JP6331250B2 - Black matrix substrate manufacturing method, color filter manufacturing method, black matrix substrate, color filter, liquid crystal display device, and organic electroluminescence display device. - Google Patents

Description

  The present invention relates to a manufacturing method of a black matrix substrate, a manufacturing method of a color filter, and the like used for a liquid crystal display device and an organic electroluminescence display device.

  A general color filter has a large number of pixels, and each pixel has a colored layer of each color. The colored layers for each color are formed in the openings of the black matrix. The black matrix is provided to prevent light leakage from the backlight and color mixing of each colored layer.

  In recent years, high resolution has advanced in both liquid crystal display devices and organic electroluminescence display devices. For example, in smartphones, products with a resolution of 150-200 ppi (pixel per inch) around 2009-2010, but products with a resolution of 326 ppi have appeared in 2011, and the resolution will continue to advance. It is believed that. Compared with the current HDTV (horizontal number of pixels 1920 × vertical 1080), higher definition 4K2K (number of pixels horizontal 4000 × vertical 2000) and 8K4K (number of pixels horizontal 8000 × vertical 4000) are possible. Stationary televisions have been announced, and even higher resolutions are required for stationary televisions.

  As the resolution of the display device increases, the size of one pixel decreases, and it is necessary to form a black matrix with a small aperture size. However, when the black matrix is formed using the black photosensitive resin composition using photolithography, the line width of the obtained black matrix becomes smaller than the planned pattern as the pattern interval becomes shorter. The problem of getting thicker occurred. This problem will be described with reference to FIG. FIGS. 12A to 12C are diagrams illustrating a black matrix forming process when the pattern interval is short. First, as shown in FIG. 12A, a black photosensitive resin composition 105 is applied on the substrate 103. Next, as shown in FIG. 12B, exposure was performed with exposure light 117 through a photomask 111 having a narrow pattern interval, and a photosensitive black photosensitive resin composition 107 was obtained. However, in FIG. 12C, when development and post-baking are performed, the black obtained by development and post-baking with respect to the width A of the black photosensitive resin composition 107 exposed through the photomask 111 is exposed. The line width B of the matrix 109 is increased.

  The reason why this phenomenon occurs will be described with reference to FIGS. FIGS. 13A to 13C are diagrams illustrating a black matrix forming process when the pattern interval is sufficiently wide. First, as shown in FIG. 13A, the black photosensitive resin composition 105 is exposed through a photomask 121. Next, as shown in FIG. 13B, the black photosensitive resin composition 105 is developed. In the photomask 121, since the transmission parts without the light shielding film 125 are sufficiently separated from each other, the interval D between the exposed black photosensitive resin compositions 107 is sufficiently large. Therefore, a new developer 119 is always brought into contact with the unexposed black photosensitive resin composition 105 between the exposed black photosensitive resin compositions 107 and is easily dissolved. Therefore, as shown in FIG. 13C, the line width C of the black matrix 129 is substantially the same as the width A of the exposed black photosensitive resin composition 107, and the black matrix 129 is formed with a predetermined line width. be able to.

  On the other hand, FIGS. 14A to 14C are diagrams illustrating a black matrix forming process when the pattern interval is narrow. As shown in FIG. 14A, the black photosensitive resin composition 105 is exposed through a photomask 111. In FIG. 14B, the black photosensitive resin composition 105 is developed. In the photomask 111, the interval between the transmissive portions without the light shielding film 115 is narrow, and thus the interval E between the exposed black photosensitive resin compositions 107 is small. Therefore, it is not easy for the developer 119 to dissolve the unexposed black photosensitive resin composition 105 between the exposed black photosensitive resin compositions 107. Therefore, when the same development conditions as in FIG. 13 are adopted, the black photosensitive resin composition 105 remains around the exposed black photosensitive resin composition 107 after the development step, as shown in FIG. Thus, the line width B of the black matrix 109 obtained by post-baking is larger than the width A of the exposed black photosensitive resin composition 107, and the black matrix 109 can be formed with a predetermined thickness. Can not.

  When the inventors actually formed a black matrix of a linear pattern having a plurality of parallel lines under the same conditions while changing the line spacing using photolithography, the resolution was as shown in FIG. , The narrower the opening width and the shorter the distance between patterns, the larger the line width.

  As described above, as shown in FIG. 12C, when a black matrix used for a high-resolution display device is manufactured, if the pattern interval is shortened, the line width of the black matrix 109 becomes thicker than before. .

  Such a problem is more serious at the corners (also referred to as corners) of the grid-like black matrix. That is, as shown in FIG. 16A, when a black matrix 131 having a sufficiently large rectangular size F of the rectangular opening 133 is formed using photolithography, the line width of the black matrix 131 G is a desired thickness, and the corners of the opening 133 are also clear. However, when the black matrix 141 having a small size H of the rectangular opening 143 as shown in FIG. 16B is formed by photolithography, the line width I of the black matrix 141 is formed. It becomes thicker than the desired thickness, and the corners of the opening 143 are also rounded. Therefore, the black matrix 141 has a lower aperture ratio, which is the ratio of the openings in the substrate, than the black matrix 131. If a black matrix substrate having a low aperture ratio is used, a display device with inferior screen brightness can be obtained.

  In order to solve this problem and obtain a high-definition black matrix, it is conceivable to change the photolithography conditions such as increasing the development time or changing the material of the photosensitive resin composition. (For example, refer to Patent Document 1). That is, even if the interval between the patterns is short, if the development time in FIG. 14B is set longer than the conventional one, development proceeds sufficiently, and the black photosensitive resin composition 107 in which the line width B of the resulting black matrix 109 is also exposed. There is a possibility of approaching the width A. In addition, by changing the material of the photosensitive resin composition, the type of developer, etc., development can be sufficiently achieved in a short time, and a black matrix can be obtained with a planned line width even if the distance between patterns is short. there is a possibility.

JP 2011-122151 A

  However, when the development time is lengthened, there is a problem that the production amount of the black matrix substrate per unit time is reduced, that is, the throughput is lowered. In addition, when the development time is lengthened, there is a problem that the linearity of the black matrix is deteriorated in addition to a decrease in throughput. Note that the linearity of the black matrix means that the black matrix has a smooth outline. When the linearity is bad, a part of the outline of the black matrix becomes jagged and rough.

  In addition, when changing the photosensitive resin composition, it is necessary to change the material to be added and the developer, and to develop a device suitable for the change, and there is a problem that it takes development cost and development time.

  The present invention has been made in view of the above-described problems, and an object of the present invention is to obtain a high-definition black matrix substrate using the current manufacturing conditions of the black matrix.

  As a result of intensive studies to achieve the above-described object, the present inventors have formed a black matrix in a plurality of times even if the current manufacturing conditions of the black matrix are used. It has been found that a black matrix substrate having a black matrix with a narrow line width can be obtained even if is short. The present invention has been made based on this finding.

  The present invention will be further described with reference to FIG. If the black matrix 151 is to be created with a design pattern having a short pattern interval as shown in FIG. 17A, the line width as in the black matrix 109 in the conventional manufacturing method as shown in FIG. Will become thicker. Therefore, in the present invention, as shown in FIG. 17C, the black matrix formation step is repeated twice to form the first black matrix 153a, and then the second black matrix 153b is formed. In each black matrix forming step, the interval between the first black matrices 153a and the interval between the second black matrices 153b are widened, so that the line width of the black matrix is reduced. If the line width does not become sufficiently narrow even when it is formed in two steps, as shown in FIG. 17 (d), the black matrix forming step is further divided and repeated a plurality of times to reduce the line width of the black matrix. Can be thinned.

The present invention has the following features.
(1) A step of applying a first black photosensitive resin composition to a substrate, a step of exposing the first black photosensitive resin composition through a first photomask, and the first black photosensitive resin A step of developing the photosensitive resin composition, a step of post-baking the first black photosensitive resin composition to form a first black matrix, and on the substrate and the first black matrix, A step of applying a second black photosensitive resin composition, a step of exposing the second black photosensitive resin composition through a second photomask, and the second black photosensitive resin composition. A step of developing, and a step of post-baking the second black photosensitive resin composition to form a second black matrix, and in a plane, the line segment of the first black matrix and the Of the second black matrix Black matrix substrate manufacturing method characterized by characterized by producing a black matrix substrate having a cross-shaped section by minute.
(2) A step of applying a first black photosensitive resin composition to a substrate, a step of exposing the first black photosensitive resin composition through a first photomask, and the first black photosensitive resin. A step of developing the photosensitive resin composition, a step of post-baking the first black photosensitive resin composition to form a first black matrix, and on the substrate and the first black matrix, A step of applying a second black photosensitive resin composition, a step of exposing the second black photosensitive resin composition through a second photomask, and the second black photosensitive resin composition. A step of developing, and a step of post-baking the second black photosensitive resin composition to form a second black matrix, wherein the first black matrix is formed when the first black matrix is formed. Photomask and the second mask Black matrix substrate manufacturing method, wherein said second photo mask for forming the click matrix are identical.
(3) A step of applying a first black photosensitive resin composition to a substrate, a step of exposing the first black photosensitive resin composition through a first photomask, and the first black photosensitive resin. A step of developing the photosensitive resin composition, a step of post-baking the first black photosensitive resin composition to form a first black matrix, and on the substrate and the first black matrix, A step of applying a second black photosensitive resin composition, a step of exposing the second black photosensitive resin composition through a second photomask, and the second black photosensitive resin composition. A step of developing and a step of post-baking the second black photosensitive resin composition to form a second black matrix, wherein the pattern of the first photomask and the second photomask are formed. Both mask pattern and line Method of manufacturing a black matrix substrate, which is a pattern.
(4) A step of applying a first black photosensitive resin composition to a substrate, a step of exposing the first black photosensitive resin composition through a first photomask, and the first black photosensitive resin. A step of developing the photosensitive resin composition, a step of post-baking the first black photosensitive resin composition to form a first black matrix, and on the substrate and the first black matrix, A step of applying a second black photosensitive resin composition, a step of exposing the second black photosensitive resin composition through a second photomask, and the second black photosensitive resin composition. A step of developing, and a step of post-baking the second black photosensitive resin composition to form a second black matrix, the first black matrix and the second black matrix, Formed by overlapping Black matrix substrate manufacturing method characterized in that the height of the place, characterized in that for producing the first black matrix or high black matrix substrate than the second black matrix.
(5) A step of applying a first black photosensitive resin composition to a substrate, a step of exposing the first black photosensitive resin composition through a first photomask, and the first black photosensitive resin. A step of developing the photosensitive resin composition, a step of post-baking the first black photosensitive resin composition to form a first black matrix, and on the substrate and the first black matrix, A step of applying a second black photosensitive resin composition, a step of exposing the second black photosensitive resin composition through a second photomask, and the second black photosensitive resin composition. A step of developing, a step of post-baking the second black photosensitive resin composition to form a second black matrix, a step of forming the first black matrix and the second black matrix on the substrate. Add a colored layer to the opening And manufacturing a color filter having a cross-shaped portion formed by a line segment of the first black matrix and a line segment of the second black matrix in a plane. Manufacturing method.
(6) A step of applying a first black photosensitive resin composition to a substrate, a step of exposing the first black photosensitive resin composition through a first photomask, and the first black photosensitive resin. A step of developing the photosensitive resin composition, a step of post-baking the first black photosensitive resin composition to form a first black matrix, and on the substrate and the first black matrix, A step of applying a second black photosensitive resin composition, a step of exposing the second black photosensitive resin composition through a second photomask, and the second black photosensitive resin composition. A step of developing, a step of post-baking the second black photosensitive resin composition to form a second black matrix, a step of forming the first black matrix and the second black matrix on the substrate. Add a colored layer to the opening The first photomask when forming the first black matrix and the second photomask when forming the second black matrix are the same A method for producing a color filter characterized by the above.
(7) A step of applying a first black photosensitive resin composition to a substrate, a step of exposing the first black photosensitive resin composition through a first photomask, and the first black photosensitive resin. A step of developing the photosensitive resin composition, a step of post-baking the first black photosensitive resin composition to form a first black matrix, and on the substrate and the first black matrix, A step of applying a second black photosensitive resin composition, a step of exposing the second black photosensitive resin composition through a second photomask, and the second black photosensitive resin composition. A step of developing, a step of post-baking the second black photosensitive resin composition to form a second black matrix, a step of forming the first black matrix and the second black matrix on the substrate. Add a colored layer to the opening It includes a step of forming, a method of manufacturing a color filter, wherein the the pattern of said pattern of the first photomask second photomask are both linear pattern.
(8) A step of applying a first black photosensitive resin composition to a substrate, a step of exposing the first black photosensitive resin composition through a first photomask, and the first black photosensitive resin. A step of developing the photosensitive resin composition, a step of post-baking the first black photosensitive resin composition to form a first black matrix, and on the substrate and the first black matrix, A step of applying a second black photosensitive resin composition, a step of exposing the second black photosensitive resin composition through a second photomask, and the second black photosensitive resin composition. A step of developing, a step of post-baking the second black photosensitive resin composition to form a second black matrix, a step of forming the first black matrix and the second black matrix on the substrate. Add a colored layer to the opening And a height of a portion formed by overlapping the first black matrix and the second black matrix is higher than that of the first black matrix or the second black matrix. A method for producing a color filter, comprising producing a high color filter.
(9) A step of applying a first black photosensitive resin composition to a substrate, a step of exposing the first black photosensitive resin composition through a first photomask, and the first black photosensitive resin. A step of developing the photosensitive resin composition, a step of post-baking the first black photosensitive resin composition to form a first black matrix, and a colored layer at an opening of the first black matrix. Forming a second black photosensitive resin composition on the substrate, the first black matrix, and the colored layer; and forming the second black photosensitive resin composition on the second layer. A step of exposing through the photomask, a step of developing the second black photosensitive resin composition, and post-baking the second black photosensitive resin composition to form a second black matrix Having a process of Method of manufacturing a color filter to be butterflies.
(10) A substrate, a first black matrix formed on the substrate, and a second black matrix formed on the substrate so as to divide an opening of the first black matrix. And a black matrix substrate having a cross-shaped portion formed by a line segment of the first black matrix and a line segment of the second black matrix in a plane.
(11) A substrate, a first black matrix formed on the substrate, and a second black matrix formed on the substrate so as to divide an opening of the first black matrix. And a black matrix substrate, wherein the first black matrix and the second black matrix have the same pattern.
(12) A substrate, a first black matrix formed on the substrate, and a second black matrix formed on the substrate so as to divide an opening of the first black matrix. And a black matrix substrate characterized in that both the first black matrix pattern and the second black matrix pattern are linear patterns.
(13) A substrate, a first black matrix formed on the substrate, and a second black matrix formed on the substrate so as to divide an opening of the first black matrix. And the height of a portion formed by overlapping the first black matrix and the second black matrix is higher than that of the first black matrix or the second black matrix. Black matrix substrate.
(14) A substrate, a first black matrix formed on the substrate, a second black matrix formed on the substrate so as to divide an opening of the first black matrix, and a substrate The first black matrix and a colored layer formed in the opening of the second black matrix are arranged on the plane, and in a plane, the line segment of the first black matrix and the second black matrix And a second black matrix covering the colored layer. The color filter according to claim 1, wherein the second black matrix covers the colored layer.
(15) A substrate, a first black matrix formed on the substrate, a second black matrix formed on the substrate so as to divide an opening of the first black matrix, and a substrate Further, the first black matrix and a colored layer formed in the opening of the second black matrix are provided, and the patterns of the first black matrix and the second black matrix are the same. A color filter characterized by that.
(16) A substrate, a first black matrix formed on the substrate, a second black matrix formed on the substrate so as to divide an opening of the first black matrix, and a substrate And a colored layer formed in an opening of the first black matrix and the second black matrix, wherein the first black matrix pattern and the second black matrix pattern are both Ri linear pattern der, the color filter of the first black matrix and the second black matrix characterized that you cross in plan.
(17) A substrate, a first black matrix formed on the substrate, a second black matrix formed on the substrate so as to divide an opening of the first black matrix, and a substrate The first black matrix and a colored layer formed in the opening of the second black matrix are formed on the first black matrix and the second black matrix. A color filter characterized in that the height of the spot is higher than that of the first black matrix or the second black matrix.
(18) The color filter according to any one of (14) to (17), a liquid crystal drive substrate facing the color filter, and a liquid crystal layer sealed between the color filter and the liquid crystal drive substrate And a liquid crystal display device.
(19) An organic electroluminescence light source having an organic electroluminescence layer on a substrate, and the color filter according to any one of (14) to (17) provided on the observation side of the organic EL light source An organic electroluminescence display device.

  According to the present invention, a high-definition black matrix substrate can be obtained using the current black matrix manufacturing conditions.

(A)-(f) The figure which shows the manufacturing method of the black matrix substrate 10 which concerns on 1st Embodiment. (A)-(c) The figure which shows the manufacturing method of the color filter 27 which concerns on 1st Embodiment. (A)-(c) The figure which shows the other manufacturing method of the color filter 27 which concerns on 1st Embodiment. FIG. 5 is a view showing another example of the black matrix substrate according to the first embodiment. (A) X-X 'sectional drawing of FIG.2 (b), (b) Y-Y' sectional drawing of FIG. (A)-(d) The figure which shows the manufacturing method of the color filter 37 which concerns on 2nd Embodiment. (A)-(d) The figure which shows the other manufacturing method of the color filter 37 which concerns on 2nd Embodiment. The figure which shows the other example of the black matrix board | substrate which concerns on 2nd Embodiment. (A)-(c) The figure which shows the manufacturing method of the color filter 47 which concerns on 3rd Embodiment. (A)-(c) The figure which shows the other manufacturing method of the color filter 47 which concerns on 3rd Embodiment. The figure which shows the other example of the black matrix board | substrate which concerns on 3rd Embodiment. (A)-(c) The figure explaining the formation process of a black matrix in case the space | interval of a pattern is short by the conventional method. (A)-(c) The figure explaining the formation process of a black matrix in case the space | interval of a pattern is wide enough by the conventional method. (A)-(c) The figure explaining the formation process of a black matrix in case the space | interval of a pattern is short by the conventional method. The figure which shows the relationship between the resolution and line | wire width at the time of forming a linear pattern on the same conditions. (A) The figure which shows the black matrix 131 which has the large opening part 133, (b) The figure which shows the black matrix 141 which has the small opening part 143 formed by the conventional method. (A) a black matrix design pattern, (b) a black matrix 109 formed by a conventional manufacturing method, (c) a black matrix formed by a manufacturing method according to the present invention, and (d) a manufacturing method according to the present invention. Another example of the formed black matrix.

(Method for Manufacturing Black Matrix Substrate According to First Embodiment)
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is a view showing a method for manufacturing the black matrix substrate 10 according to the first embodiment.
FIG. 1A shows a step of applying the first black photosensitive resin composition 5 a to the substrate 3.
FIG. 1B shows a step of exposing the first black photosensitive resin composition 5a on the substrate 3 through the first photomask 11a.
FIG. 1C shows a step of developing the first black photosensitive resin composition 5a and a step of forming the first black matrix 9a by post-baking the first black photosensitive resin composition 5a. Show.
FIG. 1D shows a process of applying the second black photosensitive resin composition 5b on the substrate 3 and the first black matrix 9a.
FIG.1 (e) shows the process of exposing the 2nd black photosensitive resin composition 5b through the 2nd photomask 11b.
FIG. 1 (f) shows a step of developing the second black photosensitive resin composition 5b and a step of post-baking the second black photosensitive resin composition 5b to form the second black matrix 9b. Show.

(Formation of first black matrix)
First, as shown in FIG. 1A, a first black photosensitive resin composition 5a is applied on a substrate 3. A prebaking process is performed as needed and the 1st black photosensitive resin composition 5a is dried.

(substrate)
The substrate 3 is not particularly limited, and a transparent substrate generally used for a color filter can be used. For example, inflexible transparent rigid materials such as borosilicate glass, aluminoborosilicate glass, alkali-free glass, quartz glass, synthetic quartz glass, soda lime glass, white sapphire, transparent resin film, optical resin film, etc. A transparent flexible material having the following flexibility can be used. As the flexible material, acrylic such as polymethyl methacrylate, polyamide, polyacetal, polybutylene terephthalate, polyethylene terephthalate, polyethylene naphthalate, triacetyl cellulose, syndiotactic polystyrene, polyphenylene sulfide, polyether ketone, polyether ether ketone, Examples include fluororesin, polyether nitrile, polycarbonate, modified polyphenylene ether, polycyclohexene, polynorbornene resin, polysulfone, polyethersulfone, polyarylate, polyamideimide, polyetherimide, thermoplastic polyimide, and the like. However, those made of general plastics can also be used. In particular, alkali-free glass is a material having a small coefficient of thermal expansion, and is excellent in dimensional stability and characteristics in high-temperature heat treatment.

(Black photosensitive resin composition)
The first black photosensitive resin composition 5a is a photosensitive resin containing light shielding particles.
Hereinafter, although the case where a negative photosensitive resin is used is described in the first embodiment, a positive photosensitive resin can also be used. The negative photosensitive resin used in the first embodiment is not particularly limited, and a commonly used negative photosensitive resin can be used. For example, a chemically amplified photosensitive resin based on a crosslinked resin, specifically, a chemically amplified photosensitive resin in which a crosslinking agent is added to polyvinylphenol and an acid generator is further added. In addition, as an acrylic negative photosensitive resin, a photopolymerization initiator that generates a radical component upon irradiation with ultraviolet rays, a component that has an acrylic group in the molecule, causes a polymerization reaction by the generated radical, and cures thereafter, What contains the functional group (for example, the component which has an acidic group in the case of image development by an alkaline solution) which can melt | dissolve an unexposed part by image development can be used. Among the above-mentioned components having an acrylic group, examples of relatively low molecular weight polyfunctional acrylic molecules include dipentaerythritol hexaacrylate (DPHA), dipentaerythritol pentaacrylate (DPPA), and tetramethylpentatriacrylate (TMPTA). Can be mentioned. In addition, examples of high molecular weight polyfunctional acrylic molecules include polymers in which an acrylic group is introduced via an epoxy group into a part of the carboxylic acid group of the styrene-acrylic acid-benzyl methacrylate copolymer, and methyl methacrylate-styrene- An acrylic acid copolymer etc. are mentioned.
As the photosensitive resin, in addition to the above-described negative photosensitive resin, a positive photosensitive resin can be used. The positive photosensitive resin is not particularly limited, and a commonly used one can be used. Specifically, a chemically amplified photosensitive resin using a novolac resin as a base resin is an example of a positive photosensitive resin.

  Examples of the light-shielding particles added to the first black photosensitive resin composition 5a include metal oxide powders such as titanium oxide and iron tetroxide, metal sulfide powders, metal powders, carbon black, red, blue, Mixtures of pigments such as green can be used.

  Examples of the photosensitive resin coating method include spin coating, casting, dipping, bar coating, blade coating, roll coating, gravure coating, flexographic printing, spray coating, and die coating. is there.

  Thereafter, as shown in FIG. 1 (b), exposure light 17 is irradiated from the side coated with the first black photosensitive resin composition 5a through the first photomask 11a having a predetermined pattern. The first black photosensitive resin composition 5a is exposed with a pattern. Here, since the first black photosensitive resin composition 5a is a negative photosensitive resin, a photosensitive first black photosensitive resin composition 7a cured by exposure is obtained.

  The first photomask 11 a has a light shielding film 15 having a pattern corresponding to the pattern of the first black photosensitive resin composition 5 a to be removed on the photomask substrate 13. In the first photomask 11a, the transmission parts without the light shielding film 15 are sufficiently separated from each other.

  Thereafter, as shown in FIG. 1C, the substrate 3 is developed, the unexposed first black photosensitive resin composition 5a is dissolved, and further post-baking is performed, thereby exposing the first black photosensitive resin. The functional resin composition 7a is referred to as a first black matrix 9a. Here, since the distance J between the exposed first black photosensitive resin compositions 7a is sufficiently wide, the development can be sufficiently performed, and the width C of the first black matrix 9a is equal to the width of the first black photosensitive resin. It becomes substantially the same as the width A of the conductive resin composition 7a. The post-baking is performed by heating the substrate 3 having the exposed first black photosensitive resin composition 7a at a temperature of about 150 ° C. to 240 ° C.

(Formation of second black matrix)
As shown in FIG.1 (d), after forming a 1st black matrix, the 2nd black photosensitive resin composition 5b is apply | coated on the board | substrate 3 and the 1st black matrix 9a. As the second black photosensitive resin composition 5b, the same material as that of the first black photosensitive resin composition 5a can be used.

  Thereafter, as shown in FIG. 1 (e), the exposure light 17 is irradiated from the side coated with the second black photosensitive resin composition 5b through the second photomask 11b having a predetermined pattern. The second black photosensitive resin composition 5b is exposed with a pattern. Here, since the second black photosensitive resin composition 5b is a negative photosensitive resin, a photosensitive second black photosensitive resin composition 7b cured by exposure is obtained.

  The second photomask 11b has a light shielding film 15 having a pattern corresponding to the pattern of the second black photosensitive resin composition 5b to be removed on the photomask substrate 13. In the second photomask 11b, the transmission parts without the light shielding film 15 are sufficiently separated from each other.

  Thereafter, as shown in FIG. 1 (f), the substrate 3 is developed, the unexposed second black photosensitive resin composition 5b is dissolved, and further post-baking is performed, thereby exposing the second black photosensitive resin. The functional resin composition 7b is referred to as a second black matrix 9b. Here, since the distance J between the exposed second black photosensitive resin compositions 7b is sufficiently large, the width C of the second black matrix 9b is equal to that of the exposed second black photosensitive resin composition 7b. It is almost the same as the width A.

  Since both development and post-baking are performed after the formation of the first black matrix 9a, the first black matrix 9a is not affected in the second black matrix formation step. Therefore, in the process of developing the second black matrix, the first black matrix 9a does not affect, and the pattern interval is wide in both the first black matrix forming process and the second black matrix forming process. A black matrix with a narrow line width can be obtained under the same conditions as in the black matrix forming step.

  Here, if the second photomask 11b is exposed after the exposure with the first photomask 11a without performing the development and the post-baking, the same problem as in the development process of FIG. It is thought that the width of the matrix becomes thick.

  In FIG. 1, the black matrix is formed twice, but if a higher definition black matrix is required, the black matrix may be formed three times or more. That is, a step (a) of applying a black photosensitive resin composition to a substrate, a step (b) of exposing the black photosensitive resin composition through a photomask, and a step of developing the black photosensitive resin composition ( The black matrix may be formed by repeating c) and the step (d) of post-baking the black photosensitive resin composition three times or more.

(Method for Producing Color Filter According to First Embodiment)
2A to 2C are views showing a method for manufacturing the color filter 27 according to the first embodiment.
FIG. 2A shows a process of forming a first black matrix 21 a having a lattice pattern on the substrate 3.
FIG. 2B shows a process of forming a second black matrix 21b having a lattice pattern on the substrate 3 and the first black matrix 21a.
FIG. 2C shows a process of forming the colored layer 23 in the openings of the first black matrix 21a and the second black matrix 21b.

In the step of forming the first black matrix 21a shown in FIG. 2 (a), the first black photosensitive resin composition is actually applied to the substrate as shown in FIGS. 1 (a) to (c). A step, a step of exposing the first black photosensitive resin composition through a first photomask, a step of developing the first black photosensitive resin composition, and a first black photosensitive resin composition And post-baking to form a first black matrix.
Similarly, in the step of forming the second black matrix 21b shown in FIG. 2B, the second black matrix 21b is formed on the substrate and the first black matrix as shown in FIGS. A step of applying a black photosensitive resin composition, a step of exposing the second black photosensitive resin composition through a second photomask, and a step of developing the second black photosensitive resin composition; Post-baking the second black photosensitive resin composition to form a second black matrix.

  The pattern of the first photomask is a grid pattern, and the pattern of the second photomask is also a grid pattern. Further, when exposure is performed using the second photomask, exposure may be performed using a photomask different from the first photomask, or exposure may be performed by shifting the position of the same mask as the first photomask. May be.

  By forming the first black matrix 21a and the second black matrix 21b on the substrate 3, the black matrix substrate 25 is obtained. The second black matrix 21b is formed so as to divide the opening of the first black matrix 21a. Since the rectangular portion of the first black matrix 21a is sufficiently large, the corner portion of the rectangular portion is not rounded or the line width is not increased, and the corner portion or the line width of the rectangular portion is formed in a predetermined shape. The

  FIG. 5A is a cross-sectional view taken along the line X-X ′ of FIG. In FIG. 2B, the second black matrix 21b overlaps the first black matrix 21a at the intersection of the second black matrix 21b and the first black matrix 21a, and is formed so as to overlap. The height is higher than both the first black matrix 21a and the second black matrix 21b.

  In FIG. 2C, the color filter 27 is formed by forming the colored layer 23 of each color such as a red colored layer, a blue colored layer, a green colored layer, and a yellow colored layer in the opening of the black matrix substrate 25. In FIG. 2C, the four colored layers 23 are used, but in reality, three colors of red, blue, and green may be used, and the number of colors may be further increased.

  The formation of the colored layer 23 for each color is not particularly limited, and a general method for forming a colored layer can be used. For example, after applying a photosensitive resin containing a colorant for each color, it has a predetermined appropriate pattern. It can be formed by patterning by exposure using a photomask, development and patterning. For the red colored layer, the blue colored layer, the green colored layer, and the yellow colored layer, a photosensitive resin in which an appropriate colorant or the like corresponding to each color is dispersed and contained is used. As the photosensitive resin, the above-described negative photosensitive resin or positive photosensitive resin can be used.

  As an example of another method for forming the colored layer, an inkjet method may be used. The inkjet method is a method in which a colored layer forming coating solution is discharged and applied to the opening of the black matrix substrate 25, and usually has a plurality of nozzles that can discharge the colored layer forming coating solution. An ink jet head is used.

(Another example of the color filter manufacturing method according to the first embodiment)
3A to 3C are diagrams showing another example of the method for manufacturing the color filter 27 according to the first embodiment.
FIG. 3A shows a process of forming the first black matrix 21 a having a lattice pattern on the substrate 3.
FIG. 3B shows a process of forming the colored layer 23 in the opening of the first black matrix 21a.
FIG. 3C shows a step of forming a second black matrix 21 b having a lattice pattern on the substrate 3, the first black matrix 21 a, and the coloring layer 23.

  In this case, by forming the colored layer 23 before the second black matrix 21b, the second black matrix 21b can reliably cover the colored layer 23. As a result, it is possible to more reliably prevent the colored layer 23 from being mixed in color and from causing white spots without overlapping between the colored layer and the black matrix.

(Another example of the black matrix substrate according to the first embodiment)
FIG. 4 is a view showing a black matrix substrate 29 which is another example of the black matrix substrate according to the first embodiment. In the black matrix substrate 29, the second black matrix 21c is formed so as not to overlap the first black matrix 21a. That is, the second black matrix 21c is formed from a plurality of cross-shaped black matrices.

  FIG. 5B shows a Y-Y ′ cross-sectional view in FIG. 4. In FIG. 4, the second black matrix 21c does not overlap the first black matrix 21a, and the height of the black matrix is substantially the same on the substrate.

(Effects of the first embodiment)
In the first embodiment, since the process of forming the black matrix with a sufficiently wide line pattern as shown in FIG. 13 is repeated a plurality of times, the line width of each formed black matrix is narrow. As a result, a precise black matrix can be obtained with a narrow line width.

  In the first embodiment, since a material and manufacturing conditions for forming a black matrix with a sufficiently wide line pattern as shown in FIG. 13 can be used as they are, a new photosensitive resin composition is used. Compared to development, it is advantageous in terms of cost and time. Further, since the manufacturing conditions are the same as in the case where the spacing between the lines is wide as shown in FIG. 13, the black matrix linearity can be made to the same good finish.

  In the first embodiment, since the manufacturing process of the black matrix substrate is divided into a plurality of times, the manufacturing process of the black matrix is increased as compared with the case where the black matrix is formed by one exposure / development. However, although the lead time for manufacturing the black matrix substrate becomes long, the throughput from the production line once started is the same as the conventional method because the black matrix forming process is performed under the same conditions as the conventional method. . On the other hand, when the development time is increased, the development time becomes a bottleneck, and it is necessary to move the production line in accordance with the increased development time, so that the throughput of the production line decreases.

(Second Embodiment)
Next, a second embodiment will be described. In the second embodiment, the first black matrix 31a is a lattice pattern, and the second black matrix 31b and the third black matrix 31c are linear patterns.

6A to 6D are views showing a method for manufacturing the color filter 37 according to the second embodiment.
FIG. 6A shows a process of forming the first black matrix 31 a having a lattice pattern on the substrate 3.
FIG. 6B shows a step of forming a second black matrix 31b having a linear pattern on the substrate 3 and the first black matrix 31a.
FIG. 6C shows a step of forming a third black matrix 31c having a linear pattern on the substrate 3 and the first black matrix 31a.
FIG. 6D shows a process of forming the colored layer 33 in the opening formed by the substrate 3, the first black matrix 31a, the second black matrix 31b, and the third black matrix 31c.

In the step of forming the first black matrix 31a shown in FIG. 6 (a), the first black photosensitive resin composition is actually applied to the substrate as shown in FIGS. 1 (a) to 1 (c). A step, a step of exposing the first black photosensitive resin composition through a first photomask, a step of developing the first black photosensitive resin composition, and a first black photosensitive resin composition And post-baking to form a first black matrix.
Similarly, in the step of forming the second black matrix 31b shown in FIG. 6B, the second black matrix 31b is formed on the substrate and the first black matrix as shown in FIGS. A step of applying a black photosensitive resin composition, a step of exposing the second black photosensitive resin composition through a second photomask, and a step of developing the second black photosensitive resin composition; Post-baking the second black photosensitive resin composition to form a second black matrix.
Further, in the step of forming the third black matrix 31c shown in FIG. 6C, the third black photosensitive resin composition is applied on the substrate, the first black matrix, and the second black matrix. A step of exposing the third black photosensitive resin composition through a third photomask; a step of developing the third black photosensitive resin composition; and a third black photosensitive resin composition. Post-baking to form a third black matrix.

  The pattern of the first photomask is a lattice pattern, the pattern of the second photomask is a linear pattern, and the pattern of the third photomask is a linear pattern. A linear pattern is a pattern in which a plurality of lines are arranged in parallel.

  By forming the first black matrix 31a, the second black matrix 31b, and the third black matrix 31c on the substrate 3, the black matrix substrate 35 is obtained. The second black matrix 31b and the third black matrix 31c are formed so as to divide the opening of the first black matrix 31a.

  In FIG. 6D, a color layer 37 of each color such as a red color layer, a blue color layer, and a green color layer is formed in the opening of the black matrix substrate 35 to form a color filter 37. In FIG. 6D, the three colored layers 33 are used, but the number of colors may be further increased. The colored layer 33 can be formed by the same method as the colored layer 23.

(Another example of the color filter manufacturing method according to the second embodiment)
7A to 7D are diagrams illustrating another example of the method for manufacturing the color filter 37 according to the second embodiment.
FIG. 7A shows a process of forming a first black matrix 31 a having a lattice pattern on the substrate 3.
FIG. 7B shows a process of forming the colored layer 33 in the opening of the first black matrix 31a.
FIG. 7C shows a step of forming a second black matrix 31 b having a linear pattern on the substrate 3, the first black matrix 31 a and the coloring layer 33.
FIG. 7D shows a step of forming a third black matrix 31 c having a linear pattern on the substrate 3, the first black matrix 31 a, and the coloring layer 33.

  In this case, the colored layer 33 is formed before the second black matrix 31b and the third black matrix 31c, so that the second black matrix 31b and the third black matrix 31c cover the colored layer 33. it can. As a result, it is possible to more reliably prevent the colored layer from being mixed, and the colored layer and the black matrix from being whitened without overlapping.

(Another example of the black matrix substrate according to the second embodiment)
FIG. 8 is a view showing a black matrix substrate 39 which is another example of the black matrix substrate according to the second embodiment. In the black matrix substrate 39, the second black matrix 31d and the third black matrix 31e are formed so as not to overlap with the first black matrix 31a. That is, the second black matrix 31d and the third black matrix 31e are configured by a plurality of dotted black matrices arranged in parallel.

  The second embodiment also has the same effect as the first embodiment.

(Third embodiment)
Next, a third embodiment will be described. In the third embodiment, the first black matrix 41a is a linear pattern, and the second black matrix 41b is a linear pattern.

9A to 9C are diagrams illustrating a method for manufacturing the color filter 47 according to the third embodiment.
FIG. 9A shows a process of forming the first black matrix 41 a having a linear pattern on the substrate 3.
FIG. 9B shows a step of forming a second black matrix 41b having a linear pattern intersecting with the first black matrix 41a on the substrate 3 and the first black matrix 41a.
FIG. 9C shows a step of forming the colored layer 43 in the opening formed by the substrate 3, the first black matrix 41a, and the second black matrix 41b.

In the step of forming the first black matrix 41a shown in FIG. 9A, the first black photosensitive resin composition is actually applied to the substrate as shown in FIGS. 1A to 1C. A step, a step of exposing the first black photosensitive resin composition through a first photomask, a step of developing the first black photosensitive resin composition, and a first black photosensitive resin composition And post-baking to form a first black matrix.
Similarly, in the step of forming the second black matrix 31b shown in FIG. 9B, the second black matrix 31b is formed on the substrate and the first black matrix as shown in FIGS. Applying the photosensitive resin composition, exposing the second black photosensitive resin composition through the second photomask, developing the second black photosensitive resin composition, Post-baking the black photosensitive resin composition of No. 2 to form a second black matrix.

  The pattern of the first photomask is a linear pattern, and the pattern of the second photomask is also a linear pattern. Further, as the second photomask, the same mask as the first photomask may be rotated and used.

  In order to form a high-definition black matrix, when the pattern spacing of the first black matrix is too narrow to be formed with a predetermined line width, the first black matrix is divided into two times. May be formed. That is, in FIG. 9, the first black matrix 41a in which the lines are arranged in the vertical direction is formed once, and the second black matrix 41b in which the lines are arranged in the horizontal direction is formed once, and the black matrix is divided into two times in total. A matrix is formed. However, the first black matrix in which the lines are arranged in the vertical direction is formed in two times, the second black matrix in which the lines are arranged in the horizontal direction is formed in two times, and the black matrix is divided into four times in total. May be formed.

  By forming the first black matrix 41a and the second black matrix 41b on the substrate 3, the black matrix substrate 45 is obtained. The second black matrix 41b is formed so as to intersect with the first black matrix 41a and form an opening.

  In FIG. 9C, the color filter 47 is formed by forming the colored layer 43 of each color such as a red colored layer, a blue colored layer, a green colored layer, and a yellow colored layer in the opening of the black matrix substrate 45. In FIG. 9C, four colored layers 43 are used, but three colors of red, blue, and green may be used, or the number of colors may be further increased. The colored layer 43 can be formed by the same method as the colored layer 23.

(Another example of the color filter manufacturing method according to the third embodiment)
FIGS. 10A to 10C are diagrams showing another example of the method for manufacturing the color filter 47 according to the third embodiment.
FIG. 10A shows a process of forming the first black matrix 41 a having a linear pattern on the substrate 3.
FIG. 10B shows a step of forming the colored layer 43 between the first black matrices 41a.
FIG. 10C shows a step of forming a second black matrix 41 b having a linear pattern on the substrate 3, the first black matrix 41 a and the coloring layer 43.

  In this case, by forming the colored layer 43 prior to the second black matrix 41b, the second black matrix 41b can reliably cover the colored layer 43. As a result, it is possible to more reliably prevent the colored layer from being mixed, and the colored layer and the black matrix from being whitened without overlapping.

(Another example of the black matrix substrate according to the third embodiment)
FIG. 11 is a view showing a black matrix substrate 49 which is another example of the black matrix substrate according to the third embodiment. In the black matrix substrate 49, the second black matrix 41c is formed so as not to overlap the first black matrix 41a. That is, the second black matrix 41c is configured by arranging a plurality of dotted black matrices in parallel.

(Effect of the third embodiment)
The third embodiment also has the same effect as the first embodiment.
Furthermore, in the third embodiment, since each black matrix to be formed has a linear pattern, the corners do not become round at the intersection formed by the intersection of the two black matrices. The aperture ratio of the black matrix substrate is improved. That is, when the lattice-like black matrix is formed by photolithography, the intersection of the lattice is difficult to be developed, so that the corner of the intersection tends to be rounded as shown in FIG. When the linear patterns are overlapped as in the embodiment, the intersection is not developed at the time of formation, so that the corner of the intersection of the obtained black matrix lattice is not easily rounded.

(Liquid crystal display device)
The liquid crystal display device according to the present invention has a liquid crystal layer filled with liquid crystal between a color filter and a liquid crystal drive substrate, and the liquid crystal layer is sealed with a sealant. The color filter is a color filter according to the first to third embodiments, which is formed by dividing the black matrix into a plurality of times, and on the colored layer or the black matrix, a photo spacer or a transparent conductive film, if necessary. An alignment film or the like is formed. The liquid crystal drive substrate is formed with TFTs or the like to drive the liquid crystal corresponding to each pixel. The liquid crystal orientation of the liquid crystal layer is changed by the voltage applied by the liquid crystal drive substrate, and the backlight light is transmitted. Can display the image.

(Organic electroluminescence display)
The organic electroluminescence display device according to the present invention includes an organic electroluminescence light source having an organic electroluminescence layer on a substrate, and a color filter provided on the observation side of the organic EL light source. The color filter is a color filter according to the first to third embodiments that forms the black matrix in a plurality of times. An organic electroluminescence light source has an organic electroluminescence layer and a transparent electrode layer and a back electrode layer that sandwich the organic electroluminescence layer on a substrate. When the organic electroluminescence light source emits white light, it can be colored into white light by a color filter. In addition, when the organic electroluminescence light source itself emits light in a plurality of colors, the color can be brightened by the color filter.

  The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. It will be apparent to those skilled in the art that various changes and modifications can be made within the scope of the technical idea disclosed in the present application, and these are naturally within the technical scope of the present invention. Understood.

3 ......... Substrate 5a ......... First black photosensitive resin composition 5b ......... Second black photosensitive resin 7a ......... First photosensitive black photosensitive resin composition 7b ......... Second The photosensitive black photosensitive resin composition 9a .... the first black matrix 9b .... the second black matrix 10 .... the black matrix substrate 11a .... the first photomask 11b .... the second. Photomask 13... Photomask substrate 15... Light shielding film 17... Exposure light 21 a... First black matrix 21 b ... Second black matrix 21 c ... Second black matrix 23 ......... Colored layer 25 ......... Black matrix substrate 27 ......... Color filter 29 ......... Black matrix substrate 31a ......... First black matrix 31b ......... Second Rack matrix 31c ......... third black matrix 31d ......... second black matrix 31e ......... third black matrix 33 ......... colored layer 35 ......... black matrix substrate 37 ......... color filter 39 ... ...... Black matrix substrate 41a ......... First black matrix 41b ......... Second black matrix 41c ......... Second black matrix 43 ......... Colored layer 45 ......... Black matrix substrate 47 ......... Color Filter 49 ......... Black matrix substrate 103 ......... Substrate 105 ......... Black photosensitive resin composition 107 ......... Black photosensitive resin composition 109 exposed ... Black matrix 111 ...... Photomask 113 ... ... Photomask substrate 115 ......... Light shielding film 117 ......... Exposure light 1 21 ......... Photomask 123 ......... Photomask substrate 125 ......... Light-shielding film 129 ......... Black matrix 131 ......... Black matrix 133 ......... Opening portion 141 ......... Black matrix 143 ......... Opening portion 151 ... Black matrix (design)
153a ......... first black matrix 153b ......... second black matrix 155a ......... first black matrix 155b ......... second black matrix 155c ......... third black matrix 155d ......... first 4 black matrix

Claims (19)

Applying a first black photosensitive resin composition to the substrate;
Exposing the first black photosensitive resin composition through a first photomask;
Developing the first black photosensitive resin composition;
Post-baking the first black photosensitive resin composition to form a first black matrix;
Applying a second black photosensitive resin composition on the substrate and the first black matrix;
Exposing the second black photosensitive resin composition through a second photomask;
Developing the second black photosensitive resin composition;
Post-baking the second black photosensitive resin composition to form a second black matrix;
Have
A black matrix substrate having a cross-shaped portion formed by a line segment of the first black matrix and a line segment of the second black matrix in a plane is manufactured. Method. Applying a first black photosensitive resin composition to the substrate;
Exposing the first black photosensitive resin composition through a first photomask;
Developing the first black photosensitive resin composition;
Post-baking the first black photosensitive resin composition to form a first black matrix;
Applying a second black photosensitive resin composition on the substrate and the first black matrix;
Exposing the second black photosensitive resin composition through a second photomask;
Developing the second black photosensitive resin composition;
Post-baking the second black photosensitive resin composition to form a second black matrix;
Have
A black matrix substrate characterized in that the first photomask for forming the first black matrix and the second photomask for forming the second black matrix are the same. Production method. Applying a first black photosensitive resin composition to the substrate;
Exposing the first black photosensitive resin composition through a first photomask;
Developing the first black photosensitive resin composition;
Post-baking the first black photosensitive resin composition to form a first black matrix;
Applying a second black photosensitive resin composition on the substrate and the first black matrix;
Exposing the second black photosensitive resin composition through a second photomask;
Developing the second black photosensitive resin composition;
Post-baking the second black photosensitive resin composition to form a second black matrix;
Have
A method for manufacturing a black matrix substrate, wherein both the first photomask pattern and the second photomask pattern are linear patterns. Applying a first black photosensitive resin composition to the substrate;
Exposing the first black photosensitive resin composition through a first photomask;
Developing the first black photosensitive resin composition;
Post-baking the first black photosensitive resin composition to form a first black matrix;
Applying a second black photosensitive resin composition on the substrate and the first black matrix;
Exposing the second black photosensitive resin composition through a second photomask;
Developing the second black photosensitive resin composition;
Post-baking the second black photosensitive resin composition to form a second black matrix;
Have
Producing a black matrix substrate in which a height of a portion formed by overlapping the first black matrix and the second black matrix is higher than that of the first black matrix or the second black matrix; A method for manufacturing a black matrix substrate, characterized by comprising: Applying a first black photosensitive resin composition to the substrate;
Exposing the first black photosensitive resin composition through a first photomask;
Developing the first black photosensitive resin composition;
Post-baking the first black photosensitive resin composition to form a first black matrix;
Applying a second black photosensitive resin composition on the substrate and the first black matrix;
Exposing the second black photosensitive resin composition through a second photomask;
Developing the second black photosensitive resin composition;
Post-baking the second black photosensitive resin composition to form a second black matrix;
Forming a colored layer in openings of the first black matrix and the second black matrix on the substrate;
Have
A method for producing a color filter, comprising: producing a color filter having a cross-shaped portion by a line segment of the first black matrix and a line segment of the second black matrix in a plane. Applying a first black photosensitive resin composition to the substrate;
Exposing the first black photosensitive resin composition through a first photomask;
Developing the first black photosensitive resin composition;
Post-baking the first black photosensitive resin composition to form a first black matrix;
Applying a second black photosensitive resin composition on the substrate and the first black matrix;
Exposing the second black photosensitive resin composition through a second photomask;
Developing the second black photosensitive resin composition;
Post-baking the second black photosensitive resin composition to form a second black matrix;
Forming a colored layer in openings of the first black matrix and the second black matrix on the substrate;
Have
Manufacturing of a color filter, wherein the first photomask for forming the first black matrix and the second photomask for forming the second black matrix are the same Method. Applying a first black photosensitive resin composition to the substrate;
Exposing the first black photosensitive resin composition through a first photomask;
Developing the first black photosensitive resin composition;
Post-baking the first black photosensitive resin composition to form a first black matrix;
Applying a second black photosensitive resin composition on the substrate and the first black matrix;
Exposing the second black photosensitive resin composition through a second photomask;
Developing the second black photosensitive resin composition;
Post-baking the second black photosensitive resin composition to form a second black matrix;
Forming a colored layer in openings of the first black matrix and the second black matrix on the substrate;
Have
The color filter manufacturing method, wherein both the first photomask pattern and the second photomask pattern are linear patterns. Applying a first black photosensitive resin composition to the substrate;
Exposing the first black photosensitive resin composition through a first photomask;
Developing the first black photosensitive resin composition;
Post-baking the first black photosensitive resin composition to form a first black matrix;
Applying a second black photosensitive resin composition on the substrate and the first black matrix;
Exposing the second black photosensitive resin composition through a second photomask;
Developing the second black photosensitive resin composition;
Post-baking the second black photosensitive resin composition to form a second black matrix;
Forming a colored layer in openings of the first black matrix and the second black matrix on the substrate;
Have
A color filter in which a height of a portion formed by overlapping the first black matrix and the second black matrix is higher than that of the first black matrix or the second black matrix is manufactured. A method for producing a color filter. Applying a first black photosensitive resin composition to the substrate;
Exposing the first black photosensitive resin composition through a first photomask;
Developing the first black photosensitive resin composition;
Post-baking the first black photosensitive resin composition to form a first black matrix;
Forming a colored layer in the opening of the first black matrix;
Applying a second black photosensitive resin composition on the substrate, the first black matrix and the colored layer;
Exposing the second black photosensitive resin composition through a second photomask;
Developing the second black photosensitive resin composition;
Post-baking the second black photosensitive resin composition to form a second black matrix;
A method for producing a color filter, comprising: A substrate,
A first black matrix formed on the substrate;
A second black matrix formed on the substrate so as to divide an opening of the first black matrix;
Have
A black matrix substrate having a cross-shaped portion by a line segment of the first black matrix and a line segment of the second black matrix in a plane. A substrate,
A first black matrix formed on the substrate;
A second black matrix formed on the substrate so as to divide an opening of the first black matrix;
Have
The black matrix substrate, wherein the first black matrix and the second black matrix have the same pattern. A substrate,
A first black matrix formed on the substrate;
A second black matrix formed on the substrate so as to divide an opening of the first black matrix;
Have
The black matrix substrate, wherein both the first black matrix pattern and the second black matrix pattern are linear patterns. A substrate,
A first black matrix formed on the substrate;
A second black matrix formed on the substrate so as to divide an opening of the first black matrix;
Have
A black matrix substrate, wherein a height of a portion formed by overlapping the first black matrix and the second black matrix is higher than that of the first black matrix or the second black matrix. . A substrate,
A first black matrix formed on the substrate;
A second black matrix formed on the substrate so as to divide an opening of the first black matrix;
On the substrate, a colored layer formed in openings of the first black matrix and the second black matrix;
Have
A color filter having a cross-shaped portion formed by a line segment of the first black matrix and a line segment of the second black matrix in a plane, and the second black matrix covers the colored layer . A substrate,
A first black matrix formed on the substrate;
A second black matrix formed on the substrate so as to divide an opening of the first black matrix;
On the substrate, a colored layer formed in openings of the first black matrix and the second black matrix;
Have
A color filter, wherein the first black matrix and the second black matrix have the same pattern. A substrate,
A first black matrix formed on the substrate;
A second black matrix formed on the substrate so as to divide an opening of the first black matrix;
On the substrate, a colored layer formed in openings of the first black matrix and the second black matrix;
Have
Wherein the first black matrix pattern and the second black matrix patterns are both Ri linear pattern der, characterized that you intersect at the first black matrix and the second black matrix plane Color filter. A substrate,
A first black matrix formed on the substrate;
A second black matrix formed on the substrate so as to divide an opening of the first black matrix;
On the substrate, a colored layer formed in openings of the first black matrix and the second black matrix;
Have
A color filter, wherein a height of a portion formed by overlapping the first black matrix and the second black matrix is higher than that of the first black matrix or the second black matrix. The color filter according to any one of claims 14 to 17,
A liquid crystal driving substrate facing the color filter;
A liquid crystal layer sealed between the color filter and the liquid crystal driving substrate;
A liquid crystal display device comprising: An organic electroluminescence light source having an organic electroluminescence layer on a substrate;
The color filter according to any one of claims 14 to 17, provided on the observation side of the organic EL light source,
An organic electroluminescence display device comprising:

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