JP5674466B2 - ナノチューブデバイスおよび製造方法 - Google Patents
ナノチューブデバイスおよび製造方法 Download PDFInfo
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- JP5674466B2 JP5674466B2 JP2010513427A JP2010513427A JP5674466B2 JP 5674466 B2 JP5674466 B2 JP 5674466B2 JP 2010513427 A JP2010513427 A JP 2010513427A JP 2010513427 A JP2010513427 A JP 2010513427A JP 5674466 B2 JP5674466 B2 JP 5674466B2
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- nanotubes
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- 239000002071 nanotube Substances 0.000 title claims description 153
- 238000004519 manufacturing process Methods 0.000 title description 27
- 239000002041 carbon nanotube Substances 0.000 claims description 79
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 57
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 54
- 229910052751 metal Inorganic materials 0.000 claims description 47
- 239000002184 metal Substances 0.000 claims description 47
- 230000005684 electric field Effects 0.000 claims description 43
- 238000000151 deposition Methods 0.000 claims description 39
- 239000000758 substrate Substances 0.000 claims description 39
- 230000008021 deposition Effects 0.000 claims description 27
- 238000009826 distribution Methods 0.000 claims description 23
- 238000001962 electrophoresis Methods 0.000 claims description 11
- 238000004458 analytical method Methods 0.000 claims description 10
- 239000003792 electrolyte Substances 0.000 claims description 8
- 238000012545 processing Methods 0.000 claims description 7
- 239000012530 fluid Substances 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 61
- 230000008569 process Effects 0.000 description 15
- 238000001652 electrophoretic deposition Methods 0.000 description 14
- 239000002109 single walled nanotube Substances 0.000 description 12
- 238000001459 lithography Methods 0.000 description 10
- 239000000523 sample Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 229910004205 SiNX Inorganic materials 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 238000005530 etching Methods 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
- 238000000926 separation method Methods 0.000 description 7
- 239000000725 suspension Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 229910017052 cobalt Inorganic materials 0.000 description 5
- 239000010941 cobalt Substances 0.000 description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 5
- 239000004020 conductor Substances 0.000 description 5
- 230000003834 intracellular effect Effects 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 238000000206 photolithography Methods 0.000 description 5
- 239000010453 quartz Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000011651 chromium Substances 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 239000002048 multi walled nanotube Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000004141 dimensional analysis Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- -1 hydrogen ions Chemical class 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- MFUVDXOKPBAHMC-UHFFFAOYSA-N magnesium;dinitrate;hexahydrate Chemical compound O.O.O.O.O.O.[Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MFUVDXOKPBAHMC-UHFFFAOYSA-N 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 239000012472 biological sample Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006143 cell culture medium Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000002365 multiple layer Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920002113 octoxynol Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/04—Electrophoretic coating characterised by the process with organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/20—Pretreatment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
- G01N27/4146—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS involving nanosized elements, e.g. nanotubes, nanowires
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/701—Integrated with dissimilar structures on a common substrate
- Y10S977/72—On an electrically conducting, semi-conducting, or semi-insulating substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
- Y10S977/953—Detector using nanostructure
- Y10S977/957—Of chemical property or presence
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
