JP5625424B2 - Color filter, color filter manufacturing method, and liquid crystal display device including the same - Google Patents

Description

  The present invention relates to a color filter used in a liquid crystal display device and the like and a method for manufacturing the color filter.

  In a liquid crystal display device, a display side substrate such as a color filter and a liquid crystal driving side substrate are opposed to each other, a liquid crystal layer is formed therebetween, and the arrangement of liquid crystal molecules in the liquid crystal layer is electrically controlled by the liquid crystal driving side substrate. Thus, display is performed by selectively changing the amount of transmitted or reflected light of the display side substrate.

  The display side substrate is provided with a spacer that holds a gap between the display side substrate and the liquid crystal driving side substrate. Conventionally, it has been necessary to perform the photolithography process for forming the spacer separately from the photolithography process for forming the colored layer. However, if an independent spacer forming step is provided, the number of steps necessary for the production of the color filter is increased, the production efficiency is lowered, and the production cost is increased.

  Therefore, for the purpose of improving the production efficiency of the color filter, a method has been proposed in which a colored layer is laminated on a black matrix and the laminated colored layer is used as a spacer. (See Patent Document 1)

JP 2009-169064 A

  However, as shown in FIG. 7, in the conventional color filter 21 in which the colored layers 23R, 23G, and 23B are formed in a stripe shape, after forming the colored layer, a transparent resin is applied to form a transparent protective layer (also referred to as an overcoat layer). 13) is formed, the black matrix 5 and the stacked pillars form an inclination in the display area portion of the transparent protective layer 13. When such a color filter 21 is used in a liquid crystal display device, this tilt causes a disturbance in the alignment of the liquid crystal, and there is a problem that a clear display is not performed. In particular, the transparent protective layer 13 needs to be flat, and since a material that can be easily flattened is used as the material of the transparent protective layer 13, the transparent protective layer 13 can easily be inclined.

  The present invention has been made in view of the above-described problems, and provides a color filter and the like in which the transparent protective layer does not disturb the alignment of the liquid crystal in the display region while reducing the number of steps in the color filter production process. For the purpose.

The present invention for achieving the above-described object is as follows.
(1) A substrate, a black matrix having a plurality of openings formed on the substrate, an isolated pattern-shaped first colored layer formed in the openings, and formed on the black matrix The first colored layer for columns having the same color as the first colored layer for display, the second colored layer for display having an isolated pattern formed in the opening, and the first colored layer for columns , A second colored layer for columns having the same color as the second colored layer for display and having a bottom area smaller than the upper surface of the first colored layer for columns, and for displaying an isolated pattern formed in the opening For the column having the same color as the third colored layer for display, formed on the third colored layer and the second colored layer for columns, and having a bottom area smaller than the top surface of the second colored layer for columns A third colored layer; a first colored layer for the column; a second colored layer for the column; and the column. Comprising a multilayer pillar and the third colored layer is formed, the black matrix, wherein the transparent protective layer according to the colored layer and a transparent resin covering the stacked pillar, wherein the multilayer pillars, third coloring said display formed on the black matrix between the layers and the end portions of the first colored layer the pillars, slits are formed by leaving the Ri by the end of the third colored layer display 1 m to 5 m, the slit the transparent resin flows into the section, the color filters the transparent protective layer on the third colored layer and the display is characterized in that the flat
(2) The color filter according to (1) , wherein a bottom surface of the first colored layer for pillars is circular or polygonal.
(3) The bottom surface of the first colored layer for pillars is a quadrangle, and the side of the square of the bottom surface of the first colored layer for pillars is oblique to the side forming the opening. The color filter described in (2)
(4) A liquid crystal display device comprising the color filter according to any one of (1) to (3)
(5) A step (a) of forming a black matrix on the substrate so as to have a plurality of openings, a first colored layer for display having an isolated pattern shape covering the openings, and the black matrix A step (b) of forming the first colored layer for pillars of the same color as the first colored layer for display; a second colored layer for display having an isolated pattern shape covering the opening; (C) forming a second colored layer for a column having the same color as the second colored layer for display on one colored layer and having a bottom area smaller than the upper surface of the first colored layer for columns; The third colored layer for display having an isolated pattern shape covering the opening, and the same color as the third colored layer for display on the second colored layer for pillars , and the area of the bottom surface for the pillars (d) forming a third colored layer for smaller columns than an upper surface of the second colored layer, the blanking Click matrix, wherein the colored layer and the first colored layer above the pillars, the second colored layer pillar, forming a transparent protective layer of a transparent resin covering the stacked pillar by third colored layer for posts and (e), the In the step (b), the first colored layer for pillars is formed on the black matrix between the openings where the third colored layer for display is to be formed. end by Ri to form apart 1 m to 5 m, the slit portion formed by the first colored layer the pillar leaves Ri by the end of the third colored layer and the display, the transparent resin flows, method of manufacturing a color filter, wherein the transparent protective layer on the third colored layer and the display is flat

  According to the color filter having the above configuration, since the end of the first colored layer for pillars is 1 μm or more away from the end of the third colored layer for display, the material of the transparent protective layer flows into the slit, The transparent protective layer in the region is flat with no inclination. As a result, the transparent protective layer in the display area does not disturb the alignment of the liquid crystal. Moreover, in this invention, a spacer can be formed, without providing an independent spacer formation process.

