JP5738410B2 - ファセットミラーデバイス - Google Patents

ファセットミラーデバイス Download PDF

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Publication number
JP5738410B2
JP5738410B2 JP2013520975A JP2013520975A JP5738410B2 JP 5738410 B2 JP5738410 B2 JP 5738410B2 JP 2013520975 A JP2013520975 A JP 2013520975A JP 2013520975 A JP2013520975 A JP 2013520975A JP 5738410 B2 JP5738410 B2 JP 5738410B2
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JP
Japan
Prior art keywords
support
facet
ridge
section
facet element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2013520975A
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English (en)
Japanese (ja)
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JP2013533632A5 (enExample
JP2013533632A (ja
Inventor
ヨアキム ハーティエス
ヨアキム ハーティエス
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2013533632A publication Critical patent/JP2013533632A/ja
Publication of JP2013533632A5 publication Critical patent/JP2013533632A5/ja
Application granted granted Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G02B5/126—Reflex reflectors including curved refracting surface
    • G02B5/132—Reflex reflectors including curved refracting surface with individual reflector mounting means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49826—Assembling or joining

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2013520975A 2010-07-28 2010-07-28 ファセットミラーデバイス Expired - Fee Related JP5738410B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2010/060955 WO2012013227A1 (en) 2010-07-28 2010-07-28 Facet mirror device

Publications (3)

Publication Number Publication Date
JP2013533632A JP2013533632A (ja) 2013-08-22
JP2013533632A5 JP2013533632A5 (enExample) 2013-10-03
JP5738410B2 true JP5738410B2 (ja) 2015-06-24

Family

ID=42671938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013520975A Expired - Fee Related JP5738410B2 (ja) 2010-07-28 2010-07-28 ファセットミラーデバイス

Country Status (5)

Country Link
US (1) US9599910B2 (enExample)
JP (1) JP5738410B2 (enExample)
CN (1) CN103140782B (enExample)
TW (1) TWI459047B (enExample)
WO (1) WO2012013227A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012204273B4 (de) * 2012-03-19 2015-08-13 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102013203035A1 (de) 2013-02-25 2014-08-28 Carl Zeiss Smt Gmbh Optisches modul
DE102015208514A1 (de) * 2015-05-07 2016-11-10 Carl Zeiss Smt Gmbh Facettenspiegel für die EUV-Projektionslithografie sowie Beleuchtungsoptik mit einem derartigen Facettenspiegel
DE102016205624B4 (de) * 2016-04-05 2017-12-28 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie, Beleuchtungssystem, Projektionsbelichtungsanlage und Verfahren zur Projektionsbelichtung
DE102019201509A1 (de) * 2019-02-06 2020-08-06 Carl Zeiss Smt Gmbh Abstützung eines optischen Elements
DE102019209610A1 (de) 2019-07-01 2021-01-07 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Herstellen einer Klebeverbindung zwischen einer ersten Komponente und einer zweiten Komponente
CN119717374A (zh) * 2023-09-20 2025-03-28 深圳市绎立锐光科技开发有限公司 支撑组件、其组装方法及光源装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4268123A (en) * 1979-02-26 1981-05-19 Hughes Aircraft Company Kinematic mount
NL8100164A (nl) 1981-01-15 1982-08-02 Datawell Nv Drijver voor het meten van golfhellingen.
JPS57146107U (enExample) * 1981-03-06 1982-09-14
EP0598950B1 (en) * 1992-11-26 1998-03-04 Océ-Technologies B.V. Rotary mirror system
US6043863A (en) * 1996-11-14 2000-03-28 Nikon Corporation Holder for reflecting member and exposure apparatus having the same
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
US7843632B2 (en) * 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
DE10134387A1 (de) * 2001-07-14 2003-01-23 Zeiss Carl Optisches System mit mehreren optischen Elementen
DE10205425A1 (de) 2001-11-09 2003-05-22 Zeiss Carl Smt Ag Facettenspiegel mit mehreren Spiegelfacetten
DE50214375D1 (de) * 2002-02-09 2010-05-27 Zeiss Carl Smt Ag Facettenspiegel mit mehreren spiegelfacetten
DE10324796A1 (de) 2003-05-31 2004-12-16 Carl Zeiss Smt Ag Facettenspiegel mit Spiegelfacetten
JP2004361624A (ja) * 2003-06-04 2004-12-24 Sumitomo Electric Ind Ltd 光モジュール、及び光モジュールの製造方法
US7136214B2 (en) * 2004-11-12 2006-11-14 Asml Holding N.V. Active faceted mirror system for lithography
JP2006142388A (ja) * 2004-11-16 2006-06-08 Nihon Micro Coating Co Ltd 研磨テープ及び方法
RU2008117999A (ru) * 2005-10-06 2009-11-20 Гутехоффнунгсхютте Радзатц Гмбх (De) Способ бесконтактного динамического определения профиля твердого тела
DE102007008448A1 (de) 2007-02-19 2008-08-21 Carl Zeiss Smt Ag Verfahren zur Herstellung von Spiegelfacetten für einen Facettenspiegel
WO2010049076A2 (de) * 2008-10-20 2010-05-06 Carl Zeiss Smt Ag Optische baugruppe zur führung eines strahlungsbündels

Also Published As

Publication number Publication date
CN103140782B (zh) 2018-11-27
WO2012013227A1 (en) 2012-02-02
US20130120730A1 (en) 2013-05-16
US9599910B2 (en) 2017-03-21
TWI459047B (zh) 2014-11-01
JP2013533632A (ja) 2013-08-22
CN103140782A (zh) 2013-06-05
TW201229572A (en) 2012-07-16

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