JP5689466B2 - P型コンタクトおよび紫外スペクトル領域用の発光ダイオード - Google Patents
P型コンタクトおよび紫外スペクトル領域用の発光ダイオード Download PDFInfo
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- JP5689466B2 JP5689466B2 JP2012520054A JP2012520054A JP5689466B2 JP 5689466 B2 JP5689466 B2 JP 5689466B2 JP 2012520054 A JP2012520054 A JP 2012520054A JP 2012520054 A JP2012520054 A JP 2012520054A JP 5689466 B2 JP5689466 B2 JP 5689466B2
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- 239000007943 implant Substances 0.000 claims description 73
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- 238000000576 coating method Methods 0.000 claims description 40
- 238000002347 injection Methods 0.000 claims description 37
- 239000007924 injection Substances 0.000 claims description 37
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 239000002184 metal Substances 0.000 claims description 25
- 229910002704 AlGaN Inorganic materials 0.000 claims description 21
- 229910052737 gold Inorganic materials 0.000 claims description 20
- 229910052763 palladium Inorganic materials 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 10
- 229910052697 platinum Inorganic materials 0.000 claims description 9
- 230000005855 radiation Effects 0.000 claims description 9
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910002601 GaN Inorganic materials 0.000 description 21
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- 238000002310 reflectometry Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 230000004888 barrier function Effects 0.000 description 9
- 238000002513 implantation Methods 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 239000011777 magnesium Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000004151 rapid thermal annealing Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 2
- 238000000927 vapour-phase epitaxy Methods 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000011953 bioanalysis Methods 0.000 description 1
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- 238000000407 epitaxy Methods 0.000 description 1
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- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
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- 238000001126 phototherapy Methods 0.000 description 1
- 238000007770 physical coating process Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
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- 238000012360 testing method Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/387—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape with a plurality of electrode regions in direct contact with the semiconductor body and being electrically interconnected by another electrode layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Description
(a)p型コンタクト層の第2の表面の5%〜99.99%に直接接し、200nm〜400nmの波長の紫外領域の光、好ましくは270nmの光に対して、少なくとも60%、好ましくは少なくとも80%の最大反射率を有する材料を含むまたは該材料で構成されたコーティングを有し、
(b)p型コンタクト層の第2の表面に直接設けられた複数のp型注入部を有し、