  According to the present invention, it is possible to provide a color filter or the like in which the transparent protective layer does not disturb the alignment of the liquid crystal in the display region while reducing the number of steps in the color filter production process.

(A) The partial top view of the color filter 1 which concerns on 1st Embodiment (however, illustration of the protective layer 13 is abbreviate | omitted), (b) The B part of the AA 'cross section in (a) is shown. FIG. (A) The fragmentary top view explaining preparation of the black matrix of the manufacturing process of the color filter 1 which concerns on 1st Embodiment, (b) The fragmentary sectional view which shows B part of the AA 'cross section in (a). (A) The fragmentary top view explaining preparation of the 1st colored layer of the manufacturing process of the color filter 1, (b) The fragmentary sectional view which shows B part of the AA 'cross section in (a). (A) The fragmentary top view explaining preparation of the 2nd colored layer of the manufacturing process of the color filter 1, (b) The fragmentary sectional view which shows B part of the AA 'cross section in (a). (A) The fragmentary top view explaining preparation of the 3rd colored layer of the manufacturing process of the color filter 1, (b) The fragmentary sectional view which shows the B section of the AA 'cross section in (a). (A) The partial top view of the color filter which has the laminated pillar 15 which concerns on 2nd Embodiment, (b) The partial top view of the color filter which has the laminated pillar 17 which concerns on 2nd Embodiment. (A) The fragmentary top view of the conventional color filter 21, (b) The fragmentary sectional view which shows the B section of the AA 'cross section in (a). 5 is a height profile around a multilayer column of the color filter according to the first embodiment. 6 is a height profile around a laminated column of a color filter according to Comparative Example 1;

(First embodiment)
Hereinafter, a first embodiment of the present invention will be described with reference to the drawings. An embodiment of the color filter of the present invention includes a color filter, a liquid crystal driving side substrate (not shown) provided with a common electrode and a pixel electrode, and a liquid crystal layer (not shown) formed between the color filter and the liquid crystal driving side substrate. IPS method (In-Plane Switching method, horizontal electric field liquid crystal driving method) in which the liquid crystal driving side substrate generates an electric field in a horizontal direction (lateral direction) with respect to the liquid crystal driving side substrate and drives the liquid crystal. This will be described as a color filter in a liquid crystal display device (not shown).

(Configuration of color filter 1)
First, the color filter 1 according to the first embodiment will be described with reference to FIG. Each drawing schematically shows each component, and does not accurately show an actual size or a relative size ratio. FIG. 1A is a partial plan view of the color filter 1 according to the first embodiment. However, in FIG. 1A, when the protective layer 13 is illustrated, the entire plan view is the protective layer 13, and thus the protective layer 13 is not illustrated. FIG.1 (b) is a fragmentary sectional view which shows B part of the AA 'cross section in Fig.1 (a).

  The color filter 1 has a black matrix 5 on a transparent substrate 3 and is provided with first colored layers 7R and 9R, second colored layers 7G and 9G, third colored layers 7B and 9B, a transparent protective layer 13, and the like. Among the colored layers, the colored layer for display is provided so as to cover the opening of the black matrix 5, and the colored layers for columns are stacked to form a stacked column, which serves as a spacer. Further, there is a gap between the first colored layer for column 9R and the third colored layer for display 7B, and the slit portion 11 exists.

(Transparent substrate 3)
The transparent substrate 3 is not particularly limited, and a substrate generally used for a color filter can be used. For example, inflexible transparent rigid materials such as borosilicate glass, aluminoborosilicate glass, alkali-free glass, quartz glass, synthetic quartz glass, soda lime glass, white sapphire, transparent resin film, optical resin film, etc. A transparent flexible material having the following flexibility can be used. Examples of the flexible material include acrylic such as polymethyl methacrylate, polyamide, polyacetal, polybutylene terephthalate, polyethylene terephthalate, polyethylene naphthalate, triacetyl cellulose, syndiotactic polystyrene, polyphenylene sulfide, polyether ketone, polyether ether ketone, Examples include fluororesin, polyether nitrile, polycarbonate, modified polyphenylene ether, polycyclohexene, polynorbornene resin, polysulfone, polyethersulfone, polyarylate, polyamideimide, polyetherimide, thermoplastic polyimide, and the like. However, those made of general plastics can also be used. In particular, alkali-free glass is a material having a small coefficient of thermal expansion, and is excellent in dimensional stability and characteristics in high-temperature heat treatment.

(Black Matrix 5)
The black matrix 5 is formed of a photosensitive resin containing light-shielding particles, has a thickness of about 0.5 μm to 2 μm, and is disposed on the transparent substrate 3 so as to have a plurality of openings. Each opening corresponds to the position of each pixel on the liquid crystal display substrate.

  Further, as the black matrix 5, an inorganic light-shielding film can also be used. The light-shielding film does not substantially transmit exposure light, and preferably has an average transmittance of 0.1% or less at the exposure wavelength. As the light shielding film, a light shielding film generally used for a color filter can be used, for example, a film of chromium, chromium oxide, chromium nitride, chromium oxynitride, molybdenum silicide, tantalum, aluminum, silicon, silicon oxide, silicon oxynitride, or the like. Is mentioned. Of these, chromium-based films such as chromium, chromium oxide, chromium nitride, and chromium oxynitride are preferably used. This is because such a chromium-based film has the most use record and is preferable in terms of cost and quality. This chromium-based film may be a single layer or may be a laminate of two or more layers. The film thickness of the inorganic light-shielding film is not particularly limited. For example, in the case of a chromium film, it can be about 50 nm to 150 nm.

  As a method for forming the inorganic light-shielding film, for example, a physical vapor deposition method (PVD) such as a sputtering method, an ion plating method, or a vacuum vapor deposition method is used. After the film formation, the light shielding film is patterned. The patterning method is not particularly limited, but usually a lithography method is used.

(First to third colored layers)
The first to third colored layers 7R, 7G, 7B, 9R, 9G, and 9B are formed of a photosensitive resin containing a colorant of each color, have a thickness of about 0.5 μm to 3 μm, and have a transparent substrate 3 It is arranged in an isolated pattern shape above. The display first to third colored layers 7R, 7G, and 7B are arranged so as to cover the openings of the black matrix 5.

(Laminated column)
The laminated pillar according to the present embodiment is formed by laminating the first colored layer for column 9R, the second colored layer for pillar 9G, and the third colored layer for pillar 9B on the black matrix 5, and has a thickness of about 1 μm to 5 μm. Has a height. In the present embodiment, as shown in FIG. 1A, the stacked columns are arranged on the black matrix 5 between the third colored layers for display 7B. The laminated pillar plays a role of providing an appropriate interval between the color filter 1 and the liquid crystal driving side substrate provided with the liquid crystal layer sandwiched between the color filter 1 and the colored layer side of the color filter 1. The voids are filled with liquid crystal molecules to form a liquid crystal layer.

  The place where the stacked pillars are formed is not limited to the black matrix 5 between the third colored layers for display 7B as in this embodiment, and the black matrix between the second colored layers for display 7G. However, it is not preferable to provide it between the first colored layers for display 7R. When the first colored layer for column 9R is provided between the first colored layer for display 7R, it is necessary to provide a slit portion 11 of about 1 μm between the first colored layer for display 7R and the first colored layer for column 9R. However, it is difficult to form such a fine slit due to the positional accuracy and resolution of photolithography.

  The width of the slit portion 11 between the first colored layer for column 9R and the third colored layer for display 7B is preferably 1 μm or more. The preferable width of the slit portion 11 varies depending on the material of the transparent photosensitive resin used for forming the transparent protective layer 13, but if the material is widely used at present, the width of the slit portion 11 is 1 μm or more. The transparent workable resin flows into the slit part 11 and the transparent protective layer 13 on the display region can be obtained without giving the transparent protective layer 13 on the display region the influence of the inclination of the laminated pillar.

  Moreover, since the width of the black matrix between the openings is usually about 35 μm to 90 μm in the long side direction of the openings, if the width of the slit portion 11 is too wide, the area of the first colored layer for column 9R becomes small. . As a result, the area of the second colored layer 9G for the column and the third colored layer 9B for the column is reduced, the thickness of the colored layer for each column is also reduced, the height of the entire stacked column is reduced, and the role as a spacer is reduced. It may not be fulfilled. Therefore, the width of the slit portion 11 is preferably 1 μm to 5 μm, more preferably 1 μm to 3 μm. The width of the slit portion 11 is the distance of the closest part between the first colored layer for column 9R and the third colored layer for display 7B.

(Transparent protective layer 13)
The transparent protective layer 13 is formed of a photosensitive resin that is transparent in the visible light region, has a thickness of about 0.1 μm to 2.0 μm, and includes the black matrix 5 and the first to third colored layers 7R, 7G, 7B, It arrange | positions so that the surface of 9R, 9G, 9B may be covered. The transparent protective layer 13 is provided so that the content of each colored layer such as a pigment does not elute from each colored layer into the liquid crystal layer. The transparent protective layer is also called an overcoat layer.

  The black matrix 5, the first to third colored layers 7R, 7G, 7B, 9R, 9G, 9B, etc. are exposed and developed using a photomask having a predetermined appropriate pattern after applying a photosensitive resin. Formed by patterning. For the black matrix 5 and the first to third colored layers 7R, 7G, 7B, 9R, 9G, 9B, a photosensitive resin in which an appropriate colorant or the like corresponding to each color is dispersed and contained is used. For example, in the present embodiment, the first colored layer is red, the second colored layer is green, and the third colored layer is blue.

  The transparent protective layer 13 is formed by applying a photosensitive resin, and then exposing and developing the entire surface without using a photomask.

  As the photosensitive resin, either a negative photosensitive resin or a positive photosensitive resin can be used. In the present embodiment, description will be made assuming that a negative photosensitive resin is used.

The negative photosensitive resin is not particularly limited, and a commonly used negative photosensitive resin can be used. For example, a chemically amplified photosensitive resin based on a crosslinked resin, specifically, a chemically amplified photosensitive resin in which a crosslinking agent is added to polyvinylphenol and an acid generator is further added. In addition, as an acrylic negative photosensitive resin, a photopolymerization initiator that generates a radical component upon irradiation with ultraviolet rays, a component that has an acrylic group in the molecule, causes a polymerization reaction by the generated radical, and is cured, What contains the functional group (for example, the component which has an acidic group in the case of image development by an alkaline solution) which can dissolve an unexposed part by image development can be used. Among the above-mentioned components having an acrylic group, examples of relatively low molecular weight polyfunctional acrylic molecules include dipentaerythritol hexaacrylate (DPHA), dipentaerythritol pentaacrylate (DPPA), and tetramethylpentatriacrylate (TMPTA). Can be mentioned. In addition, examples of high molecular weight polyfunctional acrylic molecules include polymers in which an acrylic group is introduced via an epoxy group into a part of the carboxylic acid group of the styrene-acrylic acid-benzyl methacrylate copolymer, and methyl methacrylate-styrene- An acrylic acid copolymer etc. are mentioned.
The positive photosensitive resin is not particularly limited, and a commonly used one can be used. Specifically, a chemically amplified photosensitive resin using a novolac resin as a base resin can be used.

  Examples of the photosensitive resin coating method include spin coating, casting, dipping, bar coating, blade coating, roll coating, gravure coating, flexographic printing, spray coating, and die coating. is there.

  The colorant contained in the photosensitive resin used for the black matrix 5 and the first to third colored layers 7R, 7G, 7B, 9R, 9G, and 9B is not particularly limited, and a commonly used pigment is used. First, various known ones can be appropriately selected and used. As the light-shielding particles to be added to the black matrix 5, a mixture of pigments such as red, blue and green in addition to metal oxide powders such as titanium oxide and iron tetroxide, metal sulfide powders, metal powders and carbon black. Can be used.

  In the present embodiment, the first colored layer is red, the second colored layer is green, and the third colored layer is blue. However, the first, second, and third colored layers are Each may be green, blue, red, green, red, blue, or blue, green, red. However, the third colored layer is preferably not green. It is preferable that the outermost colored layer of the laminated column is not green because the pigment dispersion material, adhesion aid, and the like contained in the current green colored layer tend to adversely affect reliability such as voltage holding ratio.

  In the present embodiment, the color filter 1 has only three colored layers of red, blue, and green, but other colored layers such as yellow and cyan may be provided. At that time, a colored layer of another color may or may not be added to the formation of the laminated pillar.

(Method for producing color filter 1)
Then, the manufacturing method of the color filter which forms the color filter 1 shown in FIG. 1 is demonstrated using FIGS. Each of FIGS. 2 to 5 is a partial plan view for explaining a manufacturing process of the color filter 1 according to the first embodiment, and each of FIGS. It is a fragmentary sectional view which shows B part of the AA 'cross section in Fig.5 (a).

  First, as shown in FIGS. 2A and 2B, the black matrix 5 having a plurality of openings is formed on the transparent substrate 3.

  The black matrix 5 is formed by applying a black photosensitive resin for forming a black matrix on the transparent substrate 3, having a transmission portion at a portion corresponding to the formation position of the black matrix 5, and a light shielding portion at the other portion. The black matrix 5 is formed by patterning the black photosensitive resin by exposure and development using a photomask.

  Next, as shown in FIGS. 3A and 3B, the first colored layer 7R for covering the opening of the black matrix 5 and the opening where the third colored layer for display is to be formed. The first colored layer 9R for pillars on the black matrix 5 is formed. The first colored layers 7R and 9R are formed by applying a red photosensitive resin for forming a red colored layer on the transparent substrate 3 and the black matrix 5, and displaying the first colored layer 7R for display and the first colored layer for columns. The first colored layer 7R for display and the column are formed by patterning the photosensitive resin by exposing and developing using a photomask having a transmissive portion at a portion corresponding to the 9R formation position and a light shielding portion at the other portion. The first colored layer 9R is formed. As shown in FIG. 3A, the first colored layer for display 7R is not connected to the first colored layer for display 7R formed in the opening of the adjacent pixel, and is formed in an isolated pattern shape. Is done.

  Next, as shown in FIGS. 4A and 4B, the second colored layer for display 7G that covers the openings of the black matrix 5, and the second colored layer for columns on the first colored layer for columns 9R. 9G is formed. The second colored layers 7G and 9G are formed by applying a green photosensitive resin for forming a green colored layer on the transparent substrate 3, the black matrix 5, and the first colored layers 7R and 9R, and then displaying the second colored layer for display. 7G and the second colored layer for pillar 9G corresponding to the formation position of the column, the photo-resist is patterned by exposure and development using a photomask having a transmission part in the part and a light-shielding part in the other part. The second colored layer for use 7G and the second colored layer for column 9G are formed. As shown in FIG. 4A, the second colored layer for display 7G is formed in an isolated pattern shape.

  Next, as shown in FIGS. 5A and 5B, the third colored layer for display 7B covering the openings of the black matrix 5, and the third colored layer for pillars on the second colored layer for pillars 9G. 9B. The third colored layers 7B and 9B are formed by applying a blue photosensitive resin for forming a blue colored layer on the transparent substrate 3, the black matrix 5, the first colored layers 7R and 9R, and the second colored layers 7G and 9G. Then, exposure and development are performed using a photomask having a transmission part in a portion corresponding to the formation position of the third color layer for display 7B and the third color layer for column 9B, and a light-shielding part in the other part. The third resin colored layer 7B for display and the third colored layer 9B for pillars are formed by patterning the conductive resin. As shown in FIG. 5A, the display third colored layer 7B is formed in an isolated pattern shape.

  Next, the transparent protective layer 13 covering the black matrix 5 and the first to third colored layers 7R, 7G, 7B, 9R, 9G, 9B is formed, and the color filter 1 shown in FIG. 1 is produced. The transparent protective layer 13 is formed by applying a photosensitive resin transparent in the visible light region on the transparent substrate 3, the black matrix 5, the first colored layer, the second colored layer, and the third colored layer, and exposing and developing. Thus, the transparent protective layer 13 is formed. As shown in FIG. 1, the transparent protective layer 13 covers the black matrix 5, the display first to third colored layers 7R, 7G, and 7B and the column first to third colored layers 9R, 9G, and 9B. Yes.

(Effects of the first embodiment)
As described above, according to the first embodiment, it is possible to form a stacked column that serves as a spacer by stacking a colored layer of each color and a black matrix without providing an independent spacer forming step. Therefore, it is possible to reduce the manufacturing process of the color filter.

  Further, according to the first embodiment, since the first colored layer for pillars and the nearest display colored layer are separated by 1 μm or more, the transparent photosensitive resin applied when forming the transparent protective layer Flows into the slit portion, and the inclined portion derived from the laminated pillar does not occur in the transparent protective layer on the display colored layer. Therefore, even when this color filter is used in a liquid crystal display device, the orientation of the liquid crystal in the display region is not disturbed by the inclination of the transparent protective layer.

(Second Embodiment)
Next, a second embodiment of the color filter of the present invention will be described with reference to FIG. FIG. 6 is a diagram illustrating the stacked pillars 15 and 17 according to the second embodiment. In FIG. 6, illustration of the black matrix 5 is omitted. In the following embodiment, the same number is attached | subjected to the element which fulfill | performs the same aspect as 1st Embodiment, and the overlapping description is avoided.

  In the second embodiment, the color filter has a stacked column 15 or a stacked column 17. In the stacked column 15, the bottom surface of the column first colored layer 9 </ b> R is circular. The column-shaped second colored layer 9G constituting the stacked column 15 does not need to have a cylindrical bottom surface. However, since it is desired to make the area as wide as possible and ensure the thickness of the column-used second colored layer 9G, It is preferable to make the bottom face a circle according to the shape of the colored layer 9R.

  In the stacked pillar 17, the bottom surface of the first colored layer 9 </ b> R has a quadrangular shape. The second colored layer 9G for pillars constituting the laminated pillar 17 does not need to have a rectangular bottom surface, but, like the laminated pillar 15, the cross section is matched to the shape of the first colored layer 9R for pillars in order to increase the area. Is preferably rectangular. In the stacked pillar 17, the square side of the bottom surface of the first colored layer 9 </ b> R is preferably inclined with respect to the side forming the opening of the black matrix 5. Further, the square side of the bottom surface of the first colored layer for column 9R is 45 ° with respect to the side forming the opening of the black matrix 5, that is, the diagonal line of the square of the bottom surface of the first colored layer for column 9R. Is more preferably perpendicular or parallel to the major axis direction of the opening of the black matrix 5. The distance between the first colored layer for display 7R and the first colored layer for column 9R is secured by separating the vertex of the square from the first colored layer 7R for the display layer as much as possible, and patterning by photolithography is easy. It is to make it.

  Note that the shape of the bottom surface of the first colored layer 9R for pillars need not be limited to a square or a circle, but other polygonal shapes such as hexagons and octagons, elliptical shapes, and rounded polygons combining straight lines and curves. Shapes can also be adopted.

  According to the second embodiment, in addition to the effects obtained in the first embodiment, the first colored layer for display 7R and the first colored layer for column 9R are separated from each other. The patterning of one colored layer 7R, 9R is easy.

Hereinafter, the present invention will be specifically described using examples and comparative examples.
[Example 1]
(Preparation of photosensitive resin composition)
In the polymerization tank, 63 parts by weight of methyl methacrylate (MMA), 12 parts by weight of acrylic acid (AA), 6 parts by weight of 2-hydroxyethyl methacrylate (HEMA), and 88 parts by weight of diethylene glycol methyl ether (DMDG) After part preparation and stirring to dissolve, 7 parts by weight of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly. Thereafter, the mixture was stirred at 85 ° C. for 2 hours under a nitrogen stream, and further reacted at 100 ° C. for 1 hour. Furthermore, 7 parts by weight of glycidyl methacrylate (GMA), 0.4 parts by weight of triethylamine and 0.2 parts by weight of hydroquinone were added to the solution thus obtained, and the mixture was stirred at 100 ° C. for 5 hours. Thus, a copolymer resin solution (solid content 50%) was obtained.
Next, the copolymer resin solution (solid content 50%) thus obtained was stirred and mixed with the following materials at room temperature to obtain a photosensitive resin composition.

<Composition of photosensitive resin composition>
Copolymer resin solution (solid content 50%): 16 parts by weight Dipentaerythritol pentaacrylate (Sartomer SR399): 24 parts by weight Orthocresol novolac type epoxy resin (Oka Chemical Shell Epoxy Epicoat 180S70): 4 parts by weight 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one: 4 parts by weight Diethylene glycol dimethyl ether: 52 parts by weight

(Formation of black matrix)
Next, the following materials were mixed and sufficiently dispersed with a sand mill to prepare a black pigment dispersion.

<Composition of black pigment dispersion>
Black pigment (carbon black): 23 parts by weight Polymer dispersing agent (Bicchemy Japan Co., Ltd. Disperbyk 111): 2 parts by weight Solvent (diethylene glycol dimethyl ether): 75 parts by weight

  Next, the black pigment dispersion was sufficiently mixed with the following materials to obtain a photosensitive resin composition for a black matrix.

<Composition of photosensitive resin composition for black matrix>
Black pigment dispersion: 61 parts by weight The above photosensitive resin composition: 20 parts by weight Diethylene glycol dimethyl ether: 30 parts by weight

Then, the above-mentioned photosensitive resin composition for black matrix was applied by a spin coating method on a glass substrate (Asahi Glass Co., Ltd. AN material) having a thickness of 1.1 mm, dried at 100 ° C. for 3 minutes, and having a thickness of 1.3 μm. A light shielding film was formed.
Thereafter, the light shielding film is subjected to pattern exposure with an ultra-high pressure mercury lamp, developed with 0.05 wt% potassium hydroxide aqueous solution, and subjected to heat treatment at 200 ° C. for 30 minutes, whereby a vertical stripe line width of 10 μm and a vertical stripe pitch are obtained. A grid-like black matrix pattern having a width of 160 μm, a horizontal stripe line width of 80 μm, and a horizontal stripe pitch of 530 μm was formed. As a result, an opening having a short side of 150 μm and a long side of 450 μm was formed. Of the regions sandwiched between the openings adjacent in the long side direction, the region sandwiched between the openings where the third colored layer for display is formed is defined as a stacked column forming portion.

(Formation of colored layer)
Next, a photosensitive resin composition for red, a photosensitive resin composition for green, and a photosensitive resin composition for blue having the following composition were prepared.

<Composition of photosensitive resin composition for red>
・ C. I. Pigment Red 177: 10 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight- Above photosensitive resin composition: 5 parts by weight-3-methoxybutyl acetate: 82 parts by weight <Photosensitive resin composition for green Composition>
・ C. I. Pigment Green 36: 10 parts by weight, polysulfonic acid type polymer dispersant: 3 parts by weight, the photosensitive resin composition described above: 5 parts by weight, and 3-methoxybutyl acetate: 82 parts by weight <Photosensitive resin composition for blue Composition>
・ C. I. Pigment Blue 15: 6: 10 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-The above photosensitive resin composition: 5 parts by weight-3-methoxybutyl acetate: 82 parts by weight

  The red photosensitive resin composition was applied on the glass substrate on which the black matrix was formed by spin coating, and then dried in an oven at 70 ° C. for 3 minutes to form a coating film. After that, a photomask is placed at a distance of 100 μm from the coating film, and an ultraviolet ray is irradiated only for an area where a red pattern (red pixel) is to be formed for 10 seconds using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Irradiated. Next, the glass substrate on which the coating film was formed was immersed in a 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 ° C.) for 1 minute and alkali-developed to remove only the uncured portion of the coating film. And the heat processing for 30 minutes were given to the glass substrate in which the coating film was formed at 200 degreeC, and the red pattern was formed in the area | region which should form a red pattern (1st colored layer). The thickness of the first colored layer for display was 2.0 μm. Moreover, the 1st colored layer for display and the 1st colored layer for pillars were formed simultaneously by this patterning. The first colored layer for display is formed so as to cover a predetermined opening, and the first colored layer for pillars is formed on a black matrix sandwiched between locations where the third colored layer for display is to be formed. Is done. The first colored layer for display has a long side of 467 μm and a short side of 154 μm, and the first colored layer for column was formed in a circular truncated cone shape having a bottom diameter of 60.6 μm.

  Moreover, the 2nd colored layer was formed in the area | region which should form a green pattern (2nd colored layer) using the said photosensitive resin composition for green at the process similar to formation of the 1st colored layer mentioned above. The thickness of the second colored layer for display was 2.0 μm. Moreover, the 2nd colored layer for display and the 2nd colored layer for pillars were formed simultaneously by this patterning. The second colored layer for display has a long side of 467 μm and a short side of 154 μm, and the second colored layer for column was formed to have a circular truncated cone shape with a bottom surface of 55 μm in diameter.

  Furthermore, the 3rd colored layer was formed in the area | region which should form a blue pattern (3rd colored layer) at the process similar to formation of the 1st colored layer mentioned above using the said photosensitive resin composition for blue. The thickness of the third colored layer for display was 2.0 μm. In addition, the third colored layer for display and the third colored layer for pillars were formed simultaneously by this patterning. The third colored layer for display has a long side of 467 μm and a short side of 154 μm, and the third colored layer for column has a circular truncated cone shape whose bottom surface has a diameter of 15 μm. The width of the slit portion between the first colored layer for pillars and the third colored layer for display was 1.2 μm.

(Formation of transparent protective layer)
On the board | substrate with which the said colored layer was formed, said photosensitive resin composition was apply | coated by the spin coating method, and it was made to dry, and the coating film with a thickness of 2 micrometers at the time of drying was formed. Thereafter, a photomask was placed at a distance of 100 μm from the coating film, and ultraviolet rays were irradiated for 10 seconds only on the area where the transparent protective layer was to be formed using a 2.0 kW ultra high pressure mercury lamp by a proximity aligner. Next, the glass substrate on which the coating film was formed was immersed in a 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 ° C.) for 1 minute and alkali-developed to remove only the uncured portion of the coating film. And the heat processing for 30 minutes were performed at 200 degreeC to the glass substrate in which the coating film was formed, and the 1.0-micrometer-thick transparent protective layer was formed.
Thus, a color filter substrate according to Example 1 was produced.

(Evaluation of color filter substrate)
As an evaluation of the color filter substrate, a height profile was measured before and after the formation of the transparent protective layer. The height profile was measured with a stylus-type film thickness meter (P-15, manufactured by KLA Co., Ltd.). FIG. 8 is a diagram illustrating a height profile around the multilayer pillar of the color filter according to the first embodiment.

[Comparative Example 1]
(Formation of light shielding part and colored layer)
A black matrix was formed in the same manner as in Example 1. Next, a stripe-shaped first colored layer made of a red colored layer having a width of 155 μm so as to cover the opening of the black matrix was formed. Next, a second colored layer for display composed of a green colored layer having a width of 155 μm so as to cover the opening of the black matrix, and a cone having a lower bottom diameter of 55 μm on the first colored layer on the black matrix A trapezoidal column second colored layer was formed. Next, a frustoconical shape having a lower base diameter of 15 μm is formed on the stripe-shaped third colored layer for display consisting of a green colored layer having a width of 155 μm so as to cover the opening of the black matrix and the second colored layer for pillars A third colored layer for pillars was formed. Each colored layer was formed of the same material and method as in Example 1 except that the pattern was different.

(Formation of transparent protective layer)
A transparent protective layer was formed in the same manner as in Example 1.
Thus, a color filter substrate according to Comparative Example 1 was produced.

(Evaluation of color filter substrate)
As the evaluation of the color filter substrate, as in Example 1, the height profile in the vicinity of the laminated column before and after the formation of the transparent protective layer was measured. FIG. 9 is a diagram showing a height profile around the multilayer pillar of the color filter according to Comparative Example 1.

As shown in FIG. 8, in Example 1, in the display area, the transparent protective layer has a height difference within 0.2 to 0.3 μm and is almost flat without being affected by the stacked pillars. If such a color filter is used in a liquid crystal display device, the alignment of the liquid crystal in the display area is not disturbed by the transparent protective layer.
On the other hand, as shown in FIG. 9, in Comparative Example 1, the display region is strongly influenced by the stacked columns, and the transparent protective layer has a height difference of 1 μm or more and has an inclination. When such a color filter is used in a liquid crystal display device, the alignment of the liquid crystal in the display region is disturbed by the transparent protective layer, causing problems such as a decrease in contrast of the liquid crystal display device.

  The preferred embodiments of the color filter and the like according to the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. It will be apparent to those skilled in the art that various changes or modifications can be conceived within the scope of the technical idea disclosed in the present application, and these naturally belong to the technical scope of the present invention. Understood.

DESCRIPTION OF SYMBOLS 1 ......... Color filter 3 ......... Transparent substrate 5 ......... Black matrix 7R ......... First colored layer for display 7G ......... Second colored layer for display 7B ......... Third colored layer for display 9R ... ... 1st colored layer for pillars 9G ... 2nd colored layer for pillars 9B ... 3rd colored layer for pillars 11 ... ... Slit 13 ... ... Transparent protective layer 15 ... ... Laminated pillars 17 ... ... Laminated column 21 ......... Color filter 23R ......... First colored layer 23G ......... Second colored layer for display 23B ......... Third colored layer for display 25G ......... Second colored layer for column 25B ... ... Third colored layer for pillars

Claims (5)

A substrate,
A black matrix formed on the substrate and comprising a plurality of openings;
A first colored layer for display having an isolated pattern shape formed in the opening;
A first colored layer for pillars having the same color as the first colored layer for display formed on the black matrix;
A second colored layer for display having an isolated pattern shape formed in the opening;
A second colored layer for pillars formed on the first colored layer for pillars and having the same color as the second colored layer for display and having a bottom area smaller than the upper surface of the first colored layer for pillars;
A third colored layer for display having an isolated pattern shape formed in the opening;
A third colored layer for pillars formed on the second colored layer for pillars and having the same color as the third colored layer for display and having a bottom area smaller than the top surface of the second colored layer for pillars;
A stacked column formed by the first colored layer for columns, the second colored layer for columns, and the third colored layer for columns;
A transparent protective layer made of a transparent resin covering the black matrix, the colored layers, and the stacked pillars;
Comprising
The laminated pole is formed on the black matrix between the third colored layer the display to the end of the first colored layer the pillars, by the end of the third colored layer and the display 1μm~5μm The slit part is formed by leaving,
The color filters the transparent resin in the slit portion flows, the transparent protective layer on the third colored layer and the display is characterized by comprising a flat. The color filter according to claim 1 , wherein a bottom surface of the first colored layer for pillars is circular or polygonal. The bottom surface of the first colored layer for pillars is square,
3. The color filter according to claim 2 , wherein a square side of the bottom surface of the first colored layer for pillars is inclined with respect to a side forming the opening. A liquid crystal display device comprising a color filter according to any one of claims 1 to 3. Forming a black matrix on the substrate so as to have a plurality of openings;
A step (b) of forming a first colored layer for display having an isolated pattern shape covering the opening, and a first colored layer for columns having the same color as the first colored layer for display on the black matrix; ,
The second colored layer for display having an isolated pattern shape that covers the opening, and the same color as the second colored layer for display on the first colored layer for columns , and the area of the bottom surface is the second colored layer for columns. A step (c) of forming a second colored layer for pillars smaller than the upper surface of one colored layer ;
The third colored layer for display having an isolated pattern shape covering the opening, and the same color as the third colored layer for display on the second colored layer for pillars , and the area of the bottom surface is the same as that for the pillars. A step (d) of forming a third colored layer for pillars that is smaller than the upper surface of the two colored layers ;
A step (e) of forming a transparent protective layer made of a transparent resin that covers the stacked columns of the black matrix, the colored layers, the first colored layer for columns, the second colored layer for columns, and the third colored layer for columns; ,
Comprising
In the step (b), the first colored layer for pillars is formed on the black matrix between the openings where the third colored layer for display is to be formed, and the end of the third colored layer for display. away to form good Ri 1μm~5μm,
A slit portion formed by the first colored layer the pillar leaves Ri by the end of the third colored layer and the display, the transparent resin flows, the transparent protective layer on the third colored layer and the display A method for producing a color filter, characterized in that: