apparatus and method for manufacturing semiconductor device
JP5328685B2 (ja) * 2010-01-28 2013-10-30 三菱電機株式会社 プラズマ処理装置及びプラズマ処理方法

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JP2012004108A (ja) 2012-01-05

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