- Y10S977/953—Detector using nanostructure
- Y10S977/957—Of chemical property or presence
- Y10S977/958—Of biomolecule property
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Electrochemistry (AREA)
- Molecular Biology (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Metallurgy (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Pathology (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Immunology (AREA)
- Biochemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Carbon And Carbon Compounds (AREA)
- Laminated Bodies (AREA)
- Thin Film Transistor (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/765,735 | 2007-06-20 | ||
| US11/765,735 US7964143B2 (en) | 2007-06-20 | 2007-06-20 | Nanotube device and method of fabrication |
| PCT/US2008/067604 WO2009017898A2 (en) | 2007-06-20 | 2008-06-20 | Nanotube device and method of fabrication |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010532717A JP2010532717A (ja) | 2010-10-14 |
| JP2010532717A5 JP2010532717A5 (enExample) | 2011-10-06 |
| JP5674466B2 true JP5674466B2 (ja) | 2015-02-25 |
Family
ID=40136698
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010513427A Expired - Fee Related JP5674466B2 (ja) | 2007-06-20 | 2008-06-20 | ナノチューブデバイスおよび製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US7964143B2 (enExample) |
| EP (1) | EP2171132A4 (enExample) |
| JP (1) | JP5674466B2 (enExample) |
| KR (1) | KR101464283B1 (enExample) |
| WO (1) | WO2009017898A2 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8920619B2 (en) | 2003-03-19 | 2014-12-30 | Hach Company | Carbon nanotube sensor |
| US8031514B2 (en) | 2007-04-09 | 2011-10-04 | Northeastern University | Bistable nanoswitch |
| US7964143B2 (en) | 2007-06-20 | 2011-06-21 | New Jersey Institute Of Technology | Nanotube device and method of fabrication |
| US20090045061A1 (en) * | 2007-06-20 | 2009-02-19 | New Jersey Institute Of Technology | Nanotube Devices and Vertical Field Effect Transistors |
| EP2098484A1 (en) * | 2008-02-15 | 2009-09-09 | Imec | Synthesis of zeolite crystals and formation of carbon nanostructures in patterned structures |
| US8362760B2 (en) * | 2008-02-19 | 2013-01-29 | West Virginia University Research Corporation, Wvu Office Of Technology Transfer | Stimulus responsive nanoparticles |
| FR2928093B1 (fr) * | 2008-02-28 | 2010-12-31 | Commissariat Energie Atomique | Dispositif de separation de molecules et procede de fabrication. |
| JP5717233B2 (ja) * | 2010-02-16 | 2015-05-13 | 独立行政法人産業技術総合研究所 | 単層カーボンナノチューブの分離方法、分離装置、分離済単層カーボンナノチューブ含有ミセル分散溶液 |
| US8317978B1 (en) * | 2010-04-07 | 2012-11-27 | Manning Thelma G | Nitriding of carbon nanotubes |
| US9406580B2 (en) * | 2011-03-16 | 2016-08-02 | Synaptics Incorporated | Packaging for fingerprint sensors and methods of manufacture |
| KR101311780B1 (ko) * | 2011-06-09 | 2013-09-25 | 경희대학교 산학협력단 | 탄소나노튜브 수직 배향 방법 및 장치 |
| CN103288033B (zh) * | 2012-02-23 | 2016-02-17 | 清华大学 | 碳纳米管微尖结构的制备方法 |
| WO2014109722A1 (en) | 2013-01-14 | 2014-07-17 | Kaya Cengiz | A method for production and coating of antibacterial copper (ii) oxide (cuo) nano-tube |
| WO2014165001A1 (en) | 2013-03-12 | 2014-10-09 | Farrow, Reginald, C. | Nanoprobe and methods of use |
| US10501315B2 (en) | 2016-05-23 | 2019-12-10 | New Jersey Institute Of Technology | Analytical nanoscope on a chip for sub-optical resolution imaging |
| US9643179B1 (en) * | 2016-06-24 | 2017-05-09 | International Business Machines Corporation | Techniques for fabricating horizontally aligned nanochannels for microfluidics and biosensors |
| US9837403B1 (en) * | 2016-09-27 | 2017-12-05 | International Business Machines Corporation | Asymmetrical vertical transistor |
| KR101829302B1 (ko) * | 2016-10-24 | 2018-02-19 | 한국생산기술연구원 | 나노소재 어셈블리구조의 제작방법 및 그 방법을 실시하기 위한 장치 |
| CN110178201B (zh) * | 2017-01-13 | 2023-06-16 | 应用材料公司 | 用于低温氮化硅膜的方法及设备 |
| US11467109B2 (en) * | 2018-04-30 | 2022-10-11 | The Hong Kong University Of Science And Technology | Nanotube array gas sensor |
| KR102607332B1 (ko) * | 2020-03-24 | 2023-11-29 | 한국전자통신연구원 | 전계 방출 장치 |
| US11705312B2 (en) | 2020-12-26 | 2023-07-18 | Applied Materials, Inc. | Vertically adjustable plasma source |
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| JP3902883B2 (ja) * | 1998-03-27 | 2007-04-11 | キヤノン株式会社 | ナノ構造体及びその製造方法 |
| KR100314094B1 (ko) * | 1999-08-12 | 2001-11-15 | 김순택 | 전기 영동법을 이용한 카본나노튜브 필드 에미터의 제조 방법 |
| JP3581298B2 (ja) | 2000-04-27 | 2004-10-27 | シャープ株式会社 | 電界放出型電子源アレイ及びその製造方法 |
| KR100360476B1 (ko) * | 2000-06-27 | 2002-11-08 | 삼성전자 주식회사 | 탄소나노튜브를 이용한 나노 크기 수직 트랜지스터 및 그제조방법 |
| DE10036897C1 (de) * | 2000-07-28 | 2002-01-03 | Infineon Technologies Ag | Feldeffekttransistor, Schaltungsanordnung und Verfahren zum Herstellen eines Feldeffekttransistors |
| JP3590007B2 (ja) * | 2001-06-25 | 2004-11-17 | シャープ株式会社 | 電子放出素子およびその製造方法並びに該電子放出素子を用いた画像表示装置 |
| JP3583387B2 (ja) * | 2001-06-25 | 2004-11-04 | シャープ株式会社 | 電子放出素子、その製造方法、及び電子放出素子を備えた画像表示装置 |
| US7252749B2 (en) * | 2001-11-30 | 2007-08-07 | The University Of North Carolina At Chapel Hill | Deposition method for nanostructure materials |
| US6784028B2 (en) * | 2001-12-28 | 2004-08-31 | Nantero, Inc. | Methods of making electromechanical three-trace junction devices |
| US6515325B1 (en) * | 2002-03-06 | 2003-02-04 | Micron Technology, Inc. | Nanotube semiconductor devices and methods for making the same |
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| US6933222B2 (en) * | 2003-01-02 | 2005-08-23 | Intel Corporation | Microcircuit fabrication and interconnection |
| US7045421B2 (en) * | 2003-04-22 | 2006-05-16 | Nantero, Inc. | Process for making bit selectable devices having elements made with nanotubes |
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| KR101015498B1 (ko) * | 2003-06-14 | 2011-02-21 | 삼성전자주식회사 | 수직 카본나노튜브 전계효과트랜지스터 및 그 제조방법 |
| JP2005101191A (ja) * | 2003-09-24 | 2005-04-14 | Denso Corp | 熱電変換型冷却装置およびその製造方法 |
| US8859151B2 (en) * | 2003-11-05 | 2014-10-14 | St. Louis University | Immobilized enzymes in biocathodes |
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| JP2006049435A (ja) * | 2004-08-02 | 2006-02-16 | Sony Corp | カーボンナノチューブ及びその配置方法と、これを用いた電界効果トランジスタとその製造方法及び半導体装置 |
| US7470353B2 (en) * | 2004-08-30 | 2008-12-30 | Samsung Electro-Mechanics Co., Ltd. | Method of manufacturing field emitter electrode using self-assembling carbon nanotubes and field emitter electrode manufactured thereby |
| KR100649586B1 (ko) * | 2004-08-30 | 2006-11-28 | 삼성전기주식회사 | 탄소나노튜브의 셀프 어셈블링을 이용한 전계방출 에미터전극의 제조 방법 및 이에 따라 제조된 전계방출 에미터전극 |
| JP4463070B2 (ja) | 2004-10-15 | 2010-05-12 | 株式会社日立ハイテクノロジーズ | カーボンナノチューブ精製方法、精製装置、及び精製キット |
| US20060103287A1 (en) | 2004-11-15 | 2006-05-18 | Li-Ren Tsuei | Carbon-nanotube cold cathode and method for fabricating the same |
| US7535016B2 (en) * | 2005-01-31 | 2009-05-19 | International Business Machines Corporation | Vertical carbon nanotube transistor integration |
| US7989349B2 (en) * | 2005-04-15 | 2011-08-02 | Micron Technology, Inc. | Methods of manufacturing nanotubes having controlled characteristics |
| US20060249388A1 (en) * | 2005-05-04 | 2006-11-09 | Yu-Yang Chang | Electrophoretic deposition method for a field emission device |
| JP5037804B2 (ja) * | 2005-09-30 | 2012-10-03 | 富士通株式会社 | 垂直配向カーボンナノチューブを用いた電子デバイス |
| KR20070046602A (ko) * | 2005-10-31 | 2007-05-03 | 삼성에스디아이 주식회사 | 전자 방출 소자, 이를 구비한 전자 방출 디스플레이 장치및 그 제조방법 |
| US7964143B2 (en) | 2007-06-20 | 2011-06-21 | New Jersey Institute Of Technology | Nanotube device and method of fabrication |
| US7736979B2 (en) * | 2007-06-20 | 2010-06-15 | New Jersey Institute Of Technology | Method of forming nanotube vertical field effect transistor |
-
2007
- 2007-06-20 US US11/765,735 patent/US7964143B2/en not_active Expired - Fee Related
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2008
- 2008-06-20 WO PCT/US2008/067604 patent/WO2009017898A2/en not_active Ceased
- 2008-06-20 EP EP08826831.3A patent/EP2171132A4/en not_active Withdrawn
- 2008-06-20 KR KR1020107001283A patent/KR101464283B1/ko not_active Expired - Fee Related
- 2008-06-20 JP JP2010513427A patent/JP5674466B2/ja not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| EP2171132A2 (en) | 2010-04-07 |
| WO2009017898A2 (en) | 2009-02-05 |
| KR101464283B1 (ko) | 2014-11-21 |
| US20110240480A1 (en) | 2011-10-06 |
| EP2171132A4 (en) | 2015-06-03 |
| US20080317631A1 (en) | 2008-12-25 |
| KR20100047845A (ko) | 2010-05-10 |
| US7964143B2 (en) | 2011-06-21 |
| US8257566B2 (en) | 2012-09-04 |
| WO2009017898A3 (en) | 2009-04-16 |
| JP2010532717A (ja) | 2010-10-14 |
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