JP2012004108A5 - - Google Patents
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- Publication number
- JP2012004108A5 JP2012004108A5 JP2011106983A JP2011106983A JP2012004108A5 JP 2012004108 A5 JP2012004108 A5 JP 2012004108A5 JP 2011106983 A JP2011106983 A JP 2011106983A JP 2011106983 A JP2011106983 A JP 2011106983A JP 2012004108 A5 JP2012004108 A5 JP 2012004108A5
- Authority
- JP
- Japan
- Prior art keywords
- upper electrode
- processing apparatus
- plasma processing
- space
- inert gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011261 inert gas Substances 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011106983A JP5749071B2 (ja) | 2010-05-18 | 2011-05-12 | プラズマ処理装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010114377 | 2010-05-18 | ||
| JP2010114377 | 2010-05-18 | ||
| JP2011106983A JP5749071B2 (ja) | 2010-05-18 | 2011-05-12 | プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012004108A JP2012004108A (ja) | 2012-01-05 |
| JP2012004108A5 true JP2012004108A5 (OSRAM) | 2014-06-19 |
| JP5749071B2 JP5749071B2 (ja) | 2015-07-15 |
Family
ID=45535848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011106983A Expired - Fee Related JP5749071B2 (ja) | 2010-05-18 | 2011-05-12 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5749071B2 (OSRAM) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20120043636A (ko) * | 2010-10-26 | 2012-05-04 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 플라즈마 처리 장치 및 플라즈마 ｃｖｄ 장치 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60114577A (ja) * | 1983-11-26 | 1985-06-21 | Matsushita Electric Ind Co Ltd | 化学処理装置 |
| JP4499005B2 (ja) * | 2004-09-29 | 2010-07-07 | 積水化学工業株式会社 | プラズマ処理装置 |
| JP5122805B2 (ja) * | 2006-12-20 | 2013-01-16 | 株式会社アルバック | 成膜装置 |
| JP2008186939A (ja) * | 2007-01-29 | 2008-08-14 | Tokyo Electron Ltd | プラズマ処理装置及びプラズマ処理方法並びに記憶媒体 |
| US8247315B2 (en) * | 2008-03-17 | 2012-08-21 | Semiconductor Energy Laboratory Co., Ltd. | Plasma processing apparatus and method for manufacturing semiconductor device |
| JP5328685B2 (ja) * | 2010-01-28 | 2013-10-30 | 三菱電機株式会社 | プラズマ処理装置及びプラズマ処理方法 |
-
2011
- 2011-05-12 JP JP2011106983A patent/JP5749071B2/ja not_active Expired - Fee Related
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