JP5626666B2 - Door valve - Google Patents
Door valve Download PDFInfo
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- JP5626666B2 JP5626666B2 JP2012548869A JP2012548869A JP5626666B2 JP 5626666 B2 JP5626666 B2 JP 5626666B2 JP 2012548869 A JP2012548869 A JP 2012548869A JP 2012548869 A JP2012548869 A JP 2012548869A JP 5626666 B2 JP5626666 B2 JP 5626666B2
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- compressed air
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- 239000004065 semiconductor Substances 0.000 claims description 25
- 238000007789 sealing Methods 0.000 claims description 14
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Actuator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Sliding Valves (AREA)
- Details Of Valves (AREA)
- Check Valves (AREA)
- Fluid-Driven Valves (AREA)
Description
本発明はドアバルブに関し、さらに詳しくは開閉部材の上下方向動きを主管する上下作動アクチュエーター部と前後方向の動きを主管する前後進アクチュエーター部とが備えられて、ウエハー移動通路を開閉する開閉部材が正確にエル(L)モーションに作動されるようにするドアバルブに関する。 The present invention relates to a door valve. More specifically, the present invention is provided with an up-and-down actuating actuator section that mainly controls the vertical movement of the opening and closing member and a forward-reverse actuator section that mainly controls the movement in the front-rear direction. The present invention relates to a door valve that is operated by an L (L) motion.
本出願人は特許出願10−2003−0071906号(発明の名称:スリットバルブ)を通じてウエハー移動通路の周りに配置される密封材の配置構造を改善して移動通路を密閉する密封材の損傷を防止し、バルブ駆動部に装着される指示装置で作動状態を確認することができるスリットバルブを出願した。 The present applicant has improved the arrangement structure of the sealing material arranged around the wafer moving passage through patent application 10-2003-0071906 (invention name: slit valve) to prevent damage to the sealing material sealing the moving passage. And filed a slit valve capable of confirming the operating state with an indicating device attached to the valve drive unit.
図1には従来技術によるスリットバルブの断面図が図示されている。該出願のスリットバルブはウエハー移動通路を開閉する密閉部材100と、前記密閉部材100と別途に形成されたハウジングブラケットト200と、前記密閉部材100とハウジングブラケット200との間で延長されたメインシャフト400と、前記ハウジングブラケット200の内部に形成され、空気の圧力によって駆動されるエアシリンダー310と、前記エアシリンダー310の内部に形成されたピストン320と、前記ピストン320に結合されたピストンシャフト330と、前記ピストンシャフト330に結合されるムービングユニット340と、前記ムービングユニット340とメインシャフト340に結合されたリンクが備えられたバルブ駆動部300とが備えられている。 FIG. 1 shows a sectional view of a slit valve according to the prior art. The slit valve of the application includes a sealing member 100 that opens and closes a wafer moving path, a housing bracket 200 that is formed separately from the sealing member 100, and a main shaft that extends between the sealing member 100 and the housing bracket 200. 400, an air cylinder 310 formed in the housing bracket 200 and driven by air pressure, a piston 320 formed in the air cylinder 310, and a piston shaft 330 coupled to the piston 320. , A moving unit 340 coupled to the piston shaft 330 and a valve driving unit 300 including a link coupled to the moving unit 340 and the main shaft 340 are provided.
前記のようなスリットバルブは、外部から入力される圧縮空気の圧力の変化に従ってハウジングブラケット200の内部に形成されたエアシリンダー310のピストン320が上下に回動される。これによって、ムービングユニット340が前記ピストンと同時に上下に回動され、前記ムービングユニット340にリンク350を介して連結されたメインシャフト400も回動されて密閉部材100でウエハー移動通路を開閉する。 In the slit valve as described above, the piston 320 of the air cylinder 310 formed inside the housing bracket 200 is rotated up and down in accordance with a change in the pressure of compressed air input from the outside. As a result, the moving unit 340 is rotated up and down simultaneously with the piston, and the main shaft 400 connected to the moving unit 340 via the link 350 is also rotated to open and close the wafer moving passage by the sealing member 100.
また、前記のようなスリットバルブのバルブ駆動部300は、図2に示すように、前記メインシャフト400を垂直上下回動させる1段階動作と前記メインシャフト400が垂直前後方に回動されて前記密閉部材100で半導体ウエハー移動通路を開閉する2段階動作、即ち、エル(L)字状に駆動され、前記のように、エル(L)字状に駆動されるようにガイド溝がエル(L)字状に形成されている。 In addition, as shown in FIG. 2, the valve driver 300 of the slit valve as described above has a one-step operation for vertically rotating the main shaft 400 and the main shaft 400 is rotated vertically forward and rearward. The two-stage operation of opening and closing the semiconductor wafer moving path with the sealing member 100, that is, driven in an L (L) shape, and as described above, the guide groove is moved in an L (L) shape. ) It is formed in a letter shape.
しかし、前記リンク350は構造的に回転運動されるため、従来のスリットバルブのエル(L)字状、即ち直線軌跡のガイド溝ではバルブ駆動部300を正確なエル(L)字状の運動にガイドしにくいという問題点があった。 However, since the link 350 is rotationally moved structurally, the valve drive unit 300 is moved in an accurate L (L) shape in a conventional slit valve L (L) shape, that is, in a guide groove of a linear locus. There was a problem that it was difficult to guide.
また、図2に示すように、エル(L)字状のガイド溝351で前記リンク350をガイドする場合、前記リンクとガイド溝の角に繰り返し摩擦による応力集中が発生し、前記リンクがガイド溝に嵌められた状態で回動されると、図2に示すように、微細な隙間が生じて密閉部材で半導体ウエハー通路を開閉する動作が正確に制御されにくいという問題点があった。 In addition, as shown in FIG. 2, when the link 350 is guided by an L-shaped guide groove 351, stress concentration due to repeated friction occurs at the corners of the link and the guide groove, and the link becomes a guide groove. As shown in FIG. 2, there is a problem that a fine gap is generated and the operation of opening and closing the semiconductor wafer passage with the sealing member is difficult to be accurately controlled.
また、前記のようなリンクによって半導体ウエハー移動通路を開閉する開閉部材の接触面にはゴム材質のOリングが溝に設置される。このようなOリングと半導体ウエハー移動通路が接触する時上側(または下側)Oリングには微細な回転が発生される。これによって、Oリングの回転によってOリングは溝に設置された状態で回転が発生されて溝から離脱されるか硬化される虞があった。 In addition, an O-ring made of rubber is installed in the groove on the contact surface of the opening / closing member that opens and closes the semiconductor wafer moving path using the link as described above. When such an O-ring contacts the semiconductor wafer moving path, fine rotation is generated in the upper (or lower) O-ring. Accordingly, the rotation of the O-ring may cause the O-ring to rotate while being installed in the groove and be detached from the groove or hardened.
本発明は前述した問題点を解決するために創出されたもので、本発明の目的は、開閉部材の上下方向動きを主管する上下作動アクチュエーター部と前後方向の動きを主管する前後進アクチュエーター部とが備えられて、ウエハー移動通路を開閉する開閉部材が正確にエル(L)モーションに作動されるようにするドアバルブを提供することにある。 The present invention has been created to solve the above-described problems, and an object of the present invention is to provide an up-and-down actuating actuator section that mainly controls the vertical movement of the opening and closing member, and a forward-reverse actuator section that mainly controls the back-and-forth movement. Is provided, and an opening and closing member that opens and closes the wafer moving passage is accurately operated by an L (L) motion.
前記のような問題点を解決するために、本発明によるドアバルブは、半導体ウエハー移動通路を開閉する開閉部材100と;前記開閉部材100の背面に設置され、内部後側には第1流路1が形成され、前側には第2流路2が形成され、正面にはカバー221が設置される第1シリンダー210と、前記第1シリンダー210の内部に設置されて前記第1流路1課題2流路2に流入される圧縮空気によって前後に作動する第1ピストン220と、前記第1ピストン220と開閉部材100を連結する連結部材Bとが備えられた前後進アクチュエーター部200と;内部に形成される複数の第2シリンダー310と、前記第2シリンダー310の内部に設置されて圧縮空気によって上下に作動する第2ピストン320と、一側は前記第2ピストン320に連結され、他側は前記前後進アクチュエーター部200と連結され、内部には圧縮空気が流動され、前記第1流路1と連通される第3流路3と前記第2流路2と連通される第4流路4が形成される上下シャフト330と、前記開閉部材100のウエハー移動通路の閉鎖の時圧縮空気が流入されるように形成される第1圧縮空気流入通孔340と、前記第1圧縮空気流入通孔340から流入される圧縮空気によって前記第2ピストン320が上向き移動されるように前記第1圧縮空気流入通孔340から前記第2シリンダー310の下部まで連結される第5流路5と、前記第5流路5に流入される圧縮空気によって前記第2ピストン320が上死点に到逹すれば選択的に開かれるレリーフバルブR1と前記第2ピストン320が下死点に到逹すれば選択的に開かれるチェックバルブC1が設置され、前記レリーフバルブR1が開かれると圧縮空気が前記第1流路1に移動されるように前記第1圧縮空気流入通孔340課題5流路5及び第1流路1と連通される第6流路6とが備えられた上下作動アクチュエーター部300と;を含むことを特徴とする。 In order to solve the above-described problems, the door valve according to the present invention is installed on an opening / closing member 100 for opening / closing a semiconductor wafer moving path; Is formed, the second channel 2 is formed on the front side, the front cylinder 221 is provided with a cover 221 on the front side, and the first channel 1 subject 2 is installed inside the first cylinder 210. A forward / reverse actuator portion 200 provided with a first piston 220 that operates back and forth by compressed air flowing into the flow path 2 and a connecting member B that connects the first piston 220 and the opening / closing member 100; A plurality of second cylinders 310, a second piston 320 installed in the second cylinder 310 and operated up and down by compressed air, and one side of the second piston 310 320, the other side is connected to the forward / reverse actuator part 200, and the compressed air is flowed therein, and the third flow path 3 and the second flow path 2 communicated with the first flow path 1 An upper and lower shaft 330 in which the fourth flow path 4 to be communicated is formed, a first compressed air inflow through hole 340 formed so that compressed air is introduced when the wafer moving passage of the opening and closing member 100 is closed; The second piston 320 is connected from the first compressed air inflow hole 340 to the lower part of the second cylinder 310 so that the second piston 320 is moved upward by the compressed air flowing in from the first compressed air inflow hole 340. The relief valve R1 and the second piston 320 which are selectively opened when the second piston 320 reaches the top dead center by the five flow paths 5 and the compressed air flowing into the fifth flow path 5 are bottom dead. If the check valve C1 is opened selectively, the compressed air is moved to the first flow path 1 when the relief valve R1 is opened. And an up-and-down actuating actuator section 300 provided with a fifth flow path 5 and a sixth flow path 6 communicated with the first flow path 1.
また、前記のような問題点を解決するために、本発明のまた他の実施形態によるドアバルブは、半導体ウエハー移動通路を開閉する開閉部材100と;前記開閉部材100の背面に設置され、内部後側には第1流路1が形成され、前側には第2流路2が形成され、正面にはカバー221が設置される第1シリンダー210と、前記第1シリンダー210の内部に設置されて前記第1流路1課題2流路2に流入される圧縮空気によって前後に作動する第1ピストン220と、前記第1ピストン220と開閉部材100とを連結する連結部材Bと、前記連結部材Bを外部から密閉する後面カバー201とが備えられた前後進アクチュエーター部200と;内部に形成される複数の第2シリンダー310と、前記第2シリンダー310の内部に設置されて圧縮空気によって上下に作動する第2ピストン320と、一側は前記第2ピストン320に連結され、他側は前記前後進アクチュエーター部200と連結され、内部には圧縮空気が流動され、前記第1流路1と連通される第3流路3と前記第2流路2と連通される第4流路4が形成される上下シャフト330とが備えられた上下作動アクチュエーター部300と;を含むことを特徴とする。 In order to solve the above-described problems, a door valve according to another embodiment of the present invention includes an opening / closing member 100 for opening / closing a semiconductor wafer moving passage; The first flow path 1 is formed on the side, the second flow path 2 is formed on the front side, the first cylinder 210 on which the cover 221 is installed on the front, and the first cylinder 210 is installed inside the first cylinder 210. 1st flow path 1 task 2 1st piston 220 which operates back and forth by compressed air which flows into flow path 2, connection member B which connects the 1st piston 220 and opening-and-closing member 100, and connection member B A forward / reverse actuator portion 200 provided with a rear cover 201 for sealing the outside from the outside; a plurality of second cylinders 310 formed inside; and the second cylinder 310 installed inside the second cylinder 310 The second piston 320 is operated up and down by compressed air, one side is connected to the second piston 320, the other side is connected to the forward / reverse actuator unit 200, and compressed air flows inside, An up-and-down actuating actuator section 300 provided with a third flow path 3 communicating with the first flow path 1 and an upper and lower shaft 330 formed with a fourth flow path 4 communicating with the second flow path 2; It is characterized by including.
