JP5656311B2 - 基板上にパターン金属を誘導する方法 - Google Patents

基板上にパターン金属を誘導する方法 Download PDF

Info

Publication number
JP5656311B2
JP5656311B2 JP2009182935A JP2009182935A JP5656311B2 JP 5656311 B2 JP5656311 B2 JP 5656311B2 JP 2009182935 A JP2009182935 A JP 2009182935A JP 2009182935 A JP2009182935 A JP 2009182935A JP 5656311 B2 JP5656311 B2 JP 5656311B2
Authority
JP
Japan
Prior art keywords
substrate
directing
ions
pattern
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009182935A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010045353A (ja
JP2010045353A5 (enExample
Inventor
テレサ・ホルターマン
アンソニー・グラウペラ
マイケル・ディバティスタ
Original Assignee
エフ・イ−・アイ・カンパニー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エフ・イ−・アイ・カンパニー filed Critical エフ・イ−・アイ・カンパニー
Publication of JP2010045353A publication Critical patent/JP2010045353A/ja
Publication of JP2010045353A5 publication Critical patent/JP2010045353A5/ja
Application granted granted Critical
Publication of JP5656311B2 publication Critical patent/JP5656311B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/46—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a liquid
    • H10P14/47—Electrolytic deposition, i.e. electroplating; Electroless plating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/021—Manufacture or treatment of interconnections within wafers or substrates
    • H10W20/023—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/021—Manufacture or treatment of interconnections within wafers or substrates
    • H10W20/023—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
    • H10W20/0234—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias comprising etching via holes that stop on pads or on electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/021—Manufacture or treatment of interconnections within wafers or substrates
    • H10W20/023—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
    • H10W20/0242—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias comprising etching via holes from the back sides of the chips, wafers or substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H01J2237/31706—Ion implantation characterised by the area treated
    • H01J2237/3171—Ion implantation characterised by the area treated patterned
    • H01J2237/31713—Focused ion beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31732—Depositing thin layers on selected microareas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31735—Direct-write microstructures
    • H01J2237/31737—Direct-write microstructures using ions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31742—Etching microareas for repairing masks
    • H01J2237/31744—Etching microareas for repairing masks introducing gas in vicinity of workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/207—Electrical properties, e.g. testing or measuring of resistance, deep levels or capacitance-voltage characteristics
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/031—Manufacture or treatment of conductive parts of the interconnections
    • H10W20/067—Manufacture or treatment of conductive parts of the interconnections by modifying the pattern of conductive parts

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Micromachines (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Weting (AREA)
  • Drying Of Semiconductors (AREA)
JP2009182935A 2008-08-08 2009-08-06 基板上にパターン金属を誘導する方法 Expired - Fee Related JP5656311B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US8760508P 2008-08-08 2008-08-08
US61/087,605 2008-08-08
US12/210,781 US8278220B2 (en) 2008-08-08 2008-09-15 Method to direct pattern metals on a substrate
US12/210,781 2008-09-15

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2014094903A Division JP2014187371A (ja) 2008-08-08 2014-05-01 半導体試験方法
JP2014094902A Division JP2014187370A (ja) 2008-08-08 2014-05-01 微小金属構造の製造方法

Publications (3)

Publication Number Publication Date
JP2010045353A JP2010045353A (ja) 2010-02-25
JP2010045353A5 JP2010045353A5 (enExample) 2012-08-30
JP5656311B2 true JP5656311B2 (ja) 2015-01-21

Family

ID=41228378

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2009182935A Expired - Fee Related JP5656311B2 (ja) 2008-08-08 2009-08-06 基板上にパターン金属を誘導する方法
JP2014094903A Withdrawn JP2014187371A (ja) 2008-08-08 2014-05-01 半導体試験方法
JP2014094902A Withdrawn JP2014187370A (ja) 2008-08-08 2014-05-01 微小金属構造の製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2014094903A Withdrawn JP2014187371A (ja) 2008-08-08 2014-05-01 半導体試験方法
JP2014094902A Withdrawn JP2014187370A (ja) 2008-08-08 2014-05-01 微小金属構造の製造方法

Country Status (3)