p型コンタクト層(2)がp型ドープAlGaNを有するまたはp型ドープAlGaNで構成されることを特徴とするp型コンタクトを提供することで達成される(以下の記述において、「p型ドープコンタクト」および「p型コンタクト」の用語は同じ意味で使用される)。
2 ... p型ドープAlGaNで構成されるp型コンタクト層
2a ... p型Al0.45Ga0.55Nおよびp型Al0.55Ga0.45Nの組成を有する2つのp型AlGaN層の交互配列
2b ... p型Al0.60Ga0.40N
5 ... p型注入部
6 ... Ni/Auで構成されるp型注入金属層
7 ... (In)GaNで構成されるp型注入層
8 ... 270nmの波長を有する光の少なくとも60%、好ましくは少なくとも80%を反射する材料を有するコーティング
9 ... 多重量子井戸層
9a ... (In)Al0.5Ga0.5Nバリヤー層
9a ... (In)Al0.4Ga0.6量子井戸層
9a ... (In)Al0.5Ga0.5Nバリヤー層
10 ... n型Al0.5Ga0.5Nで構成されるn型ドープ層
11 ... Al0.5Ga0.5Nで構成される非ドープ層
12 ... AlNで構成される非ドープ層
13 ... サファイヤ層
A ... p型コンタクト層2の第1の表面
B ... p型コンタクト層2の第2の表面
Claims (15)
- 紫外スペクトル領域用の発光ダイオードに使用するためのp型ドープコンタクト(1)であって、放射ゾーンに接する第1の表面(A)、および前記第1の表面(A)の逆を向く側の第2の表面(B)を有するp型コンタクト層(2)を含み、
(a)前記p型コンタクト層(2)の前記第2の表面(B)の75%〜96%に直接接し、200nm〜400nmの波長の紫外領域の光に対して少なくとも60%の最大反射率を有する材料を含みまたは該材料で構成されたコーティング(8)、および
(b)前記p型コンタクト層(2)の前記第2の表面(B)に直接設けられた複数のp型注入部(5)を有し、
前記p型コンタクト層(2)がAlGaNを有しまたはAlGaNで構成され、
前記p型注入部(5)が、前記p型注入金属層(6)のほかに、少なくとも1つの他のp型注入層(7)を有し、追加のp型注入層(7)がp型GaNもしくはp型(In)GaNを含みまたはp型GaNもしくはp型(In)GaNで構成されることを特徴とするp型ドープコンタクト(1)。 - 前記コーティング(8)が導電性であることを特徴とする請求項1に記載のp型ドープコンタクト(1)。
- 前記コーティング(8)が、さらに、p型ドープコンタクト(1)の1つ、数個または全てのp型注入部(5)を覆う、ことを特徴とする請求項1〜2のいずれか1項に記載のp型ドープコンタクト(1)。
- 前記コーティング(8)がAlを含むまたはAlで構成されることを特徴とする請求項1〜3のいずれか1項に記載のp型ドープコンタクト(1)。
- 前記p型注入部(5)が少なくとも1つのp型注入金属層(6)を有し、該p型注入金属層(6)が、前記p型コンタクト層(2)と電流源とのオーミック接続を可能にすることを特徴とする請求項1〜4のいずれか1項に記載のp型ドープコンタクト(1)。
- 前記p型注入部(5)が、Au,Ni,Pd,Pt,Rh,Ti,Ni/Au,Pd/Ti/Au,Pd/Pt/AuもしくはPt/Ti/Auを含むまたはAu,Ni,Pd,Pt,Rh,Ti,Ni/Au,Pd/Ti/Au,Pd/Pt/AuもしくはPt/Ti/Auで構成されるp型注入金属層(6)を有する、ことを特徴とする請求項1〜5のいずれか1項に記載のp型ドープコンタクト(1)。
- 前記p型コンタクト層(2)が1つ以上の異なる半導体層を有することを特徴とする請求項1〜6のいずれか1項に記載のp型ドープコンタクト(1)。
- 前記p型コンタクト層の前記第2の表面(B)を形成し、前記p型注入部が直接設けられた前記半導体層が、p型ドープAlGaNを有しまたはp型ドープAlGaNで構成される、ことを特徴とする請求項1〜7のいずれか1項に記載のp型ドープコンタクト(1)。
- 前記p型注入部(5)が10nm〜50μmの最大幅Dを有することを特徴とする請求項1〜8のいずれか1項に記載のp型ドープコンタクト(1)。
- 前記p型注入部(5)が、それぞれの隣接するp型注入部(5)から20nm〜20μmの距離Aだけ離間する、ことを特徴とする請求項1〜9のいずれか1項に記載のp型ドープコンタクト(1)。
- 前記p型注入部(5)とそれぞれの隣接するp型注入部(5)との距離Aが、全てのp型注入部(5)について、同一であることを特徴とする請求項1〜10のいずれか1項に記載のp型ドープコンタクト(1)。
- 前記最大幅Dおよび前記距離Aが、最大幅D対距離Aの比が1:1〜1:4であるように選択される、ことを特徴とする請求項1〜11のいずれか1項に記載のp型ドープコンタクト(1)。
- 前記p型注入部(5)が、前記p型コンタクト層(2)の前記第2の表面(B)に、一定のパターンで配置されることを特徴とする請求項1〜12のいずれか1項に記載のp型ドープコンタクト(1)。
- 放射ゾーンを含み、該放射ゾーンが、n型ドープコンタクトと請求項1に記載のp型ドープコンタクト(1)との間に設けられる、ことを特徴とする発光ダイオード。
- 200nm〜400nmの紫外領域、好ましくは、UV−A,UV−Bおよび/またはUV−Cの領域の光を発することを特徴とする請求項14に記載の発光ダイオード。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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DE102009034359.8 | 2009-07-17 | ||
DE102009034359A DE102009034359A1 (de) | 2009-07-17 | 2009-07-17 | P-Kontakt und Leuchtdiode für den ultravioletten Spektralbereich |
PCT/EP2010/060333 WO2011006995A1 (de) | 2009-07-17 | 2010-07-16 | P-kontakt und leuchtdiode für den ultravioletten spektralbereich |
Publications (2)
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JP2012533874A JP2012533874A (ja) | 2012-12-27 |
JP5689466B2 true JP5689466B2 (ja) | 2015-03-25 |
