JP5685473B2 - Anisotropic conductive film, method for manufacturing bonded body, and bonded body - Google Patents

Anisotropic conductive film, method for manufacturing bonded body, and bonded body Download PDF

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JP5685473B2
JP5685473B2 JP2011084634A JP2011084634A JP5685473B2 JP 5685473 B2 JP5685473 B2 JP 5685473B2 JP 2011084634 A JP2011084634 A JP 2011084634A JP 2011084634 A JP2011084634 A JP 2011084634A JP 5685473 B2 JP5685473 B2 JP 5685473B2
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anisotropic conductive
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JP2011171307A (en
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裕樹 大関
裕樹 大関
怜司 塚尾
怜司 塚尾
朋之 石松
朋之 石松
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Priority to KR1020127029200A priority patent/KR101453179B1/en
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R4/00Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
    • H01R4/04Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation using electrically conductive adhesives
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/16Non-insulated conductors or conductive bodies characterised by their form comprising conductive material in insulating or poorly conductive material, e.g. conductive rubber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R11/00Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts
    • H01R11/01Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts characterised by the form or arrangement of the conductive interconnection between the connecting locations
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • H05K3/323Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02Contact members
    • H01R13/22Contacts for co-operating by abutting
    • H01R13/24Contacts for co-operating by abutting resilient; resiliently-mounted
    • H01R13/2407Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means
    • H01R13/2414Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means conductive elastomers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1189Pressing leads, bumps or a die through an insulating layer

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Description

本発明は、ICチップ、液晶ディスプレイ(LCD)における液晶パネル(LCDパネル)等の電子部品を電気的かつ機械的に接続可能な異方性導電フィルム、並びに、該異方性導電フィルムを用いた接合体の製造方法、及び該製造方法により得られる接合体に関する。   The present invention uses an anisotropic conductive film capable of electrically and mechanically connecting electronic components such as an IC chip and a liquid crystal panel (LCD panel) in a liquid crystal display (LCD), and the anisotropic conductive film. The present invention relates to a method for manufacturing a bonded body, and a bonded body obtained by the manufacturing method.

従来より、電子部品を基板と接続する手段として、導電性粒子が分散された熱硬化性樹脂を剥離フィルムに塗布したテープ状の接続材料(例えば、異方性導電フィルム(ACF;Anisotropic Conductive Film))が用いられている。   Conventionally, as a means for connecting an electronic component to a substrate, a tape-like connection material in which a thermosetting resin in which conductive particles are dispersed is applied to a release film (for example, anisotropic conductive film (ACF)) ) Is used.

この異方性導電フィルムは、例えば、フレキシブルプリント基板(FPC)やICチップの端子と、LCDパネルのガラス基板上に形成されたITO(Indium Tin Oxide)電極とを接続する場合を始めとして、種々の端子同士を接着すると共に電気的に接続する場合に用いられている。   This anisotropic conductive film can be used for various purposes including connecting a terminal of a flexible printed circuit board (FPC) or an IC chip to an ITO (Indium Tin Oxide) electrode formed on a glass substrate of an LCD panel. These terminals are used for bonding and electrically connecting the terminals.

前記異方性導電フィルムとしては、導電性粒子を分散させた層(ACF)と分散させない層(NCF;Non Conductive Film)との二層構造としたものが提案されている。この異方性導電フィルムを用いると、ICチップなどの電子部品の端子が、導電性粒子を含まない層に入り込み、更に導電性粒子が分散された層にて導電性粒子を挟み込んでITO電極と電気的に接続される。このため、電子部品の端子間に流入する導電性粒子数が減少し、単層構造のものに比べて、導電性粒子が少量であっても、接続端子に載る導電性粒子の割合(粒子捕捉率)を向上させることが期待できる。   As the anisotropic conductive film, a film having a two-layer structure of a layer (ACF) in which conductive particles are dispersed and a layer (NCF; Non Conductive Film) in which conductive particles are not dispersed has been proposed. When this anisotropic conductive film is used, the terminals of electronic components such as IC chips enter the layer not containing conductive particles, and the conductive particles are sandwiched between the layers in which the conductive particles are dispersed. Electrically connected. For this reason, the number of conductive particles flowing between the terminals of the electronic component is reduced, and even if the amount of conductive particles is smaller than that of the single-layer structure, the ratio of conductive particles on the connection terminals (particle trapping) Rate) can be expected to improve.

このような二層構造の異方性導電フィルムとしては、例えば、第一層は少なくともフィルム形成用樹脂、及び熱硬化性樹脂を有し、且つ前記第一層中の前記フィルム形成用樹脂のガラス転移点が80℃以上であり、第二層は少なくともフィルム形成用樹脂、硬化剤を有し、且つ前記第二層中の前記フィルム形成用樹脂のガラス転移点が−20℃〜65℃である異方性導電フィルムが提案されている(特許文献1参照)。この提案の技術では、具体例として、導電性粒子含有層には硬化剤を含有せず、且つ絶縁性接着層には硬化剤を含有した、二層構造の異方性導電フィルムが検討されている。
しかし、この提案の技術では、圧着時に導電性粒子が長時間流動するために、粒子捕捉率が十分ではないという問題がある。
As such an anisotropic conductive film having a two-layer structure, for example, the first layer has at least a film-forming resin and a thermosetting resin, and the glass of the film-forming resin in the first layer. The transition point is 80 ° C. or higher, the second layer has at least a film forming resin and a curing agent, and the glass transition point of the film forming resin in the second layer is −20 ° C. to 65 ° C. An anisotropic conductive film has been proposed (see Patent Document 1). In this proposed technique, as a specific example, an anisotropic conductive film having a two-layer structure in which the conductive particle-containing layer does not contain a curing agent and the insulating adhesive layer contains a curing agent has been studied. Yes.
However, this proposed technique has a problem in that the particle trapping rate is not sufficient because the conductive particles flow for a long time during pressure bonding.

また、エポキシ樹脂(A)とエポキシ樹脂硬化剤を含む第一の接着剤層と、エポキシ樹脂(B)を含む第二の接着剤層との二層を備え、エポキシ樹脂(A)はエポキシ樹脂(B)よりゲルタイムが長いもので、前記第二の接着剤層にはエポキシ樹脂硬化剤が混入されていないか前記第一の接着剤層より混入量が少ない異方性導電フィルムが提案されている(特許文献2参照)。
しかし、この提案の技術では、短時間圧着において十分な硬化が起こらないために、接続抵抗が高くなるという問題がある。
Further, the epoxy resin (A) includes two layers of a first adhesive layer containing an epoxy resin (A) and an epoxy resin curing agent, and a second adhesive layer containing an epoxy resin (B), and the epoxy resin (A) is an epoxy resin. (B) An anisotropic conductive film has been proposed that has a longer gel time and does not contain an epoxy resin curing agent in the second adhesive layer or has a smaller amount of mixture than the first adhesive layer. (See Patent Document 2).
However, this proposed technique has a problem that the connection resistance increases because sufficient curing does not occur in the short-time pressure bonding.

したがって、二層構造の異方性導電フィルムにおいて、粒子捕捉率に優れ、且つ短時間圧着でも十分に低い接続抵抗が得られる異方性導電フィルム、該異方性導電フィルムを用いた接合体の製造方法、及び該製造方法により得られる接合体の提供が求められているのが現状である。   Therefore, in an anisotropic conductive film having a two-layer structure, an anisotropic conductive film that has an excellent particle trapping rate and a sufficiently low connection resistance can be obtained even after a short time pressure bonding, and a bonded body using the anisotropic conductive film. At present, it is required to provide a manufacturing method and a joined body obtained by the manufacturing method.

特開2005−197032号公報Japanese Patent Laying-Open No. 2005-197032 特開平10−273628号公報Japanese Patent Laid-Open No. 10-273628

本発明は、従来における前記諸問題を解決し、以下の目的を達成することを課題とする。即ち、本発明は、粒子捕捉率に優れ、且つ短時間圧着でも十分に低い接続抵抗が得られる異方性導電フィルム、該異方性導電フィルムを用いた接合体の製造方法、及び該製造方法により得られる接合体を提供することを目的とする。   An object of the present invention is to solve the above-described problems and achieve the following objects. That is, the present invention provides an anisotropic conductive film that has an excellent particle capture rate and that can provide a sufficiently low connection resistance even in a short time, and a method for manufacturing a joined body using the anisotropic conductive film, and the manufacturing method. It aims at providing the joined_body | zygote obtained by these.