Country Link
US (1) US8278220B2 (enExample)
EP (2) EP2151854A3 (enExample)
JP (3) JP5656311B2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2199434A1 (en) * 2008-12-19 2010-06-23 FEI Company Method for forming microscopic structures on a substrate
EP2226830B1 (en) 2009-03-06 2014-01-08 FEI Company Charged particle beam processing
EP2261395A1 (en) * 2009-06-12 2010-12-15 Fei Company Au-containing layer obtainable by charged particle beam processing
US8859998B2 (en) 2011-01-28 2014-10-14 Fei Company TEM sample preparation
US8986524B2 (en) 2011-01-28 2015-03-24 International Business Machines Corporation DNA sequence using multiple metal layer structure with different organic coatings forming different transient bondings to DNA
US8859963B2 (en) * 2011-06-03 2014-10-14 Fei Company Methods for preparing thin samples for TEM imaging
JP2013101929A (ja) 2011-11-07 2013-05-23 Fei Co 荷電粒子ビーム・システムの絞り
US9733164B2 (en) 2012-06-11 2017-08-15 Fei Company Lamella creation method and device using fixed-angle beam and rotating sample stage
US8759764B2 (en) 2012-06-29 2014-06-24 Fei Company On-axis detector for charged particle beam system
US9046511B2 (en) 2013-04-18 2015-06-02 International Business Machines Corporation Fabrication of tunneling junction for nanopore DNA sequencing
US9182369B2 (en) 2013-06-19 2015-11-10 Globalfoundries Inc. Manufacturable sub-3 nanometer palladium gap devices for fixed electrode tunneling recognition
US9188578B2 (en) 2013-06-19 2015-11-17 Globalfoundries Inc. Nanogap device with capped nanowire structures
JP6290559B2 (ja) * 2013-09-03 2018-03-07 株式会社日立ハイテクサイエンス 断面加工観察方法、断面加工観察装置
KR101565673B1 (ko) * 2014-01-02 2015-11-03 삼성전기주식회사 칩 전자부품의 제조방법
CA2948148C (en) * 2014-05-09 2022-12-06 AuroMedics Pharma LLC Formulations of cyclophosphamide liquid concentrate
EP3043372B1 (en) 2015-01-12 2017-01-04 Fei Company Method of modifying a sample surface layer from a microscopic sample
US10103008B2 (en) 2016-01-12 2018-10-16 Fei Company Charged particle beam-induced etching
EP3249676B1 (en) 2016-05-27 2018-10-03 FEI Company Dual-beam charged-particle microscope with in situ deposition functionality
ES2738911A1 (es) * 2018-07-25 2020-01-27 Consejo Superior Investigacion Procedimiento para depositar elementos sobre un sustrato de interes y dispositivo
US11298547B2 (en) 2018-07-27 2022-04-12 Medtronic, Inc. Fluid status detection from a cardiac electrical signal and impedance signal
CN111413727B (zh) * 2020-04-15 2021-12-28 中国科学院电工研究所 一种电子束发散角测量装置及其制备方法和测量方法
US20230369211A1 (en) * 2022-05-13 2023-11-16 Intel Corporation Designs to enable inline circuit edit