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JP2012520054A Active JP5689466B2 (ja) | 2009-07-17 | 2010-07-16 | P型コンタクトおよび紫外スペクトル領域用の発光ダイオード |
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US (1) | US9331246B2 (ja) |
EP (1) | EP2454762B1 (ja) |
JP (1) | JP5689466B2 (ja) |
KR (1) | KR101642276B1 (ja) |
DE (1) | DE102009034359A1 (ja) |
ES (1) | ES2641460T3 (ja) |
WO (1) | WO2011006995A1 (ja) |
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US6100586A (en) * | 1997-05-23 | 2000-08-08 | Agilent Technologies, Inc. | Low voltage-drop electrical contact for gallium (aluminum, indium) nitride |
DE19954319C1 (de) * | 1999-11-11 | 2001-05-03 | Vishay Semiconductor Gmbh | Verfahren zum Herstellen von mehrschichtigen Kontaktelektroden für Verbindungshalbeiter und Anordnung |
JP3299739B2 (ja) * | 2000-07-13 | 2002-07-08 | 士郎 酒井 | 発光素子 |
JP2002335048A (ja) * | 2001-03-06 | 2002-11-22 | Sony Corp | 窒化物系半導体レーザ素子及びその製造方法 |
DE20202493U1 (de) * | 2002-02-19 | 2002-06-20 | Opto Tech Corporattion, Hsinchu | Lichtemittierende Diode mit verbesserter Helligkeit |
US7002180B2 (en) * | 2002-06-28 | 2006-02-21 | Kopin Corporation | Bonding pad for gallium nitride-based light-emitting device |
DE10244986B4 (de) * | 2002-09-26 | 2008-02-07 | Osram Opto Semiconductors Gmbh | Strahlungsemittierendes Halbleiterbauelement |
KR100799857B1 (ko) * | 2003-10-27 | 2008-01-31 | 삼성전기주식회사 | 전극 구조체 및 이를 구비하는 반도체 발광 소자 |
KR20050042715A (ko) * | 2003-11-04 | 2005-05-10 | 삼성전자주식회사 | 전극 구조체, 이를 구비하는 반도체 발광 소자 및 그제조방법 |
JP3979378B2 (ja) * | 2003-11-06 | 2007-09-19 | 住友電気工業株式会社 | 半導体発光素子 |
WO2006082687A1 (ja) * | 2005-02-07 | 2006-08-10 | Mitsubishi Cable Industries, Ltd. | GaN系発光ダイオードおよび発光装置 |
JP2007324411A (ja) * | 2006-06-01 | 2007-12-13 | Toshiba Corp | 半導体発光素子及びその製造方法、並びに半導体発光素子を用いた照明装置 |
TWI331816B (en) * | 2007-04-03 | 2010-10-11 | Advanced Optoelectronic Tech | Semiconductor light-emitting device |
US8017963B2 (en) * | 2008-12-08 | 2011-09-13 | Cree, Inc. | Light emitting diode with a dielectric mirror having a lateral configuration |
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2009
- 2009-07-17 DE DE102009034359A patent/DE102009034359A1/de not_active Ceased
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2010
- 2010-07-16 KR KR1020127001221A patent/KR101642276B1/ko active IP Right Grant
- 2010-07-16 JP JP2012520054A patent/JP5689466B2/ja active Active
- 2010-07-16 ES ES10737530.5T patent/ES2641460T3/es active Active
- 2010-07-16 EP EP10737530.5A patent/EP2454762B1/de active Active
- 2010-07-16 US US13/384,208 patent/US9331246B2/en active Active
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US20120146047A1 (en) | 2012-06-14 |
DE102009034359A1 (de) | 2011-02-17 |
US9331246B2 (en) | 2016-05-03 |
KR101642276B1 (ko) | 2016-07-29 |
KR20120054006A (ko) | 2012-05-29 |
JP2012533874A (ja) | 2012-12-27 |
EP2454762B1 (de) | 2017-07-05 |
WO2011006995A1 (de) | 2011-01-20 |
EP2454762A1 (de) | 2012-05-23 |
ES2641460T3 (es) | 2017-11-10 |
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