また、前記開閉部材100によってウエハー移動通路が開放されるように圧縮空気が流入され、前記上下作動アクチュエーター部300に前記第4流路4及び第2流路2と連通されるように設置される第2圧縮空気流入通孔350と;前記第2圧縮空気流入通孔350と連通され、前記第2圧縮空気流入通孔350に流入される圧縮空気によって前記第1ピストン220が下死点に到逹すれば選択的に開かれるレリーフバルブR2と前記第1ピストン220が下死点に到逹すれば選択的に開かれるチェックバルブC2が設置され、前記レリーフバルブR2が開かれると前記第2シリンダー320の上側に圧縮空気が流入されるように形成される第7流路7と;をさらに含むことを特徴とする。 In addition, compressed air is introduced so that the wafer moving passage is opened by the opening / closing member 100, and is installed to communicate with the fourth flow path 4 and the second flow path 2 in the vertical operation actuator unit 300. A second compressed air inflow through hole 350; communicated with the second compressed air inflow through hole 350, and the compressed air flowing into the second compressed air inflow through hole 350 causes the first piston 220 to reach a bottom dead center. In other words, a relief valve R2 that is selectively opened if it reaches the bottom dead center and a check valve C2 that is selectively opened if the first piston 220 reaches the bottom dead center are installed, and the second cylinder when the relief valve R2 is opened. And a seventh flow path 7 formed to allow compressed air to flow into the upper side of 320.
また、前記第2ピストン320に設置される磁石部材321と;前記上下作動アクチュエーター部300に設置され、前記磁石部材321を感知して前記第2ピストン320の位置を検出する磁石式センサー360と;をさらに含むことを特徴とする。 A magnet member 321 installed on the second piston 320; a magnet-type sensor 360 installed on the up-and-down actuating actuator unit 300 for detecting the position of the second piston 320 by sensing the magnet member 321; Is further included.
また、前記上下作動アクチュエーター部300に設置されて、前記上下作動アクチュエーター部300によって上下に作動する前記前後進アクチュエーター200の上面と下面に接触されて前記第2ピストン320の位置を検出する接触式センサー361をさらに含むことを特徴とする。 Further, a contact-type sensor that is installed in the vertical operation actuator unit 300 and detects the position of the second piston 320 by contacting the upper and lower surfaces of the forward / reverse actuator 200 that is operated up and down by the vertical operation actuator unit 300. 361 is further included.
また、前記開閉部材100と前後進アクチュエーター部200との間と前記前後進アクチュエーター部200と上下作動アクチュエーター部300との間にそれぞれ設置されるベローズ400をさらに含むことを特徴とする。 Further, the apparatus further includes a bellows 400 installed between the opening / closing member 100 and the forward / reverse actuator part 200 and between the forward / backward actuator part 200 and the vertical actuator part 300.
また、前記上下作動アクチュエーター部300の上部と下部には前記第2シリンダー310を密閉する上部カバー301及び下部カバー302と;前記上部カバー301に形成されて、前記上下シャフト330がガイドされるようにするガイド部303と;前記ガイド部303の内部に設置されて前記上下シャフト330の外周面と接触され、前記開閉部材100の荷重による偏心の発生の時前記上下シャフト330とガイド部303の摩耗を防止するブッシング304と;をさらに含むことを特徴とする。 Further, an upper cover 301 and a lower cover 302 for sealing the second cylinder 310 are formed at the upper and lower portions of the vertical operation actuator unit 300; the upper cover 301 is formed to guide the vertical shaft 330. A guide portion 303 that is installed inside the guide portion 303 and is in contact with the outer peripheral surface of the upper and lower shafts 330, and wears the upper and lower shafts 330 and the guide portion 303 when eccentricity occurs due to the load of the opening and closing member 100. And a bushing 304 for preventing.
また、前記チェックバルブC1、C2は急速排気バルブであることを特徴とする。 The check valves C1 and C2 are quick exhaust valves.
上述したような本発明によれば、開閉部材の上下方向動きを主管する上下作動アクチュエーター部と前後方向の動きを主管する前後進アクチュエーター部とが備えられて、ウエハー移動通路を開閉する開閉部材が正確にエル(L)モーションに作動する長所がある。 According to the present invention as described above, the opening / closing member that opens and closes the wafer moving path is provided with the vertically operating actuator portion that mainly controls the vertical movement of the opening and closing member and the forward and backward actuator portion that mainly controls the movement in the front and rear direction. There is an advantage that it operates accurately in the L (L) motion.
以下、添付された図面を参照して、本発明の実施形態を説明する。各図面に提示された同じ符号は同じ部材を現わす。本発明を説明するにおいて、係わる公知機能若しくは構成に関する具体的な説明は本発明の要旨を明確にするために省略する。 Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The same reference numerals provided in each drawing represent the same member. In the description of the present invention, a specific description relating to a known function or configuration will be omitted to clarify the gist of the present invention.
図3は本発明の好ましい実施形態によるドアバルブの正面斜視図であり、図4は本発明の好ましい実施形態によるドアバルブの背面斜視図であり、図5は図3の分解斜視図であり、図6は本発明の好ましい実施形態によるドアバルブの前後進アクチュエーター部の正面及びA−A、B−B断面図であり、図7は図6のA−A断面の断面斜視図及びB−B断面の断面斜視図であり、図8は本発明の好ましい実施形態によるドアバルブの上下作動アクチュエーターの断面、平面及び底面図であり、図9は図8のC−C断面の断面斜視図である。 3 is a front perspective view of a door valve according to a preferred embodiment of the present invention, FIG. 4 is a rear perspective view of the door valve according to a preferred embodiment of the present invention, FIG. 5 is an exploded perspective view of FIG. FIG. 7 is a front view and AA and BB cross-sectional views of a forward / backward actuator part of a door valve according to a preferred embodiment of the present invention, and FIG. 7 is a cross-sectional perspective view and a cross-sectional view of a BB cross section of FIG. FIG. 8 is a sectional view, a plan view, and a bottom view of a vertical actuator for a door valve according to a preferred embodiment of the present invention, and FIG. 9 is a sectional perspective view of a CC section of FIG.
本発明の好ましい実施形態によるドアバルブは、開閉部材100、前後進アクチュエーター部200、上下作動アクチュエーター部300が含まれ、第1流路1、第2流路2、第3流路3、第4流路4、第5流路5、第6流路6、第7流路7、第1シリンダー210、第1ピストン220、第2シリンダー310、第2ピストン320、磁石部材321、上下シャフト330、第1圧縮空気流入通孔340、第2圧縮空気流入通孔350、磁石式センサー360、接触式センサー361及び連結部材Bがさらに含まれることができる。 The door valve according to a preferred embodiment of the present invention includes an opening / closing member 100, a forward / reverse actuator unit 200, and a vertical actuator unit 300, and includes a first flow path 1, a second flow path 2, a third flow path 3, and a fourth flow. Path 4, fifth flow path 5, sixth flow path 6, seventh flow path 7, first cylinder 210, first piston 220, second cylinder 310, second piston 320, magnet member 321, vertical shaft 330, first The first compressed air inflow through hole 340, the second compressed air inflow through hole 350, the magnet type sensor 360, the contact type sensor 361, and the connecting member B may be further included.
また、後述する第1流路〜第7流路には圧縮空気が流動され、このように第1流路〜第7流路に流動される圧縮空気によって前後進アクチュエーター部200と上下作動アクチュエーター部300が駆動される。 In addition, compressed air flows in a first flow path to a seventh flow path, which will be described later, and the forward / reverse actuator section 200 and the vertical operation actuator section are thus compressed by the compressed air flowing in the first flow path to the seventh flow path. 300 is driven.
前記開閉部材100は後述する前後進アクチュエーター部200の正面に設置されて、前記前後進アクチュエーター部200に流入される圧縮空気によって前進または後進されながら、半導体ウエハー移動通路(図示しない)を開閉する部材であって、半導体ウエハー移動通路と当接する面にはOリングを設置することが好ましい。 The opening / closing member 100 is installed in front of a forward / reverse actuator unit 200, which will be described later, and opens / closes a semiconductor wafer moving passage (not shown) while being moved forward or backward by compressed air flowing into the forward / backward actuator unit 200. In addition, it is preferable to install an O-ring on the surface that contacts the semiconductor wafer movement path.
前記前後進アクチュエーター部200は、図6及び図7に示すように、第1シリンダー210と、前記第1シリンダー210の内部に設置される第1ピストン220と、前記第1ピストン220の中心部を貫通して開閉部材100の背面と結合される連結部材Bとで構成され、前記連結部材Bは前記第1ピストン220の前後動きを開閉部材に伝達する役割を果たす。 As shown in FIGS. 6 and 7, the forward / reverse actuator unit 200 includes a first cylinder 210, a first piston 220 installed in the first cylinder 210, and a central portion of the first piston 220. The connecting member B is connected to the back surface of the opening / closing member 100 and passes through the opening / closing member to transmit the back-and-forth movement of the first piston 220 to the opening / closing member.
前記第1シリンダー210は、図16及び図17に示すように、後側には第1流路1が形成され、前側には第2流路2が形成される。ここで開閉部材100と隣接する側が前側である。 As shown in FIGS. 16 and 17, the first cylinder 210 has a first flow path 1 formed on the rear side and a second flow path 2 formed on the front side. Here, the side adjacent to the opening / closing member 100 is the front side.
前記のような第1シリンダー210の内部には第1ピストン220が設置され、前記第1ピストン220は第1シリンダー210の内部でのみ作動されるように、図5に示すように、前記第1シリンダー210の正面を覆うカバー221が設置されることが好ましい。 As shown in FIG. 5, the first piston 220 is installed in the first cylinder 210 as described above, and the first piston 220 is operated only in the first cylinder 210. A cover 221 that covers the front of the cylinder 210 is preferably installed.
前記第1ピストン220は前後に移動される。前記第1流路1に圧縮空気が流入されると前進し、前記第2流路2に圧縮空気が流入されると後進される。 The first piston 220 is moved back and forth. When compressed air flows into the first flow path 1, it moves forward, and when compressed air flows into the second flow path 2, it moves backward.
また、前記第1ピストン220は連結部材Bが貫通設置されて、前記第1ピストン220と上述した開閉部材100を連結する役割を果たす。このような連結部材Bは、例えばボルトや結合ピンで製作されることが好ましい。 In addition, the first piston 220 has a connecting member B penetratingly installed, and serves to connect the first piston 220 and the opening / closing member 100 described above. Such a connecting member B is preferably made of, for example, a bolt or a connecting pin.
前記のように、連結部材Bを介して第1ピストン220と結合された開閉部材100は第1ピストン220の前進及び後進によって作動されながら半導体ウエハー移動通路を開閉する。 As described above, the opening / closing member 100 coupled to the first piston 220 through the connecting member B opens and closes the semiconductor wafer moving passage while being operated by the forward and backward movements of the first piston 220.
前記上下作動アクチュエーター部300は、第2シリンダー310、第2ピストン320、上下シャフト330、第1圧縮空気流入通孔340、第2圧縮空気流入通孔350で構成される。 The vertical actuator actuator 300 includes a second cylinder 310, a second piston 320, a vertical shaft 330, a first compressed air inflow hole 340, and a second compressed air inflow hole 350.
前記第2シリンダー310は、図14及び図15、図18〜図20に示すように、上下作動アクチュエーター部300の内部に設置される。このような第2シリンダー310の内部には第2ピストン320が設置され、前記第2ピストン320の中心部には上下シャフト330が設置される。 As shown in FIGS. 14, 15, and 18 to 20, the second cylinder 310 is installed in the vertical actuator unit 300. A second piston 320 is installed inside the second cylinder 310, and an upper and lower shaft 330 is installed at the center of the second piston 320.
