JP4998201B2 - Color filter and manufacturing method thereof - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter by which a transflective liquid crystal display device having color reproduction range equal to that of a transmissive display device, free from optical leakage and having high contrast is obtained. <P>SOLUTION: The color filter 1 has a multigap layer 3 and a transparent layer 4 on a transparent substrate 9 and a coloring layer 7 is applied thereon. The thickness of the transparent layer 4 is made thinner than that of the multigap layer 3 and a recessed part 6 is provided between the multigap layer 3 and the transparent layer 4. The coloring layer 7 has a taper part made smaller and a noneffective zone of the color filter 1 is made narrower compared to the conventional example by the recessed part 6. The liquid crystal display device using the color filter 1 is free from optical leakage and becomes the high contrast transflective liquid crystal display device. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

  The present invention relates to a color filter suitable for a liquid crystal display device.

  In order to realize outdoor visibility, a transflective liquid crystal display device is used. The transflective liquid crystal display device has a transmissive region and a reflective region in one pixel (see, for example, Patent Document 1).

  A conventional example of a transflective liquid crystal display device will be described with reference to FIG. FIG. 5 is a schematic cross-sectional view of a conventional transflective liquid crystal display device 100 in which elements such as electronic circuits and TFTs are omitted. The liquid crystal display device 100 is mainly formed by sequentially providing a color filter 101, a liquid crystal cell 108, a substrate 113, and a backlight unit 115.

  The color filter 101 is provided with a multi-gap layer 103 having a trapezoidal cross section on a transparent substrate 102 and a colored layer 107 coated thereon and patterned corresponding to the pixels. Further thereon, a transparent electrode 106 is provided. A black matrix 105 is provided between the colored layer 107 and the colored layer 107 of another color to improve the contrast. A transparent electrode 109 is provided on the transparent substrate 113 corresponding to the pixel, and a reflective electrode 111 is provided on a part of the transparent electrode 109. By applying a voltage between the transparent electrode 106, the transparent electrode 109, and the reflective electrode 111, a voltage is applied to the liquid crystal cell 108, and the orientation of the liquid crystal molecules 117 is controlled. A backlight unit 115 is provided on the back surface of the substrate 113. A polarizing plate 114 is provided between the backlight unit 115 and the substrate 113, and a polarizing plate 112 is provided on the substrate 102.

  The liquid crystal display device 100 includes a reflective region having the reflective electrode 111 and a transmissive region having no reflective electrode 111. In the transmissive region, light generated from the backlight unit 115 passes through the polarizing plate 114, the substrate 113, the transparent electrode 109, the liquid crystal cell 108, the transparent electrode 106, the colored layer 107, the substrate 102, and the polarizing plate 112, and the liquid crystal display device 100. To reach outside. In the reflective region, light incident from the outside of the liquid crystal display device 100 passes through the polarizing plate 112, the substrate 102, the multigap layer 103, the colored layer 107, the transparent electrode 106, and the liquid crystal cell 108 and is reflected by the reflective electrode 111. Then, the light passes through the liquid crystal cell 108, the transparent electrode 106, the colored layer 107, the multi-gap layer 103, the substrate 102, and the polarizing plate 112 and reaches the outside of the liquid crystal display device 100.

  In this way, by providing the reflective region and the transmissive region in one pixel, it is possible to observe the display by the reflective region in bright outdoors and the display by the transmissive region indoors, and the transflective liquid crystal display device can be used outdoors. Can be used indoors.

  In the reflection region, light passes through the colored layer 107 and the liquid crystal cell 108 twice. Therefore, the color reproduction range in the reflection region is made equal to that of the transmission type by making the thickness of the colored layer 107 and the liquid crystal cell 108 corresponding to the reflection region thinner than those in the transmission region. In particular, the liquid crystal cell is half the thickness of the transmission region (see, for example, Non-Patent Document 1).

JP 2004-102243 A Koichi Fujimori, 2 others, “High Transmission Advanced TFT-LCD Technology”, Sharp Technical Journal, Sharp Corporation, April 2003, Volume 85, p.34-37

  However, in the liquid crystal display device 100 shown in FIG. 5, the orientation of the liquid crystal molecules 117 in the liquid crystal cell 108 is greatly influenced by the shapes of the colored layer 107 and the transparent electrode 106. FIG. 6 is a diagram showing the color filter 101 and the liquid crystal molecules 117. Note that the transparent electrode 106 is actually about one-tenth to one-fifth the thickness of the colored layer 107 and has the same surface shape as the colored layer 107, and thus is not shown in FIG. As shown in FIG. 6, there are a tapered portion of the multi-gap layer 103 and a tapered portion of the colored layer 107 between the transmission region and the reflection region of the color filter 101, and light transmitted through these tapered portions is flat. The light is refracted in a direction different from the part. For this reason, these tapered regions do not contribute to either transmission or reflection display, and are called invalid regions. Further, the alignment of the liquid crystal molecules 117 is disturbed by the tapered portion of the colored layer 107. For this reason, in the ineffective region, the alignment of the liquid crystal molecules 117 is disturbed, light leakage occurs, and the contrast of the liquid crystal display device 100 decreases.

  The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a color filter that realizes a high-contrast liquid crystal display device free from light leakage.

In order to achieve the above-described object, the first invention is formed in a light-transmitting substrate, a multi-gap layer formed on the substrate, and a location on the substrate where the multi-gap layer is not formed. is a multi-gap layer than the film thickness is thin transparent layer, on the substrate, wherein the multi-gap layer and the formed on the transparent layer colored layer, have a, the transparent layer and the multi-gap layer and It is a color filter characterized by having a recessed part in between .

The second invention includes a step (a) of forming a multi-gap layer on a light-transmitting substrate, a step (b) of forming a transparent layer on the substrate layer, the transparent layer on the substrate, wherein the step of forming the colored layer on the multi-gap layer (c), have a, wherein in the step (b), between the transparent layer and the multi-gap layer, and forming a recess It is a manufacturing method of a color filter. Further, the multi-gap layer and the transparent layer may be formed in one step.

  According to the present invention, it is possible to provide a color filter that realizes a high-contrast liquid crystal display device free from light leakage.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

The color filter 1 according to the first embodiment will be described.
FIG. 1 is a diagram showing a color filter 1 and liquid crystal molecules 5. A multi-gap layer 3 and a transparent layer 4 are formed on a substrate 9, and a colored layer 7 is formed thereon.

  The multi-gap layer 3 is made of a transparent photosensitive resin. As the photosensitive resin, either a positive type or a negative type can be used. The positive resist material is not particularly limited, and examples thereof include a chemically amplified resist using a novolac resin as a base resin. The negative resist material is not particularly limited. For example, a chemically amplified resist based on a crosslinkable resin or a photocurable resist based on an acrylic resin, specifically polyvinylphenol, a crosslinker. And an ultraviolet curable resist containing an acrylic copolymer resin, an acrylic copolymer resin, a polyfunctional acrylate monomer, and a photopolymerization initiator. In the present embodiment, a case where a negative photosensitive resin is used will be described.

  The multi-gap layer 3 has a trapezoidal cross section. The multi-gap layer 3 makes it possible to equalize the path of light passing through the liquid crystal cell in the transmissive region and the reflective region, and to make the phase difference value constant. The cross section of the multi-gap layer 3 may be rectangular.

  The transparent layer 4 is made of a transparent photosensitive resin, and the same photosensitive resin that forms the multi-gap layer 3 can be used. The thickness of the transparent layer 4 is 0.5 μm to 2.0 μm, and is preferably 15% to 60% of the thickness of the multi-gap layer 3.

  The transparent layer 4 is thinner than the multi-gap layer 3 and forms a recess 6 between the transparent layer 4 and the multi-gap layer 3. Due to the recess 6, the tapered portion of the colored layer 7 applied on the multi-gap layer 3 and the transparent layer 4 is reduced, and the ineffective region is also reduced.

  The colored layer 7 is a colored layer used for a color filter, and is a photosensitive resin containing a pigment. The same photosensitive resin as that used for the multi-gap layer 3 can be used.

  The colored layer 7 has a transmissive region and a reflective region having a thickness smaller than that of the transmissive region. In the transmissive region, light passes through the colored layer 7 only once, but in the reflective region, light passes through the colored layer 7 twice. At this time, the thickness of the colored layer 7 in the reflection region is reduced and the color density is reduced so that the displayed color does not change in the reflection region and the transmission region.

  As the substrate 9, a substrate generally used for a color filter can be used. For example, inflexible transparent rigid materials such as borosilicate glass, aluminoborosilicate glass, alkali-free glass, quartz glass, synthetic quartz glass, soda lime glass, white sapphire, transparent resin film, optical resin film, etc. A transparent flexible material having the following flexibility can be used. As the flexible material, acrylic such as polymethyl methacrylate, polyamide, polyacetal, polybutylene terephthalate, polyethylene terephthalate, polyethylene naphthalate, triacetyl cellulose, syndiotactic polystyrene, polyphenylene sulfide, polyether ketone, polyether ether ketone, Examples include fluororesin, polyether nitrile, polycarbonate, modified polyphenylene ether, polycyclohexene, polynorbornene resin, polysulfone, polyethersulfone, polyarylate, polyamideimide, polyetherimide, thermoplastic polyimide, and the like. However, those made of general plastics can also be used. In particular, alkali-free glass is a material having a small coefficient of thermal expansion, and is excellent in dimensional stability and characteristics in high-temperature heat treatment, and is preferable.

  A manufacturing process of the color filter 1 according to the first embodiment will be described. FIG. 2 is a diagram illustrating a manufacturing process of the color filter 1.

  First, as shown in FIG. 2A, a photosensitive resin is applied on the substrate 9 to form a transparent resin layer 19. Examples of the method for applying the photosensitive resin include spin coating, casting, dipping, bar coating, blade coating, roll coating, gravure coating, flexographic printing, spray coating, and die coating. .

  Next, as shown in FIG. 2A, exposure is performed using a mask 11 having a transparent portion 13 and a light shielding portion 15. The transparent portion 13 transmits light 17 and the light shielding portion 15 does not transmit light 17. By using a negative photosensitive resin for the transparent resin layer 19, the resin cures only in the portion corresponding to the transparent portion 13 of the transparent resin layer 19, but the resin cures in the portion corresponding to the light shielding portion 15. Not proceed. Then, it is immersed in a developing solution and developed.

  Next, as shown in FIG. 2B, the multi-gap layer 3 is formed in the portion corresponding to the transparent portion 13, and nothing is formed in the portion corresponding to the light shielding portion 15.

  Next, as shown in FIG. 2C, a photosensitive resin is applied on the substrate 9 and the multi-gap layer 3 to form a transparent resin layer 27. Examples of the method for applying the photosensitive resin include the same method as that for the transparent resin layer 19.

  Next, as shown in FIG. 2C, exposure is performed using a mask 21 having a transparent portion 23 and a light shielding portion 25. The light shielding part 25 is made to correspond to the place which was the transparent part 13 of the mask 11 so that the transparent resin layer 27 on the multi-gap layer 3 is not exposed. Then, it is immersed in a developing solution and developed.

  Next, as illustrated in FIG. 2D, the transparent layer 4 is formed in a portion corresponding to the transparent portion 23. In addition, a recess 6 is formed between the multi-gap layer 3 and the transparent layer 4.

  Next, as shown in FIG. 2 (e), a photosensitive resin containing a pigment is applied on the substrate 9, the multi-gap layer 3, and the transparent layer 4 to form a colored layer 7, thereby producing the color filter 1. To do. The colored layer 7 can be formed by the same method as the application of the transparent resin layer 19.

  Note that the transparent layer 4 may be formed first by reversing the step of forming the multi-gap layer 3 and the step of forming the transparent layer 4.

  If necessary, a protective layer made of a transparent resin may be formed on the colored layer 7. By forming the protective layer, there is no step between the colored layers, leading to an improvement in contrast of the liquid crystal display device.

  According to the first embodiment, the concave portion 6 is provided between the multi-gap layer 3 and the transparent layer 4, and it is possible to prevent the tapered portion from being formed on the colored layer 7 coated thereon. One invalid area can be made smaller than the invalid area of the conventional color filter 101 shown in FIG.

  In addition, the color filter 1 according to the first embodiment has the multi-gap layer 3 in the reflective region, and the color layer 7 in the reflective region is colored in the transmissive region, similarly to the color filter 101 in the conventional example. Since it is thinner than the layer 7, a liquid crystal display device having high color reproducibility can be realized.

Next, a second embodiment will be described.
FIG. 3 is a diagram illustrating a manufacturing process of the color filter 1 according to the second embodiment. In the following embodiment, the same number is attached | subjected to the element which fulfill | performs the same aspect as the manufacturing process of the color filter 1 concerning 1st Embodiment, and the duplicate description is avoided.

  First, as shown in FIG. 3A, a photosensitive resin is applied on a substrate 9 to form a transparent resin layer 19 as in the first embodiment. Next, it exposes using the mask 29 which has the transparent part 31, the translucent part 33, and the light-shielding part 32. FIG. The transparent portion 31 transmits the light 17, the translucent portion 33 partially transmits the light 17, and the light shielding portion 32 does not transmit the light 17.

  Next, as shown in FIG. 3B, by using a negative photosensitive resin for the transparent resin layer 19, the portion of the transparent resin layer 19 corresponding to the transparent portion 31 corresponds to the translucent portion 33. In the development, the multi-gap layer 3 is formed in the portion corresponding to the transparent portion 31 and the portion corresponding to the semi-transparent portion 33 is thinner than the multi-gap layer 3 during development. A transparent layer 4 is formed. Further, in the portion corresponding to the light shielding portion 32, the photosensitive resin is not cured and the photosensitive resin is removed during development, so that the concave portion 6 is formed.

  Next, as shown in FIG. 3C, a photosensitive resin containing a pigment is applied on the substrate 9, the multi-gap layer 3, and the transparent layer 4 to form a colored layer 7, thereby producing the color filter 1. To do. The colored layer 7 can be formed by the same method as the application of the transparent resin layer 19.

  The color filter 1 manufactured in the second embodiment has the same structure as the color filter 1 manufactured in the first embodiment except for the manufacturing process.

  If necessary, a protective layer made of a transparent resin may be formed on the colored layer 7. By forming the protective layer, there is no step between the colored layers, leading to an improvement in contrast of the liquid crystal display device.

  The mask 29 used in FIG. 3A may be a mask having a transparent portion 31 and a semi-transparent portion 33, and the mask 29a and the mask 29b shown in FIG. 4 can be used.

  As the masks 11 and 21, a mask having a light shielding film 39 that has been subjected to predetermined patterning on a substrate 35 can be used.

  FIG. 4A shows the mask 29a. The mask 29 a has a translucent film 37 and a light shielding film 39 on a transparent substrate 35. The part having no film on the substrate 35 is the transparent part 31, the part having only the semi-transparent film 37 on the substrate 35 is the semi-transparent part 33, and the part having the light-shielding film 39 on the substrate 35 is the light-shielding part. 32.

  As the transparent substrate used for the substrate 35, the substrate used for the substrate 9 can be used.

  The light shielding film 39 substantially does not transmit exposure light, and the average transmittance at the exposure wavelength is preferably 0.1% or less, and a light shielding film generally used for a photomask can be used. Examples of the film include chromium, chromium oxide, chromium nitride, chromium oxynitride, molybdenum silicide, tantalum, aluminum, silicon, silicon oxide, and silicon oxynitride. Of these, chromium-based films such as chromium, chromium oxide, chromium nitride, and chromium oxynitride are preferably used. This is because such a chromium-based film has the most use record and is preferable in terms of cost and quality. This chromium-based film may be a single layer or may be a laminate of two or more layers.

  The thickness of the light shielding film 39 is not particularly limited. For example, in the case of a chromium film, it can be about 50 nm to 150 nm.

  As a film forming method of the light shielding film 39, for example, a physical vapor deposition method (PVD) such as a sputtering method, an ion plating method, or a vacuum vapor deposition method is used.

  The translucent film 37 is not particularly limited, and examples thereof include films of oxides such as chromium, molybdenum silicide, tantalum, aluminum, and silicon, nitrides, and carbides. From the advantage that the semi-transparent film 37 and the light-shielding film 39 can be patterned by the same etching equipment and process, the semi-transparent film 37 is preferably a film made of the same material as the light-shielding film 39. As described above, since the light-shielding film 39 is preferably a chromium-based film, the translucent film 37 is also preferably a chromium-based film such as chromium oxide, chromium nitride, chromium oxynitride, or chromium oxynitride carbide. In addition, these chromium-based films are excellent in mechanical strength, and are stable without photophobic properties, so that they can be used as a mask that can withstand long-term use.

In particular, the translucent film 37 is preferably a chromium oxynitride chromium carbide (Cr _x O _y N _z C _w ) film. In this case, it is preferable that w is <0.01, and the element ratio of Cr, O, and N is Cr: 30 to 60%, O: 30 to 70%, and N: 0 to 40%. It is preferable that it is -45%, O: 40-60%, N: 2-20%.

  The translucent film 37 may be a single layer or may be composed of a plurality of layers. Thus, a multi-tone mask having a plurality of transmittances can be obtained.

  The film thickness of the translucent film 37 can be, for example, about 5 to 50 nm in the case of a chromium film, and about 5 nm to 150 nm in the case of a chromium oxide film. Since the transmissivity of the translucent film 37 varies depending on the film thickness, the desired transmissivity can be obtained by controlling the film thickness. Further, when the translucent film 37 contains oxygen, nitrogen, carbon, or the like, the transmittance varies depending on the composition. Therefore, the desired transmittance can be realized by simultaneously controlling the film thickness and the composition.

  As a film forming method of the translucent film 37, for example, a physical vapor deposition method (PVD) such as a sputtering method, an ion plating method, or a vacuum vapor deposition method is used. For example, when forming a chromium oxynitride chromium carbide film using a sputtering method, a reactive gas sputtering method using a Cr target by introducing a carrier gas such as Ar gas, oxygen (carbonic acid) gas, or nitrogen gas into the reactor. Thus, a chromium oxynitride carbide carbide film can be formed. At this time, the composition of the chromium oxynitride carbide film can be controlled by controlling the flow rates of Ar gas, oxygen (carbonic acid) gas, and nitrogen gas.

  FIG. 4B shows the mask 29b. The mask 29 b has a light shielding film 39 on a transparent substrate 35, and a part of the light shielding film 39 is a slit portion 41. A portion having no film on the substrate 35 is provided in the transparent portion 31, a light shielding film 39 is provided on the substrate 35, a portion where the slit portion 41 is provided is provided in the translucent portion 33, and the slit portion 41 is provided. The portion that is not provided becomes the light shielding portion 32.

  The slit portion 41 is provided with a slit having a thickness less than the resolution limit of the exposure machine. Since this slit is not larger than the resolution limit, the slit itself does not form an image on the photosensitive resin layer, and the exposure light according to the size is transmitted to the area including the surrounding non-opening area. . Therefore, the mask 29b functions as if there is a translucent film in the slit portion 41. Moreover, the transmittance | permeability in the slit part 41 can be changed by changing the number and thickness of a slit. Further, not a slit but a dot-like hole may be provided.

  In the second embodiment, the multi-gap layer 3 and the transparent layer 4 are produced simultaneously. Therefore, compared with the first embodiment in which the multi-gap layer 3 and the transparent layer 4 are formed in two steps, the number of steps can be reduced and the production cost of the color filter 1 can be reduced. is there.

  In the second embodiment, the produced color filter 1 has the same structure as that of the first embodiment and has the same effect as that of the first embodiment.

  Hereinafter, the present invention will be specifically described using examples and comparative examples. This will be described in more detail using examples.

  As the substrate, a glass substrate (Corning 1737 glass) having a size of 300 mm × 400 mm and a thickness of 0.7 mm was prepared. After this substrate was washed according to a conventional method, a chromium thin film (thickness: 1000 mm) was formed on the entire surface of one side of the substrate by sputtering. On this chromium thin film, a positive photosensitive resist (OFPR-8 manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied, and exposed and developed through a predetermined mask to form a resist pattern. Next, using this resist pattern as a mask, the chromium thin film was etched to form a black matrix having a line width of 20 μm and a pitch of 100 μm.

  Next, a negative photosensitive resin (polymer I) for a multi-gap layer, a negative photosensitive resin for a red pattern, a negative photosensitive resin for a green pattern, and a negative photosensitive resin for a blue pattern were prepared. .

<Polymer I>
・ Methyl methacrylate-styrene-acrylic acid copolymer 32 parts by weight ・ Epoxy resin: Epicoat 180s70 (Japan Epoxy Resin Co., Ltd.) 18 parts by weight ・ Dipentaerythritol pentaacrylate 42 parts by weight ・ Ilquagua 907 (Ciba Specialty Chemicals) 8 parts by weight) 300 parts by weight of propylene glycol monomethyl ether acetate

<Negative photosensitive resin for red pattern>
Red pigment (Ciba Specialty Chemicals Chromophthal Red A2B) 4.8 parts by weight Yellow pigment (BASF Pariotor Yellow D1819) 1.2 parts by weight Dispersant (Bicchemy Disperbic 161) 3 1.0 part by weight / monomer (SR399 manufactured by Sartomer) 4.0 parts by weight Polymer I 5.0 parts by weight initiator (Irgacure 907 manufactured by Ciba Specialty Chemicals) 1.4 parts by weight initiator (2, 2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-biimidazole) 0.6 part by weight / solvent (propylene glycol monomethyl ether acetate) 80.0 parts by weight

<Negative photosensitive resin for green pattern>
Green pigment (Avisia Monastral Green 9Y-C) 4.2 parts by weight Yellow pigment (BASF Pariotor Yellow D1819) 1.8 parts by weight Dispersant (Bicchemy Disperbic 161) 3.0 Parts by weight / monomer (SR399, manufactured by Sartomer) 4.0 parts by weight, polymer I 5.0 parts by weight, initiator (Irgacure 907, manufactured by Ciba Specialty Chemicals) 1.4 parts by weight, initiator (2,2 ′ -Bis (o-chlorophenyl) -4,5,4 ', 5'-tetraphenyl-1,2'-biimidazole) 0.6 parts by weight / solvent (propylene glycol monomethyl ether acetate) 80.0 parts by weight

<Negative photosensitive resin for blue pattern>
Blue pigment (BASF Heliogen Blue L6700F) 6.0 parts by weight Pigment derivative (Abyssia Solsperse 5000) 0.6 parts by weight Dispersant (Bic Chemie Dispersic 161) 2.4 parts by weight Monomer (SR399, manufactured by Sartomer) 4.0 parts by weight, Polymer I, 5.0 parts by weight, initiator (Irgacure 907, manufactured by Ciba Specialty Chemicals) 1.4 parts by weight, initiator (2,2'-bis (o -Chlorophenyl) -4,5,4 ', 5'-tetraphenyl-1,2'-biimidazole) 0.6 parts by weight / solvent (propylene glycol monomethyl ether acetate) 80.0 parts by weight

Next, polymer I was applied onto the glass substrate by spin coating so as to cover the black matrix, and prebaked at 100 ° C. for 3 minutes to form a transparent resin layer. Then, it exposed with the exposure amount of 100 mJ / cm < ² > and the exposure gap of 150 micrometers through the photomask.

  Next, development was performed using a 0.05 wt% potassium hydroxide aqueous solution, and baking was performed in an oven at 200 ° C. for 30 minutes. A multi-gap layer having a thickness of 4.5 μm was formed on the glass substrate.

Next, polymer I was applied onto the glass substrate by spin coating so as to cover the black matrix, and prebaked at 100 ° C. for 3 minutes to form a transparent resin layer. Then, it exposed with the exposure amount of 100 mJ / cm < ² > and the exposure gap of 150 micrometers through the photomask.

  Next, development was performed using a 0.05 wt% potassium hydroxide aqueous solution, and baking was performed in an oven at 200 ° C. for 30 minutes. A transparent layer having a thickness of 1.0 μm was formed on the glass substrate.

Next, a negative photosensitive resin for red pattern is applied on the substrate, multi-gap layer, and transparent layer by spin coating, pre-baked at 100 ° C. for 3 minutes, and the exposure amount is 100 mJ through a photomask. / Cm ² , and an exposure gap of 150 μm. Next, after development using a 0.05 wt% aqueous potassium hydroxide solution, baking was performed in an oven at 200 ° C. for 30 minutes to form a colored layer.

  Next, for the negative photosensitive resin for the green pattern and the negative photosensitive resin for the blue pattern, a colored layer was similarly formed to form a color filter.

[Comparative example]
A color filter was produced in the same manner as in Example except that the process of forming the transparent layer was omitted.

[Evaluation]
When the cross-sectional shape was evaluated, the width of the invalid region was 12 μm in the comparative example, whereas the width of the invalid region was narrowed to 5 μm in the example. The contrast value of the color filter was 1410 in the comparative example, but 2260 in the example, confirming the improvement in contrast.

  The preferred embodiments of the color filter according to the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. It will be apparent to those skilled in the art that various changes and modifications can be made within the scope of the technical idea disclosed in the present application, and these are naturally within the technical scope of the present invention. Understood.

1 is a diagram showing a color filter 1 and liquid crystal molecules 5 according to a first embodiment. The figure which shows the manufacturing process of the color filter 1 which concerns on 1st Embodiment. The figure which shows the manufacturing process of the color filter 1 which concerns on 2nd Embodiment. The figure which shows the masks 29a and 29b which have a translucent part. The figure which shows the liquid crystal display device 100 which concerns on a prior art example. The figure which shows the color filter 101 and liquid crystal molecule 117 which concern on a prior art example.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ......... Color filter 3 ......... Multi-gap layer 4 ......... Transparent layer 5 ......... Liquid crystal molecule 6 ......... Recess 7 ......... Colored layer 9 ......... Substrate 11 ......... Mask 13 ......... Transparent portion 15 ............ Light-shielding portion 17 ............ Light 19 ............ Transparent resin layer 21 ............ Mask 23 ............ Transparent portion 25 ............ Light-shielding portion 27 ............ Transparent resin layer 29 ............ Mask 31 ......... Transparent part 32 ......... Light-shielding part 33 ......... Semi-transparent part 35 ......... Substrate 37 ......... Semi-transparent film 39 ......... Light-shielding film 41 ......... Slit part 100 ......... Liquid crystal display device 101 ......... Color filter 102 ... ... Substrate 103 ... ... Multi-gap layer 105 ... ... Black matrix 106 ... ... Transparent electrode 107 ... ... Colored layer 108 ... ... Liquid crystal cell 109 ... ... Transparent electrode 111 ... ... Reflective electrode 112 ... Polarizing plate 113 ...... substrate 114 ......... polarizer 115 ......... backlight unit 117 ......... liquid crystal molecules

Claims (3)

A light transmissive substrate;
A multi-gap layer formed on the substrate;
A transparent layer having a thickness smaller than that of the multi-gap layer formed on the substrate where the multi-gap layer is not formed;
On the substrate, and the multi-gap layer and the formed on the transparent layer color layer, was closed,
A color filter having a recess between the multi-gap layer and the transparent layer . A step (a) of forming a multi-gap layer on a light-transmitting substrate;
Forming a transparent layer on the substrate layer (b);
On the substrate, the transparent layer, and (c) forming a colored layer on the multi-gap layer, have a,
In the step (b), a recess is formed between the multi-gap layer and the transparent layer . A step (d) of forming a multi-gap layer and a transparent layer on a light-transmitting substrate;
On the substrate, the transparent layer, and (e) forming a colored layer on the multi-gap layer, have a,
In the step (d), a recess is formed between the multi-gap layer and the transparent layer .

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