JP2005134878A - Method for manufacturing bank structure - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing bank structure required to manufacture the color filter of a liquid crystal display by an ink jet method. <P>SOLUTION: A black matrix layer 102 is formed on color filter base material 100, and a photoresist layer 104a is formed on the black matrix layer 102. Patterning is performed to the photoresist layer 104a by a mask so as to obtain the bank structure 104b, and then patterning is performed to the black matrix layer 102. The color filter is formed by directly coloring the gratings formed by a pattering system of the black matrix layer 102 and the bank structure 104b with ink drops 106 by the ink jet method. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a method for manufacturing a bank structure for a color filter of a liquid crystal display, and more particularly to a method for manufacturing a bank structure required when a color filter is manufactured by an inkjet method.

  The color filter (Color Filter) is, for example, a charge coupled device (CCD) that is an image sensor, a line sensor (Line Sensor), or a liquid crystal display (Liquid Crystal Display: LCD) of a thin film transistor (TFT). It is applied in the direction. As the need for these products increases, so does the need for color filters. Therefore, reducing the manufacturing cost of the color filter has been an urgent issue that must be solved.

  The reduction of the manufacturing cost of the color filter required for the TFT liquid crystal display has attracted particular attention. Conventionally, the cost of manufacturing color filters has been greatly reduced by employing an inkjet manufacturing process. The ink jet manufacturing process is a manufacturing method in which ink droplets are sprayed to directly color the inside of a lattice structure made up of a black matrix on a filter substrate. Each type of filter has a different color ink jet type, and generally three colors of red, green, and blue (R, G, B) are defined as one basic unit (pixel). However, since ink contains a carrier (or water or organic solvent), ink droplets often overflow when printing by spraying sub-pixels, and other sub-pixels A problem of color mixing may occur. For this reason, normally, by forming a bank by a photolithography manufacturing process and forming a high and deep space for containing ink droplets, the ink droplets are limited to fine subpixels and the effect of clarifying the color of the subpixels is achieved. It has gained. The bank is generally formed by applying a photoresist solution on a substrate and exposing and developing it. Therefore, it is usually necessary to use a mask in the manufacturing process. The larger the size of the thin film transistor liquid crystal display, the larger the size of the mask required for the inkjet manufacturing process, and the ratio of the cost of the mask to the entire color filter. It has risen.

  An object of the present invention is to provide a method for manufacturing a bank structure of a color filter that reduces the cost of an expensive mask in the manufacturing process of an LCD color filter.

  In order to achieve the above object, the present invention provides a method for manufacturing a color filter applied to a liquid crystal display. The manufacturing method of this color filter includes the following steps. A black matrix layer is formed on the color filter substrate, and a photoresist layer is formed on the black matrix layer. After patterning the photoresist layer with a mask to form a bank structure, the black matrix layer is patterned. The color filter is formed by directly coloring the inside of the lattice formed after the black matrix layer and the bank structure are patterned by the ink jet method.

  By applying the bank structure manufacturing method of the present invention, it is possible to reduce the cost of expensive masks in the LCD color filter manufacturing process. In addition, since the manufacturing process of the bank structure can be reduced, the required manufacturing process time can be shortened as compared with the prior art.

  In this embodiment, in order to reduce the cost of the mask occupied by the entire color filter in the process of manufacturing a color filter by the inkjet method (Ink Jet Printing), in this embodiment, the patterned photoresist layer is directly formed into a bank structure. And reduce the mask by one.

  The so-called bank structure has a single layer film formed on the black matrix layer and patterned in the same manner as the black matrix layer. The lattice structure formed after patterning the bank structure and the black matrix layer is a position colored with ink droplets by an ink jet method. The present embodiment provides a low-cost method for manufacturing a bank structure and replaces the conventional method for manufacturing a bank structure. Embodiments of the present invention will be described below with reference to embodiments.

  1A to 1C are diagrams illustrating steps for manufacturing a bank structure according to a preferred embodiment of the present invention. As shown in FIG. 1A, a black matrix layer 102 having a function of blocking light transmission is first formed on a color filter substrate 100. Then, a photoresist layer 104 is formed on the black matrix layer 102 in order to pattern the black matrix layer 102. As shown in FIG. 1B, the photoresist layer 104a is patterned by conventional exposure and phenomenon steps using a patterned mask (not shown). The patterned photoresist layer 104a (bank structure 104b) can be used not only as a shading mask for etching the black matrix layer 102 but also as a bank structure necessary for the ink jet method. FIG. 1C shows the black matrix layer 102 and the bank structure 104b patterned by an etching method.

When considering the production amount of the manufacturing process of the LCD color filter, the one-shot method is adopted, and therefore the mask size corresponds to the size of the color filter substrate. This increases the cost of the mask. For example, the fourth generation color filter must use an 800 × 920 mm ² mask for a substrate of size 680 × 880 mm ² , and its commercial price is about 2 million Taiwan dollars. Therefore, the method provided by the present embodiment can reduce the cost of the mask for the manufacturing process of the LCD color filter.

  2A to 2C show the coloring step of the inkjet method according to a preferred embodiment of the present invention. As shown in FIG. 2A, ink droplets 106 are used to color the necessary lattice structure formed by the patterning method of the bank structure 104b and the black matrix layer 102 by an inkjet method. Ink drops 106 may be red, green or blue, or other colors as required. FIG. 2B shows a state where ink droplets adhere to the grid. In order to quickly deposit ink droplets into the lattice, the curing rate may be increased by a method such as vacuum suction, baking, or ultraviolet irradiation. FIG. 2C shows the state of the ink droplet 108 after curing.

  As can be seen from the above-described preferred embodiment of the present invention, this bank structure manufacturing method can reduce the expensive mask cost for the manufacturing process of the LCD color filter. In addition, since the number of manufacturing steps of the mask structure is reduced, the process time required for manufacturing is shortened compared to the conventional one.

  In the present invention, preferred embodiments have been disclosed as described above. However, these embodiments are not intended to limit the present invention, and any person who is familiar with the technology can use various embodiments within the scope and spirit of the present invention. Changes and modifications can be made. Therefore, the scope of protection of the present invention is based on the contents specified in the claims.

It is sectional drawing which shows the manufacturing step of the bank structure of preferable one Embodiment of this invention. It is sectional drawing which shows the manufacturing step of the bank structure of preferable one Embodiment of this invention. It is sectional drawing which shows the manufacturing step of the bank structure of preferable one Embodiment of this invention. It is sectional drawing which shows the coloring step of the inkjet method of suitable one Embodiment of this invention. It is sectional drawing which shows the coloring step of the inkjet method of suitable one Embodiment of this invention. It is sectional drawing which shows the coloring step of the inkjet method of suitable one Embodiment of this invention.

Explanation of symbols

100: Color filter substrate 102: Black matrix layer 104b: Bank structure 106: Ink droplet 108: Cured ink droplet

Claims (7)

A manufacturing method of a bank structure applied when manufacturing a color filter of a liquid crystal display by an inkjet method,
Forming a black matrix layer on the color filter substrate, and forming a photoresist layer on the black matrix layer;
Patterning the photoresist layer with a mask to form a bank structure;
Forming a lattice structure necessary for an inkjet method after patterning the photoresist layer and the black matrix layer on the patterned black matrix layer.   The method of claim 1, wherein the photoresist layer is patterned by conventional exposure and development steps.   2. The method of manufacturing a bank structure according to claim 1, wherein the black matrix layer is patterned by an etching method. A method for producing a color filter to be applied to a liquid crystal display,
Forming a black matrix layer on the color filter substrate, and forming a photoresist layer on the black matrix layer;
Patterning the photoresist layer with a mask to form a bank structure;
Patterning the black matrix layer;
And a step of directly coloring the lattice structure constituted by patterning of the black matrix layer and the bank structure with color ink droplets by an ink jet method.   5. The method for producing a color filter according to claim 4, further comprising a step of curing the color ink droplets by a baking method.   The method of claim 4, wherein the photoresist layer is patterned by conventional exposure and development steps. 5. The method of manufacturing a color filter according to claim 4, wherein the black matrix layer is patterned by an etching method.

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