前記第2ピストン320は第2シリンダー310の内部に設置されて圧縮空気によって上下に作動する部材で、このような第2ピストン320は第1圧縮空気流入通孔340課題2圧縮空気流入通孔350に流入される圧縮空気によって上下方向に作動する。 The second piston 320 is a member installed inside the second cylinder 310 and operated up and down by compressed air. The second piston 320 is a first compressed air inflow hole 340. Task 2 Compressed air inflow hole 350 It operates in the up and down direction by the compressed air that flows in.
前記上下シャフト330は一側が前記第2ピストン320の中心部に連結され、他側は前記前後進アクチュエーター部200に連結される。これによって、前記上下シャフト330は第2ピストンの上昇または下降される動きを前後進アクチュエーター部200に伝達して開閉部材100を半導体ウエハー移動通路と一致する高さに上昇させるか初期状態に下降させる。 One side of the vertical shaft 330 is connected to the central portion of the second piston 320, and the other side is connected to the forward / reverse actuator portion 200. As a result, the vertical shaft 330 transmits the upward or downward movement of the second piston to the forward / reverse actuator unit 200 to raise or lower the opening / closing member 100 to a height matching the semiconductor wafer movement path or to the initial state. .
前記第1圧縮空気流入通孔340は、図14に示すように、前記開閉部材100が半導体ウエハー移動通路を閉鎖する時圧縮空気が流入される部材で、このような第1圧縮空気流入通孔340に流入された圧縮空気は後述する複数の流路の中で開閉部材100の前進に関与する流路に供給される。これについては後で詳細に説明する。 As shown in FIG. 14, the first compressed air inflow hole 340 is a member into which compressed air is introduced when the opening / closing member 100 closes the semiconductor wafer moving passage. The compressed air that has flowed into 340 is supplied to a flow path that is involved in the forward movement of the opening / closing member 100 among a plurality of flow paths that will be described later. This will be described in detail later.
前記第2圧縮空気流入通孔350は、図15に示すように、前記第1圧縮空気流入通孔340と反対の役割をする。即ち、前記開閉部材100が半導体ウエハー移動通路を開放する時圧縮空気が流入される部材である。 As shown in FIG. 15, the second compressed air inflow hole 350 has a role opposite to that of the first compressed air inflow hole 340. That is, the open / close member 100 is a member into which compressed air flows when the semiconductor wafer moving passage is opened.
前記のような第2圧縮空気流入通孔350に流入された圧縮空気は後述する複数の流路の中で開閉部材100の後進に関与する流路に供給される。これについては後で詳細に説明する。 The compressed air that has flowed into the second compressed air inflow through hole 350 as described above is supplied to a flow path that is involved in the backward movement of the opening and closing member 100 among a plurality of flow paths that will be described later. This will be described in detail later.
以下、本発明の好ましい実施形態によるドアバルブが作動する手順について、図10〜図20を参照して説明する。 Hereinafter, a procedure for operating a door valve according to a preferred embodiment of the present invention will be described with reference to FIGS.
図10〜図13は本発明が作動される状態を示す側面図であり、図14は図10のD−D断面図であり、図15は図11のE−E断面図であり、図16及び図17は前後進アクチュエーターの前進及び後進する状態の断面図であり、図18〜図20は本発明が半導体ウエハー移動通路を開放すると同時に初期状態に復元される状態の断面図である。 10 to 13 are side views showing a state in which the present invention is operated, FIG. 14 is a sectional view taken along line DD in FIG. 10, FIG. 15 is a sectional view taken along line EE in FIG. FIG. 17 is a cross-sectional view of the forward / backward movement of the forward / backward actuator, and FIGS. 18 to 20 are cross-sectional views of the present invention in which the semiconductor wafer moving passage is opened and restored to the initial state at the same time.
特に、第1流路〜第7流路に供給される圧縮空気の流れによる本発明の作動を主に説明する。また、後述する初期状態とは、図10、図14及び図20に示すように、開閉部材100が完全に下向き移動されている状態である。 In particular, the operation of the present invention by the flow of compressed air supplied to the first flow path to the seventh flow path will be mainly described. Further, the initial state to be described later is a state in which the opening / closing member 100 is completely moved downward as shown in FIGS. 10, 14, and 20.
一方、第1流路1は第1シリンダー210の下側に形成され、第2流路2は第1シリンダー210の上側に形成され、第3流路3は2つの上下シャフト330の中の一側上下シャフトの内部に上下方向に形成され、第4流路4は2つの上下シャフト330の中の他側上下シャフトの内部に上下方向に形成される。 On the other hand, the first flow path 1 is formed below the first cylinder 210, the second flow path 2 is formed above the first cylinder 210, and the third flow path 3 is one of the two upper and lower shafts 330. The fourth flow path 4 is formed in the vertical direction inside the other vertical shafts in the two vertical shafts 330.
また、第5流路5は第1圧縮空気流入通孔340課題6流路6と連通される。第6流路6には所定以上の圧力が発生されると開かれるレリーフバルブR1とチェックバルブC1が設置され、第7流路7は第2圧縮空気流入通孔350と連通される。このような第7流路7にもレリーフバルブR2とチェックバルブC1が設置されている。 Further, the fifth flow path 5 communicates with the first compressed air inflow hole 340 task 6 flow path 6. The sixth flow path 6 is provided with a relief valve R1 and a check valve C1 that are opened when a predetermined pressure or more is generated, and the seventh flow path 7 communicates with the second compressed air inflow hole 350. A relief valve R2 and a check valve C1 are also installed in the seventh flow path 7 as described above.
まず、開閉部材100で半導体ウエハー移動通路を閉鎖する動作について説明する。 First, the operation of closing the semiconductor wafer movement path using the opening / closing member 100 will be described.
初期状態で第1圧縮空気流入通孔340から圧縮空気が流入される。このように圧縮空気が第1圧縮空気流入通孔340に流入され始めると、圧縮空気は前記第1圧縮空気流入通孔340と連通される第5流路5課題6流路6に同時に進入されて、図10、14の状態から図11、15の状態に進行される。 Compressed air is introduced from the first compressed air inflow through hole 340 in the initial state. When the compressed air starts to flow into the first compressed air inflow hole 340 as described above, the compressed air enters the fifth flow path 5 and the problem 6 flow path 6 communicated with the first compressed air inflow hole 340 at the same time. Thus, the process proceeds from the state of FIGS. 10 and 14 to the state of FIGS.
この時、前記第5流路5課題6流路6には同圧、即ち、同じ圧力が発生される。前記第6流路6には所定以上の圧力が発生する場合のみ選択的に開かれるレリーフバルブR1が設置されて第5流路5に先に圧縮空気が流入される。 At this time, the same pressure, that is, the same pressure is generated in the fifth channel 5 task 6 channel 6. The sixth flow path 6 is provided with a relief valve R1 that is selectively opened only when a predetermined pressure or more is generated, and the compressed air is introduced into the fifth flow path 5 first.
前記レリーフバルブR1は後述する第7流路7にも設置される。このようなレリーフバルブR1、R2は第1圧縮空気流入通孔340課題2圧縮空気流入通孔350に流入される圧縮空気が流路に流入されて発生される1次的圧力に耐えた後、最後に開かれるようにすることが好ましい。これによって、本発明の設計の時、レリーフバルブR1に設置されたスプリングの反撥系数を適切に選択した方が良い。 The relief valve R1 is also installed in a seventh flow path 7 to be described later. The relief valves R1 and R2 have a first compressed air inflow through hole 340, task 2 and after withstanding the primary pressure generated by the compressed air flowing into the compressed air inflow through hole 350 flowing into the flow path, It is preferred that it be opened last. Accordingly, it is better to appropriately select the repulsion system number of the spring installed in the relief valve R1 when designing the present invention.
前記のように、第5流路5に進入された圧縮空気は第5流路5と連通された第2シリンダー310の下部に流入される。このように、第2シリンダー310の内部に圧縮空気が流入されると、第2ピストン320は上向きに移動され、これによって、前記第2ピストン320の中心部に設置されている上下シャフト330も上向きに移動される。 As described above, the compressed air that has entered the fifth flow path 5 flows into the lower portion of the second cylinder 310 that communicates with the fifth flow path 5. As described above, when compressed air flows into the second cylinder 310, the second piston 320 is moved upward, whereby the vertical shaft 330 installed at the center of the second piston 320 is also upward. Moved to.
この時、第6流路6に設置されているレリーフバルブR1は閉められている状態が維持されることは当然である。 At this time, it is natural that the relief valve R1 installed in the sixth flow path 6 is kept closed.
前記のように、第2ピストン320が上向きに移動され、図11、15に示すように、上死点に到逹すると、第1圧縮空気流入通孔340に流入された圧縮空気は第6流路6に集中される。圧縮空気が供給し続けられると、レリーフバルブR1が徐徐に開かれ始める。 As described above, when the second piston 320 is moved upward and reaches the top dead center as shown in FIGS. 11 and 15, the compressed air that has flowed into the first compressed air inflow hole 340 flows into the sixth flow. Concentrated on Road 6. As the compressed air continues to be supplied, the relief valve R1 begins to open gradually.
前記のように、レリーフバルブR1が徐徐に開かれ始めると、圧縮空気は一側上下シャフトの内部に形成された第3流路3を経って第1流路1に流入される。このように、第1流路1に流入された圧縮空気によって第1ピストン220は図12、16に示すように前進する。 As described above, when the relief valve R1 begins to open gradually, the compressed air flows into the first flow path 1 through the third flow path 3 formed inside the one-side upper and lower shafts. As described above, the first piston 220 advances by the compressed air flowing into the first flow path 1 as shown in FIGS.
これによって、第1ピストン220と連結部材Bを介して連結されている開閉部材100も前進しながら半導体ウエハー移動通路が密閉され、このような状態を密閉状態と言う。 As a result, the semiconductor wafer moving passage is sealed while the opening / closing member 100 connected to the first piston 220 via the connecting member B is also advanced, and such a state is referred to as a sealed state.
次に、前記のように、開閉部材で半導体ウエハー移動通路を密閉した状態から初期状態に作動される過程を説明する。 Next, the process of operating from the state where the semiconductor wafer moving passage is sealed with the opening / closing member to the initial state as described above will be described.
前述したように、密閉状態で半導体ウエハーを移動させる場合、開閉部材100が半導体ウエハー移動通路を開放しなければならない。このような場合、第2圧縮空気流入通孔350に圧縮空気を流入させる。 As described above, when the semiconductor wafer is moved in a sealed state, the opening / closing member 100 must open the semiconductor wafer movement path. In such a case, the compressed air is caused to flow into the second compressed air inflow through hole 350.
前記のように、第2圧縮空気流入通孔350に流入された圧縮空気は他側上下シャフトの内部に形成された第4流路4課題7流路7に同時に流入される。前記第7流路7にはレリーフバルブR2が設置されているので、第4流路4に圧縮空気が先に流入される。このように、第4流路4に流入された圧縮空気は第4流路4と連通された第2流路2に流入される。 As described above, the compressed air that has flowed into the second compressed air inflow hole 350 flows simultaneously into the fourth flow path 4 problem 7 flow path 7 formed inside the other side upper and lower shafts. Since the relief valve R <b> 2 is installed in the seventh flow path 7, the compressed air flows into the fourth flow path 4 first. In this way, the compressed air that has flowed into the fourth flow path 4 flows into the second flow path 2 that communicates with the fourth flow path 4.
前記のように、第2流路2に圧縮空気が流入されると、第1ピストン220は、図17に示すように、後進しながら前記第1ピストン220に連結された連結部材Bも後進し、これによって、連結部材Bに連結された開閉部材100も後進される。 As described above, when compressed air flows into the second flow path 2, the first piston 220 moves backward as shown in FIG. 17 while the connecting member B connected to the first piston 220 also moves backward. Thereby, the opening / closing member 100 connected to the connecting member B is also moved backward.
前記のように、開閉部材100が後進すれば、密閉状態を維持していた半導体ウエハー移動通路が開放され、前記第1ピストン220は、図17に示すように、下死点まで後進される。 As described above, when the opening / closing member 100 moves backward, the semiconductor wafer moving passage that has been kept in a sealed state is opened, and the first piston 220 is moved backward to the bottom dead center as shown in FIG.
前記のように、第1ピストン220が下死点まで移動されると、第2圧縮空気流入通孔350に流入される圧縮空気は第7流路7に集中され、所定以上の圧力が発生されると、レリーフバルブR2は徐徐に開かれ始めながら、圧縮空気が図20に示すように第7流路7を経って第2シリンダー310の上側に流入される。 As described above, when the first piston 220 is moved to the bottom dead center, the compressed air flowing into the second compressed air inflow hole 350 is concentrated in the seventh flow path 7, and a pressure higher than a predetermined pressure is generated. Then, while the relief valve R2 begins to open gradually, the compressed air flows into the upper side of the second cylinder 310 via the seventh flow path 7 as shown in FIG.
前記のように、第2シリンダー310の上側に圧縮空気が流入されると、上死点に位置していた第2シリンダー310は下向きに移動されて、結局下死点まで移動するようになって初期状態に戻る。 As described above, when compressed air is introduced into the upper side of the second cylinder 310, the second cylinder 310 located at the top dead center is moved downward and eventually moved to the bottom dead center. Return to the initial state.
また、第2圧縮空気流入通孔350に圧縮空気が流入されると、前後シャフト230の後進及び上下シャフト330が下向きに移動されるように、第1圧縮空気流入通孔340を通じて内部に流入されていた圧縮空気は外部に放出される。このような状態を開放状態と言う。 In addition, when compressed air flows into the second compressed air inflow through hole 350, it flows into the inside through the first compressed air inflow through hole 340 so that the back and forth shaft 230 moves backward and the vertical shaft 330 moves downward. The compressed air that has been discharged is discharged to the outside. Such a state is called an open state.
一方、第2ピストン320の上死点または下死点の位置を外部で確認できるように前記第2ピストン320には磁石部材321が設置されることが好ましく、このような磁石部材321を感知するセンサー360が図4に示すように上下作動アクチュエーター部300に備えられることが好ましい。 Meanwhile, a magnet member 321 is preferably installed on the second piston 320 so that the position of the top dead center or the bottom dead center of the second piston 320 can be confirmed externally, and such a magnet member 321 is sensed. As shown in FIG. 4, the sensor 360 is preferably provided in the vertical operation actuator unit 300.
また、前記上下作動アクチュエーター部300はメンテナンスが容易になるように前記上下作動アクチュエーター部300の上部には上部カバー301が、下部には下部カバー302がそれぞれ分離可能に設置されることが好ましく、第2シリンダー310の内部が密閉状態を維持するようにそれぞれの結合部位にはゴム材質の密閉部材Oリング(図示しない)が設置されることが好ましい。 In addition, it is preferable that an upper cover 301 and a lower cover 302 are detachably installed at the upper portion and the lower portion of the vertical actuator portion 300 so that the vertical actuator portion 300 can be easily maintained. It is preferable that a rubber sealing member O-ring (not shown) is installed at each coupling portion so that the inside of the two cylinders 310 is kept sealed.
前記下部カバー302には、図5に示すように、ストロー形状の管が形成されている。このような管は上下シャフトの第3流路3課題4流路4の内部に連通されるように結合され、前記上下シャフト330の上下方向に移動の時、上下シャフト330が安定的にガイドされることができるようにする役割を果たす。 The lower cover 302 is formed with a straw-shaped tube as shown in FIG. Such a pipe is coupled so as to communicate with the inside of the third flow path 3 task 4 flow path 4 of the upper and lower shafts, and when the vertical shaft 330 moves in the vertical direction, the vertical shaft 330 is stably guided. Play a role in being able to
これによって、前記管は上下シャフト330の上下方向に移動される距離以上の長さを有するように形成されて、前記第2ピストン320が上死点まで移動されても第3流路3課題4流路4と連通されることが好ましい。 As a result, the pipe is formed to have a length longer than the distance moved in the vertical direction of the vertical shaft 330, and even if the second piston 320 is moved to the top dead center, the third flow path 3 problem 4 It is preferable to communicate with the flow path 4.
また、前記上部カバー301は、図5に示すように、上下シャフト330の上下方向の動きを正確にガイドするようにガイド部303が上向きに突出して形成され、このようなガイド部303の内部にはゴム材質の密閉部材(Oリング)が設置されて、第2シリンダー310を密閉することが好ましい。 In addition, as shown in FIG. 5, the upper cover 301 is formed with a guide portion 303 protruding upward so as to accurately guide the vertical movement of the upper and lower shafts 330. It is preferable that a rubber sealing member (O-ring) is installed to seal the second cylinder 310.
一方、前記ガイド部303の内部には、図5に示すように、ブッシング304が設置されることが好ましい。このようなブッシング304は前記開閉部材100の前進及び後進の時発生される偏心によって前記上下シャフト330とガイド部303の接触によって発生される応力を減衰させる役割と、前記密閉部材とともに第2シリンダー310を密閉する役割を果たす。 On the other hand, a bushing 304 is preferably installed inside the guide portion 303 as shown in FIG. The bushing 304 serves to attenuate stress generated by the contact between the upper and lower shafts 330 and the guide portion 303 by the eccentricity generated when the opening / closing member 100 moves forward and backward, and the second cylinder 310 together with the sealing member. It plays a role of sealing.
前記のように設置されるブッシング304は応力が直接発生される所に設置されるので、銅やプラスチックなど比較的硬度の低い材質で製作された方が良い。 Since the bushing 304 installed as described above is installed at a place where stress is directly generated, it is preferable that the bushing 304 is made of a material having relatively low hardness such as copper or plastic.
また、前記ガイド部303の上端と前後進アクチュエーター部200との間及び前記開閉部材100と前後進アクチュエーター部200との間にはそれぞれベローズ400が設置されることが好ましい。このようなベローズ400は本発明の動作の時に発生される振動と騷音を減衰させる役割を果たすとともに、真空状態で本発明を設置する際半導体製造工程で発生されるパウダーから本発明の主要部を保護する役割を果たす。 In addition, it is preferable that bellows 400 is installed between the upper end of the guide portion 303 and the forward / reverse actuator portion 200 and between the opening / closing member 100 and the forward / backward actuator portion 200, respectively. Such a bellows 400 plays a role of attenuating vibration and noise generated during the operation of the present invention, and from the powder generated in the semiconductor manufacturing process when the present invention is installed in a vacuum state. Play a role in protecting.
次に、第6流路6課題7流路7に設置されるチェックバルブC1、C2について説明する。 Next, the check valves C1 and C2 installed in the sixth flow path 6 task 7 flow path 7 will be described.
前記第6流路6課題7流路7に設置されるチェックバルブC1、C2は前記レリーフバルブR1、R2と同じく、一方向のみに開放される部材で、このようなチェックバルブC1、C2は第1圧縮空気流入通孔340課題2圧縮空気流入通孔350に流入された圧縮空気が外部に排出される時に開かれ、前記レリーフバルブR1、R2とは反対方向に流体の流動を許容する。 Like the relief valves R1 and R2, check valves C1 and C2 installed in the sixth flow path 6 task 7 flow path 7 are members that are opened only in one direction. 1 Compressed air inflow hole 340 Task 2 Opened when compressed air that has flowed into the compressed air inflow hole 350 is discharged to the outside, and allows fluid flow in the direction opposite to the relief valves R1 and R2.
さらに詳しく説明すれば、第6流路6に設置されるチェックバルブC1は密閉状態から開放状態に転換する時、第1圧縮空気流入通孔340に流入された圧縮空気を排出する時開かれ、第7流路7に設置されたチェックバルブC2は開放状態から密閉状態に転換する時、第2圧縮空気流入通孔350に流入された圧縮空気を排出する時開かれる。 More specifically, the check valve C1 installed in the sixth channel 6 is opened when the compressed air flowing into the first compressed air inflow hole 340 is discharged when the sealed valve is changed from the sealed state to the opened state. The check valve C <b> 2 installed in the seventh flow path 7 is opened when the compressed air flowing into the second compressed air inflow hole 350 is discharged when the open valve is changed to the sealed state.
また、前記チェックバルブC1、C2は急速排気バルブで取り替えられることもできる。前記のように取り替えられる場合、排気に消耗される時間が顕著に減少されて、より速かに半導体ウエハー移動通路を開閉することができる。 The check valves C1 and C2 can be replaced with a quick exhaust valve. In the case of replacement as described above, the time consumed for exhaust is remarkably reduced, and the semiconductor wafer moving passage can be opened and closed more quickly.
前記のような急速排気バルブは大韓民国特許出願番号第10−2006−0023872号(発明の名称:急速排気バルブ装置)に記載されているように、公知技術であるため、これに対する詳細な説明は省略する。 Such a quick exhaust valve is a known technique as described in Korean Patent Application No. 10-2006-0023872 (name of invention: quick exhaust valve device), and thus detailed description thereof is omitted. To do.
図面と明細書に最適な実施形態が開示された。ここで、特定の用語を用いたが、これはただ本発明を説明するための目的で用いられたもので、意味の限定や特許請求の範囲に記載された本発明の範囲を制限するために用いられたものではない。また、本技術分野において通常の知識を有する者であれば、これから多様な変形及び均等な他の実施形態が可能であることは理解すべきである。従って、本発明の真の技術的保護範囲は添付された特許請求の範囲の技術的思想によって定められるべきである。 The best embodiments have been disclosed in the drawings and specification. Although specific terms are used herein, they are merely used for the purpose of describing the present invention, and are intended to limit the scope of the present invention described in the meaning limitation and claims. It was not used. It should be understood by those skilled in the art that various modifications and other equivalent embodiments are possible. Accordingly, the true technical protection scope of the present invention should be determined by the technical spirit of the appended claims.
Claims (7)
前記第2圧縮空気流入通孔(350)と連通され、前記第2圧縮空気流入通孔(350)に流入される圧縮空気によって前記第1ピストン(220)が下死点に到逹すれば選択的に開かれるレリーフバルブ(R2)と前記第1ピストン(220)が下死点に到逹すれば選択的に開かれるチェックバルブ(C2)とが設置され、前記レリーフバルブ(R2)が開かれると前記第2シリンダー(320)の上側に圧縮空気が流入されるように形成される第7流路(7)と;をさらに含むことを特徴とする請求項1に記載のドアバルブ。 Compressed air is introduced so that the wafer moving passage is opened by the opening / closing member (100), and is communicated with the fourth flow path (4) and the second flow path (2) through the vertical actuator section (300). A second compressed air inlet hole (350) installed to be
Selected if the first piston (220) reaches the bottom dead center by the compressed air that is communicated with the second compressed air inflow hole (350) and flows into the second compressed air inflow hole (350). The relief valve (R2) that is opened automatically and the check valve (C2) that is selectively opened when the first piston (220) reaches bottom dead center are installed, and the relief valve (R2) is opened. The door valve according to claim 1, further comprising: a seventh flow path (7) formed to allow compressed air to flow into the upper side of the second cylinder (320).
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KR1020100004247A KR100994761B1 (en) | 2009-10-16 | 2010-01-18 | Door valve |
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PCT/KR2010/004000 WO2011087190A1 (en) | 2010-01-18 | 2010-06-21 | Door valve |
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US9086172B2 (en) * | 2012-07-19 | 2015-07-21 | Vat Holding Ag | Vacuum valve |
JP6150388B2 (en) * | 2013-06-05 | 2017-06-21 | 入江工研株式会社 | Gate valves and chambers |
TWI656293B (en) * | 2014-04-25 | 2019-04-11 | 瑞士商Vat控股股份有限公司 | Valve |
JP7245724B2 (en) * | 2019-06-06 | 2023-03-24 | 入江工研株式会社 | Valve body and vacuum gate valve |
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JP3256490B2 (en) * | 1998-05-14 | 2002-02-12 | イーグル工業株式会社 | Gate valve |
JP2000028013A (en) * | 1998-07-13 | 2000-01-25 | Ckd Corp | Gate type vacuum shut-off valve |
US6913243B1 (en) * | 2000-03-30 | 2005-07-05 | Lam Research Corporation | Unitary slot valve actuator with dual valves |
JP3425938B2 (en) * | 2000-12-14 | 2003-07-14 | 入江工研株式会社 | Gate valve |
JP3696103B2 (en) * | 2001-02-23 | 2005-09-14 | Smc株式会社 | High speed pressurizing method and mechanism in cylinder with cushion mechanism |
JP2004257527A (en) * | 2003-02-27 | 2004-09-16 | Nippon Valqua Ind Ltd | Vacuum gate valve and seal member mounting method |
KR100448174B1 (en) * | 2003-10-15 | 2004-09-13 | 주식회사 에스티에스 | Slit valve |
KR100596332B1 (en) * | 2004-01-05 | 2006-07-06 | 주식회사 에이디피엔지니어링 | Gate valve of vacuum processing apparatus |
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