JP5650548B2 - マスフローコントローラシステム - Google Patents
マスフローコントローラシステム Download PDFInfo
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- JP5650548B2 JP5650548B2 JP2010550775A JP2010550775A JP5650548B2 JP 5650548 B2 JP5650548 B2 JP 5650548B2 JP 2010550775 A JP2010550775 A JP 2010550775A JP 2010550775 A JP2010550775 A JP 2010550775A JP 5650548 B2 JP5650548 B2 JP 5650548B2
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- 238000004364 calculation method Methods 0.000 claims description 51
- 238000006243 chemical reaction Methods 0.000 claims description 35
- 238000013500 data storage Methods 0.000 claims description 14
- 239000007789 gas Substances 0.000 description 283
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 229910001873 dinitrogen Inorganic materials 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 7
- 238000010790 dilution Methods 0.000 description 6
- 239000012895 dilution Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 238000011088 calibration curve Methods 0.000 description 4
- 238000012937 correction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 101100023111 Schizosaccharomyces pombe (strain 972 / ATCC 24843) mfc1 gene Proteins 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
- G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
- G05D7/0652—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in parallel
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7781—With separate connected fluid reactor surface
- Y10T137/7784—Responsive to change in rate of fluid flow
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Flow Control (AREA)
- Measuring Volume Flow (AREA)
- Details Of Flowmeters (AREA)
Description
2 ・・・ガス濃度調整器
MFC・・・マスフローコントローラ
3 ・・・制御機器
D1 ・・・関係データ格納部
31 ・・・受付部
32 ・・・基準ガス流量換算部
33 ・・・流量設定値算出部
34 ・・・試料ガス流量算出部
35 ・・・CF値更新部
このように構成した本実施形態に係るマスフローコントローラシステム100によれば、目標流量(Qm)と、実際に出力されるであろう流量(試料ガス流量(Qsam gas))とを比較して、その差(Qm−Qsam gas)が所定範囲以下になるようにCF値を更新することによって、基準ガスの流量値毎に最適なCF値を選択して、高精度に流量制御できるようになる。
なお、本発明は前記実施形態に限られるものではない。
Claims (4)
- 基準ガスを用いて校正された流量制御機器と、この流量制御機器に流量設定値を出力する制御機器とを具備するシステムであって、
基準ガスの流量値と試料ガスのCF値との対応関係を示す関係データを格納する関係データ格納部と、
前記流量制御部により流すべき試料ガスの目標流量を所定のCF値を用いて基準ガス流量に換算する基準ガス流量換算部と、
前記基準ガス流量換算部により得られた基準ガス流量及び当該基準ガス流量に対応するCF値から試料ガス流量を算出する試料ガス流量算出部と、
前記試料ガス流量算出部により得られた試料ガス流量と前記目標流量との差異が所定範囲よりも大きい場合に、前記試料ガス流量と前記目標流量との差異が所定範囲以下となるように、前記基準ガス流量換算部又は前記試料ガス流量算出部において用いるCF値を更新するCF値更新部とを備えるマスフローコントローラシステム。 - 前記CF値更新部が、前記試料ガス流量算出部により得られた試料ガス流量と前記目標流量との差異に関連する値を用いて前記基準ガス流量を更新し、前記更新後の基準ガス流量に対応するCF値によって、前記基準ガス流量換算部において用いるCF値を更新するものである請求項1記載のマスフローコントローラシステム。
- 前記CF値更新部が、前記目標流量から、前記試料ガス流量算出部により得られた試料ガス流量と前記目標流量との差を差し引いた流量を新たな目標流量とし、当該目標流量を前記基準ガス流量換算部に出力するとともに、前記基準ガス流量換算部において用いるCF値を更新するものである請求項1記載のマスフローコントローラシステム。
- 基準ガスを用いて校正された流量制御機器と、この流量制御機器に流量設定値を出力する制御機器とを具備するマスフローコントローラシステムの制御プログラムであって、
基準ガスの流量値と試料ガスのCF値との対応関係を示す関係データを格納する関係データ格納部と、
前記流量制御部により流すべき試料ガスの目標流量を所定のCF値を用いて基準ガス流量に換算する基準ガス流量換算部と、
前記基準ガス流量換算部により得られた基準ガス流量及び当該基準ガス流量に対応するCF値から試料ガス流量を算出する試料ガス流量算出部と、
前記試料ガス流量算出部により得られた試料ガス流量と前記目標流量との差異が所定範囲よりも大きい場合に、前記試料ガス流量と前記目標流量との差異が所定範囲以下となるように、前記基準ガス流量換算部又は前記試料ガス流量算出部において用いるCF値を更新するCF値更新部と、としての機能を前記制御機器に発揮させる、マスフローコントローラシステムの制御プログラム。
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JP2010550775A JP5650548B2 (ja) | 2009-12-25 | 2010-12-22 | マスフローコントローラシステム |
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JP2009295400 | 2009-12-25 | ||
JP2009295400 | 2009-12-25 | ||
PCT/JP2010/073172 WO2011078242A1 (ja) | 2009-12-25 | 2010-12-22 | マスフローコントローラシステム |
JP2010550775A JP5650548B2 (ja) | 2009-12-25 | 2010-12-22 | マスフローコントローラシステム |
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JPWO2011078242A1 JPWO2011078242A1 (ja) | 2013-05-09 |
JP5650548B2 true JP5650548B2 (ja) | 2015-01-07 |
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Country Status (5)
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US (1) | US9223318B2 (ja) |
EP (1) | EP2518581B1 (ja) |
JP (1) | JP5650548B2 (ja) |
CN (1) | CN102576231B (ja) |
WO (1) | WO2011078242A1 (ja) |
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JP5855921B2 (ja) * | 2010-12-17 | 2016-02-09 | 株式会社堀場エステック | ガス濃度調整装置 |
US9958302B2 (en) | 2011-08-20 | 2018-05-01 | Reno Technologies, Inc. | Flow control system, method, and apparatus |
US9188989B1 (en) | 2011-08-20 | 2015-11-17 | Daniel T. Mudd | Flow node to deliver process gas using a remote pressure measurement device |
US9772629B2 (en) * | 2011-09-29 | 2017-09-26 | Applied Materials, Inc. | Methods for monitoring a flow controller coupled to a process chamber |
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JP5238094B1 (ja) * | 2012-11-08 | 2013-07-17 | 株式会社ベスト測器 | ガス成分濃度算出方法および装置 |
US9454158B2 (en) | 2013-03-15 | 2016-09-27 | Bhushan Somani | Real time diagnostics for flow controller systems and methods |
EP2940549A3 (en) * | 2014-04-30 | 2016-04-20 | Horiba, Ltd. | Verification system |
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US9939416B2 (en) * | 2014-08-28 | 2018-04-10 | Veltek Assoicates, Inc. | Programmable logic controller-based system and user interface for air sampling in controlled environments |
US10658222B2 (en) | 2015-01-16 | 2020-05-19 | Lam Research Corporation | Moveable edge coupling ring for edge process control during semiconductor wafer processing |
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CN107779846A (zh) * | 2017-10-27 | 2018-03-09 | 君泰创新(北京)科技有限公司 | 一种pecvd设备的工艺气体流量的调整方法和系统 |
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2010
- 2010-12-22 CN CN201080047852.6A patent/CN102576231B/zh active Active
- 2010-12-22 WO PCT/JP2010/073172 patent/WO2011078242A1/ja active Application Filing
- 2010-12-22 JP JP2010550775A patent/JP5650548B2/ja active Active
- 2010-12-22 EP EP10839472.7A patent/EP2518581B1/en active Active
- 2010-12-22 US US13/519,115 patent/US9223318B2/en active Active
Patent Citations (4)
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JPH0641759A (ja) * | 1992-07-28 | 1994-02-15 | Komatsu Denshi Kinzoku Kk | 気相成長装置および気相成長装置におけるマスフローコントローラの校正方法 |
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Also Published As
Publication number | Publication date |
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JPWO2011078242A1 (ja) | 2013-05-09 |
US9223318B2 (en) | 2015-12-29 |
EP2518581A4 (en) | 2016-06-15 |
CN102576231A (zh) | 2012-07-11 |
EP2518581B1 (en) | 2019-03-06 |
EP2518581A1 (en) | 2012-10-31 |
WO2011078242A1 (ja) | 2011-06-30 |
CN102576231B (zh) | 2015-04-15 |
US20120298221A1 (en) | 2012-11-29 |
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