前記課題を解決するための手段としては、以下の通りである。即ち、
<1> 基板の端子と電子部品の端子とを異方性導電接続させる異方性導電フィルムであって、
アクリル樹脂を含有する絶縁性接着層と、
導電性粒子、アクリル樹脂、及び重合開始剤を含有する導電性粒子含有層とを有し、
前記絶縁性接着層と前記導電性粒子含有層のうちの前記導電性粒子含有層のみが、前記重合開始剤を含有することを特徴とする異方性導電フィルムである。
<2> 重合開始剤が、有機過酸化物である前記<1>に記載の異方性導電フィルムである。
<3> 有機過酸化物の1分間半減期温度が、90.0℃〜154.0℃である前記<2>に記載の異方性導電フィルムである。
<4> 導電性粒子含有層における有機過酸化物の含有量が、前記導電性粒子含有層中の樹脂成分に対して、3質量%〜8質量%である前記<2>から<3>のいずれかに記載の異方性導電フィルムである。
<5> 前記<1>から<4>のいずれかに記載の異方性導電フィルムを、基板の端子上に、前記異方性導電フィルムの導電性粒子含有層が前記基板の端子に接触するように貼り付ける貼付工程と、
前記異方性導電フィルム上に電子部品を載置する載置工程と、
前記電子部品を加熱押圧部材により加熱及び押圧する加熱押圧工程とを含み、
前記基板の端子と前記電子部品の端子とを異方性導電接続させることを特徴とする接合体の製造方法である。
<6> 前記<5>に記載の接合体の製造方法により製造されることを特徴とする接合体である。
Means for solving the problems are as follows. That is,
<1> An anisotropic conductive film for anisotropically conductively connecting a terminal of a substrate and a terminal of an electronic component,
An insulating adhesive layer containing an acrylic resin;
Having conductive particles, an acrylic resin, and a conductive particle-containing layer containing a polymerization initiator,
Of the insulating adhesive layer and the conductive particle-containing layer, only the conductive particle-containing layer contains the polymerization initiator.
<2> The anisotropic conductive film according to <1>, wherein the polymerization initiator is an organic peroxide.
<3> The anisotropic conductive film according to <2>, wherein the organic peroxide has a one-minute half-life temperature of 90.0 ° C. to 154.0 ° C.
<4> From <2> to <3>, the content of the organic peroxide in the conductive particle-containing layer is 3% by mass to 8% by mass with respect to the resin component in the conductive particle-containing layer. It is an anisotropic conductive film in any one.
<5> The anisotropic conductive film according to any one of <1> to <4> is provided on a terminal of the substrate, and the conductive particle-containing layer of the anisotropic conductive film is in contact with the terminal of the substrate. Pasting process to paste,
A placing step of placing an electronic component on the anisotropic conductive film;
A heating and pressing step of heating and pressing the electronic component with a heating and pressing member,
A method for manufacturing a joined body, wherein the terminals of the substrate and the terminals of the electronic component are anisotropically conductively connected.
<6> A joined body produced by the method for producing a joined body according to <5>.

本発明によれば、従来における前記諸問題を解決し、前記目的を達成することができ、粒子捕捉率に優れ、且つ短時間圧着でも十分に低い接続抵抗が得られる異方性導電フィルム、該異方性導電フィルムを用いた接合体の製造方法、及び該製造方法により得られる接合体を提供することができる。   According to the present invention, the anisotropic conductive film that can solve the above-described problems and can achieve the above-described object, has an excellent particle capture rate, and can obtain a sufficiently low connection resistance even in a short time is provided. The manufacturing method of the conjugate | zygote using an anisotropic conductive film and the conjugate | zygote obtained by this manufacturing method can be provided.

図1は、本発明の異方性導電フィルムの概略図である。FIG. 1 is a schematic view of the anisotropic conductive film of the present invention. 図2Aは、本発明の接合体の製造方法を説明するための概略図である。FIG. 2A is a schematic view for explaining the method for producing a joined body of the present invention. 図2Bは、本発明の接合体の製造方法を説明するための概略図である。FIG. 2B is a schematic view for explaining the method of manufacturing the joined body of the present invention. 図2Cは、本発明の接合体の製造方法を説明するための概略図である。FIG. 2C is a schematic view for explaining the method for producing a joined body according to the present invention.

(異方性導電フィルム)
本発明の異方性導電フィルムは、絶縁性接着層と、導電性粒子含有層とを少なくとも有し、更に必要に応じて、その他の部材を有する。
前記絶縁性接着層と前記導電性粒子含有層のうちの前記導電性粒子含有層のみが、重合開始剤を含有する。
前記異方性導電フィルムは、基板の端子と電子部品の端子とを異方性導電接続させる異方性導電フィルムである。
前記異方性導電フィルムの構造としては、特に制限はなく、目的に応じて適宜選択することができるが、前記絶縁性接着層と前記導電性粒子含有層からなる二層構造が好ましい。
(Anisotropic conductive film)
The anisotropic conductive film of this invention has an insulating contact bonding layer and an electroconductive particle content layer at least, and also has another member as needed.
Only the conductive particle-containing layer of the insulating adhesive layer and the conductive particle-containing layer contains a polymerization initiator.
The anisotropic conductive film is an anisotropic conductive film that connects a terminal of a substrate and a terminal of an electronic component in an anisotropic conductive connection.
There is no restriction | limiting in particular as a structure of the said anisotropic conductive film, Although it can select suitably according to the objective, The two-layer structure which consists of the said insulating contact bonding layer and the said electroconductive particle content layer is preferable.

<絶縁性接着層>
前記絶縁性接着層は、アクリル樹脂を少なくとも含有し、更に必要に応じて、その他の成分を含有する。ただし、前記絶縁性接着層は、重合開始剤を含有しない。
<Insulating adhesive layer>
The insulating adhesive layer contains at least an acrylic resin, and further contains other components as necessary. However, the insulating adhesive layer does not contain a polymerization initiator.

−アクリル樹脂−
前記アクリル樹脂としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、アクリル化合物、液状アクリレート等が例示され、具体的には、メチルアクリレート、エチルアクリレート、イソプロピルアクリレート、イソブチルアクリレート、リン酸基含有アクリレート、エチレングリコールジアクリレート、ジエチレングリコールジアクリレート、トリメチロールプロパントリアクリレート、ジメチロールトリシクロデカンジアクリレート、テトラメチレングリコールテトラアクリレート、2−ヒドロキシ−1,3−ジアクリロキシプロパン、2,2−ビス[4−(アクリロキシメトキシ)フェニル]プロパン、2,2−ビス[4−(アクリロキシエトキシ)フェニル]プロパン、ジシクロペンテニルアクリレート、トリシクロデカニルアクリレート、トリス(アクリロキシエチル)イソシアヌレート、ウレタンアクリレート、エポキシアクリレートなどが挙げられる。なお、前記アクリレートをメタクリレートにしたものを用いることもできる。これらは、1種単独で使用してもよいし、2種以上を併用してもよい。
前記絶縁性接着層における前記アクリル樹脂の含有量としては、特に制限はなく、目的に応じて適宜選択することができる。
-Acrylic resin-
There is no restriction | limiting in particular as said acrylic resin, According to the objective, it can select suitably, For example, an acrylic compound, liquid acrylate etc. are illustrated, Specifically, methyl acrylate, ethyl acrylate, isopropyl acrylate, isobutyl acrylate , Phosphate group-containing acrylate, ethylene glycol diacrylate, diethylene glycol diacrylate, trimethylolpropane triacrylate, dimethyloltricyclodecane diacrylate, tetramethylene glycol tetraacrylate, 2-hydroxy-1,3-diaacryloxypropane, 2 , 2-bis [4- (acryloxymethoxy) phenyl] propane, 2,2-bis [4- (acryloxyethoxy) phenyl] propane, dicyclopentenyl acrylate, tri Black decanyl acrylate, tris (acryloxyethyl) isocyanurate, urethane acrylate, epoxy acrylate. In addition, what made the said acrylate the methacrylate can also be used. These may be used individually by 1 type and may use 2 or more types together.
There is no restriction | limiting in particular as content of the said acrylic resin in the said insulating contact bonding layer, According to the objective, it can select suitably.

−その他の成分−
前記その他の成分としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、膜形成樹脂、シランカップリング剤などが挙げられる。
-Other ingredients-
There is no restriction | limiting in particular as said other component, According to the objective, it can select suitably, For example, film forming resin, a silane coupling agent, etc. are mentioned.

−−膜形成樹脂−−
前記膜形成樹脂としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、フェノキシ樹脂、エポキシ樹脂、不飽和ポリエステル樹脂、飽和ポリエステル樹脂、ウレタン樹脂、ブタジエン樹脂、ポリイミド樹脂、ポリアミド樹脂、ポリオレフィン樹脂などが挙げられる。前記膜形成樹脂は、1種単独で使用してもよいし、2種以上を併用してもよい。これらの中でも、製膜性、加工性、接続信頼性の点からフェノキシ樹脂が特に好ましい。
前記フェノキシ樹脂とは、ビスフェノールAとエピクロルヒドリンより合成される樹脂であって、適宜合成したものを使用してもよいし、市販品を使用してもよい。
前記絶縁性接着層における前記膜形成樹脂の含有量としては、特に制限はなく、目的に応じて適宜選択することができる。
--- Film-forming resin--
There is no restriction | limiting in particular as said film formation resin, According to the objective, it can select suitably, For example, a phenoxy resin, an epoxy resin, unsaturated polyester resin, saturated polyester resin, urethane resin, butadiene resin, polyimide resin, polyamide Examples thereof include resins and polyolefin resins. The film forming resin may be used alone or in combination of two or more. Among these, phenoxy resin is particularly preferable from the viewpoints of film formability, processability, and connection reliability.
The said phenoxy resin is resin synthesize | combined from bisphenol A and epichlorohydrin, Comprising: What was synthesize | combined suitably may be used and a commercial item may be used.
There is no restriction | limiting in particular as content of the said film formation resin in the said insulating contact bonding layer, According to the objective, it can select suitably.

−−シランカップリング剤−−
前記シランカップリング剤としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、エポキシ系シランカップリング剤、アクリル系シランカップリング剤、チオール系シランカップリング剤、アミン系シランカップリング剤などが挙げられる。
前記導電性粒子含有層における前記シランカップリング剤の含有量としては、特に制限はなく、目的に応じて適宜選択することができる。
--Silane coupling agent--
The silane coupling agent is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include an epoxy silane coupling agent, an acrylic silane coupling agent, a thiol silane coupling agent, and an amine silane. A coupling agent etc. are mentioned.
There is no restriction | limiting in particular as content of the said silane coupling agent in the said electroconductive particle content layer, According to the objective, it can select suitably.

前記絶縁性接着層の平均厚みとしては、特に制限はなく、後述する導電性粒子含有層の厚みとの関係で、適宜選択することができるが、5μm〜25μmが好ましく、8μm〜20μmがより好ましい。前記平均厚みが、5μm未満であると、端子間における樹脂充填率が減少することがあり、25μmを超えると、接続不良の発生の原因となることがある。
ここで、前記平均厚みは、任意に前記絶縁性接着層の5箇所の厚みを測定した際の平均値である。
There is no restriction | limiting in particular as average thickness of the said insulating contact bonding layer, Although it can select suitably in relation to the thickness of the electroconductive particle content layer mentioned later, 5 micrometers-25 micrometers are preferable, and 8 micrometers-20 micrometers are more preferable. . When the average thickness is less than 5 μm, the resin filling rate between the terminals may be reduced, and when it exceeds 25 μm, connection failure may be caused.
Here, the said average thickness is an average value at the time of measuring the thickness of five places of the said insulating contact bonding layers arbitrarily.

<導電性粒子含有層>
前記導電性粒子含有層は、導電性粒子と、アクリル樹脂と、重合開始剤とを少なくとも含有し、更に必要に応じて、その他の成分を含有する。
<Conductive particle-containing layer>
The conductive particle-containing layer contains at least conductive particles, an acrylic resin, and a polymerization initiator, and further contains other components as necessary.

−導電性粒子−
前記導電性粒子としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、金属粒子、金属被覆樹脂粒子などが挙げられる。
前記金属粒子としては、例えば、ニッケル、コバルト、銀、銅、金、パラジウムなどが挙げられる。これらは、1種単独で使用してもよいし、2種以上を併用してもよい。これらの中でも、ニッケル、銀、銅が好ましい。これらの表面酸化を防ぐ目的で、表面に金、パラジウムを施した粒子を用いてもよい。更に、表面に金属突起や有機物で絶縁皮膜を施したものを用いてもよい。
前記金属被覆樹脂粒子としては、例えば、樹脂コアの表面をニッケル、銅、金、及びパラジウムのいずれかの金属で被覆した粒子などが挙げられる。同様に、最外表面に金、パラジウムを施した粒子を用いてもよい。更に、表面に金属突起や有機物で絶縁皮膜を施したものを用いてもよい。
前記樹脂コアへの金属の被覆方法としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、無電解めっき法、スパッタリング法などが挙げられる。
前記樹脂コアの材料としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、スチレン−ジビニルベンゼン共重合体、ベンゾグアナミン樹脂、架橋ポリスチレン樹脂、アクリル樹脂、スチレン−シリカ複合樹脂などが挙げられる。
前記導電性粒子含有層における前記導電性粒子の含有量としては、特に制限はなく、回路部材の配線ピッチや、接続面積などによって適宜調整することができる。
-Conductive particles-
There is no restriction | limiting in particular as said electroconductive particle, According to the objective, it can select suitably, For example, a metal particle, a metal covering resin particle, etc. are mentioned.
As said metal particle, nickel, cobalt, silver, copper, gold | metal | money, palladium etc. are mentioned, for example. These may be used individually by 1 type and may use 2 or more types together. Among these, nickel, silver, and copper are preferable. In order to prevent these surface oxidations, particles having gold or palladium on the surface may be used. Furthermore, you may use what gave the insulating film with the metal protrusion and organic substance on the surface.
Examples of the metal-coated resin particles include particles in which the surface of the resin core is coated with any metal of nickel, copper, gold, and palladium. Similarly, particles having gold or palladium on the outermost surface may be used. Furthermore, you may use what gave the insulating film with the metal protrusion and organic substance on the surface.
There is no restriction | limiting in particular as the coating method of the metal to the said resin core, According to the objective, it can select suitably, For example, an electroless-plating method, sputtering method, etc. are mentioned.
The material for the resin core is not particularly limited and may be appropriately selected depending on the intended purpose. For example, styrene-divinylbenzene copolymer, benzoguanamine resin, cross-linked polystyrene resin, acrylic resin, styrene-silica composite resin, etc. Is mentioned.
There is no restriction | limiting in particular as content of the said electroconductive particle in the said electroconductive particle content layer, According to the wiring pitch of a circuit member, a connection area, etc., it can adjust suitably.

−アクリル樹脂−
前記アクリル樹脂としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、前記絶縁性接着層の説明において記載した前記アクリル樹脂と同様のものなどが挙げられる。
前記導電性粒子含有層における前記アクリル樹脂の含有量としては、特に制限はなく、目的に応じて適宜選択することができる。
-Acrylic resin-
There is no restriction | limiting in particular as said acrylic resin, According to the objective, it can select suitably, For example, the thing similar to the said acrylic resin described in description of the said insulating contact bonding layer etc. are mentioned.
There is no restriction | limiting in particular as content of the said acrylic resin in the said electroconductive particle content layer, According to the objective, it can select suitably.

−重合開始剤−
前記重合開始剤としては、前記アクリル樹脂を重合させることができるものであれば、特に制限はなく、目的に応じて適宜選択することができるが、熱又は光によって遊離ラジカルを発生する重合開始剤が好ましい。
前記熱又は光によって遊離ラジカルを発生する重合開始剤としては、有機過酸化物が好ましく、接続抵抗と粒子捕捉率がより優れる点から1分間半減期温度が90.0℃〜154.0℃である有機過酸化物がより好ましい。
10秒間以下で接合を行うためには1分間半減期温度が154.0℃以下であることが好ましい。1分間半減期温度が90.0℃未満であると保管が困難となることがある。
熱によって遊離ラジカルを発生する重合開始剤としては、例えば、有機過酸化物、アゾ化合物などが挙げられる。前記有機過酸化物としては、例えば、過酸化ベンゾイル、ターシャリーブチルパーオキシド、ジ−2−エチルヘキシルペルオキシジカーボネート、ジラウロイルパーオキサイド、1,1−ジ(t−ブチルパーオキシ)シクロへキサンなどが挙げられる。前記アゾ化合物としては、例えば、2,2’−アゾビス(4−メトキシ−2,4−ジメチルバレロニトリル)、2,2’−アゾビス(2,4−ジメチルバレロニトリル)(V−65)、2,2’−アゾビスイソブチロニトリル(AIBN)、2,2’−アゾビス(2−メチルブチロニトリル)、1,1−アゾビス(シクロヘキサン−1−カルボニトリル)、2,2’−アゾビス〔2−メチル−N−[1,1−ビス(ヒドロキシメチル)−2−ヒドロキシエチル]プロピオンアミド〕、ジメチル2,2’−アゾビス(2−メトキシプロピオネート)などが挙げられる。これらは、1種単独で使用してもよいし、2種以上を併用してもよい。
光によって遊離ラジカルを発生する重合開始剤としては、例えば、アルキルフェノン、ベンゾイン、ベンゾフェノン、ジカルボニル化合物、チオキサントン、アシルホスフィンオキサイド、これらの誘導体などが挙げられる。これらは、1種単独で使用してもよいし、2種以上を併用してもよい。
前記導電性粒子含有層における前記重合開始剤の含有量としては、特に制限はなく、目的に応じて適宜選択することができるが、前記導電性粒子含有層の樹脂成分に対して、1質量%〜12質量%が好ましく、1質量%〜10質量%がより好ましく、3質量%〜8質量%が特に好ましい。前記含有量が、1質量%未満であると、異方性導電フィルムの硬化率が低下することがあり、12質量%を超えると、前記絶縁性接着層が効率良く流動しなくなり、粒子捕捉率が低下することがある。
ここで、樹脂成分とは、前記導電性粒子含有層において、導電性粒子を除いた成分をいい、例えば、前記アクリル樹脂、前記重合開始剤、後述する膜形成樹脂、シランカップリング剤などの有機成分が挙げられる。
-Polymerization initiator-
The polymerization initiator is not particularly limited as long as it can polymerize the acrylic resin, and can be appropriately selected according to the purpose. The polymerization initiator generates free radicals by heat or light. Is preferred.
The polymerization initiator that generates free radicals by heat or light is preferably an organic peroxide, and has a half-life temperature of 90.0 ° C. to 154.0 ° C. for 1 minute from the viewpoint of better connection resistance and particle capture rate. Some organic peroxides are more preferred.
In order to perform bonding in 10 seconds or less, it is preferable that the half-life temperature for 1 minute is 154.0 ° C. or less. If the 1-minute half-life temperature is less than 90.0 ° C., storage may be difficult.
Examples of the polymerization initiator that generates free radicals by heat include organic peroxides and azo compounds. Examples of the organic peroxide include benzoyl peroxide, tertiary butyl peroxide, di-2-ethylhexyl peroxydicarbonate, dilauroyl peroxide, 1,1-di (t-butylperoxy) cyclohexane, and the like. Is mentioned. Examples of the azo compound include 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), 2,2′-azobis (2,4-dimethylvaleronitrile) (V-65), 2 , 2′-azobisisobutyronitrile (AIBN), 2,2′-azobis (2-methylbutyronitrile), 1,1-azobis (cyclohexane-1-carbonitrile), 2,2′-azobis [ 2-methyl-N- [1,1-bis (hydroxymethyl) -2-hydroxyethyl] propionamide], dimethyl 2,2′-azobis (2-methoxypropionate) and the like. These may be used individually by 1 type and may use 2 or more types together.
Examples of the polymerization initiator that generates a free radical by light include alkylphenone, benzoin, benzophenone, dicarbonyl compound, thioxanthone, acylphosphine oxide, and derivatives thereof. These may be used individually by 1 type and may use 2 or more types together.
There is no restriction | limiting in particular as content of the said polymerization initiator in the said electroconductive particle content layer, Although it can select suitably according to the objective, 1 mass% with respect to the resin component of the said electroconductive particle content layer. -12% by mass is preferable, 1% by mass to 10% by mass is more preferable, and 3% by mass to 8% by mass is particularly preferable. When the content is less than 1% by mass, the curing rate of the anisotropic conductive film may decrease. When the content exceeds 12% by mass, the insulating adhesive layer does not flow efficiently, and the particle capture rate. May decrease.
Here, the resin component refers to a component excluding the conductive particles in the conductive particle-containing layer, and examples thereof include organic materials such as the acrylic resin, the polymerization initiator, a film-forming resin described later, and a silane coupling agent. Ingredients.

前記導電性粒子含有層の平均厚みとしては、特に制限はなく、前記導電性粒子の平均粒径、前記絶縁性接着層の厚みとの関係で、適宜選択することができるが、2μm〜10μmが好ましく、4μm〜10μmがより好ましい。前記平均厚みが、2μm未満であると、基板の端子と電子部品の端子の間に導電性粒子が十分に充填されないことがあり、10μmを超えると、接続不良の原因となることがある。
また、前記導電性粒子含有層の平均厚みは、前記絶縁性接着層の平均厚みよりも薄いことが、粒子捕捉率がより優れる点で好ましい。
ここで、前記平均厚みは、任意に前記導電性粒子含有層の5箇所の厚みを測定した際の平均値である。
There is no restriction | limiting in particular as average thickness of the said electroconductive particle content layer, Although it can select suitably by the relationship with the average particle diameter of the said electroconductive particle and the thickness of the said insulating contact bonding layer, 2 micrometers-10 micrometers are sufficient. 4 μm to 10 μm is preferable. When the average thickness is less than 2 μm, the conductive particles may not be sufficiently filled between the terminals of the substrate and the terminals of the electronic component, and when it exceeds 10 μm, connection failure may be caused.
Moreover, it is preferable that the average thickness of the said electroconductive particle content layer is thinner than the average thickness of the said insulating contact bonding layer from the point that a particle capture rate is more excellent.
Here, the said average thickness is an average value at the time of measuring the thickness of five places of the said electroconductive particle content layer arbitrarily.

−その他の成分−
前記その他の成分としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、膜形成樹脂、シランカップリング剤などが挙げられる。前記膜形成樹脂、及び前記シランカップリング剤としては、前記絶縁性接着層の説明において記載した前記膜形成樹脂、及び前記シランカップリング剤と同様のものなどが挙げられる。
-Other ingredients-
There is no restriction | limiting in particular as said other component, According to the objective, it can select suitably, For example, film forming resin, a silane coupling agent, etc. are mentioned. Examples of the film-forming resin and the silane coupling agent include those similar to the film-forming resin and the silane coupling agent described in the description of the insulating adhesive layer.

<基板>
前記基板としては、前記異方性導電フィルムを用いた異方性導電性接続の対象となる、端子を有する基板であれば、特に制限はなく、目的に応じて適宜選択することができ、例えば、ITOガラス基板、フレキシブル基板、リジッド基板などが挙げられる。
前記基板の大きさ、形状、構造としては、特に制限はなく、目的に応じて適宜選択することができる。
<Board>
The substrate is not particularly limited as long as it is a substrate having terminals, which is an object of anisotropic conductive connection using the anisotropic conductive film, and can be appropriately selected according to the purpose. , ITO glass substrate, flexible substrate, rigid substrate and the like.
There is no restriction | limiting in particular as a magnitude | size, a shape, and a structure of the said board | substrate, According to the objective, it can select suitably.

<電子部品>
前記電子部品としては、前記異方性導電フィルムを用いた異方性導電性接続の対象となる電子部品であれば、特に制限はなく、目的に応じて適宜選択することができ、例えば、ICチップ、TABテープ、液晶パネルなどが挙げられる。前記ICチップとしては、例えば、フラットパネルディスプレイ(FPD)における液晶画面制御用ICチップなどが挙げられる。
<Electronic parts>
The electronic component is not particularly limited as long as the electronic component is an object of anisotropic conductive connection using the anisotropic conductive film, and can be appropriately selected according to the purpose. A chip, a TAB tape, a liquid crystal panel, etc. are mentioned. Examples of the IC chip include a liquid crystal screen control IC chip in a flat panel display (FPD).

本発明の異方性導電フィルムは、前記絶縁性接着層に重合開始剤を含有していないため、異方性導電接続において、前記異方性導電フィルム上に載置した電子部品を押し込む際に、前記絶縁性接着層が短時間で効率良く流動する。そうすると、電子部品の端子間に前記絶縁性接着層が流入し、電子部品の端子間に流入する導電性粒子の数が減少する。その結果、端子と接触する導電性粒子の数が増え、粒子捕捉率が向上する。また、前記絶縁性接着層が重合開始剤を含有しないため、加熱及び押圧を低速で押し込んだ際でも、前記絶縁性接着層が硬化しておらず、前記導電性粒子含有層の導電性粒子を十分に押し込むことができ、十分な接続抵抗を得ることができる。更に、電子部品の端子間に流入する導電性粒子の数が減少することで、ファインピッチ(狭ピッチ)の異方性導電接続にも対応することができる。   Since the anisotropic conductive film of the present invention does not contain a polymerization initiator in the insulating adhesive layer, in the anisotropic conductive connection, when the electronic component placed on the anisotropic conductive film is pushed in The insulating adhesive layer flows efficiently in a short time. Then, the insulating adhesive layer flows between the terminals of the electronic component, and the number of conductive particles flowing between the terminals of the electronic component decreases. As a result, the number of conductive particles in contact with the terminal is increased, and the particle capture rate is improved. In addition, since the insulating adhesive layer does not contain a polymerization initiator, the insulating adhesive layer is not cured even when heated and pressed at a low speed, and the conductive particles in the conductive particle-containing layer are not cured. It can be pushed in sufficiently and a sufficient connection resistance can be obtained. Furthermore, since the number of conductive particles flowing between the terminals of the electronic component is reduced, it is possible to cope with fine pitch (narrow pitch) anisotropic conductive connection.

(接合体の製造方法、及び接合体)
本発明の接合体の製造方法は、貼付工程と、載置工程と、加熱押圧工程とを少なくとも含み、更に必要に応じて、その他の工程を含む。
前記接合体の製造方法は、基板の端子と電子部品の端子とを異方性導電接続させることにより、接合体を製造する。
本発明の接合体は、本発明の接合体の製造方法により製造される。
(Manufacturing method of joined body and joined body)
The manufacturing method of the joined body of the present invention includes at least a pasting step, a placing step, and a heating and pressing step, and further includes other steps as necessary.
In the manufacturing method of the bonded body, the bonded body is manufactured by anisotropically connecting the terminal of the substrate and the terminal of the electronic component.
The joined body of the present invention is produced by the method for producing a joined body of the present invention.

<貼付工程>
前記貼付工程としては、異方性導電フィルムを、基板の端子上に、前記異方性導電フィルムの導電性粒子含有層が前記基板の端子に接触するように貼り付ける工程であれば、特に制限はなく、目的に応じて適宜選択することができる。
前記基板としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、本発明の前記異方性導電フィルムの説明において記載した前記基板と同様のものなどが挙げられる。
前記異方性導電フィルムは、本発明の前記異方性導電フィルムである。
<Paste process>
The sticking step is not particularly limited as long as it is a step of sticking the anisotropic conductive film on the terminal of the substrate so that the conductive particle-containing layer of the anisotropic conductive film is in contact with the terminal of the substrate. It can be appropriately selected depending on the purpose.
There is no restriction | limiting in particular as said board | substrate, According to the objective, it can select suitably, For example, the thing similar to the said board | substrate described in description of the said anisotropic conductive film of this invention etc. are mentioned.
The anisotropic conductive film is the anisotropic conductive film of the present invention.

<載置工程>
前記載置工程としては、前記異方性導電フィルム上に電子部品を載置する工程であれば、特に制限はなく、目的に応じて適宜選択することができる。
前記載置工程においては、前記異方性導電フィルムの絶縁性接着層上に、前記電子部品が載置される。
この際、異方性導電接続は行われていない。
<Installation process>
The placing step is not particularly limited as long as it is a step of placing an electronic component on the anisotropic conductive film, and can be appropriately selected according to the purpose.
In the placing step, the electronic component is placed on the insulating adhesive layer of the anisotropic conductive film.
At this time, anisotropic conductive connection is not performed.

<加熱押圧工程>
前記加熱押圧工程としては、前記電子部品を加熱押圧部材により加熱及び押圧する工程であれば、特に制限はなく、目的に応じて適宜選択することができる。
前記加熱押圧部材としては、例えば、加熱機構を有する押圧部材などが挙げられる。前記加熱機構を有する押圧部材としては、例えば、ヒートツールなどが挙げられる。
前記加熱の温度としては、特に制限はなく、目的に応じて適宜選択することができるが、140℃〜200℃が好ましい。
前記押圧の圧力としては、特に制限はなく、目的に応じて適宜選択することができるが、0.1MPa〜10MPaが好ましい。
前記加熱及び押圧の時間としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、0.5秒間〜120秒間が挙げられる。
<Heat pressing process>
The heating and pressing step is not particularly limited as long as it is a step of heating and pressing the electronic component with a heating and pressing member, and can be appropriately selected according to the purpose.
Examples of the heating and pressing member include a pressing member having a heating mechanism. Examples of the pressing member having the heating mechanism include a heat tool.
There is no restriction | limiting in particular as temperature of the said heating, Although it can select suitably according to the objective, 140 to 200 degreeC is preferable.
There is no restriction | limiting in particular as the pressure of the said press, Although it can select suitably according to the objective, 0.1 MPa-10 MPa are preferable.
There is no restriction | limiting in particular as time of the said heating and press, According to the objective, it can select suitably, For example, 0.5 second-120 second is mentioned.

以上の工程により、前記基板の端子と前記電子部品の端子とを異方性導電接続させることができ、接合体を製造することができる。   Through the above steps, the terminal of the substrate and the terminal of the electronic component can be anisotropically conductively connected, and a joined body can be manufactured.

本発明の異方性導電フィルム、接合体の製造方法、及び接合体について、その一例を、図を参照して説明する。
図1は、本発明の異方性導電フィルムの概略図である。異方性導電フィルム1は、導電性粒子含有層2と、絶縁性接着層3とからなり、導電性粒子含有層2は、導電性粒子4を含有している。
図2A〜図2Cは、本発明の接合体の製造方法を説明するための概略図である。まず、端子6を有する基板5に、異方性導電フィルムを前記異方性導電フィルムの導電性粒子含有層2が端子6に接するように貼り付ける(図2A)。続いて、その貼り付けた異方性導電フィルムの絶縁性接着層3の上に、端子7を有する電子部品8を載置する。この時点では、基板5と電子部品8は、まだ異方性導電接続されていない(図2B)。そして、電子部品8の上から加熱押圧部材(図示せず)により電子部品8を加熱及び押圧することにより、基板5と電子部品8を異方性導電接続する(図2C)。この際、本発明の異方性導電フィルムの絶縁性接着層3は、重合開始剤を含有していないため、短時間で効率良く流動する。そうすると、電子部品8の端子7間に絶縁性接着層3が流入し、電子部品8の端子7間に流入する導電性粒子4の数が減少する。その結果、端子6及び端子7の間の導電性粒子4の数が増え、粒子捕捉率が向上した接合体を製造することができる。また、絶縁性接着層3が重合開始剤を含有しないため、加熱及び押圧を低速で押し込んだ際でも、絶縁性接着層3が硬化しておらず、導電性粒子含有層2の導電性粒子4を十分に押し込むことができ、十分な接続抵抗を得ることができる。更に、電子部品8の端子間に流入する導電性粒子4の数が減少することで、ファインピッチ(狭ピッチ)の接合体を製造することができる。
An example of the anisotropic conductive film, the method for producing a joined body, and the joined body of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic view of the anisotropic conductive film of the present invention. The anisotropic conductive film 1 includes a conductive particle-containing layer 2 and an insulating adhesive layer 3, and the conductive particle-containing layer 2 contains conductive particles 4.
2A to 2C are schematic views for explaining the method for manufacturing a joined body according to the present invention. First, an anisotropic conductive film is affixed on the substrate 5 having terminals 6 so that the conductive particle-containing layer 2 of the anisotropic conductive film is in contact with the terminals 6 (FIG. 2A). Subsequently, the electronic component 8 having the terminals 7 is placed on the insulating adhesive layer 3 of the attached anisotropic conductive film. At this point, the substrate 5 and the electronic component 8 are not yet anisotropically conductively connected (FIG. 2B). Then, the substrate 5 and the electronic component 8 are anisotropically conductively connected by heating and pressing the electronic component 8 from above the electronic component 8 with a heat pressing member (not shown) (FIG. 2C). Under the present circumstances, since the insulating contact bonding layer 3 of the anisotropic conductive film of this invention does not contain a polymerization initiator, it flows efficiently in a short time. Then, the insulating adhesive layer 3 flows between the terminals 7 of the electronic component 8, and the number of conductive particles 4 flowing between the terminals 7 of the electronic component 8 decreases. As a result, the number of the conductive particles 4 between the terminals 6 and 7 is increased, and a bonded body with an improved particle capture rate can be manufactured. Further, since the insulating adhesive layer 3 does not contain a polymerization initiator, the insulating adhesive layer 3 is not cured even when heating and pressing are performed at a low speed, and the conductive particles 4 of the conductive particle-containing layer 2 are not cured. Can be pushed in sufficiently, and a sufficient connection resistance can be obtained. Further, the number of the conductive particles 4 flowing between the terminals of the electronic component 8 is reduced, so that a joined body having a fine pitch (narrow pitch) can be manufactured.

以下、本発明の実施例を説明するが、本発明は、これらの実施例に何ら限定されるものではない。   Examples of the present invention will be described below, but the present invention is not limited to these examples.

(実施例1)
<異方性導電フィルムの作製>
−導電性粒子含有層の作製−
フェノキシ樹脂(品名:YP50、新日鐵化学社製)60質量部と、アクリル樹脂(品名:EB−600、ダイセル・サイテック社製)35質量部と、シランカップリング剤(品名:KBM−503、信越化学工業社製)2質量部と、重合開始剤(品名:パーヘキサC、1,1−ジ(t−ブチルパーオキシ)シクロへキサン、日油社製)1質量部とで構成された接着剤中に導電性粒子(品名:AUL704、積水化学工業社製)を粒子密度8,000個/mmになるよう分散させた。分散後の配合物を剥離処理したPET上に乾燥後の平均厚みが8μmとなるように塗布し、導電性粒子含有層を作製した。
(Example 1)
<Preparation of anisotropic conductive film>
-Production of conductive particle-containing layer-
60 parts by mass of a phenoxy resin (product name: YP50, manufactured by Nippon Steel Chemical Co., Ltd.), 35 parts by mass of an acrylic resin (product name: EB-600, manufactured by Daicel-Cytec), and a silane coupling agent (product name: KBM-503, Adhesion composed of 2 parts by mass of Shin-Etsu Chemical Co., Ltd.) and 1 part by mass of a polymerization initiator (product name: perhexa C, 1,1-di (t-butylperoxy) cyclohexane, manufactured by NOF Corporation) Conductive particles (product name: AUL704, manufactured by Sekisui Chemical Co., Ltd.) were dispersed in the agent so that the particle density was 8,000 particles / mm 2 . The dispersed compound was applied onto the release-treated PET so that the average thickness after drying was 8 μm, thereby preparing a conductive particle-containing layer.

−絶縁性接着層の作製−
フェノキシ樹脂(品名:YP70、新日鐵化学社製)60質量部と、アクリル樹脂(品名:EB−600、ダイセル・サイテック社製)35質量部と、シランカップリング剤(品名:KBM−503、信越化学工業社製)2質量部とで構成された配合物を、剥離処理したPET上に乾燥後の平均厚みが16μmとなるように塗布し、絶縁性接着層を作製した。
-Production of insulating adhesive layer-
60 parts by mass of a phenoxy resin (product name: YP70, manufactured by Nippon Steel Chemical Co., Ltd.), 35 parts by mass of an acrylic resin (product name: EB-600, manufactured by Daicel-Cytec), and a silane coupling agent (product name: KBM-503, A composition composed of 2 parts by mass) (manufactured by Shin-Etsu Chemical Co., Ltd.) was applied onto the peeled PET so that the average thickness after drying was 16 μm, and an insulating adhesive layer was produced.

上記で得られた導電性粒子含有層と絶縁性接着層をロールラミネータを用いて、ロール温度45℃にてラミネートし、異方性導電フィルムを得た。   The conductive particle-containing layer and the insulating adhesive layer obtained above were laminated at a roll temperature of 45 ° C. using a roll laminator to obtain an anisotropic conductive film.

<評価>
得られた異方性導電フィルムについて、以下の評価を行った。結果を表1−1に示す。
<Evaluation>
The following evaluation was performed about the obtained anisotropic conductive film. The results are shown in Table 1-1.

〔接続抵抗〕
以下の「通常評価」又は「押込み評価」にて作製した接合体について、デジタルマルチメータ(品番:デジタルマルチメータ7555、横河電機社製)を用いて4端子法にて電流1mAを流したときの接続抵抗を測定した。
[Connection resistance]
When a current of 1 mA is passed by a four-terminal method using a digital multimeter (product number: digital multimeter 7555, manufactured by Yokogawa Electric Corporation) for a joined body produced by the following “normal evaluation” or “indentation evaluation” The connection resistance was measured.

−通常評価−
評価基材として、COF(評価用基材、50μmピッチ、Cu8μm厚み−Snメッキ、38μm厚み−S’perflex基材)とITOコーティングガラス(評価用基材、全表面ITOコート、ガラス厚み0.7mm)を用い、異方性導電接続を行った。
具体的には、実施例1で作製した異方性導電フィルムを1.5mm幅にスリットして、導電性粒子含有層がITOコーティングガラスに接するように、ITOコーティングガラスに貼り付けた。
その上に前記COFを置いて仮固定した後、ヒートツール1.5mm幅で緩衝材(厚み100μmのテフロン)を用いて、圧着条件180℃、3.5MPa、6秒間(ツールスピード10mm/sec、ステージ温度40℃)で異方性導電接続を行い、接合体を作製した。
-Normal evaluation-
As an evaluation substrate, COF (evaluation substrate, 50 μm pitch, Cu 8 μm thickness—Sn plating, 38 μm thickness—S′perflex substrate) and ITO coating glass (evaluation substrate, entire surface ITO coating, glass thickness 0.7 mm) ) To make anisotropic conductive connection.
Specifically, the anisotropic conductive film produced in Example 1 was slit to a width of 1.5 mm, and attached to the ITO coating glass so that the conductive particle-containing layer was in contact with the ITO coating glass.
After the COF was placed and temporarily fixed thereon, a heat tool having a width of 1.5 mm and a buffer material (Teflon having a thickness of 100 μm) was used for pressure bonding conditions of 180 ° C., 3.5 MPa, 6 seconds (tool speed of 10 mm / sec, An anisotropic conductive connection was made at a stage temperature of 40 ° C. to produce a joined body.

−押込み評価−
前記通常評価において、圧着時のツールスピードを1mm/sec、ステージ温度100℃にして圧着条件180℃、3.5MPa、6秒間で異方性導電接続を行った以外は、前記通常評価と同様にして、接合体を作製した。
-Indentation evaluation-
In the above-mentioned normal evaluation, the same as the above-mentioned normal evaluation, except that the tool speed at the time of crimping was 1 mm / sec, the stage temperature was 100 ° C., and the anisotropic conductive connection was performed at the crimping conditions of 180 ° C. and 3.5 MPa for 6 seconds. Thus, a joined body was produced.

〔粒子捕捉率〕
粒子捕捉率は、下記方法により測定した。
(1)まず、前記COFと前記ITOコーティングガラスとの圧着前の導電性粒子含有層における導電性粒子の数を、顕微鏡を用いて数えた。
(2)次いで、前記COFと前記ITOコーティングガラスとを、前記通常評価と同じ条件で圧着した後、端子上に捕捉された前記導電性粒子の数を、顕微鏡を用いて数えた。このとき、明らかに導通に関与していると判断される導電性粒子のみをカウントし、前記端子の端部に存在しているだけの導電性粒子や、その一部が前記端子からはみ出している導電性粒子、また、粒子の潰れが不充分である導電性粒子の数は、カウントしない。
(3)そして、前記(1)及び(2)により求めた、前記COFと前記ITOコーティングガラスとの圧着前後における、前記端子の単位面積あたりの前記導電性粒子の数の比を算出した。この比を、前記粒子捕捉率とした。
(Particle capture rate)
The particle capture rate was measured by the following method.
(1) First, the number of conductive particles in the conductive particle-containing layer before pressure bonding between the COF and the ITO coating glass was counted using a microscope.
(2) Next, the COF and the ITO coating glass were pressure-bonded under the same conditions as in the normal evaluation, and then the number of the conductive particles captured on the terminals was counted using a microscope. At this time, only the conductive particles that are clearly determined to be involved in the conduction are counted, and only the conductive particles existing at the end of the terminal or a part thereof protrudes from the terminal. The number of conductive particles and conductive particles that are not sufficiently crushed are not counted.
(3) Then, the ratio of the number of the conductive particles per unit area of the terminal before and after pressure bonding between the COF and the ITO coating glass, which was obtained by the above (1) and (2), was calculated. This ratio was defined as the particle capture rate.

(実施例2)
<異方性導電フィルムの作製>
実施例1において、導電性粒子含有層の重合開始剤(品名:パーヘキサC、1,1−ジ(t−ブチルパーオキシ)シクロへキサン、日油社製)を3質量部に変えた以外は、実施例1と同様にして、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−1に示す。
(Example 2)
<Preparation of anisotropic conductive film>
In Example 1, except that the polymerization initiator (product name: perhexa C, 1,1-di (t-butylperoxy) cyclohexane, manufactured by NOF Corporation) of the conductive particle-containing layer was changed to 3 parts by mass. In the same manner as in Example 1, an anisotropic conductive film was obtained.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-1.

(実施例3)
<異方性導電フィルムの作製>
実施例1において、導電性粒子含有層の重合開始剤(品名:パーヘキサC、1,1−ジ(t−ブチルパーオキシ)シクロへキサン、日油社製)を8質量部に変えた以外は、実施例1と同様にして、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−1に示す。
Example 3
<Preparation of anisotropic conductive film>
In Example 1, except that the polymerization initiator (product name: perhexa C, 1,1-di (t-butylperoxy) cyclohexane, manufactured by NOF Corporation) of the conductive particle-containing layer was changed to 8 parts by mass. In the same manner as in Example 1, an anisotropic conductive film was obtained.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-1.

(実施例4)
<異方性導電フィルムの作製>
実施例1において、導電性粒子含有層の重合開始剤をパーロイルL(ジラウロイルパーオキサイド、日油社製)に代え、且つ重合開始剤の量を4質量部に変えた以外は、実施例1と同様にして、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−1に示す。
Example 4
<Preparation of anisotropic conductive film>
In Example 1, except that the polymerization initiator of the conductive particle-containing layer was replaced with Perroyl L (Dilauroyl peroxide, manufactured by NOF Corporation), and the amount of the polymerization initiator was changed to 4 parts by mass. In the same manner, an anisotropic conductive film was obtained.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-1.

(実施例5)
<異方性導電フィルムの作製>
実施例4において、導電性粒子含有層の重合開始剤をパーロイルOPP(ジ−2−エチルヘキシルペルオキシジカーボネート、日油社製)に代えた以外は、実施例4と同様にして、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−2に示す。
(Example 5)
<Preparation of anisotropic conductive film>
In Example 4, anisotropic conductivity was conducted in the same manner as in Example 4 except that the polymerization initiator of the conductive particle-containing layer was changed to perloyl OPP (di-2-ethylhexyl peroxydicarbonate, manufactured by NOF Corporation). A film was obtained.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-2.

(実施例6)
<異方性導電フィルムの作製>
実施例1において、導電性粒子含有層の重合開始剤(品名:パーヘキサC、1,1−ジ(t−ブチルパーオキシ)シクロへキサン、日油社製)を12質量部に変えた以外は、実施例1と同様にして、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−2に示す。
(Example 6)
<Preparation of anisotropic conductive film>
In Example 1, except that the polymerization initiator (product name: perhexa C, 1,1-di (t-butylperoxy) cyclohexane, manufactured by NOF Corporation) of the conductive particle-containing layer was changed to 12 parts by mass. In the same manner as in Example 1, an anisotropic conductive film was obtained.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-2.

(実施例7)
<異方性導電フィルムの作製>
実施例1において、絶縁性接着層のアクリル樹脂をアクリル樹脂(品名:U−4HA、新中村化学工業社製)に代えた以外は、実施例1と同様にして、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−2に示す。
(Example 7)
<Preparation of anisotropic conductive film>
In Example 1, an anisotropic conductive film was obtained in the same manner as in Example 1 except that the acrylic resin of the insulating adhesive layer was replaced with an acrylic resin (product name: U-4HA, manufactured by Shin-Nakamura Chemical Co., Ltd.). It was.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-2.

(実施例8)
<異方性導電フィルムの作製>
実施例1において、導電性粒子含有層のアクリル樹脂をアクリル樹脂(品名:U−4HA、新中村化学工業社製)に代えた以外は、実施例1と同様にして、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−2に示す。
(Example 8)
<Preparation of anisotropic conductive film>
In Example 1, an anisotropic conductive film was prepared in the same manner as in Example 1 except that the acrylic resin of the conductive particle-containing layer was replaced with an acrylic resin (product name: U-4HA, manufactured by Shin-Nakamura Chemical Co., Ltd.). Obtained.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-2.

(比較例1)
<異方性導電フィルムの作製>
−導電性粒子含有層の作製−
フェノキシ樹脂(品名:YP50、新日鐵化学社製)60部質量と、アクリル樹脂(品名:EB−600、ダイセル・サイテック社製)35質量部と、シランカップリング剤(品名:KBM−503、信越化学工業社製)2質量部と、重合開始剤(品名:パーヘキサC、1,1−ジ(t−ブチルパーオキシ)シクロへキサン、日油社製)2質量部とで構成された接着剤中に導電性粒子(品名:AUL704、積水化学工業社製)を粒子密度8,000個/mmになるよう分散させた。分散後の配合物を剥離処理したPET上に乾燥後の平均厚みが8μmとなるように塗布し、導電性粒子含有層を作製した。
(Comparative Example 1)
<Preparation of anisotropic conductive film>
-Production of conductive particle-containing layer-
60 parts by mass of a phenoxy resin (product name: YP50, manufactured by Nippon Steel Chemical Co., Ltd.), 35 parts by mass of an acrylic resin (product name: EB-600, manufactured by Daicel-Cytec), and a silane coupling agent (product name: KBM-503, Adhesion composed of 2 parts by mass of Shin-Etsu Chemical Co., Ltd. and 2 parts by mass of a polymerization initiator (product name: perhexa C, 1,1-di (t-butylperoxy) cyclohexane, manufactured by NOF Corporation) Conductive particles (product name: AUL704, manufactured by Sekisui Chemical Co., Ltd.) were dispersed in the agent so that the particle density was 8,000 particles / mm 2 . The dispersed compound was applied onto the release-treated PET so that the average thickness after drying was 8 μm, thereby preparing a conductive particle-containing layer.

−絶縁性接着層の作製−
フェノキシ樹脂(品名:YP70、新日鐵化学社製)60質量部と、アクリル樹脂(品名:EB−600、ダイセル・サイテック社製)35質量部と、シランカップリング剤(品名:KBM−503、信越化学工業社製)2質量部と、重合開始剤(品名:パーヘキサC、1,1−ジ(t−ブチルパーオキシ)シクロへキサン、日油社製)2質量部とで構成された配合物を、剥離処理したPET上に乾燥後の平均厚みが16μmとなるように塗布し、絶縁性接着層を作製した。
-Production of insulating adhesive layer-
60 parts by mass of a phenoxy resin (product name: YP70, manufactured by Nippon Steel Chemical Co., Ltd.), 35 parts by mass of an acrylic resin (product name: EB-600, manufactured by Daicel-Cytec), and a silane coupling agent (product name: KBM-503, A composition composed of 2 parts by mass of Shin-Etsu Chemical Co., Ltd. and 2 parts by mass of a polymerization initiator (product name: perhexa C, 1,1-di (t-butylperoxy) cyclohexane, manufactured by NOF Corporation). The product was coated on the peeled PET so that the average thickness after drying was 16 μm, and an insulating adhesive layer was produced.

上記で得られた導電性粒子含有層と絶縁性接着層をロールラミネータを用いて、ロール温度45℃にてラミネートし、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−3に示す。
The conductive particle-containing layer and the insulating adhesive layer obtained above were laminated at a roll temperature of 45 ° C. using a roll laminator to obtain an anisotropic conductive film.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-3.

(比較例2)
<異方性導電フィルムの作製>
比較例1において、導電性粒子含有層の重合開始剤(品名:パーヘキサC、1,1−ジ(t−ブチルパーオキシ)シクロへキサン、日油社製)を6質量部に変えた以外は、比較例1と同様にして、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−3に示す。
(Comparative Example 2)
<Preparation of anisotropic conductive film>
In Comparative Example 1, except that the polymerization initiator (product name: perhexa C, 1,1-di (t-butylperoxy) cyclohexane, manufactured by NOF Corporation) of the conductive particle-containing layer was changed to 6 parts by mass. In the same manner as in Comparative Example 1, an anisotropic conductive film was obtained.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-3.

(比較例3)
<異方性導電フィルムの作製>
比較例1において、導電性粒子含有層と絶縁性接着層の重合開始剤(品名:パーヘキサC、1,1−ジ(t−ブチルパーオキシ)シクロへキサン、日油社製)を、重合開始剤(品名:パーロイルL、ジラウロイルパーオキサイド、日油社製)に代えた以外は、実施例1と同様にして、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−3に示す。
(Comparative Example 3)
<Preparation of anisotropic conductive film>
In Comparative Example 1, a polymerization initiator (product name: perhexa C, 1,1-di (t-butylperoxy) cyclohexane, manufactured by NOF Corporation) for the conductive particle-containing layer and the insulating adhesive layer was polymerized. An anisotropic conductive film was obtained in the same manner as in Example 1 except that the agent was replaced with the agent (product name: perloyl L, dilauroyl peroxide, manufactured by NOF Corporation).
Evaluation similar to Example 1 was performed. The results are shown in Table 1-3.

(比較例4)
<異方性導電フィルムの作製>
比較例1において、導電性粒子含有層には重合開始剤を含有せず、且つ絶縁性接着層の重合開始剤(品名:パーヘキサC、1,1−ジ(t−ブチルパーオキシ)シクロへキサン、日油社製)を4質量部に代えた以外は、比較例1と同様にして、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−3に示す。
(Comparative Example 4)
<Preparation of anisotropic conductive film>
In Comparative Example 1, the conductive particle-containing layer does not contain a polymerization initiator, and the insulating adhesive layer polymerization initiator (product name: perhexa C, 1,1-di (t-butylperoxy) cyclohexane , Manufactured by NOF Corporation) was replaced with 4 parts by mass, and an anisotropic conductive film was obtained in the same manner as in Comparative Example 1.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-3.

(比較例5)
<異方性導電フィルムの作製>
−導電性粒子含有層の作製−
フェノキシ樹脂(品名:YP50、新日鐵化学社製)50部質量と、エポキシ樹脂(品名:EP−828、三菱化学社製)20質量部と、シランカップリング剤(品名:KBM−503、信越化学工業社製)2質量部と、イミダゾール硬化剤(品名:ノバキュア3941HP、旭化成ケミカルズ社製)30質量部とで構成された接着剤中に導電性粒子(品名:AUL704、積水化学工業社製)を粒子密度8,000個/mmになるよう分散させた。分散後の配合物を剥離処理したPET上に乾燥後の平均厚みが8μmとなるように塗布し、導電性粒子含有層を作製した。
(Comparative Example 5)
<Preparation of anisotropic conductive film>
-Production of conductive particle-containing layer-
50 parts by mass of a phenoxy resin (product name: YP50, manufactured by Nippon Steel Chemical Co., Ltd.), 20 parts by mass of an epoxy resin (product name: EP-828, manufactured by Mitsubishi Chemical Corporation), and a silane coupling agent (product name: KBM-503, Shin-Etsu) Conductive particles (product name: AUL704, manufactured by Sekisui Chemical Co., Ltd.) in an adhesive composed of 2 parts by mass and 2 parts by mass of imidazole curing agent (product name: Novacure 3941HP, manufactured by Asahi Kasei Chemicals) Was dispersed to a particle density of 8,000 particles / mm 2 . The dispersed compound was applied onto the release-treated PET so that the average thickness after drying was 8 μm, thereby preparing a conductive particle-containing layer.

−絶縁性接着層の作製−
フェノキシ樹脂(品名:YP70、新日鐵化学社製)50質量部と、エポキシ樹脂(品名:EP−828、三菱化学社製)20質量部と、シランカップリング剤(品名:KBM−503、信越化学工業社製)2質量部とで構成された配合物を、剥離処理したPET上に乾燥後の平均厚みが16μmとなるように塗布し、絶縁性接着層を作製した。
-Production of insulating adhesive layer-
50 parts by mass of a phenoxy resin (product name: YP70, manufactured by Nippon Steel Chemical Co., Ltd.), 20 parts by mass of an epoxy resin (product name: EP-828, manufactured by Mitsubishi Chemical Corporation), and a silane coupling agent (product name: KBM-503, Shin-Etsu) A compound composed of 2 parts by mass of Chemical Industries Co., Ltd. was applied onto the peeled PET so that the average thickness after drying was 16 μm, and an insulating adhesive layer was produced.

上記で得られた導電性粒子含有層と絶縁性接着層をロールラミネータを用いて、ロール温度45℃にてラミネートし、異方性導電フィルムを得た。
実施例1と同様の評価を行った。結果を表1−3に示す。
The conductive particle-containing layer and the insulating adhesive layer obtained above were laminated at a roll temperature of 45 ° C. using a roll laminator to obtain an anisotropic conductive film.
Evaluation similar to Example 1 was performed. The results are shown in Table 1-3.

Figure 0005685473
Figure 0005685473

Figure 0005685473
Figure 0005685473

Figure 0005685473
Figure 0005685473

表1−1及び表1−2中、各重合開始剤の1分間半減期温度(℃)は、以下のとおりである。
(A):90.6℃、パーロイルOPP
(B):116.4℃、パーロイルL
(C):153.8℃、パーヘキサC
In Table 1-1 and Table 1-2, the 1-minute half-life temperature (° C.) of each polymerization initiator is as follows.
(A): 90.6 ° C., paroyl OPP
(B): 116.4 ° C., Parroyl L
(C): 153.8 ° C., perhexa C

実施例1〜8の結果から、本発明の異方性導電フィルムは、通常評価、及び低速で押込みを行った押込み評価のいずれにおいても、接続抵抗が十分低く、且つ粒子捕捉率に優れる結果であった。
特に、重合開始剤の含有量が3質量%〜8質量%である実施例2〜4は、接続抵抗及び粒子捕捉率のいずれもがより優れていた。特に、1分間半減期温度が116.4℃のパーロイルLを用いた実施例4では、接続抵抗及び粒子捕捉率のいずれもが特に優れていた。
重合開始剤の含有量が8質量%を超える実施例6は、押込み時の接続抵抗が、実施例2〜4よりも若干高い結果となった。
From the results of Examples 1 to 8, the anisotropic conductive film of the present invention is a result that the connection resistance is sufficiently low and the particle trapping rate is excellent in both the normal evaluation and the indentation evaluation in which indentation is performed at a low speed. there were.
In particular, in Examples 2 to 4 in which the content of the polymerization initiator was 3% by mass to 8% by mass, both the connection resistance and the particle capture rate were more excellent. In particular, in Example 4 using Parroyl L having a 1-minute half-life temperature of 116.4 ° C., both the connection resistance and the particle trapping rate were particularly excellent.
In Example 6 in which the content of the polymerization initiator exceeds 8% by mass, the connection resistance at the time of indentation was slightly higher than those in Examples 2 to 4.

絶縁性接着層、及び導電性粒子含有層のいずれにも重合開始剤を含有する比較例1〜3は、圧着時の絶縁性接着層の流動性が低く、実施例に比べ粒子捕捉率が低い結果となった。また、比較例3では押込み時の接続抵抗が高い結果となった。
また、絶縁性接着層のみに重合開始剤を含有する比較例4は、導電性粒子含有層に重合開始剤を含有しないため、圧着時に導電性粒子が流動し、粒子捕捉率が低い結果となった。
また、バインダーがエポキシ樹脂である比較例5は、短時間圧着においては、十分な硬化が得られず、接続抵抗が高く、且つ粒子捕捉率が低い結果となった。
In Comparative Examples 1 to 3 containing a polymerization initiator in both the insulating adhesive layer and the conductive particle-containing layer, the fluidity of the insulating adhesive layer at the time of pressure bonding is low, and the particle trapping rate is low compared to the examples. As a result. In Comparative Example 3, the connection resistance during pressing was high.
Further, Comparative Example 4 containing the polymerization initiator only in the insulating adhesive layer does not contain the polymerization initiator in the conductive particle-containing layer, so that the conductive particles flow at the time of pressure bonding, resulting in a low particle capture rate. It was.
In Comparative Example 5 in which the binder is an epoxy resin, sufficient curing was not obtained in the short-time pressure bonding, resulting in a high connection resistance and a low particle capture rate.

本発明の異方性導電フィルムは、粒子捕捉率に優れ、且つ短時間圧着でも十分に低い接続抵抗が得られることから、基板と電子部品の異方性導電接続などに好適用いられる。   The anisotropic conductive film of the present invention is suitable for anisotropic conductive connection between a substrate and an electronic component because it has an excellent particle trapping rate and a sufficiently low connection resistance can be obtained even for a short time.

1 異方性導電フィルム
2 導電性粒子含有層
3 絶縁性接着層
4 導電性粒子
5 基材
6 端子
7 端子
8 電子部品
DESCRIPTION OF SYMBOLS 1 Anisotropic conductive film 2 Conductive particle content layer 3 Insulating adhesive layer 4 Conductive particle 5 Base material 6 Terminal 7 Terminal 8 Electronic component

Claims (7)

基板の端子と電子部品の端子とを異方性導電接続させる異方性導電フィルムであって、
アクリル樹脂を含有する絶縁性接着層と、
導電性粒子、アクリル樹脂、及び重合開始剤を含有する導電性粒子含有層とを有し、
前記絶縁性接着層と前記導電性粒子含有層のうちの前記導電性粒子含有層のみが、前記重合開始剤を含有することを特徴とする異方性導電フィルム。
An anisotropic conductive film for anisotropic conductive connection between a terminal of a substrate and a terminal of an electronic component,
An insulating adhesive layer containing an acrylic resin;
Having conductive particles, an acrylic resin, and a conductive particle-containing layer containing a polymerization initiator,
Of the insulating adhesive layer and the conductive particle-containing layer, only the conductive particle-containing layer contains the polymerization initiator.
重合開始剤が、有機過酸化物である請求項1に記載の異方性導電フィルム。   The anisotropic conductive film according to claim 1, wherein the polymerization initiator is an organic peroxide. 有機過酸化物の1分間半減期温度が、90.0℃〜154.0℃である請求項2に記載の異方性導電フィルム。   The anisotropic conductive film according to claim 2, wherein the organic peroxide has a one-minute half-life temperature of 90.0 ° C to 154.0 ° C. 導電性粒子含有層における有機過酸化物の含有量が、前記導電性粒子含有層中の樹脂成分に対して、3質量%〜8質量%である請求項2から3のいずれかに記載の異方性導電フィルム。   The content of the organic peroxide in a conductive particle content layer is 3 mass%-8 mass% with respect to the resin component in the said conductive particle content layer, The difference in any one of Claim 2 to 3 Isotropic conductive film. 導電性粒子含有層の平均厚みが、2μm〜10μmであり、The average thickness of the conductive particle-containing layer is 2 μm to 10 μm,
絶縁性接着層の平均厚みが、5μm〜25μmである、請求項1から4のいずれかに記載の異方性導電フィルム。The anisotropic conductive film in any one of Claim 1 to 4 whose average thickness of an insulating contact bonding layer is 5 micrometers-25 micrometers.
請求項1から5のいずれかに記載の異方性導電フィルムを、基板の端子上に、前記異方性導電フィルムの導電性粒子含有層が前記基板の端子に接触するように貼り付ける貼付工程と、A sticking step of attaching the anisotropic conductive film according to any one of claims 1 to 5 on the terminal of the substrate so that the conductive particle-containing layer of the anisotropic conductive film is in contact with the terminal of the substrate. When,
前記異方性導電フィルム上に電子部品を載置する載置工程と、A placing step of placing an electronic component on the anisotropic conductive film;
前記電子部品を加熱押圧部材により加熱及び押圧する加熱押圧工程とを含み、A heating and pressing step of heating and pressing the electronic component with a heating and pressing member,
前記基板の端子と前記電子部品の端子とを異方性導電接続させることを特徴とする接合体の製造方法。A method for manufacturing a joined body, wherein the terminals of the substrate and the terminals of the electronic component are anisotropically conductively connected.
請求項6に記載の接合体の製造方法により製造されることを特徴とする接合体。A joined body produced by the method for producing a joined body according to claim 6.
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