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3013955A (en) 1959-04-29 1961-12-19 Fairchild Camera Instr Co Method of transistor manufacture
US3043955A (en) 1960-01-25 1962-07-10 Hughes Aircraft Co Discriminating radiation detector
GB1062365A (en) 1965-03-01 1967-03-22 Hughes Aircraft Co A method of electroplating an ohmic contact bump upon a semiconductor body
US3506545A (en) * 1967-02-14 1970-04-14 Ibm Method for plating conductive patterns with high resolution
JPS60143630A (ja) * 1983-12-29 1985-07-29 Fujitsu Ltd イオン注入方法
JPS60145612A (ja) * 1984-01-09 1985-08-01 Mitsubishi Electric Corp 半導体装置の製造方法
JPS63210845A (ja) * 1987-02-27 1988-09-01 Hitachi Ltd 欠陥修正方法
US4874460A (en) 1987-11-16 1989-10-17 Seiko Instruments Inc. Method and apparatus for modifying patterned film
JP2553926B2 (ja) * 1989-01-25 1996-11-13 理化学研究所 選択的金属薄膜の形成方法
US6153891A (en) 1994-11-23 2000-11-28 Intel Corporation Method and apparatus providing a circuit edit structure through the back side of an integrated circuit die
US5976980A (en) 1994-11-23 1999-11-02 Intel Corporation Method and apparatus providing a mechanical probe structure in an integrated circuit die
JP2000232078A (ja) 1999-02-10 2000-08-22 Toshiba Corp メッキ方法及びメッキ装置
US6319831B1 (en) 1999-03-18 2001-11-20 Taiwan Semiconductor Manufacturing Company Gap filling by two-step plating
JP3541931B2 (ja) 1999-05-17 2004-07-14 富士ゼロックス株式会社 電着膜形成方法、電極形成方法および電着膜形成装置
US6372529B1 (en) 1999-09-30 2002-04-16 Advanced Micro Devices, Inc. Forming elongated probe points useful in testing semiconductor devices
US6838380B2 (en) 2001-01-26 2005-01-04 Fei Company Fabrication of high resistivity structures using focused ion beams
US6815358B2 (en) * 2001-09-06 2004-11-09 Seagate Technology Llc Electron beam lithography method for plating sub-100 nm trenches
KR100465063B1 (ko) 2002-04-01 2005-01-06 주식회사 하이닉스반도체 반도체 소자의 금속배선 형성방법
US6974768B1 (en) 2003-01-15 2005-12-13 Novellus Systems, Inc. Methods of providing an adhesion layer for adhesion of barrier and/or seed layers to dielectric films
US6958248B1 (en) * 2003-02-28 2005-10-25 Credence Systems Corporation Method and apparatus for the improvement of material/voltage contrast
US7674706B2 (en) * 2004-04-13 2010-03-09 Fei Company System for modifying small structures using localized charge transfer mechanism to remove or deposit material
US20060251801A1 (en) 2005-03-18 2006-11-09 Weidman Timothy W In-situ silicidation metallization process
EP1890136A1 (en) 2006-08-16 2008-02-20 FEI Company Method for obtaining images from slices of a specimen

Also Published As

Publication number Publication date
EP2151854A3 (en) 2011-11-16
JP2014187370A (ja) 2014-10-02
US8278220B2 (en) 2012-10-02
JP2010045353A (ja) 2010-02-25
EP2151854A2 (en) 2010-02-10
EP2151859A3 (en) 2011-08-17
US20100032302A1 (en) 2010-02-11
JP2014187371A (ja) 2014-10-02
EP2151859A2 (en) 2010-02-10

Similar Documents

Publication Publication Date Title
JP5656311B2 (ja) 基板上にパターン金属を誘導する方法
KR101290681B1 (ko) 소구조물 변경 시스템
US9812286B2 (en) Localized, in-vacuum modification of small structures
US11999016B2 (en) Methods of forming parts using laser machining
US8557707B2 (en) Focused ion beam deep nano-patterning apparatus and method
US7902062B2 (en) Electrodepositing a metal in integrated circuit applications
KR20250105457A (ko) 깊은 다중층 구조의 개선된 편집
CN100592466C (zh) 用于修改小结构的系统
Park et al. FIB overview
TWI902278B (zh) 離子束掃描半導體樣品之方法及檢查和修復系統
JP2002075849A (ja) 電子ビーム露光装置、荷電粒子線を整形する部材及びその製造方法
JP2011179959A (ja) 電気特性測定用試料の作製方法、測定方法及び試料加工測定装置
RU2762129C2 (ru) Способ обработки несогласованностей в устройствах на основе солнечных элементов и устройства, полученные с его помощью
JP2006507675A (ja) 金属、特に銅を電着する方法、この方法の使用、および集積回路構造
HK40115207A (zh) 利用导电材料沉积在半导体上以产生相变和欧姆接触所形成的半导体器件及其制造方法
JP2002222725A (ja) 薄膜インダクタの製造方法
KR100238237B1 (ko) 전자빔 셀 투영 리소그래피용 마스크 및 그 제조방법
Cheng Metallic nanotransistors

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120714

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120714

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130930

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20131101

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140131

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140205

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140226

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140303

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140331

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140403

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140430

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140527

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140826

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140829

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140925

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20141024

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20141122

R150 Certificate of patent or registration of utility model

Ref document number: 5656311

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees